JPS4833908A - - Google Patents

Info

Publication number
JPS4833908A
JPS4833908A JP8007972A JP8007972A JPS4833908A JP S4833908 A JPS4833908 A JP S4833908A JP 8007972 A JP8007972 A JP 8007972A JP 8007972 A JP8007972 A JP 8007972A JP S4833908 A JPS4833908 A JP S4833908A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8007972A
Other versions
JPS5133445B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4833908A publication Critical patent/JPS4833908A/ja
Publication of JPS5133445B2 publication Critical patent/JPS5133445B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
JP8007972A 1971-09-01 1972-08-11 Expired JPS5133445B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19712143737 DE2143737A1 (de) 1971-09-01 1971-09-01 Photoaetzverfahren

Publications (2)

Publication Number Publication Date
JPS4833908A true JPS4833908A (ja) 1973-05-15
JPS5133445B2 JPS5133445B2 (ja) 1976-09-20

Family

ID=5818349

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8007972A Expired JPS5133445B2 (ja) 1971-09-01 1972-08-11

Country Status (4)

Country Link
JP (1) JPS5133445B2 (ja)
DE (1) DE2143737A1 (ja)
FR (1) FR2151130A1 (ja)
IT (1) IT963413B (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501805A (ja) * 1973-05-14 1975-01-09
JPS5168772A (en) * 1974-12-11 1976-06-14 Matsushita Electronics Corp Handotaisochino seizohoho
JPS5348676A (en) * 1976-10-15 1978-05-02 Handotai Kenkyu Shinkokai Method of forming pattern
JPS5429976A (en) * 1977-08-10 1979-03-06 Nec Home Electronics Ltd Manufacture of semiconductor device
JPS59232418A (ja) * 1983-06-15 1984-12-27 Sumitomo Electric Ind Ltd 微細パタ−ン形成法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4099062A (en) * 1976-12-27 1978-07-04 International Business Machines Corporation Electron beam lithography process
DE2734580C2 (de) * 1977-08-01 1979-02-15 Hoechst Ag, 6000 Frankfurt Verfahren zum Herstellen eines Originals eines Informationsträgers
JPS5676531A (en) * 1979-11-28 1981-06-24 Fujitsu Ltd Manufacture of semiconductor device
DE3013819A1 (de) * 1980-04-10 1981-10-15 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung gedruckter leiterplatten
JPS5749915A (en) * 1980-09-10 1982-03-24 Sumitomo Electric Ind Ltd Image converting element
US4456371A (en) * 1982-06-30 1984-06-26 International Business Machines Corporation Optical projection printing threshold leveling arrangement
JPS594017A (ja) * 1982-06-30 1984-01-10 Toshiba Corp 電子ビ−ム露光方法
EP0448735B1 (en) * 1990-03-23 1997-08-06 Ushio Denki Kabushiki Kaisha Method of exposing a peripheral part of wafer

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501805A (ja) * 1973-05-14 1975-01-09
JPS5168772A (en) * 1974-12-11 1976-06-14 Matsushita Electronics Corp Handotaisochino seizohoho
JPS5348676A (en) * 1976-10-15 1978-05-02 Handotai Kenkyu Shinkokai Method of forming pattern
JPS579488B2 (ja) * 1976-10-15 1982-02-22
JPS5429976A (en) * 1977-08-10 1979-03-06 Nec Home Electronics Ltd Manufacture of semiconductor device
JPS59232418A (ja) * 1983-06-15 1984-12-27 Sumitomo Electric Ind Ltd 微細パタ−ン形成法
JPH0462166B2 (ja) * 1983-06-15 1992-10-05 Sumitomo Electric Industries

Also Published As

Publication number Publication date
FR2151130A1 (en) 1973-04-13
DE2143737A1 (de) 1973-03-08
JPS5133445B2 (ja) 1976-09-20
FR2151130B1 (ja) 1974-08-19
IT963413B (it) 1974-01-10

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