JPS4926184A - - Google Patents
Info
- Publication number
- JPS4926184A JPS4926184A JP47089196A JP8919672A JPS4926184A JP S4926184 A JPS4926184 A JP S4926184A JP 47089196 A JP47089196 A JP 47089196A JP 8919672 A JP8919672 A JP 8919672A JP S4926184 A JPS4926184 A JP S4926184A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17824871A | 1971-09-07 | 1971-09-07 | |
US178240A US3884793A (en) | 1971-09-07 | 1971-09-07 | Electrode type glow discharge apparatus |
US25450472A | 1972-05-18 | 1972-05-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS4926184A true JPS4926184A (enrdf_load_stackoverflow) | 1974-03-08 |
JPS5748637B2 JPS5748637B2 (enrdf_load_stackoverflow) | 1982-10-16 |
Family
ID=27390946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP47089196A Expired JPS5748637B2 (enrdf_load_stackoverflow) | 1971-09-07 | 1972-09-07 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS5748637B2 (enrdf_load_stackoverflow) |
AU (1) | AU475272B2 (enrdf_load_stackoverflow) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5064185A (enrdf_load_stackoverflow) * | 1973-08-31 | 1975-05-31 | ||
JPS5197548U (enrdf_load_stackoverflow) * | 1975-02-03 | 1976-08-05 | ||
JPS5596164U (enrdf_load_stackoverflow) * | 1979-10-01 | 1980-07-03 | ||
JPS57161057A (en) * | 1981-03-30 | 1982-10-04 | Mitsubishi Electric Corp | Chemical vapor phase growth device using plasma |
JPS58147567A (ja) * | 1982-02-24 | 1983-09-02 | Mitsubishi Heavy Ind Ltd | アルミニウム又はアルミニウム合金タンク用防食剤 |
JPS58171569A (ja) * | 1982-03-31 | 1983-10-08 | Hidetoshi Tsuchiya | スパッタリング方法 |
JP2008510066A (ja) * | 2004-08-12 | 2008-04-03 | フォン アルデンヌ アンラジェンテクニック ゲーエムベーハー | 自浄式ターゲットを有する円筒状マグネトロン |
WO2015076162A1 (ja) * | 2013-11-22 | 2015-05-28 | 東レ株式会社 | プラズマ電極、プラズマ処理電極、cvd電極、プラズマcvd装置及び薄膜付基材の製造方法 |
-
1972
- 1972-09-05 AU AU46331/72A patent/AU475272B2/en not_active Expired
- 1972-09-07 JP JP47089196A patent/JPS5748637B2/ja not_active Expired
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5064185A (enrdf_load_stackoverflow) * | 1973-08-31 | 1975-05-31 | ||
JPS5197548U (enrdf_load_stackoverflow) * | 1975-02-03 | 1976-08-05 | ||
JPS5596164U (enrdf_load_stackoverflow) * | 1979-10-01 | 1980-07-03 | ||
JPS57161057A (en) * | 1981-03-30 | 1982-10-04 | Mitsubishi Electric Corp | Chemical vapor phase growth device using plasma |
JPS58147567A (ja) * | 1982-02-24 | 1983-09-02 | Mitsubishi Heavy Ind Ltd | アルミニウム又はアルミニウム合金タンク用防食剤 |
JPS58171569A (ja) * | 1982-03-31 | 1983-10-08 | Hidetoshi Tsuchiya | スパッタリング方法 |
JP2008510066A (ja) * | 2004-08-12 | 2008-04-03 | フォン アルデンヌ アンラジェンテクニック ゲーエムベーハー | 自浄式ターゲットを有する円筒状マグネトロン |
WO2015076162A1 (ja) * | 2013-11-22 | 2015-05-28 | 東レ株式会社 | プラズマ電極、プラズマ処理電極、cvd電極、プラズマcvd装置及び薄膜付基材の製造方法 |
JPWO2015076162A1 (ja) * | 2013-11-22 | 2017-03-16 | 東レ株式会社 | プラズマ電極、プラズマ処理電極、cvd電極、プラズマcvd装置及び薄膜付基材の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
AU475272B2 (en) | 1976-08-19 |
AU4633172A (en) | 1974-03-14 |
JPS5748637B2 (enrdf_load_stackoverflow) | 1982-10-16 |