JPS4988466A - - Google Patents
Info
- Publication number
- JPS4988466A JPS4988466A JP48132970A JP13297073A JPS4988466A JP S4988466 A JPS4988466 A JP S4988466A JP 48132970 A JP48132970 A JP 48132970A JP 13297073 A JP13297073 A JP 13297073A JP S4988466 A JPS4988466 A JP S4988466A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
- H01J9/22—Applying luminescent coatings
- H01J9/227—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines
- H01J9/2271—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines by photographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL7216227A NL7216227A (ja) | 1972-11-30 | 1972-11-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS4988466A true JPS4988466A (ja) | 1974-08-23 |
Family
ID=19817449
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP48132970A Pending JPS4988466A (ja) | 1972-11-30 | 1973-11-27 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3965278A (ja) |
JP (1) | JPS4988466A (ja) |
BE (1) | BE807940A (ja) |
DE (1) | DE2356476A1 (ja) |
FR (1) | FR2209207A1 (ja) |
NL (1) | NL7216227A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59104642A (ja) * | 1982-11-01 | 1984-06-16 | ハルズ アメリカ インコーポレイテッド | 集積回路の製法 |
JPS60112256U (ja) * | 1983-12-29 | 1985-07-30 | コニカ株式会社 | 画像記録装置 |
JPS62234148A (ja) * | 1982-11-01 | 1987-10-14 | マイクロサイ,インコーポレイテッド | コントラスト増強用の光脱色性層 |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4273842A (en) * | 1977-04-13 | 1981-06-16 | Hitachi, Ltd. | Process for forming patternwise coated powder layer |
DE2731126A1 (de) * | 1977-07-09 | 1979-01-25 | Licentia Gmbh | Verfahren zum herstellen eines leuchtschirmes |
US4150990A (en) * | 1978-01-10 | 1979-04-24 | Gte Sylvania Incorporated | Small phosphor area black matrix fabricating process |
US5108874A (en) * | 1982-11-01 | 1992-04-28 | Microsi, Inc. | Composite useful in photolithography |
US4677049A (en) * | 1983-09-28 | 1987-06-30 | General Electric Company | Spin castable photobleachable layer forming compositions |
US4745042A (en) * | 1984-04-19 | 1988-05-17 | Matsushita Electric Industrial Co., Ltd. | Water-soluble photopolymer and method of forming pattern by use of the same |
DE3584306D1 (de) * | 1984-05-14 | 1991-11-14 | Toshiba Kawasaki Kk | Verfahren zur herstellung von schutzlackbildern und zusammensetzung dafuer. |
US5188924A (en) * | 1984-05-14 | 1993-02-23 | Kabushiki Kaisha Toshiba | Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt |
US4663275A (en) * | 1984-09-04 | 1987-05-05 | General Electric Company | Photolithographic method and combination including barrier layer |
US4804614A (en) * | 1984-10-01 | 1989-02-14 | The Aerospace Corporation | Photoresist process of fabricating microelectronic circuits using water processable diazonium compound containing contrast enhancement layer |
ES2060579T3 (es) * | 1985-12-09 | 1994-12-01 | Nippon Paint Co Ltd | Material de impresion a base de resina fotosensible. |
US4707426A (en) * | 1986-02-04 | 1987-11-17 | Sony Corporation | Radiation exposure method of manufacturing a color cathode ray tube having light absorptive areas |
US4997742A (en) * | 1986-06-27 | 1991-03-05 | Texas Instruments Inc. | Water soluble contrast enhancement composition with 1-oxy-2 diazonaphthalene sulfonamide salt and polyvinyl alcohol |
US5173390A (en) * | 1986-06-27 | 1992-12-22 | Texas Instruments Incorporated | Water soluble contrast enhancement composition and method of use |
US4816380A (en) * | 1986-06-27 | 1989-03-28 | Texas Instruments Incorporated | Water soluble contrast enhancement layer method of forming resist image on semiconductor chip |
US4735681A (en) * | 1986-08-15 | 1988-04-05 | Motorola Inc. | Fabrication method for sub-micron trench |
US4863827A (en) * | 1986-10-20 | 1989-09-05 | American Hoechst Corporation | Postive working multi-level photoresist |
EP0280197A3 (en) * | 1987-02-23 | 1990-05-23 | Oki Electric Industry Company, Limited | Process for forming photoresist pattern |
US5477105A (en) * | 1992-04-10 | 1995-12-19 | Silicon Video Corporation | Structure of light-emitting device with raised black matrix for use in optical devices such as flat-panel cathode-ray tubes |
TW358118B (en) * | 1993-10-08 | 1999-05-11 | Toshiba Co Ltd | Display and the manufacturing method |
CN101187710A (zh) | 1996-01-11 | 2008-05-28 | 株式会社东芝 | 在非纤维质基材上形成滤色膜图案的方法及所形成的滤色膜 |
US6812636B2 (en) | 2001-03-30 | 2004-11-02 | Candescent Technologies Corporation | Light-emitting device having light-emissive particles partially coated with light-reflective or/and getter material |
KR20020077948A (ko) | 2001-04-03 | 2002-10-18 | 삼성에스디아이 주식회사 | 칼라음극선관용 포토레지스트 제조용 단량체,칼라음극선관용 포토레지스트 중합체, 칼라음극선관용포토레지스트 조성물 및 칼라음극선관용 형광막 조성물 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3615462A (en) * | 1968-11-06 | 1971-10-26 | Zenith Radio Corp | Processing black-surround screens |
US3615460A (en) * | 1968-11-06 | 1971-10-26 | Zenith Radio Corp | Method of forming a black surround screen |
US3653939A (en) * | 1970-01-05 | 1972-04-04 | Zenith Radio Corp | Screening of black-surround color picture tubes |
US3712815A (en) * | 1970-06-30 | 1973-01-23 | Westinghouse Electric Corp | Method of manufacturing a display screen |
-
1972
- 1972-11-30 NL NL7216227A patent/NL7216227A/xx unknown
-
1973
- 1973-11-12 DE DE2356476A patent/DE2356476A1/de active Pending
- 1973-11-13 US US05/415,367 patent/US3965278A/en not_active Expired - Lifetime
- 1973-11-27 JP JP48132970A patent/JPS4988466A/ja active Pending
- 1973-11-28 FR FR7342312A patent/FR2209207A1/fr not_active Withdrawn
- 1973-11-28 BE BE138284A patent/BE807940A/xx unknown
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59104642A (ja) * | 1982-11-01 | 1984-06-16 | ハルズ アメリカ インコーポレイテッド | 集積回路の製法 |
JPS6240697B2 (ja) * | 1982-11-01 | 1987-08-29 | Gen Electric | |
JPS62234148A (ja) * | 1982-11-01 | 1987-10-14 | マイクロサイ,インコーポレイテッド | コントラスト増強用の光脱色性層 |
JPS60112256U (ja) * | 1983-12-29 | 1985-07-30 | コニカ株式会社 | 画像記録装置 |
Also Published As
Publication number | Publication date |
---|---|
BE807940A (fr) | 1974-05-28 |
DE2356476A1 (de) | 1974-06-06 |
NL7216227A (ja) | 1974-06-04 |
US3965278A (en) | 1976-06-22 |
FR2209207A1 (ja) | 1974-06-28 |