JPS494851B1 - - Google Patents
Info
- Publication number
- JPS494851B1 JPS494851B1 JP9224068A JP9224068A JPS494851B1 JP S494851 B1 JPS494851 B1 JP S494851B1 JP 9224068 A JP9224068 A JP 9224068A JP 9224068 A JP9224068 A JP 9224068A JP S494851 B1 JPS494851 B1 JP S494851B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US72464068A | 1968-04-26 | 1968-04-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS494851B1 true JPS494851B1 (sv) | 1974-02-04 |
Family
ID=24911238
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9224068A Pending JPS494851B1 (sv) | 1968-04-26 | 1968-12-16 |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS494851B1 (sv) |
| AT (1) | AT297478B (sv) |
| BE (1) | BE732026A (sv) |
| DE (1) | DE1920932C3 (sv) |
| FR (1) | FR2007530A1 (sv) |
| GB (1) | GB1246704A (sv) |
| NL (1) | NL6906398A (sv) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2441315A1 (de) * | 1974-08-29 | 1976-03-11 | Hoechst Ag | Mit o-naphthochinondiazidverbindung vorsensibilisierte druckplatte |
| EP0104235A4 (en) * | 1982-03-29 | 1984-09-14 | Motorola Inc | METHOD OF FORMING A HYBRID LITHOGRAPHIC PROTECTION MATERIAL WITH ELECTRONIC / OPTICAL RADIUS. |
| GB8403698D0 (en) * | 1984-02-13 | 1984-03-14 | British Telecomm | Semiconductor device fabrication |
| US4782008A (en) * | 1985-03-19 | 1988-11-01 | International Business Machines Corporation | Plasma-resistant polymeric material, preparation thereof, and use thereof |
| US4737425A (en) * | 1986-06-10 | 1988-04-12 | International Business Machines Corporation | Patterned resist and process |
| DE3720465A1 (de) * | 1987-06-20 | 1988-12-29 | Asea Brown Boveri | Haftvermittler fuer negativresist zum aetzen tiefer graeben in siliciumscheiben mit glatter oberflaeche und verfahren zur herstellung des haftvermittlers |
-
1968
- 1968-12-16 JP JP9224068A patent/JPS494851B1/ja active Pending
-
1969
- 1969-03-27 GB GB1607969A patent/GB1246704A/en not_active Expired
- 1969-04-24 DE DE19691920932 patent/DE1920932C3/de not_active Expired
- 1969-04-24 FR FR6913033A patent/FR2007530A1/fr not_active Withdrawn
- 1969-04-24 BE BE732026D patent/BE732026A/xx unknown
- 1969-04-25 NL NL6906398A patent/NL6906398A/xx unknown
- 1969-04-25 AT AT402569A patent/AT297478B/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| GB1246704A (en) | 1971-09-15 |
| FR2007530A1 (sv) | 1970-01-09 |
| AT297478B (de) | 1972-03-27 |
| DE1920932B2 (de) | 1971-11-25 |
| DE1920932C3 (de) | 1975-12-04 |
| DE1920932A1 (de) | 1971-04-08 |
| NL6906398A (sv) | 1969-10-28 |
| BE732026A (sv) | 1969-10-24 |