JPH1172608A - Production of color filters - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a process for producing color filters which entirely eliminates the white defects after releasing of a base film within a substrate. SOLUTION: This process for producing the color filters by arraying black matrices and red, green and blue colored layers consisting of photosetting resins in the prescribed positions on the transparent substrate consists in forming the black matrices in the prescribed positions on the transparent substrate and forming any one color among the red, green and blue described above as a first color layer by a film transfer method over the entire surface of the transparent substrate and the black matrices. The base film which is a base of the color film is then peeled. The color layer surface is washed by a contactless washing method of blowing air and sucking away the blown air. The alignment of a photomask opened in prescribed sections and the transparent substrate described above is then executed and are subjected to exposure and development via the photomask. Next, second pixels and third pixels are successively formed in the prescribed positions in the same manner as the stage for forming the first pixels.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a method for manufacturing a color filter used in a color liquid crystal display device.

[0002]

2. Description of the Related Art Liquid crystal displays (hereinafter abbreviated as LCDs)
Utilizes features such as low profile, small size, and low power consumption.
It is used for display units such as watches, calculators, TVs, and personal computers. In recent years, color LCDs have been developed and used for a number of applications such as navigation systems and viewfinders, mainly OA / AV equipment, and the market is expected to rapidly expand in the future.

As shown in FIG. 3, a color filter for displaying a color image on an LCD is composed of R (red) and G (green) on a substrate 2 such as a glass plate on which a BM (black matrix) 1 having a lattice pattern is formed. ) And B (blue) color pixels 3 (about 100 × 300 × 2 μm) are sequentially formed, and a transparent overcoat layer (OC) 4 is formed thereon. 5 is a polarizing plate and 6 is an ITO electrode.

[0004] In the color LCD, the color filter 7 has an LC
D, the display screen can be colored by transmitting backlight light through a color filter. 8 is an alignment film, 9 is a liquid crystal, 10 is a sealing material, 11 is a top coat layer, 12 is an ITO electrode, 13 is a substrate such as a glass plate, 14
Is a polarizing plate.

At present, color filters are mainly manufactured using a dyeing method. However, in this method, a step of forming a pixel by applying a transparent photosensitive resin on a glass substrate, drying, exposing, and developing, dyeing with a dye, and then forming a color mixing prevention layer is required to be repeated three times. Therefore, reliability (lightfastness,
Heat resistance). Therefore, some color filters using a pigment as a coloring agent have been proposed, among which are an electrodeposition method, a printing method, and a photolithography method (photolithography method).

However, the electrodeposition method requires the formation of an electrode pattern. (1) The degree of freedom of the pattern is small.
(2) The printing method has problems such as high cost and (1) poor pattern flatness. At present, the photolithography method is considered to be the mainstream. For photolithography, liquid resists and films are contemplated. The liquid resist is formed by applying a varnish obtained by dispersing a pigment in a photosensitive resin on a glass substrate by a spinner, drying, exposing, and developing to form color pixels. On the other hand, as shown in FIG. 2, the film is a film obtained by forming a varnish into a film in the same manner as the photosensitive film for a printed board, and a film obtained by applying a coloring material 3 as a coloring layer to a base film 16 as a support is used. After lamination on the substrate 2, the base film 16 is peeled off, and then exposed and developed to form color pixels 25.

[0007]

As shown in FIG. 2, in a method of manufacturing a color filter for forming color pixels 25 by exposing and developing after exfoliating a base film 16 as a support, When the insulating film 16 is peeled off, the insulating material is separated from the insulating material.
Both are charged, and the foreign matter 17 in the vicinity is attracted and adheres.
Although there is no problem because the base film 16 is directly used as a waste material, foreign matters adhering to the glass substrate 2 block or reduce ultraviolet rays in the next exposure step, so that the photosensitive resin to be exposed becomes insufficiently exposed. White spot defect 2 in development
There was a problem of becoming 1. Further, the adhered foreign matter was transferred to the photomask side at the time of exposure, and the subsequent substrate became a white defect 21 for the same reason as described above.

The present invention provides a method for manufacturing a color filter which solves the problems caused by the film method.

[0009]

In order to solve the above-mentioned problems, a method of manufacturing a color filter according to the present invention is directed to a method of manufacturing a color LCD color filter.
Forming a black matrix at a predetermined position on a transparent substrate in a method of manufacturing a color filter in which red, green, and blue coloring layers composed of a black matrix and a photocurable resin are arranged at predetermined positions on a transparent substrate; One of the three colors red, green and blue is applied to the first surface of the transparent substrate and the black matrix by a film transfer method.
A step of forming a color layer, a step of peeling off a base film that is a support of the color film, a step of spraying the surface of the color layer with air, and a step of washing by a non-contact washing method of absorbing the blown air, and a predetermined portion Aligning the transparent substrate with the photomask having an opening, exposing and developing through the photomask, and then performing the first
A second pixel and a third pixel are sequentially formed at predetermined positions in the same manner as in the step of forming a pixel.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, in a film method, before exposure with ultraviolet rays through a photomask 20, a non-contact type foreign matter removing device 24 comprising an air blowout 19 and an air suction port 18 is laminated. Color material 3 surface treatment,
The foreign matter 17 attached due to static electricity generated when the base film 16 is peeled off is removed, and the white defect 22 generated at the time of development due to low ultraviolet intensity is prevented.

[0011]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below based on embodiments.
Corning # 1727 glass vertical 200 as transparent substrate
A glass substrate of mm × 300 mm × 0.7 mm in thickness was used. Chromium 0.15μ as BM material on this substrate
It is formed by the mDC sputtering method. In the present invention, B
Although chromium was used for M, a two-layer film in which chromium oxide was formed at 0.08 μm by sputtering while continuously introducing trace amounts of oxygen and nitrogen after forming chromium by DC sputtering at 0.15 μm, or vice versa. It may have a structure, a structure formed by sequentially and continuously changing the introduction amounts of oxygen and nitrogen, or a structure obtained by dispersing carbon in a resin. Next, the photolithography method was used to process the BM material into a BM. First, 2 μm of positive photoresist Az-1350J manufactured by Shipley Co. is applied at 2000 rpm for 20 seconds by a spinner method. Next, prebaking is performed in a clean oven at 90 ° C. for 20 minutes. Next, exposure is performed at 120 mJ / cm ² through a photomask.
Next, development was performed for 1 minute and 30 seconds with an alkaline developer, and
Perform post-baking at 0 ° C. for 20 minutes. Next, etching is performed for 1 minute with a 15% ceric ammonium nitrate aqueous solution, and then the resist is stripped with an alkali stripper. Next, after performing ultrasonic cleaning, a first color forming process is started. The film is made of polyethylene terephthalate (P) having a thickness of 50 μm.
ET) A film for CF manufactured by Hitachi Chemical Co., Ltd., in which a color material was applied on a base film 16 by a roll-to-roll method, was used. Laminating temperature 80 ° C, laminating speed 0.2m
/ Min, and a roll pressure of 5 kg / cm ² , and the thermocompression roll 15 is used to bond the BM1 to the glass substrate.
Next, base film 1 attached by a film peeling machine
6 is peeled off. At this time, static electricity is generated, and foreign matter 17 existing around is attracted to adhere to the color material 3 adhered on the glass substrate 2. Next, the process proceeds to a step of removing the attached foreign matter 17. In the present embodiment, a new ultra cleaner UVU-W manufactured by Shinko Co., Ltd. was used as the foreign matter removing device 24. This apparatus employs a system in which ultrasonic air is blown from both sides of a head to a substrate through an air blowout port 19 and sucked in through a center air suction port 18. The present invention is not limited to this type, but may be any type using high-pressure air instead of ultrasonic air, or any type that blows from one side instead of blowing from both sides and sucks from the opposite side. In the present invention, it is preferable that the blown air be sucked out, because the blown foreign substance can be prevented from reattaching. Further, in the present invention, the non-contact type foreign matter removing device 24 is used. However, a method of rubbing and removing the removed foreign matter with a brush or the like and sucking the removed foreign matter with vacuum is also possible.
Since the color material is in a semi-cured state, it may be damaged.
With this device, the blowing pressure is 0.15 kg / cm ² ,
Processing was performed at a substrate transfer speed of 0.5 m / min. If the blowing pressure is 0.12 to 0.18 kg / cm ² , there is an effect. The conveying speed is effective in the range of 0.1 to 2 m / min. In addition, in order to facilitate removal of foreign matter adhered by electrostatic attraction, the apparatus may be attached to the static eliminator 23 immediately before the present process, and may be performed after charging is reduced. Next, an exposure step is started. Using a proximity exposure machine for exposure,
The photomask 20 having the light-shielding film 21 and the BM1 of the glass substrate 2 are aligned and 400 mJ / c at 405 nm.
m ² exposure. Next, development is performed with a 3% toehole solution to form pixels 25, which are washed with water, drained, and cured. This process is repeated for three colors. After three colors are formed, washing is performed,
In some cases, an overcoat is formed thereon to complete the color filter.

[0012]

According to the present invention, 2 to 5 white defects due to foreign matter reattachment after peeling off the base film were always present in a 200 × 300 size substrate. Conventional foreign substances are mainly fibrous and have a large size of about 100 μm in length.

[Brief description of the drawings]

FIG. 1 is a process sectional view showing an embodiment of a method for manufacturing a color filter according to the present invention.

FIG. 2 is a cross-sectional view for explaining a conventional manufacturing method.

FIG. 3 is a cross-sectional view of a color liquid crystal display for explaining a color filter.

[Explanation of symbols]

Reference Signs List 1 black matrix (BM) 14 polarizing plate 2 glass substrate 15 thermocompression roll 3 color pixel 16 base film 4 overcoat layer 17 foreign matter 5 polarizing plate 18 air suction port 6 ITO electrode 19 air blowing port 7 color filter 20 photomask 8 orientation Film 21 Light-shielding film 9 Liquid crystal 22 White spots 10 Sealing material 23 Static eliminator 11 Top coat layer 24 Foreign matter removing device 12 ITO electrode 25 Pixel 13 Glass substrate

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Toshikatsu Shimazaki 48 Wadai, Tsukuba, Ibaraki Prefecture Within Tsukuba Development Laboratory, Hitachi Chemical Co., Ltd. (72) Inventor Naoto Okada 2-1-1 Nishishinjuku, Shinjuku-ku, Tokyo Hitachi (72) Masayuki Iwata, Inventor 1150 Goshomiya, Shimodate-shi, Ibaraki Pref., Hitachi Chemical Co., Ltd.

Claims (1)

[Claims] 1. A method of manufacturing a color filter, comprising arranging red, green and blue colored layers comprising a black matrix and a photo-curable resin at predetermined positions on a transparent substrate. A step of forming a matrix, a step of forming any one of the three colors of red, green, and blue as a first color layer on the entire surface of the transparent substrate and the black matrix by a film transfer method. A step of peeling off the base film as a support, a step of spraying the surface of the color layer with air, and a step of washing by a non-contact washing method of sucking the sprayed air, and then aligning the transparent substrate with a photomask having a predetermined portion opened. Exposure through a photomask,
Developing step. Next, similarly to the step of forming the first pixel, a second pixel and a third pixel are sequentially formed at predetermined positions.