JPS4883828A - - Google Patents
Info
- Publication number
- JPS4883828A JPS4883828A JP47124845A JP12484572A JPS4883828A JP S4883828 A JPS4883828 A JP S4883828A JP 47124845 A JP47124845 A JP 47124845A JP 12484572 A JP12484572 A JP 12484572A JP S4883828 A JPS4883828 A JP S4883828A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- H10W74/47—
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Electrophotography Using Other Than Carlson'S Method (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US21988172A | 1972-01-21 | 1972-01-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4883828A true JPS4883828A (en:Method) | 1973-11-08 |
| JPS5129017B2 JPS5129017B2 (en:Method) | 1976-08-23 |
Family
ID=22821140
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47124845A Expired JPS5129017B2 (en:Method) | 1972-01-21 | 1972-12-14 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3794510A (en:Method) |
| JP (1) | JPS5129017B2 (en:Method) |
| BE (1) | BE794343A (en:Method) |
| DE (1) | DE2302667C3 (en:Method) |
| FR (1) | FR2168593A1 (en:Method) |
| GB (1) | GB1417726A (en:Method) |
| IT (1) | IT978291B (en:Method) |
| SE (1) | SE386210B (en:Method) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3950569A (en) * | 1972-05-05 | 1976-04-13 | W. R. Grace & Co. | Method for preparing coatings with solid curable compositions containing styrene-allyl alcohol copolymer based polythiols |
| US4018937A (en) * | 1972-12-14 | 1977-04-19 | Rca Corporation | Electron beam recording comprising polymer of 1-methylvinyl methyl ketone |
| US4012536A (en) * | 1972-12-14 | 1977-03-15 | Rca Corporation | Electron beam recording medium comprising 1-methylvinyl methyl ketone |
| US4061799A (en) * | 1973-11-05 | 1977-12-06 | Texas Instruments Incorporated | Method of patterning styrene diene block copolymer electron beam resists |
| US3916035A (en) * | 1973-11-05 | 1975-10-28 | Texas Instruments Inc | Epoxy-polymer electron beam resists |
| DE2545047C3 (de) * | 1975-10-08 | 1978-09-21 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren zur Herstellung eines Halbleiterfestwertspeichers |
| JPS5315153A (en) * | 1976-07-27 | 1978-02-10 | Canon Inc | Hologram |
| CS193322B1 (en) * | 1977-11-07 | 1979-10-31 | Jaroslav Kalal | Electron resisit |
| JPS5511217A (en) * | 1978-07-10 | 1980-01-26 | Nippon Telegr & Teleph Corp <Ntt> | Pattern forming method using radiation sensitive high polymer |
| DE3070833D1 (en) * | 1980-09-19 | 1985-08-08 | Ibm Deutschland | Structure with a silicon body that presents an aperture and method of making this structure |
| US4892617A (en) * | 1984-08-22 | 1990-01-09 | American Telephone & Telegraph Company, At&T Bell Laboratories | Processes involving lithographic materials |
| JPH0234984A (ja) * | 1988-04-13 | 1990-02-05 | Mitsubishi Electric Corp | プリント回路基板の製造方法 |
-
0
- BE BE794343D patent/BE794343A/xx unknown
-
1972
- 1972-01-21 US US00219881A patent/US3794510A/en not_active Expired - Lifetime
- 1972-12-14 JP JP47124845A patent/JPS5129017B2/ja not_active Expired
- 1972-12-18 GB GB5832872A patent/GB1417726A/en not_active Expired
-
1973
- 1973-01-19 SE SE7300820A patent/SE386210B/xx unknown
- 1973-01-19 IT IT19377/73A patent/IT978291B/it active
- 1973-01-19 DE DE2302667A patent/DE2302667C3/de not_active Expired
- 1973-01-22 FR FR7302085A patent/FR2168593A1/fr not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| IT978291B (it) | 1974-09-20 |
| DE2302667C3 (de) | 1982-01-07 |
| JPS5129017B2 (en:Method) | 1976-08-23 |
| DE2302667A1 (de) | 1973-07-26 |
| FR2168593A1 (en:Method) | 1973-08-31 |
| US3794510A (en) | 1974-02-26 |
| DE2302667B2 (de) | 1981-01-22 |
| GB1417726A (en) | 1975-12-17 |
| SE386210B (sv) | 1976-08-02 |
| BE794343A (fr) | 1973-07-19 |