JPH0480530B2 - - Google Patents
Info
- Publication number
- JPH0480530B2 JPH0480530B2 JP63188433A JP18843388A JPH0480530B2 JP H0480530 B2 JPH0480530 B2 JP H0480530B2 JP 63188433 A JP63188433 A JP 63188433A JP 18843388 A JP18843388 A JP 18843388A JP H0480530 B2 JPH0480530 B2 JP H0480530B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- light source
- exposure
- pulse laser
- laser light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 24
- 238000005286 illumination Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 7
- 230000001629 suppression Effects 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 230000001427 coherent effect Effects 0.000 description 7
- 239000005337 ground glass Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- QGJOPFRUJISHPQ-UHFFFAOYSA-N Carbon disulfide Chemical compound S=C=S QGJOPFRUJISHPQ-UHFFFAOYSA-N 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000013307 optical fiber Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63188433A JPS6477124A (en) | 1988-07-29 | 1988-07-29 | Projection type exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63188433A JPS6477124A (en) | 1988-07-29 | 1988-07-29 | Projection type exposure device |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3257457A Division JP2501053B2 (ja) | 1991-10-04 | 1991-10-04 | 紫外パルスレ―ザによる投影式露光方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6477124A JPS6477124A (en) | 1989-03-23 |
JPH0480530B2 true JPH0480530B2 (de) | 1992-12-18 |
Family
ID=16223589
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63188433A Granted JPS6477124A (en) | 1988-07-29 | 1988-07-29 | Projection type exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6477124A (de) |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4830875A (de) * | 1971-08-25 | 1973-04-23 | ||
JPS4831969A (de) * | 1971-08-27 | 1973-04-26 | ||
JPS4847848A (de) * | 1971-10-18 | 1973-07-06 | ||
JPS4998645A (de) * | 1973-01-24 | 1974-09-18 | ||
JPS505040A (de) * | 1973-02-19 | 1975-01-20 | ||
JPS5038378A (de) * | 1973-08-08 | 1975-04-09 | ||
JPS5038377A (de) * | 1973-08-08 | 1975-04-09 | ||
JPS5372575A (en) * | 1976-12-10 | 1978-06-28 | Thomson Csf | Pattern transfer optical device |
-
1988
- 1988-07-29 JP JP63188433A patent/JPS6477124A/ja active Granted
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4830875A (de) * | 1971-08-25 | 1973-04-23 | ||
JPS4831969A (de) * | 1971-08-27 | 1973-04-26 | ||
JPS4847848A (de) * | 1971-10-18 | 1973-07-06 | ||
JPS4998645A (de) * | 1973-01-24 | 1974-09-18 | ||
JPS505040A (de) * | 1973-02-19 | 1975-01-20 | ||
JPS5038378A (de) * | 1973-08-08 | 1975-04-09 | ||
JPS5038377A (de) * | 1973-08-08 | 1975-04-09 | ||
JPS5372575A (en) * | 1976-12-10 | 1978-06-28 | Thomson Csf | Pattern transfer optical device |
Also Published As
Publication number | Publication date |
---|---|
JPS6477124A (en) | 1989-03-23 |
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