JPS5051324A - - Google Patents
Info
- Publication number
- JPS5051324A JPS5051324A JP9964373A JP9964373A JPS5051324A JP S5051324 A JPS5051324 A JP S5051324A JP 9964373 A JP9964373 A JP 9964373A JP 9964373 A JP9964373 A JP 9964373A JP S5051324 A JPS5051324 A JP S5051324A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP48099643A JPS5743892B2 (fr) | 1973-09-04 | 1973-09-04 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP48099643A JPS5743892B2 (fr) | 1973-09-04 | 1973-09-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5051324A true JPS5051324A (fr) | 1975-05-08 |
JPS5743892B2 JPS5743892B2 (fr) | 1982-09-17 |
Family
ID=14252722
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP48099643A Expired JPS5743892B2 (fr) | 1973-09-04 | 1973-09-04 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5743892B2 (fr) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2406838A1 (fr) * | 1977-10-24 | 1979-05-18 | Fuji Photo Film Co Ltd | Procede de developpement de plaques de tirage planographique |
JPS5522759A (en) * | 1978-08-08 | 1980-02-18 | Fuji Photo Film Co Ltd | Developing method of positive type photosensitive lithographic printing plate |
JPS55115039A (en) * | 1979-02-27 | 1980-09-04 | Fuji Photo Film Co Ltd | Constant retention method for developing activity of developing solution |
JPS5612645A (en) * | 1979-07-11 | 1981-02-07 | Fuji Photo Film Co Ltd | Developing method for positive type photosensitive lithographic plate |
WO1982001086A1 (fr) * | 1980-09-20 | 1982-04-01 | Seino M | Procede permettant de developper une plaque d'impression lithographique photosensible positive |
JPS6012547A (ja) * | 1983-06-17 | 1985-01-22 | マイクロシィ・インコーポレーテッド | 高コントラストホトレジスト現像剤 |
JPS6278549A (ja) * | 1985-07-18 | 1987-04-10 | マイクロシィ・インコーポレーテッド | 放射感受性フイルム用現像液およびこれを用いる現像法 |
JPS62143055A (ja) * | 1979-02-27 | 1987-06-26 | Fuji Photo Film Co Ltd | 平版印刷版用処理剤 |
JPS6472155A (en) * | 1987-09-12 | 1989-03-17 | Tama Kagaku Kogyo Kk | Developing solution for positive type photoresist |
EP0732628A1 (fr) | 1995-03-07 | 1996-09-18 | Minnesota Mining And Manufacturing Company | Solution alkaline aqueuse pour le développement des plaques offset |
EP1314552A2 (fr) | 1998-04-06 | 2003-05-28 | Fuji Photo Film Co., Ltd. | Composition de résine photosensible |
EP1338415A2 (fr) | 2002-02-21 | 2003-08-27 | Fuji Photo Film Co., Ltd. | Procédé de fabrication d'une plaque d'impression lithographique |
EP1584984A1 (fr) | 2004-04-06 | 2005-10-12 | Fuji Photo Film Co., Ltd. | Méthode pour régénérer le développeur dans un appareil à développement automatique pour plaques d'impressions |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4842802A (fr) * | 1971-10-04 | 1973-06-21 |
-
1973
- 1973-09-04 JP JP48099643A patent/JPS5743892B2/ja not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4842802A (fr) * | 1971-10-04 | 1973-06-21 |
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2406838A1 (fr) * | 1977-10-24 | 1979-05-18 | Fuji Photo Film Co Ltd | Procede de developpement de plaques de tirage planographique |
JPS577427B2 (fr) * | 1978-08-08 | 1982-02-10 | ||
JPS5522759A (en) * | 1978-08-08 | 1980-02-18 | Fuji Photo Film Co Ltd | Developing method of positive type photosensitive lithographic printing plate |
JPS62143055A (ja) * | 1979-02-27 | 1987-06-26 | Fuji Photo Film Co Ltd | 平版印刷版用処理剤 |
JPS55115039A (en) * | 1979-02-27 | 1980-09-04 | Fuji Photo Film Co Ltd | Constant retention method for developing activity of developing solution |
JPH0411859B2 (fr) * | 1979-02-27 | 1992-03-02 | Fuji Photo Film Co Ltd | |
JPS6339895B2 (fr) * | 1979-07-11 | 1988-08-08 | Fuji Photo Film Co Ltd | |
JPS5612645A (en) * | 1979-07-11 | 1981-02-07 | Fuji Photo Film Co Ltd | Developing method for positive type photosensitive lithographic plate |
WO1982001086A1 (fr) * | 1980-09-20 | 1982-04-01 | Seino M | Procede permettant de developper une plaque d'impression lithographique photosensible positive |
JPH0462576B2 (fr) * | 1983-06-17 | 1992-10-06 | Maikuroshii Inc | |
JPS6012547A (ja) * | 1983-06-17 | 1985-01-22 | マイクロシィ・インコーポレーテッド | 高コントラストホトレジスト現像剤 |
JPS6278549A (ja) * | 1985-07-18 | 1987-04-10 | マイクロシィ・インコーポレーテッド | 放射感受性フイルム用現像液およびこれを用いる現像法 |
JPS6472155A (en) * | 1987-09-12 | 1989-03-17 | Tama Kagaku Kogyo Kk | Developing solution for positive type photoresist |
EP0732628A1 (fr) | 1995-03-07 | 1996-09-18 | Minnesota Mining And Manufacturing Company | Solution alkaline aqueuse pour le développement des plaques offset |
US5670294A (en) * | 1995-03-07 | 1997-09-23 | Imation Corp | Aqueous alkaline solution for developing offset printing plates |
EP1314552A2 (fr) | 1998-04-06 | 2003-05-28 | Fuji Photo Film Co., Ltd. | Composition de résine photosensible |
EP1338415A2 (fr) | 2002-02-21 | 2003-08-27 | Fuji Photo Film Co., Ltd. | Procédé de fabrication d'une plaque d'impression lithographique |
EP1584984A1 (fr) | 2004-04-06 | 2005-10-12 | Fuji Photo Film Co., Ltd. | Méthode pour régénérer le développeur dans un appareil à développement automatique pour plaques d'impressions |
Also Published As
Publication number | Publication date |
---|---|
JPS5743892B2 (fr) | 1982-09-17 |