JPS4815059A - - Google Patents

Info

Publication number
JPS4815059A
JPS4815059A JP5569572A JP5569572A JPS4815059A JP S4815059 A JPS4815059 A JP S4815059A JP 5569572 A JP5569572 A JP 5569572A JP 5569572 A JP5569572 A JP 5569572A JP S4815059 A JPS4815059 A JP S4815059A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5569572A
Other languages
Japanese (ja)
Other versions
JPS5037531B1 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4815059A publication Critical patent/JPS4815059A/ja
Publication of JPS5037531B1 publication Critical patent/JPS5037531B1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676—Single layer compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Organic Insulating Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
JP47055695A 1971-06-28 1972-06-06 Pending JPS5037531B1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15762571A 1971-06-28 1971-06-28

Publications (2)

Publication Number Publication Date
JPS4815059A true JPS4815059A (enrdf_load_stackoverflow) 1973-02-26
JPS5037531B1 JPS5037531B1 (enrdf_load_stackoverflow) 1975-12-03

Family

ID=22564554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47055695A Pending JPS5037531B1 (enrdf_load_stackoverflow) 1971-06-28 1972-06-06

Country Status (5)

Country Link
JP (1) JPS5037531B1 (enrdf_load_stackoverflow)
DE (1) DE2231297A1 (enrdf_load_stackoverflow)
FR (1) FR2143706B1 (enrdf_load_stackoverflow)
GB (1) GB1330100A (enrdf_load_stackoverflow)
IT (1) IT951496B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5137216A (enrdf_load_stackoverflow) * 1974-09-26 1976-03-29 Asahi Chemical Ind

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4368253A (en) 1981-01-28 1983-01-11 Ciba-Geigy Corporation Image formation process
US4439517A (en) * 1982-01-21 1984-03-27 Ciba-Geigy Corporation Process for the formation of images with epoxide resin
US4663269A (en) * 1985-08-07 1987-05-05 Polytechnic Institute Of New York Method of forming highly sensitive photoresist film in the absence of water
US5650261A (en) * 1989-10-27 1997-07-22 Rohm And Haas Company Positive acting photoresist comprising a photoacid, a photobase and a film forming acid-hardening resin system
JP2739726B2 (ja) 1990-09-27 1998-04-15 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン 多層プリント回路板
US6168898B1 (en) * 1998-02-17 2001-01-02 Isola Laminate Systems Corp. Positive acting photodielectric composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5137216A (enrdf_load_stackoverflow) * 1974-09-26 1976-03-29 Asahi Chemical Ind

Also Published As

Publication number Publication date
FR2143706B1 (enrdf_load_stackoverflow) 1976-06-11
JPS5037531B1 (enrdf_load_stackoverflow) 1975-12-03
FR2143706A1 (enrdf_load_stackoverflow) 1973-02-09
IT951496B (it) 1973-06-30
DE2231297A1 (de) 1973-01-11
GB1330100A (en) 1973-09-12

Similar Documents

Publication Publication Date Title
FR2143706B1 (enrdf_load_stackoverflow)
AU2658571A (enrdf_load_stackoverflow)
AU2691671A (enrdf_load_stackoverflow)
AU2485671A (enrdf_load_stackoverflow)
AU2684071A (enrdf_load_stackoverflow)
AU2564071A (enrdf_load_stackoverflow)
AU2684171A (enrdf_load_stackoverflow)
AU3038671A (enrdf_load_stackoverflow)
AU2706571A (enrdf_load_stackoverflow)
AU2885171A (enrdf_load_stackoverflow)
AU2486471A (enrdf_load_stackoverflow)
AU2724971A (enrdf_load_stackoverflow)
AR202997Q (enrdf_load_stackoverflow)
AU2588771A (enrdf_load_stackoverflow)
AU2503871A (enrdf_load_stackoverflow)
AU2473671A (enrdf_load_stackoverflow)
AU2577671A (enrdf_load_stackoverflow)
AU2669471A (enrdf_load_stackoverflow)
AU3025871A (enrdf_load_stackoverflow)
AU2654071A (enrdf_load_stackoverflow)
CH562324A5 (enrdf_load_stackoverflow)
CH561291A5 (enrdf_load_stackoverflow)
CH559018A5 (enrdf_load_stackoverflow)
CH546013A (enrdf_load_stackoverflow)
CH559266A5 (enrdf_load_stackoverflow)