JPS4979176A - - Google Patents
Info
- Publication number
- JPS4979176A JPS4979176A JP12061072A JP12061072A JPS4979176A JP S4979176 A JPS4979176 A JP S4979176A JP 12061072 A JP12061072 A JP 12061072A JP 12061072 A JP12061072 A JP 12061072A JP S4979176 A JPS4979176 A JP S4979176A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12061072A JPS4979176A (ja) | 1972-12-04 | 1972-12-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12061072A JPS4979176A (ja) | 1972-12-04 | 1972-12-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4979176A true JPS4979176A (ja) | 1974-07-31 |
Family
ID=14790492
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12061072A Pending JPS4979176A (ja) | 1972-12-04 | 1972-12-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4979176A (ja) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53143171A (en) * | 1977-05-20 | 1978-12-13 | Hitachi Ltd | Mask for x-ray transfer |
| JPS55101945A (en) * | 1979-01-31 | 1980-08-04 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Mask for exposure |
| JPS5968745A (ja) * | 1982-09-01 | 1984-04-18 | エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン | Ｘ−線リトグラフイによりパタ−ンをラツカ−層に形成するマスクおよびその製造方法 |
| JPS61111536A (ja) * | 1985-09-30 | 1986-05-29 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Ｘ線露光用板状物 |
| JPS62155518A (ja) * | 1977-12-23 | 1987-07-10 | Dainippon Printing Co Ltd | 軟ｘ線リソグラフイ−用マスク |
| JPS63104327A (ja) * | 1986-10-20 | 1988-05-09 | Mitsubishi Electric Corp | Ｘ線マスク、およびその製造方法 |
-
1972
- 1972-12-04 JP JP12061072A patent/JPS4979176A/ja active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53143171A (en) * | 1977-05-20 | 1978-12-13 | Hitachi Ltd | Mask for x-ray transfer |
| JPS5637692B2 (ja) * | 1977-05-20 | 1981-09-02 | ||
| JPS62155518A (ja) * | 1977-12-23 | 1987-07-10 | Dainippon Printing Co Ltd | 軟ｘ線リソグラフイ−用マスク |
| JPH0441487B2 (ja) * | 1977-12-23 | 1992-07-08 | Dainippon Printing Co Ltd | |
| JPS55101945A (en) * | 1979-01-31 | 1980-08-04 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Mask for exposure |
| JPS6054671B2 (ja) * | 1979-01-31 | 1985-11-30 | 超エル・エス・アイ技術研究組合 | 露光用マスク |
| JPS5968745A (ja) * | 1982-09-01 | 1984-04-18 | エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン | Ｘ−線リトグラフイによりパタ−ンをラツカ−層に形成するマスクおよびその製造方法 |
| JPS61111536A (ja) * | 1985-09-30 | 1986-05-29 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Ｘ線露光用板状物 |
| JPS63104327A (ja) * | 1986-10-20 | 1988-05-09 | Mitsubishi Electric Corp | Ｘ線マスク、およびその製造方法 |