JPH1182609A - 除振装置及び露光装置 - Google Patents

除振装置及び露光装置

Info

Publication number
JPH1182609A
JPH1182609A JP9247554A JP24755497A JPH1182609A JP H1182609 A JPH1182609 A JP H1182609A JP 9247554 A JP9247554 A JP 9247554A JP 24755497 A JP24755497 A JP 24755497A JP H1182609 A JPH1182609 A JP H1182609A
Authority
JP
Japan
Prior art keywords
vibration
cable
vibration isolation
exposure apparatus
cables
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9247554A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1182609A5 (enExample
Inventor
Tatsuya Osaki
達哉 大崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9247554A priority Critical patent/JPH1182609A/ja
Publication of JPH1182609A publication Critical patent/JPH1182609A/ja
Publication of JPH1182609A5 publication Critical patent/JPH1182609A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Vibration Prevention Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9247554A 1997-08-29 1997-08-29 除振装置及び露光装置 Withdrawn JPH1182609A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9247554A JPH1182609A (ja) 1997-08-29 1997-08-29 除振装置及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9247554A JPH1182609A (ja) 1997-08-29 1997-08-29 除振装置及び露光装置

Publications (2)

Publication Number Publication Date
JPH1182609A true JPH1182609A (ja) 1999-03-26
JPH1182609A5 JPH1182609A5 (enExample) 2005-06-02

Family

ID=17165229

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9247554A Withdrawn JPH1182609A (ja) 1997-08-29 1997-08-29 除振装置及び露光装置

Country Status (1)

Country Link
JP (1) JPH1182609A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6396562B1 (en) 1998-12-02 2002-05-28 Canon Kabushiki Kaisha Microdevice manufacturing apparatus
JP2008042201A (ja) * 2006-08-08 2008-02-21 Asml Netherlands Bv ケーブル接続、ケーブル接続用の制御システム、およびケーブル接続を経て振動が第1の対象から第2の対象へと伝達されることを軽減する方法
CN111965943A (zh) * 2019-05-20 2020-11-20 上海微电子装备(集团)股份有限公司 一种线缆牵拉刚度的调节装置及光刻机

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6396562B1 (en) 1998-12-02 2002-05-28 Canon Kabushiki Kaisha Microdevice manufacturing apparatus
JP2008042201A (ja) * 2006-08-08 2008-02-21 Asml Netherlands Bv ケーブル接続、ケーブル接続用の制御システム、およびケーブル接続を経て振動が第1の対象から第2の対象へと伝達されることを軽減する方法
US8743344B2 (en) 2006-08-08 2014-06-03 Asml Netherlands B.V. Cable connection, control system, and method to decrease the passing on of vibrations from a first object to a second object
CN111965943A (zh) * 2019-05-20 2020-11-20 上海微电子装备(集团)股份有限公司 一种线缆牵拉刚度的调节装置及光刻机
CN111965943B (zh) * 2019-05-20 2021-09-17 上海微电子装备(集团)股份有限公司 一种线缆牵拉刚度的调节装置及光刻机

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