JPS5022780A - - Google Patents
Info
- Publication number
- JPS5022780A JPS5022780A JP7437373A JP7437373A JPS5022780A JP S5022780 A JPS5022780 A JP S5022780A JP 7437373 A JP7437373 A JP 7437373A JP 7437373 A JP7437373 A JP 7437373A JP S5022780 A JPS5022780 A JP S5022780A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7437373A JPS539191B2 (enrdf_load_html_response) | 1973-07-03 | 1973-07-03 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7437373A JPS539191B2 (enrdf_load_html_response) | 1973-07-03 | 1973-07-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5022780A true JPS5022780A (enrdf_load_html_response) | 1975-03-11 |
JPS539191B2 JPS539191B2 (enrdf_load_html_response) | 1978-04-04 |
Family
ID=13545289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7437373A Expired JPS539191B2 (enrdf_load_html_response) | 1973-07-03 | 1973-07-03 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS539191B2 (enrdf_load_html_response) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51106641A (ja) * | 1975-03-17 | 1976-09-21 | Matsushita Electric Ind Co Ltd | Ionpureeteingusochi |
JPS51106642A (ja) * | 1975-03-17 | 1976-09-21 | Matsushita Electric Ind Co Ltd | Ionpureeteingusochi |
JPS51111484A (en) * | 1975-03-28 | 1976-10-01 | Matsushita Electric Ind Co Ltd | Manufacture of thin layer of vanadium dioxide |
JPS5253778A (en) * | 1975-10-29 | 1977-04-30 | Yoichi Murayama | Ion plating apparatus |
JPS571231A (en) * | 1980-06-04 | 1982-01-06 | Res Dev Corp Of Japan | Plasma chemical vapour deposition (cvd) device |
JPH01317998A (ja) * | 1988-06-17 | 1989-12-22 | Toshiba Corp | 保持装置 |
JP2022546072A (ja) * | 2019-08-30 | 2022-11-02 | ダイソン・テクノロジー・リミテッド | 堆積システム |
-
1973
- 1973-07-03 JP JP7437373A patent/JPS539191B2/ja not_active Expired
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51106641A (ja) * | 1975-03-17 | 1976-09-21 | Matsushita Electric Ind Co Ltd | Ionpureeteingusochi |
JPS51106642A (ja) * | 1975-03-17 | 1976-09-21 | Matsushita Electric Ind Co Ltd | Ionpureeteingusochi |
JPS51111484A (en) * | 1975-03-28 | 1976-10-01 | Matsushita Electric Ind Co Ltd | Manufacture of thin layer of vanadium dioxide |
JPS5253778A (en) * | 1975-10-29 | 1977-04-30 | Yoichi Murayama | Ion plating apparatus |
JPS571231A (en) * | 1980-06-04 | 1982-01-06 | Res Dev Corp Of Japan | Plasma chemical vapour deposition (cvd) device |
JPH01317998A (ja) * | 1988-06-17 | 1989-12-22 | Toshiba Corp | 保持装置 |
JP2022546072A (ja) * | 2019-08-30 | 2022-11-02 | ダイソン・テクノロジー・リミテッド | 堆積システム |
Also Published As
Publication number | Publication date |
---|---|
JPS539191B2 (enrdf_load_html_response) | 1978-04-04 |