FR2168593A1 - - Google Patents

Info

Publication number
FR2168593A1
FR2168593A1 FR7302085A FR7302085A FR2168593A1 FR 2168593 A1 FR2168593 A1 FR 2168593A1 FR 7302085 A FR7302085 A FR 7302085A FR 7302085 A FR7302085 A FR 7302085A FR 2168593 A1 FR2168593 A1 FR 2168593A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7302085A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CBS Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of FR2168593A1 publication Critical patent/FR2168593A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
FR7302085A 1972-01-21 1973-01-22 Withdrawn FR2168593A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21988172A 1972-01-21 1972-01-21

Publications (1)

Publication Number Publication Date
FR2168593A1 true FR2168593A1 (fr) 1973-08-31

Family

ID=22821140

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7302085A Withdrawn FR2168593A1 (fr) 1972-01-21 1973-01-22

Country Status (8)

Country Link
US (1) US3794510A (fr)
JP (1) JPS5129017B2 (fr)
BE (1) BE794343A (fr)
DE (1) DE2302667C3 (fr)
FR (1) FR2168593A1 (fr)
GB (1) GB1417726A (fr)
IT (1) IT978291B (fr)
SE (1) SE386210B (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3950569A (en) * 1972-05-05 1976-04-13 W. R. Grace & Co. Method for preparing coatings with solid curable compositions containing styrene-allyl alcohol copolymer based polythiols
US4012536A (en) * 1972-12-14 1977-03-15 Rca Corporation Electron beam recording medium comprising 1-methylvinyl methyl ketone
US4018937A (en) * 1972-12-14 1977-04-19 Rca Corporation Electron beam recording comprising polymer of 1-methylvinyl methyl ketone
US3916035A (en) * 1973-11-05 1975-10-28 Texas Instruments Inc Epoxy-polymer electron beam resists
US4061799A (en) * 1973-11-05 1977-12-06 Texas Instruments Incorporated Method of patterning styrene diene block copolymer electron beam resists
DE2545047C3 (de) * 1975-10-08 1978-09-21 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur Herstellung eines Halbleiterfestwertspeichers
JPS5315153A (en) * 1976-07-27 1978-02-10 Canon Inc Hologram
CS193322B1 (en) * 1977-11-07 1979-10-31 Jaroslav Kalal Electron resisit
JPS5511217A (en) * 1978-07-10 1980-01-26 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method using radiation sensitive high polymer
DE3070833D1 (en) * 1980-09-19 1985-08-08 Ibm Deutschland Structure with a silicon body that presents an aperture and method of making this structure
US4892617A (en) * 1984-08-22 1990-01-09 American Telephone & Telegraph Company, At&T Bell Laboratories Processes involving lithographic materials
JPH0234984A (ja) * 1988-04-13 1990-02-05 Mitsubishi Electric Corp プリント回路基板の製造方法

Also Published As

Publication number Publication date
DE2302667C3 (de) 1982-01-07
BE794343A (fr) 1973-07-19
US3794510A (en) 1974-02-26
DE2302667B2 (de) 1981-01-22
SE386210B (sv) 1976-08-02
DE2302667A1 (de) 1973-07-26
IT978291B (it) 1974-09-20
JPS5129017B2 (fr) 1976-08-23
JPS4883828A (fr) 1973-11-08
GB1417726A (en) 1975-12-17

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Legal Events

Date Code Title Description
ST Notification of lapse