JPS51115782A - Semiconductor apparatus - Google Patents

Semiconductor apparatus

Info

Publication number
JPS51115782A
JPS51115782A JP50040270A JP4027075A JPS51115782A JP S51115782 A JPS51115782 A JP S51115782A JP 50040270 A JP50040270 A JP 50040270A JP 4027075 A JP4027075 A JP 4027075A JP S51115782 A JPS51115782 A JP S51115782A
Authority
JP
Japan
Prior art keywords
semiconductor apparatus
high speed
type transistor
connection type
darlington connection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50040270A
Other languages
Japanese (ja)
Other versions
JPS561785B2 (en
Inventor
Takao Sasayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50040270A priority Critical patent/JPS51115782A/en
Priority to GB12506/76A priority patent/GB1539426A/en
Priority to DE2614065A priority patent/DE2614065B2/en
Publication of JPS51115782A publication Critical patent/JPS51115782A/en
Priority to US05/750,587 priority patent/US4100564A/en
Publication of JPS561785B2 publication Critical patent/JPS561785B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/611Combinations of BJTs and one or more of diodes, resistors or capacitors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D18/00Thyristors
    • H10D18/251Lateral thyristors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/104Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices having particular shapes of the bodies at or near reverse-biased junctions, e.g. having bevels or moats
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/641Combinations of only vertical BJTs
    • H10D84/642Combinations of non-inverted vertical BJTs of the same conductivity type having different characteristics, e.g. Darlington transistors

Landscapes

  • Bipolar Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)
  • Amplifiers (AREA)

Abstract

PURPOSE: A darlington connection type transistor fitted to switch major current by high speed.
COPYRIGHT: (C)1976,JPO&Japio
JP50040270A 1975-04-04 1975-04-04 Semiconductor apparatus Granted JPS51115782A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP50040270A JPS51115782A (en) 1975-04-04 1975-04-04 Semiconductor apparatus
GB12506/76A GB1539426A (en) 1975-04-04 1976-03-29 Power transistor device
DE2614065A DE2614065B2 (en) 1975-04-04 1976-04-01 Monolithically integrated Darlington pair
US05/750,587 US4100564A (en) 1975-04-04 1976-12-15 Power transistor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50040270A JPS51115782A (en) 1975-04-04 1975-04-04 Semiconductor apparatus

Publications (2)

Publication Number Publication Date
JPS51115782A true JPS51115782A (en) 1976-10-12
JPS561785B2 JPS561785B2 (en) 1981-01-16

Family

ID=12575938

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50040270A Granted JPS51115782A (en) 1975-04-04 1975-04-04 Semiconductor apparatus

Country Status (3)

Country Link
JP (1) JPS51115782A (en)
DE (1) DE2614065B2 (en)
GB (1) GB1539426A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1214806B (en) * 1984-09-21 1990-01-18 Ates Componenti Elettron INTEGRATED MONOLITHIC POWER AND SEMICONDUCTOR DEVICE
US4936928A (en) * 1985-11-27 1990-06-26 Raytheon Company Semiconductor device
GB2183907B (en) * 1985-11-27 1989-10-04 Raytheon Co Semiconductor device
CN113474878A (en) * 2018-10-12 2021-10-01 瑟其福耐斯特有限公司 Method of fabricating transistor device

Also Published As

Publication number Publication date
GB1539426A (en) 1979-01-31
JPS561785B2 (en) 1981-01-16
DE2614065B2 (en) 1978-06-22
DE2614065A1 (en) 1976-10-14

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