JPS51113477A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS51113477A
JPS51113477A JP3825075A JP3825075A JPS51113477A JP S51113477 A JPS51113477 A JP S51113477A JP 3825075 A JP3825075 A JP 3825075A JP 3825075 A JP3825075 A JP 3825075A JP S51113477 A JPS51113477 A JP S51113477A
Authority
JP
Japan
Prior art keywords
semiconductor device
wiring
layer
keeps
poly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3825075A
Other languages
Japanese (ja)
Inventor
Takaharu Nawata
Mikio Takagi
Kazufumi Nakayama
Chiaki Terada
Kunio Abe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3825075A priority Critical patent/JPS51113477A/en
Publication of JPS51113477A publication Critical patent/JPS51113477A/en
Pending legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE: This distributing layer of semiconductor device hinders projection generating even if aluminium wiring is treated by heat, keeps the smooth condition of membrane surface, and prevents short between conductor membranes even when poly-layer wiring is carried out.
COPYRIGHT: (C)1976,JPO&Japio
JP3825075A 1975-03-28 1975-03-28 Semiconductor device Pending JPS51113477A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3825075A JPS51113477A (en) 1975-03-28 1975-03-28 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3825075A JPS51113477A (en) 1975-03-28 1975-03-28 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS51113477A true JPS51113477A (en) 1976-10-06

Family

ID=12520051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3825075A Pending JPS51113477A (en) 1975-03-28 1975-03-28 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS51113477A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5274281A (en) * 1975-12-17 1977-06-22 Hitachi Ltd Production of semiconductor device
JPS5966150A (en) * 1982-10-08 1984-04-14 Toshiba Corp Semiconductor device and manufacture thereof
JPS6388845A (en) * 1986-10-01 1988-04-19 Nec Corp Manufacture of semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5274281A (en) * 1975-12-17 1977-06-22 Hitachi Ltd Production of semiconductor device
JPS5966150A (en) * 1982-10-08 1984-04-14 Toshiba Corp Semiconductor device and manufacture thereof
JPS6388845A (en) * 1986-10-01 1988-04-19 Nec Corp Manufacture of semiconductor device

Similar Documents

Publication Publication Date Title
JPS5240978A (en) Process for production of semiconductor device
JPS51113477A (en) Semiconductor device
JPS523390A (en) Manufacturing method of semiconductor device
JPS52142970A (en) Plasma treating device
JPS5227387A (en) Forming system of multi-layer wiring
JPS51140182A (en) Divesting process of covered wire
JPS5227390A (en) Electrode wiring formation system of semiconductor device
JPS5230188A (en) Process for producing smiconductor device
JPS52113162A (en) Preparation of semiconductor device
JPS51125698A (en) The formation of silicon dioxide film
JPS5240061A (en) Semiconductor device and process for production of same
JPS5268371A (en) Semiconductor device
JPS51145267A (en) Manufacture of semiconductor device
JPS525264A (en) Semi-conductor device
JPS522987A (en) Semi submerged boat
JPS525700A (en) The process for production of silicon nitride
JPS51147324A (en) Solvent for electronic wire resist
JPS51136183A (en) Insulated cable
JPS5214365A (en) Process for formation of insulating membrane by spreading
JPS51135465A (en) Semi-conductor unit
JPS51119154A (en) Floor heating system
JPS51138875A (en) Intermittent elmination
JPS51151075A (en) Etching apparatus
JPS5245089A (en) Making method for clamp for use of wiring or tubing
JPS51150137A (en) Water controller