JPS5128466B1 - - Google Patents
Info
- Publication number
- JPS5128466B1 JPS5128466B1 JP46070987A JP7098771A JPS5128466B1 JP S5128466 B1 JPS5128466 B1 JP S5128466B1 JP 46070987 A JP46070987 A JP 46070987A JP 7098771 A JP7098771 A JP 7098771A JP S5128466 B1 JPS5128466 B1 JP S5128466B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
- B05C11/06—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface with a blast of gas or vapour
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Coating Apparatus (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US8340170A | 1970-10-23 | 1970-10-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5128466B1 true JPS5128466B1 (https=) | 1976-08-19 |
Family
ID=22178060
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP46070987A Pending JPS5128466B1 (https=) | 1970-10-23 | 1971-09-14 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3707944A (https=) |
| JP (1) | JPS5128466B1 (https=) |
| DE (1) | DE2151037C3 (https=) |
| FR (1) | FR2109716A5 (https=) |
| GB (1) | GB1299138A (https=) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6076652A (en) | 1971-04-16 | 2000-06-20 | Texas Instruments Incorporated | Assembly line system and apparatus controlling transfer of a workpiece |
| US3896762A (en) * | 1973-12-07 | 1975-07-29 | Purdue Research Foundation | Coating apparatus |
| DE2944180A1 (de) * | 1979-11-02 | 1981-05-07 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren zum herstellen einer einen halbleiterkoerper einseitig bedeckenden isolierschicht |
| DE3041238C2 (de) * | 1980-11-03 | 1982-09-30 | Erich Bockhacker, Emaillierungen, 4401 Saerbeck | Vorrichtung zum Beschichten der Innenseite von Hohlkörpern |
| NL8300649A (nl) * | 1983-02-21 | 1984-09-17 | Integrated Automation | Methode en inrichting voor het aanbrengen van een coating op een substraat of tape. |
| NL8200753A (nl) * | 1982-02-24 | 1983-09-16 | Integrated Automation | Methode en inrichting voor het aanbrengen van een coating op een substraat of tape. |
| JPS60210840A (ja) * | 1984-03-06 | 1985-10-23 | Fujitsu Ltd | スピン処理装置 |
| WO1987006057A1 (fr) * | 1986-04-03 | 1987-10-08 | Semax Prozess-Technik Gmbh | INSTALLATION ET PROCEDE POUR TRAITER DES TRANCHES DE SEMICONDUCTEURS (TRANCHES DE Si OU GaAs) POUR CIRCUITS INTEGRES |
| DE3720525A1 (de) * | 1987-06-20 | 1988-12-29 | Pav Praezisions Apparatebau Ag | Belackungsanlage fuer compact-discs |
| DE3732113C1 (de) * | 1987-09-24 | 1988-10-20 | Convac Gmbh | Einrichtung zur Inline-Belackung von Compact-Discs |
| KR970006206B1 (ko) * | 1988-02-10 | 1997-04-24 | 도오교오 에레구토론 가부시끼가이샤 | 자동 도포 시스템 |
| JPH0828565B2 (ja) * | 1990-09-06 | 1996-03-21 | ティーディーケイ株式会社 | 電子部品のプリント基板への搭載方法 |
| US5622747A (en) * | 1991-09-18 | 1997-04-22 | National Semiconductor Corporation | Method for dispensing a layer of photoresist on a wafer without spinning the wafer |
| DE19718471A1 (de) * | 1997-04-30 | 1998-11-05 | Steag Hamatech Gmbh Machines | Verfahren und Vorrichtung zum Verkleben von zwei Substraten |
| EP1626840A4 (en) * | 2003-04-21 | 2008-09-03 | Inopla Inc | DEVICE AND METHOD FOR POLISHING SEMICONDUCTOR WAFERS USING ONE OR MORE POLISHING SURFACES |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2185089A (en) * | 1937-06-11 | 1939-12-26 | Continental Can Co | Machine for coating can ends |
| GB510141A (en) * | 1938-02-04 | 1939-07-27 | Philips Nv | Improved method of constructing stratified electrode-systems |
| US2516908A (en) * | 1945-09-24 | 1950-08-01 | American Can Co | Apparatus for lining can ends |
| US3357856A (en) * | 1964-02-13 | 1967-12-12 | Electra Mfg Company | Method for metallizing openings in miniature printed circuit wafers |
| US3475867A (en) * | 1966-12-20 | 1969-11-04 | Monsanto Co | Processing of semiconductor wafers |
| US3538883A (en) * | 1967-12-12 | 1970-11-10 | Alco Standard Corp | Vacuum chuck with safety device |
| US3494326A (en) * | 1968-02-01 | 1970-02-10 | American Optical Corp | Spin-coating machine |
-
1970
- 1970-10-23 US US00083401A patent/US3707944A/en not_active Expired - Lifetime
-
1971
- 1971-08-20 FR FR7131085A patent/FR2109716A5/fr not_active Expired
- 1971-09-14 JP JP46070987A patent/JPS5128466B1/ja active Pending
- 1971-09-30 GB GB45502/71A patent/GB1299138A/en not_active Expired
- 1971-10-13 DE DE2151037A patent/DE2151037C3/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US3707944A (en) | 1973-01-02 |
| GB1299138A (en) | 1972-12-06 |
| DE2151037A1 (de) | 1972-05-04 |
| DE2151037C3 (de) | 1979-11-15 |
| DE2151037B2 (de) | 1979-03-15 |
| FR2109716A5 (https=) | 1972-05-26 |