JPS4963775A - - Google Patents

Info

Publication number
JPS4963775A
JPS4963775A JP48073352A JP7335273A JPS4963775A JP S4963775 A JPS4963775 A JP S4963775A JP 48073352 A JP48073352 A JP 48073352A JP 7335273 A JP7335273 A JP 7335273A JP S4963775 A JPS4963775 A JP S4963775A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48073352A
Other languages
Japanese (ja)
Other versions
JPS5928204B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4963775A publication Critical patent/JPS4963775A/ja
Publication of JPS5928204B2 publication Critical patent/JPS5928204B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/01—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Heterocyclic Compounds That Contain Two Or More Ring Oxygen Atoms (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
JP48073352A 1972-07-01 1973-06-30 紫外線照射により重合可能の混合物 Expired JPS5928204B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2232365 1972-07-01
DE2232365A DE2232365C2 (de) 1972-07-01 1972-07-01 Durch UV-Bestrahlung polymerisierbare Gemische

Publications (2)

Publication Number Publication Date
JPS4963775A true JPS4963775A (enrdf_load_stackoverflow) 1974-06-20
JPS5928204B2 JPS5928204B2 (ja) 1984-07-11

Family

ID=5849394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48073352A Expired JPS5928204B2 (ja) 1972-07-01 1973-06-30 紫外線照射により重合可能の混合物

Country Status (8)

Country Link
US (1) US3998712A (enrdf_load_stackoverflow)
JP (1) JPS5928204B2 (enrdf_load_stackoverflow)
BE (1) BE801696A (enrdf_load_stackoverflow)
DE (1) DE2232365C2 (enrdf_load_stackoverflow)
FR (1) FR2190842B1 (enrdf_load_stackoverflow)
GB (1) GB1431224A (enrdf_load_stackoverflow)
IT (1) IT985810B (enrdf_load_stackoverflow)
NL (1) NL172242C (enrdf_load_stackoverflow)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4160794A (en) * 1974-12-24 1979-07-10 Ciba-Geigy Corporation 1-Oxo-2,2-[dialkylphosphono(alkyl)alkyloxy]-1,2-diphenylethane
US4058442A (en) * 1975-09-15 1977-11-15 Lee Pharmaceuticals Photopolymerizable composition for formed-in-place artificial nails
CH598288A5 (enrdf_load_stackoverflow) * 1975-12-23 1978-04-28 Ciba Geigy Ag
US4144156A (en) * 1976-04-14 1979-03-13 Basf Aktiengesellschaft Manufacture of unsymmetric monoacetals of aromatic 1,2-diketones employable as photoiniatiators
DE2616382C2 (de) * 1976-04-14 1986-09-11 Basf Ag, 6700 Ludwigshafen Verfahren zur Herstellung von nicht-cyclischen, unsymmetrischen 1,1-Acetalen aromatischer 1,2-Diketone, einige nicht-cyclische, unsymmetrische 1,2-Diketone als solche und deren Verwendung als Photoinitiatoren
US4287367A (en) 1976-04-14 1981-09-01 Basf Aktiengesellschaft Manufacture of symmetrical or unsymmetrical monoacetals of aromatic 1,2-diketones
DE2730462A1 (de) * 1976-07-15 1978-01-19 Ciba Geigy Ag Photoinitiatoren fuer uv-haertbare massen
JPS53109703A (en) * 1977-03-08 1978-09-25 Teijin Ltd Improved supporting plate
CH611633A5 (enrdf_load_stackoverflow) * 1977-03-16 1979-06-15 Espe Pharm Praep
DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse
US4318791A (en) * 1977-12-22 1982-03-09 Ciba-Geigy Corporation Use of aromatic-aliphatic ketones as photo sensitizers
US4308119A (en) * 1979-02-21 1981-12-29 Panelgraphic Corporation Abrasion-resistant optical coating composition containing pentaerythritol based polyacrylates and cellulose esters
US4399192A (en) * 1980-01-07 1983-08-16 Panelographic Corporation Radiation cured abrasion resistant coatings of pentaerythritol acrylates and cellulose esters on polymeric substrates
US4407855A (en) * 1980-01-07 1983-10-04 Panelographic Corporation Method for forming an abrasion resistant coating from cellulose ester and pentaerythritol acrylates
US4351708A (en) 1980-02-29 1982-09-28 Ciba-Geigy Corporation Photochemically or thermally polymerizable mixtures
US4373007A (en) * 1980-11-03 1983-02-08 Panelgraphic Corporation [Non-photoinitialio] non-photocatalyzed dipentaerythritol polyacrylate based coating compositions exhibiting high abrasion resistance
DE3512179A1 (de) * 1985-04-03 1986-12-04 Merck Patent Gmbh, 6100 Darmstadt Fotoinitiatoren fuer die fotopolymerisation in waessrigen systemen
US5288917A (en) * 1986-04-15 1994-02-22 Ciba-Geigy Corporation Liquid photoinitiator mixtures
US4950795A (en) * 1987-08-27 1990-08-21 Ciba-Geigy Corporation Oligomeric benzil ketals and their use as photoinitiators
US5095044A (en) * 1987-08-27 1992-03-10 Ciba-Geigy Corporation Oligomeric benzil ketals and their use as photoinitiators
US6204302B1 (en) 1998-11-20 2001-03-20 Bisco, Inc. Photosensitizers for free radical polymerization initiation resins and method of making the same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3010945A (en) * 1957-09-10 1961-11-28 Du Pont Polymerizing vinyl cyclic acetals with cobaltous salts of dicarboxylic acid half-esters
US3225014A (en) * 1962-07-09 1965-12-21 Scott Paper Co Ethylene dicarboxylic esters of 1,2 alkane ketals
DE1236201B (de) * 1963-11-14 1967-03-09 Degussa Verfahren zur Homo- und Copolymerisation von Monovinylverbindungen
DE1694149C2 (de) * 1967-05-06 1976-01-02 Bayer Ag, 5090 Leverkusen Polyester-Form- und Überzugsmassen
DE1769576A1 (de) * 1968-06-11 1971-09-30 Bayer Ag Durch UV-Bestrahlen haertbare Polyester-Form- und UEberzugsmassen
DE1769854C3 (de) * 1968-07-26 1982-08-19 Bayer Ag, 5090 Leverkusen Photoinitiatoren und Verfahren zur Photopolymerisation
DE1923266B2 (de) * 1969-05-07 1977-09-29 Basf Ag, 6700 Ludwigshafen Alpha-hydroxymethylbenzoinaether
US3715293A (en) * 1971-12-17 1973-02-06 Union Carbide Corp Acetophenone-type photosensitizers for radiation curable coatings

Also Published As

Publication number Publication date
US3998712A (en) 1976-12-21
JPS5928204B2 (ja) 1984-07-11
GB1431224A (en) 1976-04-07
IT985810B (it) 1974-12-20
DE2232365C2 (de) 1982-06-09
NL172242B (nl) 1983-03-01
BE801696A (fr) 1974-01-02
FR2190842A1 (enrdf_load_stackoverflow) 1974-02-01
DE2232365A1 (de) 1974-01-31
FR2190842B1 (enrdf_load_stackoverflow) 1976-09-17
NL7309148A (enrdf_load_stackoverflow) 1974-01-03
NL172242C (nl) 1983-08-01

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