JPS4830875A - - Google Patents
Info
- Publication number
- JPS4830875A JPS4830875A JP6444071A JP6444071A JPS4830875A JP S4830875 A JPS4830875 A JP S4830875A JP 6444071 A JP6444071 A JP 6444071A JP 6444071 A JP6444071 A JP 6444071A JP S4830875 A JPS4830875 A JP S4830875A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6444071A JPS4830875A (de) | 1971-08-25 | 1971-08-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6444071A JPS4830875A (de) | 1971-08-25 | 1971-08-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4830875A true JPS4830875A (de) | 1973-04-23 |
Family
ID=13258329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6444071A Pending JPS4830875A (de) | 1971-08-25 | 1971-08-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4830875A (de) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54111832A (en) * | 1978-02-22 | 1979-09-01 | Hitachi Ltd | Exposure device |
| JPS5673437A (en) * | 1979-11-20 | 1981-06-18 | Fujitsu Ltd | Far-ultraviolet light exposing method and device |
| JPS5690523A (en) * | 1979-12-25 | 1981-07-22 | Fujitsu Ltd | Pattern transcription |
| JPS56501183A (de) * | 1979-09-24 | 1981-08-20 | ||
| JPS56105634A (en) * | 1980-01-25 | 1981-08-22 | Fujitsu Ltd | X rays transcription device |
| JPS56111666U (de) * | 1980-12-09 | 1981-08-28 | ||
| JPS5739014U (de) * | 1980-08-11 | 1982-03-02 | ||
| JPS5799747A (en) * | 1980-12-12 | 1982-06-21 | Fujitsu Ltd | Light beam diffusor |
| JPS5841525A (ja) * | 1981-09-07 | 1983-03-10 | オリンパス光学工業株式会社 | 内視鏡用光源装置 |
| JPS59186817U (ja) * | 1983-05-30 | 1984-12-11 | 三菱レイヨン株式会社 | ライトガイド用光源装置 |
| JPS60133409U (ja) * | 1984-02-15 | 1985-09-05 | 古河電気工業株式会社 | 光ケ−ブル接続函 |
| JPS6187334A (ja) * | 1985-10-18 | 1986-05-02 | Tokyo Erekutoron Kk | ウエハ露光方法 |
| JPS61202437A (ja) * | 1985-03-06 | 1986-09-08 | Canon Inc | ステップアンドリピート露光方法 |
| JPS6477124A (en) * | 1988-07-29 | 1989-03-23 | Hitachi Ltd | Projection type exposure device |
-
1971
- 1971-08-25 JP JP6444071A patent/JPS4830875A/ja active Pending
Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54111832A (en) * | 1978-02-22 | 1979-09-01 | Hitachi Ltd | Exposure device |
| JPH0114695B2 (de) * | 1978-02-22 | 1989-03-14 | Hitachi Ltd | |
| JPS56501183A (de) * | 1979-09-24 | 1981-08-20 | ||
| JPS6231490B2 (de) * | 1979-11-20 | 1987-07-08 | Fujitsu Ltd | |
| JPS5673437A (en) * | 1979-11-20 | 1981-06-18 | Fujitsu Ltd | Far-ultraviolet light exposing method and device |
| JPS5690523A (en) * | 1979-12-25 | 1981-07-22 | Fujitsu Ltd | Pattern transcription |
| JPS56105634A (en) * | 1980-01-25 | 1981-08-22 | Fujitsu Ltd | X rays transcription device |
| JPS5739014U (de) * | 1980-08-11 | 1982-03-02 | ||
| JPS6343446Y2 (de) * | 1980-08-11 | 1988-11-14 | ||
| JPS56111666U (de) * | 1980-12-09 | 1981-08-28 | ||
| JPS6322453B2 (de) * | 1980-12-12 | 1988-05-12 | Fujitsu Ltd | |
| JPS5799747A (en) * | 1980-12-12 | 1982-06-21 | Fujitsu Ltd | Light beam diffusor |
| JPS5841525A (ja) * | 1981-09-07 | 1983-03-10 | オリンパス光学工業株式会社 | 内視鏡用光源装置 |
| JPH0364848B2 (de) * | 1981-09-07 | 1991-10-08 | Olympus Optical Co | |
| JPS59186817U (ja) * | 1983-05-30 | 1984-12-11 | 三菱レイヨン株式会社 | ライトガイド用光源装置 |
| JPS60133409U (ja) * | 1984-02-15 | 1985-09-05 | 古河電気工業株式会社 | 光ケ−ブル接続函 |
| JPS61202437A (ja) * | 1985-03-06 | 1986-09-08 | Canon Inc | ステップアンドリピート露光方法 |
| JPS6187334A (ja) * | 1985-10-18 | 1986-05-02 | Tokyo Erekutoron Kk | ウエハ露光方法 |
| JPS6477124A (en) * | 1988-07-29 | 1989-03-23 | Hitachi Ltd | Projection type exposure device |
| JPH0480530B2 (de) * | 1988-07-29 | 1992-12-18 | Hitachi Ltd |