JPS409727B1 - - Google Patents
Info
- Publication number
- JPS409727B1 JPS409727B1 JP6334363A JP6334363A JPS409727B1 JP S409727 B1 JPS409727 B1 JP S409727B1 JP 6334363 A JP6334363 A JP 6334363A JP 6334363 A JP6334363 A JP 6334363A JP S409727 B1 JPS409727 B1 JP S409727B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
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- H10P50/693—
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- H10P50/695—
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- H10P50/71—
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- H10P76/4085—
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- H10P95/00—
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/80—Material per se process of making same
- Y10S505/815—Process of making per se
- Y10S505/818—Coating
- Y10S505/82—And etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Electrodes Of Semiconductors (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Containers, Films, And Cooling For Superconductive Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- ing And Chemical Polishing (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6334363A JPS409727B1 (show.php) | 1962-12-10 | 1963-11-27 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US243468A US3326717A (en) | 1962-12-10 | 1962-12-10 | Circuit fabrication |
| JP6334363A JPS409727B1 (show.php) | 1962-12-10 | 1963-11-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS409727B1 true JPS409727B1 (show.php) | 1965-05-19 |
Family
ID=22918882
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6334363A Pending JPS409727B1 (show.php) | 1962-12-10 | 1963-11-27 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3326717A (show.php) |
| JP (1) | JPS409727B1 (show.php) |
| DE (1) | DE1244262B (show.php) |
| FR (1) | FR1389506A (show.php) |
| GB (1) | GB997642A (show.php) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3617375A (en) * | 1969-08-11 | 1971-11-02 | Texas Instruments Inc | Electron beam evaporated quartz insulating material process |
| JPS5036127B1 (show.php) * | 1971-05-27 | 1975-11-21 | ||
| US4313783A (en) * | 1980-05-19 | 1982-02-02 | Branson International Plasma Corporation | Computer controlled system for processing semiconductor wafers |
| ATE199046T1 (de) * | 1990-05-09 | 2001-02-15 | Canon Kk | Erzeugung von mustern und herstellungsverfahren für halbleiteranordnungen mit diesem muster |
| US5658387A (en) * | 1991-03-06 | 1997-08-19 | Semitool, Inc. | Semiconductor processing spray coating apparatus |
| US6375741B2 (en) * | 1991-03-06 | 2002-04-23 | Timothy J. Reardon | Semiconductor processing spray coating apparatus |
| EP0908781A3 (en) * | 1990-09-26 | 1999-04-21 | Canon Kabushiki Kaisha | Photolithographic processing method and apparatus |
| US5714306A (en) * | 1990-09-26 | 1998-02-03 | Canon Kabushiki Kaisha | Processing method and apparatus |
| FR2872502B1 (fr) * | 2004-07-05 | 2006-11-10 | Ecole Norm Superieure Lyon | Dispositif de microstructuration de surface |
| CN102310602B (zh) * | 2010-06-30 | 2014-03-26 | 鸿富锦精密工业（深圳）有限公司 | 铝塑复合结构及其制作方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3114652A (en) * | 1960-04-15 | 1963-12-17 | Alloyd Corp | Vapor deposition process |
| US3132046A (en) * | 1960-09-28 | 1964-05-05 | Space Technology Lab Inc | Method for the deposition of thin films by electron bombardment |
| US3056881A (en) * | 1961-06-07 | 1962-10-02 | United Aircraft Corp | Method of making electrical conductor device |
| US3095341A (en) * | 1961-06-30 | 1963-06-25 | Bell Telephone Labor Inc | Photosensitive gas phase etching of semiconductors by selective radiation |
-
1962
- 1962-12-10 US US243468A patent/US3326717A/en not_active Expired - Lifetime
-
1963
- 1963-11-21 GB GB45930/63A patent/GB997642A/en not_active Expired
- 1963-11-27 JP JP6334363A patent/JPS409727B1/ja active Pending
- 1963-12-06 FR FR956268A patent/FR1389506A/fr not_active Expired
- 1963-12-10 DE DEJ24889A patent/DE1244262B/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE1244262B (de) | 1967-07-13 |
| US3326717A (en) | 1967-06-20 |
| FR1389506A (fr) | 1965-02-19 |
| GB997642A (en) | 1965-07-07 |