JPH1187418A - Semiconductor chip with bump - Google Patents

Semiconductor chip with bump

Info

Publication number
JPH1187418A
JPH1187418A JP9239666A JP23966697A JPH1187418A JP H1187418 A JPH1187418 A JP H1187418A JP 9239666 A JP9239666 A JP 9239666A JP 23966697 A JP23966697 A JP 23966697A JP H1187418 A JPH1187418 A JP H1187418A
Authority
JP
Japan
Prior art keywords
bumps
bump
electrodes
chip
semiconductor chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9239666A
Other languages
Japanese (ja)
Inventor
Makoto Aoki
真 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Aviation Electronics Industry Ltd
Original Assignee
Japan Aviation Electronics Industry Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Aviation Electronics Industry Ltd filed Critical Japan Aviation Electronics Industry Ltd
Priority to JP9239666A priority Critical patent/JPH1187418A/en
Publication of JPH1187418A publication Critical patent/JPH1187418A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/11Manufacturing methods
    • H01L2224/113Manufacturing methods by local deposition of the material of the bump connector
    • H01L2224/1133Manufacturing methods by local deposition of the material of the bump connector in solid form
    • H01L2224/1134Stud bumping, i.e. using a wire-bonding apparatus
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/8119Arrangement of the bump connectors prior to mounting
    • H01L2224/81191Arrangement of the bump connectors prior to mounting wherein the bump connectors are disposed only on the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83192Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]

Landscapes

  • Wire Bonding (AREA)

Abstract

PROBLEM TO BE SOLVED: To suppress the generation of a void by a method wherein electrodes are arranged along each side of a surface of the chip body, and the bumps, having the oval-shaped junction surface of each electrode, are formed on the electrodes. SOLUTION: Electrodes 13 are formed along each side of one surface of a chip body 12, and bumps 31 are formed on the electrodes 13. The junction surface of each bump 31 with the electrodes 13 is oval shaped, and the longitudinal direction of the oval shaped bump 31 is formed in the direction orthogonally intersecting with the side along the bumps 31. Consequently, a wide chip 32 can be obtained between the adjacent bumps 31, and sealing resin easily passes between the bumps 31 when they are mounted on a substrate. To be more precise, the sealing resin is allowed to flow uniformly and the entainment of air is suppressed, and as a result, the generation of voids in the sealing resin can be suppressed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は回路基板上にフリ
ップチップ方式で実装されるバンプ付半導体チップに関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor chip with bumps mounted on a circuit board by a flip chip method.

【0002】[0002]

【従来の技術】従来のこの種のバンプ付半導体チップの
外観構造の一例を図7に示す。このバンプ付半導体チッ
プ(以下、チップと言う。)11は端子が周辺配置構造
とされたもので、チップ本体12の方形をなす一面の各
辺に沿って電極13が配列形成され、それら電極13上
にバンプ14がそれぞれ形成されている。
2. Description of the Related Art FIG. 7 shows an example of an appearance structure of a conventional semiconductor chip with bumps of this kind. The semiconductor chip with bumps (hereinafter, referred to as chip) 11 has terminals arranged in a peripheral structure, and electrodes 13 are arranged and formed along each side of a square surface of the chip body 12. The bumps 14 are formed on each of them.

【0003】バンプ14の形成は図8に示したように、
超音波ホーン15に取付けられたキャピラリ16を用い
て行われ、即ちキャピラリ16より供給されるワイヤ1
7がスパーク電極(図示せず)により溶融されてワイヤ
17の先端にボール18が形成され、ワイヤ17の冗長
部分をキャピラリ16内に収容した後、キャピラリ16
によりボール18を電極13に押し付け、超音波を加え
てボール18を電極13に接合させることにより、バン
プ14が形成される。この際、チップ本体12は所要の
温度に加熱されている。ワイヤ17の材料としては、A
u,Cu,あるいはこれらを主成分とする合金、半田等
が用いられる。
[0003] As shown in FIG.
This is performed using a capillary 16 attached to the ultrasonic horn 15, that is, the wire 1 supplied from the capillary 16
7 is melted by a spark electrode (not shown) to form a ball 18 at the tip of the wire 17, and a redundant portion of the wire 17 is accommodated in the capillary 16.
The bumps 14 are formed by pressing the ball 18 against the electrode 13 and applying ultrasonic waves to join the ball 18 to the electrode 13. At this time, the chip body 12 is heated to a required temperature. The material of the wire 17 is A
u, Cu, an alloy containing these as a main component, solder, or the like is used.

【0004】ボール18が電極13に接する時のボール
18への荷重は、超音波を加えている時の荷重の例えば
1.5倍程度に設定され、これによりボール18が電極1
3に接した時の荷重でバンプ14の径が決定され、超音
波を加えている時の荷重はバンプ形状に影響せず、ボー
ル18と電極13との接合に供せられる。図9はこのよ
うにして形状されたバンプ14の形状を拡大して示した
ものであり、ボール18が電極13に接した時の荷重は
ボール18を上方より均等に押しつぶすように作用する
ため、形成されたバンプ14の電極13との接合面の形
状はほぼ円形となっている。なお、この円形をなす接合
部14a上に続く先細部分は、ワイヤ17の破断により
生じる破断部14bである。
The load on the ball 18 when the ball 18 contacts the electrode 13 is, for example, the load when applying ultrasonic waves.
It is set to about 1.5 times, so that the ball 18
The diameter of the bump 14 is determined by the load when it comes into contact with 3, and the load when ultrasonic waves are applied does not affect the bump shape, and is used for bonding the ball 18 and the electrode 13. FIG. 9 is an enlarged view of the shape of the bump 14 thus formed. Since the load when the ball 18 comes into contact with the electrode 13 acts to crush the ball 18 evenly from above, The shape of the bonding surface of the formed bump 14 with the electrode 13 is substantially circular. The tapered portion following the circular joining portion 14a is a broken portion 14b caused by the breaking of the wire 17.

【0005】上記のようなバンプ14を有するチップ1
1は、図10AあるいはBに示すようにして基板21に
実装される。図10Aは各バンプ14が対応する基板電
極22上に位置するように、チップ11を基板21に搭
載し、チップ本体12を押圧して各バンプ14を基板電
極22に圧接させた状態で、チップ本体12の周辺より
例えばエポキシ樹脂等の樹脂23を毛細管現象によりチ
ップ本体12の下に流し込むことにより、樹脂封止して
実装する方法を示したものである。
[0005] Chip 1 having bumps 14 as described above
1 is mounted on the substrate 21 as shown in FIG. 10A or 10B. FIG. 10A shows a state in which the chip 11 is mounted on the substrate 21 so that each bump 14 is located on the corresponding substrate electrode 22, and the chip body 12 is pressed to press each bump 14 against the substrate electrode 22. This shows a method in which a resin 23 such as an epoxy resin is poured under the chip main body 12 from the periphery of the main body 12 by a capillary phenomenon, and is sealed with a resin and mounted.

【0006】一方、図10Bは基板21のチップ搭載位
置中央付近に予め所定量の樹脂23を供給しておき、チ
ップ11の搭載によりチップ本体12の下に樹脂23を
押し広げて実装する方法を示したものであり、チップ1
1はこれらの方法により樹脂封止されて基板21にフリ
ップチップ実装される。
On the other hand, FIG. 10B shows a method in which a predetermined amount of resin 23 is supplied in advance in the vicinity of the center of the chip mounting position of the substrate 21, and the resin 23 is spread under the chip main body 12 by mounting the chip 11 for mounting. Shown, chip 1
1 is flip-chip mounted on the substrate 21 by resin sealing by these methods.

【0007】[0007]

【発明が解決しようとする課題】ところで、半導体素子
の集積度の向上及び入出力端子数の増加が進む中、この
種のチップ11においても、その電極13の配列ピッチ
の狭ピッチ化が進んでおり、この場合以下に示すような
問題が発生する。即ち、隣接バンプ間の間隔が狭くなる
ため、図10A及びBに示したいずれの実装方法におい
ても共通する問題として、樹脂封止工程において樹脂2
3が周辺からチップ本体12の下へ、あるいはチップ本
体12の下から周辺へ移動する際に、バンプ間を通過し
難くなり、つまり樹脂23の流れが非常に悪くなるとい
う問題が発生する。そして、この場合、バンプ14の位
置精度のばらつきにより、バンプ間の間隔がばらつく
と、樹脂23の通過速度に差が生じてエアーを巻き込む
ような状況が発生し、樹脂23が硬化した後にボイドと
して残ってしまうという状況が発生する。図11は図1
0Bの実装方法を例に、この様子を示したものであり、
図中、24は発生したボイドを示す。
By the way, as the degree of integration of semiconductor devices and the number of input / output terminals increase, the pitch of the electrodes 13 of this type of chip 11 also decreases. In this case, the following problem occurs. That is, since the distance between adjacent bumps becomes narrow, a common problem in any of the mounting methods shown in FIGS.
When 3 moves from the periphery to below the chip body 12 or from below the chip body 12 to the periphery, it becomes difficult to pass between the bumps, that is, the flow of the resin 23 becomes extremely poor. In this case, if the distance between the bumps varies due to the variation in the positional accuracy of the bumps 14, a difference occurs in the passing speed of the resin 23, causing a situation in which air is entrapped. A situation occurs in which it remains. FIG. 11 shows FIG.
This is shown by taking the mounting method of 0B as an example.
In the drawing, reference numeral 24 denotes a generated void.

【0008】封止樹脂23′内にボイド24が発生する
と、その内包された気体が温度変化により膨張・収縮す
ることによって樹脂23′に応力が作用し、例えばバン
プ14と基板電極22との圧接状態がその影響を受けて
接触抵抗値が増大するといった不具合が発生する恐れが
あり、また最悪、バンプ14が基板電極22から離れる
といった障害が発生し、信頼性上、大きな問題となる。
When a void 24 is generated in the sealing resin 23 ', the gas contained therein expands and contracts due to a change in temperature, so that a stress acts on the resin 23', for example, the pressure contact between the bump 14 and the substrate electrode 22. There is a possibility that a problem such as an increase in the contact resistance value occurs due to the influence of the state, and a trouble such as the bump 14 separating from the substrate electrode 22 occurs at worst, which is a serious problem in reliability.

【0009】この発明の目的は上述した問題点に鑑み、
ボイドの発生を抑制することができ、信頼性に優れた実
装状態を実現できるようにしたバンプ付半導体チップを
提供することにある。
In view of the above problems, an object of the present invention is to provide
An object of the present invention is to provide a bumped semiconductor chip capable of suppressing the generation of voids and realizing a highly reliable mounting state.

【0010】[0010]

【課題を解決するための手段】請求項1の発明によれ
ば、チップ本体の一面の各辺に沿って電極が配列形成さ
れ、それら電極上にバンプがそれぞれ形成されてなるバ
ンプ付半導体チップにおいて、バンプの、電極との接合
面の形状が楕円形とされる。請求項2の発明では、請求
項1の発明において、上記楕円の長軸方向がそのバンプ
が沿う辺と直交する方向とされる。
According to the first aspect of the present invention, there is provided a semiconductor chip with bumps in which electrodes are formed along each side of one surface of a chip body and bumps are formed on the electrodes. The shape of the bonding surface of the bump and the electrode is elliptical. According to a second aspect of the present invention, in the first aspect, a major axis direction of the ellipse is a direction orthogonal to a side along which the bump is located.

【0011】請求項3の発明では、請求項2の発明にお
いて、上記楕円の長軸方向及び短軸方向における電極の
長さをそれぞれa及びbとした時、楕円の長軸長さL1
及び短軸長さL2 が、 L2 ≦0.8L1 a/2≦L1 ≦a b/3≦L2 を満足するように選定される。
According to a third aspect of the present invention, when the lengths of the electrodes in the major axis direction and the minor axis direction of the ellipse are a and b, respectively, in the invention of the second aspect, the major axis length L 1 of the ellipse is set.
And the short axis length L 2 is selected so as to satisfy L 2 ≦ 0.8 L 1 a / 2 ≦ L 1 ≦ ab / 3 ≦ L 2 .

【0012】[0012]

【発明の実施の形態】この発明の実施の形態を図面を参
照して実施例により説明する。なお、図7〜11と対応
する部分には同一符号を付し、その説明を省略する。図
1はこの発明の一実施例を示したものである。この例で
は電極13上に形成されるバンプ31の、電極13との
接合面の形状は楕円形とされる。電極13は図1では省
略して示しているが、チップ本体12の方形をなす一面
の各辺に沿って例えば80個ずつ、計320個配列形成
されている。各電極13上の楕円形をなすバンプ31
は、その楕円の長軸方向が、そのバンプ31が沿う辺と
それぞれ直交する方向とされている。
Embodiments of the present invention will be described with reference to the accompanying drawings. Parts corresponding to those in FIGS. 7 to 11 are denoted by the same reference numerals, and description thereof is omitted. FIG. 1 shows an embodiment of the present invention. In this example, the shape of the bonding surface of the bump 31 formed on the electrode 13 with the electrode 13 is elliptical. Although not shown in FIG. 1, a total of 320 electrodes 13 are formed along each side of one surface of the chip body 12, for example, 80 electrodes 13. Elliptical bumps 31 on each electrode 13
Is such that the major axis direction of the ellipse is orthogonal to the sides along which the bumps 31 extend.

【0013】図2はバンプ31の形状を拡大して示した
ものであり、バンプ31は楕円形をなす接合部31a
と、それに続くワイヤ破断部31bとを有している。上
記のような形状を有するバンプ31の形成は図3に示し
たように、従来と同様、超音波ホーン15に取付けられ
たキャピラリ16を用いて行われる。この際、従来の荷
重の設定とは異なり、ワイヤ17の先端に形成されたボ
ール18が電極13に接する時の荷重に対し、超音波を
加えている時の荷重が例えば1〜1.5倍になるように設
定する。これにより、超音波を加えている時の荷重がバ
ンプ形状に影響し、つまりキャピラリ16は超音波ホー
ン15の振動方向に振動しながらボール18を変形させ
ていくため、楕円形のバンプ31を形成することができ
る。
FIG. 2 is an enlarged view of the shape of the bump 31. The bump 31 has an elliptical joint 31a.
And a subsequent wire break 31b. As shown in FIG. 3, the formation of the bump 31 having the above-described shape is performed by using the capillary 16 attached to the ultrasonic horn 15, as in the related art. At this time, unlike the conventional setting of the load, the load when applying the ultrasonic wave is, for example, 1 to 1.5 times the load when the ball 18 formed at the tip of the wire 17 contacts the electrode 13. Set to be. As a result, the load when the ultrasonic wave is applied affects the bump shape, that is, the capillary 16 deforms the ball 18 while vibrating in the vibration direction of the ultrasonic horn 15, so that the elliptical bump 31 is formed. can do.

【0014】図4は各辺の電極13へのバンプ31の形
成方法の一例を示したものであり、チップ本体12の一
辺に沿って超音波ホーン15を移動させて順次バンプ3
1を形成し、その一辺のバンプ形成が終了したら、チッ
プ本体12を90°回転させて次の辺のバンプ31を形
成し、これを繰り返して4辺の電極13全てにバンプ形
成を行うようにしたものである。
FIG. 4 shows an example of a method of forming the bumps 31 on the electrodes 13 on each side. The ultrasonic horn 15 is moved along one side of the chip body 12 to sequentially form the bumps 3.
1 is formed, and when the formation of the bumps on one side is completed, the chip body 12 is rotated by 90 ° to form the bumps 31 on the next side, and this is repeated so that the bumps are formed on all the electrodes 13 on the four sides. It was done.

【0015】上記のようなバンプ31を有するバンプ付
半導体チップ(以下、チップと言う。)32において
は、隣接バンプ間の間隔が図9に示した従来の円形の接
合面を有するバンプ14よりも広くなり、つまり同一接
合面面積としても楕円形ゆえ、隣接バンプ間の間隔を広
くすることができるため、その分樹脂封止工程における
バンプ間を通過する樹脂の流れを良くすることができ
る。
In the bumped semiconductor chip (hereinafter, referred to as a chip) 32 having the bumps 31 as described above, the distance between adjacent bumps is larger than that of the conventional bump 14 having a circular bonding surface shown in FIG. Since the area becomes wider, that is, even if the area of the same joint surface is elliptical, the interval between adjacent bumps can be made wider, so that the flow of the resin passing between the bumps in the resin sealing step can be improved.

【0016】なお、楕円形の大きさは図2に示したよう
に、楕円の長軸方向及び短軸方向における電極13の長
さをそれぞれa及びbとし、楕円の長軸長さをL1 ,短
軸長さL2 とした時、これらa,b,L1 及びL2 が下
式を満足するように選定するのが好ましい。 L2 ≦0.8L1 a/2≦L1 ≦a b/3≦L2 図5はチップ32を樹脂封止して基板21に実装する様
子を示したものであり、図5Aは樹脂23を周辺からチ
ップ本体12の下へ流し込む場合を示し、図5Bは樹脂
23をチップ本体12の下から周辺に押し広げる場合を
示している。いずれの場合にもバンプ間の間隔が従来に
比し、広いため、樹脂23は良好に流れ、よってエアー
の巻き込みは生じにくくなり、封止樹脂23′内にボイ
ドが発生しにくいものとなる。
As shown in FIG. 2, the elliptical shape is such that the lengths of the electrodes 13 in the major axis direction and the minor axis direction of the ellipse are a and b, respectively, and the major axis length of the ellipse is L 1. , when the short axis length L 2, these a, b, preferably L 1 and L 2 is selected to satisfy the following equation. L 2 ≦ 0.8 L 1 a / 2 ≦ L 1 ≦ ab / 3 ≦ L 2 FIG. 5 shows a state in which the chip 32 is sealed with a resin and mounted on the substrate 21, and FIG. FIG. 5B shows a case in which the resin 23 is spread from below the chip body 12 to the periphery. In any case, since the interval between the bumps is wider than in the conventional case, the resin 23 flows well, so that the entrainment of air is less likely to occur, and voids are less likely to occur in the sealing resin 23 '.

【0017】図6は上述のようにしてチップ32が基板
21に実装された状態を示したものである。なお、上述
した例では楕円形をなすバンプ31は、その楕円の長軸
方向が、そのバンプ31が沿うチップ本体12の辺と直
交する方向とされているが、例えばチップ本体12の中
央部から放射状に樹脂23が流れる場合には、その流れ
に対応して楕円の長軸方向をチップ本体12の中心から
の放射方向に向けることも考えられる。つまり、楕円の
長軸方向は樹脂23の流れる方向に対応して選定されう
る。
FIG. 6 shows a state in which the chip 32 is mounted on the substrate 21 as described above. In the above-described example, the elliptical bump 31 has a major axis direction perpendicular to a side of the chip body 12 along which the bump 31 extends. When the resin 23 flows radially, the major axis of the ellipse may be directed in the radial direction from the center of the chip body 12 corresponding to the flow. That is, the major axis direction of the ellipse can be selected according to the direction in which the resin 23 flows.

【0018】[0018]

【発明の効果】以上説明したように、この発明によれば
隣接バンプ間の間隔が従来に比し、広いチップ32を得
ることができるため、基板21への実装時に封止用の樹
脂23がバンプ間を通過しやすくなり、即ち樹脂23が
良好かつ一様に流れ、エアーの巻き込みが生じにくくな
るため、封止樹脂23′内のボイドの発生を抑制するこ
とができ、従って信頼性に優れたフリップチップ実装を
実現することができる。
As described above, according to the present invention, it is possible to obtain a chip 32 in which the distance between adjacent bumps is wider than in the conventional case. Since the resin 23 easily flows between the bumps, that is, the resin 23 flows favorably and uniformly, and the air is hardly caught, the generation of voids in the sealing resin 23 'can be suppressed, and therefore, the reliability is excellent. Flip chip mounting can be realized.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の一実施例を示す底面図。FIG. 1 is a bottom view showing one embodiment of the present invention.

【図2】Aは図1におけるバンプの拡大図、Bはその側
面図。
2A is an enlarged view of a bump in FIG. 1, and FIG. 2B is a side view thereof.

【図3】バンプの形成方法を説明するための図。FIG. 3 is a diagram illustrating a method of forming a bump.

【図4】チップの各電極へのバンプの形成方法を説明す
るための図。
FIG. 4 is a diagram for explaining a method of forming bumps on each electrode of a chip.

【図5】チップの基板への実装方法及び封止樹脂の流れ
を説明するための図。
FIG. 5 is a diagram for explaining a method of mounting a chip on a substrate and a flow of a sealing resin.

【図6】Aはチップの基板への実装状態を示す部分拡大
図、BはそのEE断面図、CはそのFF断面図。
6A is a partially enlarged view showing a mounted state of a chip on a substrate, FIG. 6B is an EE sectional view thereof, and C is an FF sectional view thereof.

【図7】従来のチップを示す底面図。FIG. 7 is a bottom view showing a conventional chip.

【図8】従来のバンプの形成方法を説明するための図。FIG. 8 is a view for explaining a conventional bump forming method.

【図9】Aは図7におけるバンプの拡大図、Bはその側
面図。
9A is an enlarged view of a bump in FIG. 7, and FIG. 9B is a side view thereof.

【図10】チップの基板への実装方法を説明するための
図。
FIG. 10 is a diagram for explaining a method of mounting a chip on a substrate.

【図11】封止樹脂内にボイドが発生する様子を示す
図。
FIG. 11 is a diagram illustrating a state in which voids are generated in a sealing resin.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 チップ本体の一面の各辺に沿って電極が
配列形成され、それら電極上にバンプがそれぞれ形成さ
れてなるバンプ付半導体チップにおいて、 上記バンプの、上記電極との接合面の形状が楕円形とさ
れていることを特徴とするバンプ付半導体チップ。
1. A bumped semiconductor chip in which electrodes are arranged and formed along each side of one surface of a chip body, and bumps are respectively formed on the electrodes, wherein a shape of a bonding surface of the bumps with the electrodes is provided. Wherein the semiconductor chip has an elliptical shape.
【請求項2】 請求項1記載のバンプ付半導体チップに
おいて、 上記楕円の長軸方向がそのバンプが沿う辺と直交する方
向とされていることを特徴とするバンプ付半導体チッ
プ。
2. The semiconductor chip with bump according to claim 1, wherein the major axis direction of the ellipse is a direction orthogonal to a side along which the bump extends.
【請求項3】 請求項2記載のバンプ付半導体チップに
おいて、 上記楕円の長軸方向及び短軸方向における上記電極の長
さをそれぞれa及びbとした時、上記楕円の長軸長さL
1 及び短軸長さL2 が、 L2 ≦0.8L1 a/2≦L1 ≦a b/3≦L2 を満足するように選定されていることを特徴とするバン
プ付半導体チップ。
3. The semiconductor chip with bumps according to claim 2, wherein the lengths of the electrodes in the major axis direction and the minor axis direction of the ellipse are a and b, respectively.
A semiconductor chip with bumps, wherein 1 and the minor axis length L 2 are selected so as to satisfy L 2 ≦ 0.8 L 1 a / 2 ≦ L 1 ≦ ab / 3 ≦ L 2 .
JP9239666A 1997-09-04 1997-09-04 Semiconductor chip with bump Pending JPH1187418A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9239666A JPH1187418A (en) 1997-09-04 1997-09-04 Semiconductor chip with bump

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9239666A JPH1187418A (en) 1997-09-04 1997-09-04 Semiconductor chip with bump

Publications (1)

Publication Number Publication Date
JPH1187418A true JPH1187418A (en) 1999-03-30

Family

ID=17048108

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9239666A Pending JPH1187418A (en) 1997-09-04 1997-09-04 Semiconductor chip with bump

Country Status (1)

Country Link
JP (1) JPH1187418A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002334901A (en) * 2001-05-08 2002-11-22 Nec Corp Semiconductor device
JP2011171720A (en) * 2010-01-20 2011-09-01 Connectec Japan Corp Mounting substrate, production method thereof, electronic component, and production method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002334901A (en) * 2001-05-08 2002-11-22 Nec Corp Semiconductor device
JP2011171720A (en) * 2010-01-20 2011-09-01 Connectec Japan Corp Mounting substrate, production method thereof, electronic component, and production method thereof

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