JPS51107775A - Handotaisochino bisaikakohoho - Google Patents
Handotaisochino bisaikakohohoInfo
- Publication number
- JPS51107775A JPS51107775A JP3219575A JP3219575A JPS51107775A JP S51107775 A JPS51107775 A JP S51107775A JP 3219575 A JP3219575 A JP 3219575A JP 3219575 A JP3219575 A JP 3219575A JP S51107775 A JPS51107775 A JP S51107775A
- Authority
- JP
- Japan
- Prior art keywords
- bisaikakohoho
- handotaisochino
- handotaisochino bisaikakohoho
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3219575A JPS5851412B2 (en) | 1975-03-19 | 1975-03-19 | Microfabrication method for semiconductor devices |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3219575A JPS5851412B2 (en) | 1975-03-19 | 1975-03-19 | Microfabrication method for semiconductor devices |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59180514A Division JPS6084820A (en) | 1984-08-31 | 1984-08-31 | Method for fine processing |
JP18051584A Division JPS6074437A (en) | 1984-08-31 | 1984-08-31 | Fine processing of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51107775A true JPS51107775A (en) | 1976-09-24 |
JPS5851412B2 JPS5851412B2 (en) | 1983-11-16 |
Family
ID=12352110
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3219575A Expired JPS5851412B2 (en) | 1975-03-19 | 1975-03-19 | Microfabrication method for semiconductor devices |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5851412B2 (en) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55151338A (en) * | 1979-05-16 | 1980-11-25 | Matsushita Electric Ind Co Ltd | Fabricating method of semiconductor device |
JPS5793526A (en) * | 1980-12-03 | 1982-06-10 | Comput Basic Mach Technol Res Assoc | Forming method for thin film pattern |
JPS57106033A (en) * | 1980-12-23 | 1982-07-01 | Fujitsu Ltd | Formation of mask |
JPS57130430A (en) * | 1981-02-06 | 1982-08-12 | Nippon Telegr & Teleph Corp <Ntt> | Pattern formation |
JPS57143830A (en) * | 1981-01-27 | 1982-09-06 | Siemens Ag | Method of forming extrafine pattern |
JPS57186335A (en) * | 1981-05-12 | 1982-11-16 | Nippon Telegr & Teleph Corp <Ntt> | Forming method for pattern |
JPS583232A (en) * | 1981-06-30 | 1983-01-10 | Fujitsu Ltd | Forming method for pattern |
JPS5867028A (en) * | 1981-10-19 | 1983-04-21 | Toshiba Corp | Manufacture of semiconductor device |
JPS5888815A (en) * | 1981-11-20 | 1983-05-27 | Nec Corp | Production of thin film magnetic head |
JPS6074437A (en) * | 1984-08-31 | 1985-04-26 | Hitachi Ltd | Fine processing of semiconductor device |
JPS6084820A (en) * | 1984-08-31 | 1985-05-14 | Hitachi Ltd | Method for fine processing |
JPS60167428A (en) * | 1984-02-10 | 1985-08-30 | Mitsubishi Electric Corp | Fine process |
US7671471B2 (en) | 2004-04-20 | 2010-03-02 | Intel Corporation | Method for making a semiconductor device having a high-k dielectric layer and a metal gate electrode |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62188117U (en) * | 1986-05-21 | 1987-11-30 | ||
JPH0582012U (en) * | 1992-04-10 | 1993-11-05 | ティーディーケイ株式会社 | Magnetic shield type surface mount coil device |
-
1975
- 1975-03-19 JP JP3219575A patent/JPS5851412B2/en not_active Expired
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55151338A (en) * | 1979-05-16 | 1980-11-25 | Matsushita Electric Ind Co Ltd | Fabricating method of semiconductor device |
JPS5793526A (en) * | 1980-12-03 | 1982-06-10 | Comput Basic Mach Technol Res Assoc | Forming method for thin film pattern |
JPS57106033A (en) * | 1980-12-23 | 1982-07-01 | Fujitsu Ltd | Formation of mask |
JPS57143830A (en) * | 1981-01-27 | 1982-09-06 | Siemens Ag | Method of forming extrafine pattern |
JPS57130430A (en) * | 1981-02-06 | 1982-08-12 | Nippon Telegr & Teleph Corp <Ntt> | Pattern formation |
JPH0160940B2 (en) * | 1981-02-06 | 1989-12-26 | Nippon Telegraph & Telephone | |
JPH0143453B2 (en) * | 1981-05-12 | 1989-09-20 | Nippon Telegraph & Telephone | |
JPS57186335A (en) * | 1981-05-12 | 1982-11-16 | Nippon Telegr & Teleph Corp <Ntt> | Forming method for pattern |
JPS583232A (en) * | 1981-06-30 | 1983-01-10 | Fujitsu Ltd | Forming method for pattern |
JPH0224017B2 (en) * | 1981-06-30 | 1990-05-28 | Fujitsu Ltd | |
JPS5867028A (en) * | 1981-10-19 | 1983-04-21 | Toshiba Corp | Manufacture of semiconductor device |
JPS5888815A (en) * | 1981-11-20 | 1983-05-27 | Nec Corp | Production of thin film magnetic head |
JPS60167428A (en) * | 1984-02-10 | 1985-08-30 | Mitsubishi Electric Corp | Fine process |
JPS6074437A (en) * | 1984-08-31 | 1985-04-26 | Hitachi Ltd | Fine processing of semiconductor device |
JPS6084820A (en) * | 1984-08-31 | 1985-05-14 | Hitachi Ltd | Method for fine processing |
US7671471B2 (en) | 2004-04-20 | 2010-03-02 | Intel Corporation | Method for making a semiconductor device having a high-k dielectric layer and a metal gate electrode |
Also Published As
Publication number | Publication date |
---|---|
JPS5851412B2 (en) | 1983-11-16 |
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