JPS48102076A - - Google Patents

Info

Publication number
JPS48102076A
JPS48102076A JP2274273A JP2274273A JPS48102076A JP S48102076 A JPS48102076 A JP S48102076A JP 2274273 A JP2274273 A JP 2274273A JP 2274273 A JP2274273 A JP 2274273A JP S48102076 A JPS48102076 A JP S48102076A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2274273A
Other languages
Japanese (ja)
Other versions
JPS5411798B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS48102076A publication Critical patent/JPS48102076A/ja
Publication of JPS5411798B2 publication Critical patent/JPS5411798B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2274273A 1972-03-06 1973-02-27 Expired JPS5411798B2 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH327572A CH565869A5 (enrdf_load_stackoverflow) 1972-03-06 1972-03-06

Publications (2)

Publication Number Publication Date
JPS48102076A true JPS48102076A (enrdf_load_stackoverflow) 1973-12-21
JPS5411798B2 JPS5411798B2 (enrdf_load_stackoverflow) 1979-05-17

Family

ID=4252464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2274273A Expired JPS5411798B2 (enrdf_load_stackoverflow) 1972-03-06 1973-02-27

Country Status (7)

Country Link
JP (1) JPS5411798B2 (enrdf_load_stackoverflow)
AT (1) AT319007B (enrdf_load_stackoverflow)
CH (1) CH565869A5 (enrdf_load_stackoverflow)
DE (1) DE2305359C3 (enrdf_load_stackoverflow)
FR (1) FR2174967B1 (enrdf_load_stackoverflow)
GB (1) GB1394655A (enrdf_load_stackoverflow)
NL (1) NL151137B (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5691437A (en) * 1979-12-26 1981-07-24 Nippon Hoso Kyokai <Nhk> Preparation of metallized element
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
JPS6115967A (ja) * 1984-06-29 1986-01-24 Sumitomo Electric Ind Ltd 表面処理方法
JPS61177366A (ja) * 1985-01-31 1986-08-09 Sharp Corp 超微粒子分散基板の製造装置
US4888202A (en) * 1986-07-31 1989-12-19 Nippon Telegraph And Telephone Corporation Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film

Also Published As

Publication number Publication date
JPS5411798B2 (enrdf_load_stackoverflow) 1979-05-17
DE2305359C3 (de) 1980-01-10
NL151137B (nl) 1976-10-15
DE2305359A1 (de) 1973-09-13
FR2174967B1 (enrdf_load_stackoverflow) 1977-04-22
NL7205592A (enrdf_load_stackoverflow) 1973-09-10
GB1394655A (en) 1975-05-21
FR2174967A1 (enrdf_load_stackoverflow) 1973-10-19
CH565869A5 (enrdf_load_stackoverflow) 1975-08-29
DE2305359B2 (de) 1975-07-17
AT319007B (de) 1974-11-25

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