JPS4840380A - - Google Patents

Info

Publication number
JPS4840380A
JPS4840380A JP47094188A JP9418872A JPS4840380A JP S4840380 A JPS4840380 A JP S4840380A JP 47094188 A JP47094188 A JP 47094188A JP 9418872 A JP9418872 A JP 9418872A JP S4840380 A JPS4840380 A JP S4840380A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP47094188A
Other versions
JPS5212060B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4840380A publication Critical patent/JPS4840380A/ja
Publication of JPS5212060B2 publication Critical patent/JPS5212060B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
    • H01L21/30608—Anisotropic liquid etching
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/06—Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/32—Alkaline compositions
    • C23F1/40—Alkaline compositions for etching other metallic material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/051—Etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/115—Orientation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
JP47094188A 1971-09-22 1972-09-21 Expired JPS5212060B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US18289171A 1971-09-22 1971-09-22

Publications (2)

Publication Number Publication Date
JPS4840380A true JPS4840380A (ja) 1973-06-13
JPS5212060B2 JPS5212060B2 (ja) 1977-04-04

Family

ID=22670506

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47094188A Expired JPS5212060B2 (ja) 1971-09-22 1972-09-21

Country Status (12)

Country Link
US (1) US3738881A (ja)
JP (1) JPS5212060B2 (ja)
KR (1) KR780000484B1 (ja)
BE (1) BE789090A (ja)
CA (1) CA954425A (ja)
CH (1) CH582755A5 (ja)
DE (1) DE2245809C3 (ja)
FR (1) FR2153384B1 (ja)
GB (1) GB1357831A (ja)
IT (1) IT969438B (ja)
NL (1) NL166361C (ja)
SE (1) SE380543B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019068087A (ja) * 2014-12-29 2019-04-25 バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー エッチング液及びその使用方法

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4013502A (en) * 1973-06-18 1977-03-22 Texas Instruments Incorporated Stencil process for high resolution pattern replication
US3990925A (en) * 1975-03-31 1976-11-09 Bell Telephone Laboratories, Incorporated Removal of projections on epitaxial layers
US4057939A (en) * 1975-12-05 1977-11-15 International Business Machines Corporation Silicon wafer polishing
JPS5351970A (en) * 1976-10-21 1978-05-11 Toshiba Corp Manufacture for semiconductor substrate
FR2372904A1 (fr) * 1976-11-19 1978-06-30 Ibm Composition de decapage du silicium polycristallin contenant de l'hydroxyde de tetramethylammonium et procede d'application
US6060237A (en) 1985-02-26 2000-05-09 Biostar, Inc. Devices and methods for optical detection of nucleic acid hybridization
US4680243A (en) * 1985-08-02 1987-07-14 Micronix Corporation Method for producing a mask for use in X-ray photolithography and resulting structure
US5482830A (en) * 1986-02-25 1996-01-09 Biostar, Inc. Devices and methods for detection of an analyte based upon light interference
DE3805752A1 (de) * 1988-02-24 1989-08-31 Fraunhofer Ges Forschung Anisotropes aetzverfahren mit elektrochemischem aetzstop
US4996627A (en) * 1989-01-30 1991-02-26 Dresser Industries, Inc. High sensitivity miniature pressure transducer
US4918030A (en) * 1989-03-31 1990-04-17 Electric Power Research Institute Method of forming light-trapping surface for photovoltaic cell and resulting structure
US5116464A (en) * 1989-06-02 1992-05-26 Massachusetts Institute Of Technology Cesium hydroxide etch of a semiconductor crystal
US5541057A (en) * 1989-09-18 1996-07-30 Biostar, Inc. Methods for detection of an analyte
WO1991004483A1 (en) * 1989-09-18 1991-04-04 Biostar Medical Products, Inc. Apparatus for detection of an immobilized analyte
US5639671A (en) * 1989-09-18 1997-06-17 Biostar, Inc. Methods for optimizing of an optical assay device
US5550063A (en) * 1991-02-11 1996-08-27 Biostar, Inc. Methods for production of an optical assay device
US5955377A (en) * 1991-02-11 1999-09-21 Biostar, Inc. Methods and kits for the amplification of thin film based assays
US5418136A (en) * 1991-10-01 1995-05-23 Biostar, Inc. Devices for detection of an analyte based upon light interference
US5494829A (en) * 1992-07-31 1996-02-27 Biostar, Inc. Devices and methods for detection of an analyte based upon light interference
US5431777A (en) * 1992-09-17 1995-07-11 International Business Machines Corporation Methods and compositions for the selective etching of silicon
US5552272A (en) * 1993-06-10 1996-09-03 Biostar, Inc. Detection of an analyte by fluorescence using a thin film optical device
US6114248A (en) * 1998-01-15 2000-09-05 International Business Machines Corporation Process to reduce localized polish stop erosion
US8021483B2 (en) 2002-02-20 2011-09-20 Hemlock Semiconductor Corporation Flowable chips and methods for the preparation and use of same, and apparatus for use in the methods
AU2003238773A1 (en) * 2002-06-07 2003-12-22 Mallinckrodt Baker Inc. Microelectronic cleaning compositions containing oxidizers and organic solvents
US6874713B2 (en) 2002-08-22 2005-04-05 Dow Corning Corporation Method and apparatus for improving silicon processing efficiency
US7270706B2 (en) 2004-10-04 2007-09-18 Dow Corning Corporation Roll crusher to produce high purity polycrystalline silicon chips
US7994062B2 (en) * 2009-10-30 2011-08-09 Sachem, Inc. Selective silicon etch process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019068087A (ja) * 2014-12-29 2019-04-25 バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー エッチング液及びその使用方法

Also Published As

Publication number Publication date
NL166361C (nl) 1981-07-15
SE380543B (sv) 1975-11-10
NL166361B (nl) 1981-02-16
FR2153384A1 (ja) 1973-05-04
FR2153384B1 (ja) 1976-10-29
DE2245809B2 (de) 1977-09-01
KR780000484B1 (en) 1978-10-24
BE789090A (fr) 1973-01-15
JPS5212060B2 (ja) 1977-04-04
US3738881A (en) 1973-06-12
DE2245809C3 (de) 1978-04-27
IT969438B (it) 1974-03-30
GB1357831A (en) 1974-06-26
NL7212612A (ja) 1973-03-26
CH582755A5 (ja) 1976-12-15
DE2245809A1 (de) 1973-04-05
CA954425A (en) 1974-09-10

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