JPS498182A - - Google Patents

Info

Publication number
JPS498182A
JPS498182A JP4615372A JP4615372A JPS498182A JP S498182 A JPS498182 A JP S498182A JP 4615372 A JP4615372 A JP 4615372A JP 4615372 A JP4615372 A JP 4615372A JP S498182 A JPS498182 A JP S498182A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4615372A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4615372A priority Critical patent/JPS498182A/ja
Publication of JPS498182A publication Critical patent/JPS498182A/ja
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP4615372A 1972-05-10 1972-05-10 Pending JPS498182A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4615372A JPS498182A (ja) 1972-05-10 1972-05-10

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4615372A JPS498182A (ja) 1972-05-10 1972-05-10

Publications (1)

Publication Number Publication Date
JPS498182A true JPS498182A (ja) 1974-01-24

Family

ID=12739025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4615372A Pending JPS498182A (ja) 1972-05-10 1972-05-10

Country Status (1)

Country Link
JP (1) JPS498182A (ja)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50115827A (ja) * 1974-02-22 1975-09-10
JPS5158072A (ja) * 1974-11-18 1976-05-21 Matsushita Electric Ind Co Ltd Handotaisochinoseizohoho
JPS5293273A (en) * 1976-01-31 1977-08-05 Nippon Telegr & Teleph Corp <Ntt> Fine pattern forming method
JPS52121079U (ja) * 1976-03-10 1977-09-14
JPS5346700A (en) * 1976-10-12 1978-04-26 Fujitsu Ltd Exposuring method for resist
JPS5412735A (en) * 1977-06-30 1979-01-30 Toshiba Corp Photoetching of metal plate
JPS5680130A (en) * 1979-12-05 1981-07-01 Toshiba Corp Manufacture of semiconductor device
JPS5694738A (en) * 1979-12-28 1981-07-31 Fujitsu Ltd Manufacturing method of semiconductor device
JPS58149045A (ja) * 1982-02-26 1983-09-05 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 光学的リソグラフイ方法
JPS6038821A (ja) * 1983-08-12 1985-02-28 Hitachi Ltd エッチング方法
JPS612696A (ja) * 1984-06-13 1986-01-08 住友重機械工業株式会社 リフタ−偏心荷重防止装置
JPS6120024A (ja) * 1984-06-11 1986-01-28 ミネソタ　マイニング　アンド　マニユフアクチユアリング　コンパニー 単層ハレーシヨン防止システム
JPH0582657A (ja) * 1991-09-19 1993-04-02 Nec Corp 半導体装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS511550A (ja) * 1974-06-27 1976-01-08 Idemitsu Kosan Co Dendoseiyukazai

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS511550A (ja) * 1974-06-27 1976-01-08 Idemitsu Kosan Co Dendoseiyukazai

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5746214B2 (ja) * 1974-02-22 1982-10-01
JPS50115827A (ja) * 1974-02-22 1975-09-10
JPS5158072A (ja) * 1974-11-18 1976-05-21 Matsushita Electric Ind Co Ltd Handotaisochinoseizohoho
JPS5293273A (en) * 1976-01-31 1977-08-05 Nippon Telegr & Teleph Corp <Ntt> Fine pattern forming method
JPS52121079U (ja) * 1976-03-10 1977-09-14
JPS5537522Y2 (ja) * 1976-03-10 1980-09-03
JPS5346700A (en) * 1976-10-12 1978-04-26 Fujitsu Ltd Exposuring method for resist
JPS5412735A (en) * 1977-06-30 1979-01-30 Toshiba Corp Photoetching of metal plate
JPS5680130A (en) * 1979-12-05 1981-07-01 Toshiba Corp Manufacture of semiconductor device
JPS5694738A (en) * 1979-12-28 1981-07-31 Fujitsu Ltd Manufacturing method of semiconductor device
JPS58149045A (ja) * 1982-02-26 1983-09-05 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 光学的リソグラフイ方法
JPH0160813B2 (ja) * 1982-02-26 1989-12-26 Intaanashonaru Bijinesu Mashiinzu Corp
JPS6038821A (ja) * 1983-08-12 1985-02-28 Hitachi Ltd エッチング方法
JPH0455323B2 (ja) * 1983-08-12 1992-09-03 Hitachi Ltd
JPS6120024A (ja) * 1984-06-11 1986-01-28 ミネソタ　マイニング　アンド　マニユフアクチユアリング　コンパニー 単層ハレーシヨン防止システム
JPS612696A (ja) * 1984-06-13 1986-01-08 住友重機械工業株式会社 リフタ−偏心荷重防止装置
JPH0345000B2 (ja) * 1984-06-13 1991-07-09 Sumitomo Jukikai Kogyo Kk
JPH0582657A (ja) * 1991-09-19 1993-04-02 Nec Corp 半導体装置

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