JPH1164835A - Foreign matter removing device for liquid crystal glass substrate - Google Patents

Foreign matter removing device for liquid crystal glass substrate

Info

Publication number
JPH1164835A
JPH1164835A JP24185397A JP24185397A JPH1164835A JP H1164835 A JPH1164835 A JP H1164835A JP 24185397 A JP24185397 A JP 24185397A JP 24185397 A JP24185397 A JP 24185397A JP H1164835 A JPH1164835 A JP H1164835A
Authority
JP
Japan
Prior art keywords
glass substrate
foreign matter
rotating body
liquid crystal
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24185397A
Other languages
Japanese (ja)
Other versions
JP3148808B2 (en
Inventor
Atsushi Sui
淳 須井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Takatori Corp
Original Assignee
Takatori Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Takatori Corp filed Critical Takatori Corp
Priority to JP24185397A priority Critical patent/JP3148808B2/en
Publication of JPH1164835A publication Critical patent/JPH1164835A/en
Application granted granted Critical
Publication of JP3148808B2 publication Critical patent/JP3148808B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To lessen the generation of loss time at the time of foreign matter removing work and to obviate the occurrence of the foreign matter remaining without being cut by applying rotation and revolution to a liftably supported rotating body in the state of bringing a fabric-like blank into contact with the surface of a glass substrate on the rear surface of the rotating body, thereby removing the foreign matter on the glass substrate. SOLUTION: A rotating frame 13 is rotated around a stationary shaft 16 by the start of a motor 11. A stationary shaft 16 and a gear 21 fixed thereto do not rotate but a revolving shaft 20 disposed in the lower part of the rotating frame 13 revolves around the stationary shaft 16. At this time, a gear 22 revolves around the gear 21 and both gears 21, 22 mesh with each other and, therefore, the rotation is generated at the revolving shaft 20. The flat disk-shaped rotating body 23 which is flat at the rear surface is fixed to the bottom end of the revolving shaft 20. The fabric-like blank 24 having the elastic nature for removing the cullet sticking on the substrate A is affixed and fixed to the rear surface of the rotating body 23. The rotation and revolution are applied to the rotating body 23 in the state of bringing the fabric-like blank 24 into contact with the surface of the glass substrate A in such a manner, by which the foreign matter on the glass substrate A is removed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、液晶ガラス基板
の表面に付着したカレットや封止剤等の異物を自動的に
取り除くようにした異物除去装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a foreign matter removing apparatus which automatically removes foreign matter such as cullet and sealant adhered to the surface of a liquid crystal glass substrate.

【0002】[0002]

【従来の技術】液晶パネルの製造は、二枚のガラス板を
貼り合せ、この貼り合せたガラス板を所定の大きさに切
断した後、二枚のガラス板間に液晶を注入して封止し、
その後ガラス板両面に偏光板を貼着することによって行
われる。
2. Description of the Related Art A liquid crystal panel is manufactured by laminating two glass plates, cutting the bonded glass plates into a predetermined size, and injecting a liquid crystal between the two glass plates and sealing. And
Thereafter, a polarizing plate is attached to both sides of the glass plate.

【0003】上記液晶パネルの製造工程において、貼り
合せたガラスを所定の大きさに切断する工程時に、切断
によって発生したカレット(ガラスの粉や小さなかけ
ら)が液晶ガラス基板の表面にこびりつくように付着し
たり、また二枚のガラス板間に液晶を注入した後の注入
口を封止する際に、その封止剤が注入口付近のガラス表
面に付着する状態が発生する。
In the process of manufacturing the liquid crystal panel, cullet (glass powder or small fragments) generated by the cutting adheres to the surface of the liquid crystal glass substrate in a process of cutting the bonded glass into a predetermined size. When the liquid crystal is injected between the two glass plates and the injection port is sealed, the sealing agent adheres to the glass surface near the injection port.

【0004】このように、液晶パネルの製造工程でカレ
ットや封止剤等の異物がガラス板の表面に付着すると、
次の偏光板の貼着が行えないため、これら異物の除去装
置が必らず必要になる。
As described above, when foreign substances such as cullet and sealant adhere to the surface of the glass plate during the manufacturing process of the liquid crystal panel,
Since the next polarizing plate cannot be attached, a device for removing these foreign substances is necessarily required.

【0005】そして、これらの異物は液晶ガラスの表面
にこびりつくように付着しているので、手でこすった程
度では取れない状態になり、このため機械的に異物を除
去する装置が必要になる。
[0005] Since these foreign substances adhere to the surface of the liquid crystal glass in such a way that they adhere to the surface of the liquid crystal glass, they cannot be removed by hand rubbing. Therefore, a device for mechanically removing the foreign substances is required.

【0006】上記異物を除去する従来の除去装置は、液
晶ガラス基板を載置するテーブル上に配置したホルダー
の先端に刃物を取り付け、液晶ガラス基板に対して刃物
を所定の傾斜状態でX軸方向とY軸方向及びZ軸方向に
移動自在となるよう配置して構成されている。
In the conventional removing apparatus for removing foreign substances, a blade is attached to a tip of a holder arranged on a table on which a liquid crystal glass substrate is placed, and the blade is tilted with respect to the liquid crystal glass substrate in the X axis direction. And are arranged so as to be movable in the Y-axis direction and the Z-axis direction.

【0007】異物を除去するには、刃物を液晶ガラス基
板上に圧接させた状態でX軸方向に前進動させ、刃物の
幅の範囲で異物を削り落とし、続いて刃物をZ軸方向に
上昇動させてX軸方向に後退動させ、次にY軸方向に定
量移動させ、この後Z軸方向に下降動させて刃物を液晶
ガラス基板上に再び圧接させ、そして上記と同じ動作を
数回繰り返し、液晶ガラス基板上全体の異物を取り除く
ものである。
[0007] To remove foreign matter, the blade is moved forward in the X-axis direction while being pressed against the liquid crystal glass substrate, and the foreign matter is scraped off within the width of the blade, and then the blade is raised in the Z-axis direction. To move it back in the X-axis direction, then move it in the Y-axis direction, and then move it down in the Z-axis direction to press the blade again on the liquid crystal glass substrate, and repeat the same operation several times. Repeatedly remove foreign matter from the entire surface of the liquid crystal glass substrate.

【0008】[0008]

【発明が解決しようとする課題】ところで、上記した従
来の除去装置は、刃物の移動にロスタイムが多く、作業
能率が悪いだけでなく、液晶ガラス基板が大型化した場
合、刃物を単に長くして能率を向上させようとしても、
異物を十分に除去することができない。
However, the above-described conventional removing apparatus has a long time loss in the movement of the blade, not only is the work efficiency inferior, but also when the size of the liquid crystal glass substrate is increased, the blade is simply lengthened. Even trying to improve efficiency,
Foreign matter cannot be sufficiently removed.

【0009】なぜならば、カレットの除去は、液晶ガラ
ス基板に対して刃物の刃先全長を軽く接する程度に密着
させなければならないが、液晶ガラス基板は大型化する
と、うねりとか歪みが発生し、そのため、液晶ガラス基
板と刃先の間に隙間が生じ、カレットを挟みこんで液晶
ガラス基板の表面に傷を付け易いという問題がある。
This is because the cullet must be removed so that the entire length of the blade is slightly touched to the liquid crystal glass substrate. However, when the size of the liquid crystal glass substrate is increased, undulation or distortion occurs. There is a problem that a gap is formed between the liquid crystal glass substrate and the cutting edge, and the surface of the liquid crystal glass substrate is easily damaged by sandwiching the cullet.

【0010】そこで、この発明の課題は、異物除去作業
時のロスタイムの発生を少なくし、作業能率の向上を図
ることができると共に、異物の削り残しの発生がなく、
しかも液晶ガラスが大型化しても表面に傷をつけること
のない液晶ガラス基板の異物除去装置を提供することに
ある。
[0010] Therefore, an object of the present invention is to reduce the occurrence of loss time at the time of removing foreign matter, to improve the work efficiency, and to prevent the occurrence of uncut foreign matter.
Another object of the present invention is to provide an apparatus for removing foreign substances on a liquid crystal glass substrate, which does not damage the surface even when the liquid crystal glass is enlarged.

【0011】[0011]

【課題を解決するための手段】上記のような課題を解決
するため、請求項1の発明は、昇降可能に支持した回転
体の下面に弾性質の布状素材を貼着し、この布状素材を
ガラス基板上に接触させた状態で、上記回転体に自転と
公転を与えて該ガラス基板上の異物を取り除くようにし
た構成を採用したものである。
According to a first aspect of the present invention, an elastic cloth-like material is attached to the lower surface of a rotating body supported so as to be able to move up and down. With the material in contact with the glass substrate, the rotating body is rotated and revolved to remove foreign matter on the glass substrate.

【0012】請求項2の発明は、請求項1の発明におい
て、回転体の下面に貼着した布状素材に適量の水分を含
ませるか、又はガラス基板上に適量の水分を散布した状
態で異物を取り除くようにした構成を採用したものであ
る。
According to a second aspect of the present invention, in the first aspect of the present invention, a proper amount of moisture is contained in the cloth-like material attached to the lower surface of the rotating body, or a proper amount of water is sprayed on the glass substrate. This adopts a configuration for removing foreign matter.

【0013】請求項3の発明は、下面に弾性質の布状素
材を貼着した第1の回転体と、下面に研磨シート材を貼
着した第2の回転体を互いに昇降可能に支持すると共
に、これら第1及び第2の回転体に自転と公転を与えな
がら、ガラス基板上に付着したカレットを第1の回転体
の布状素材で取り除き、ガラス基板上に付着した封止剤
を第2の回転体の研磨シート材で取り除くようにした構
成を採用したものである。
According to a third aspect of the present invention, a first rotating body having an elastic cloth-like material adhered to the lower surface and a second rotating body having an abrasive sheet material adhered to the lower surface are supported so as to be able to move up and down with respect to each other. At the same time, while giving rotation and revolution to the first and second rotating bodies, the cullet adhered on the glass substrate is removed with the cloth-like material of the first rotating body, and the sealant adhered on the glass substrate is removed by the first step. The structure adopts a configuration in which the rotating body is removed with a polishing sheet material.

【0014】請求項4の発明は、請求項3の発明におい
て、第1の回転体の布状素材と第2の回転体の研磨シー
ト材に適量の水分を含ませるか、又はガラス基板上に適
量の水分を散布した状態で異物を取り除くようにした構
成を採用したものである。
According to a fourth aspect of the present invention, in the third aspect of the present invention, the cloth-like material of the first rotating body and the polishing sheet material of the second rotating body contain an appropriate amount of moisture, or This adopts a configuration in which foreign matter is removed while an appropriate amount of water is being sprayed.

【0015】[0015]

【発明の実施の形態】以下、この発明の実施の形態を図
示例と共に説明する。図1は、液晶ガラス基板A(以下
単に基板という)の表面に付着したカレットの除去に適
した異物除去装置の第1の実施の形態の要部を示し、図
4に示す如くX軸方向に移動自在となるフレーム1の上
下位置に、Y軸方向に沿って水平となる二本のレール
2、2とその間にボールねじ3が設けられ、該レール
2、2にブラケット4がレール2、2に沿ってY軸方向
に移動自在となるよう取り付けられ、このブラケット4
の前面にヘッド5が図5に示す如く上下Z軸方向に移動
自在に設けられている。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows a main part of a first embodiment of a foreign matter removing apparatus suitable for removing cullet adhering to the surface of a liquid crystal glass substrate A (hereinafter simply referred to as a substrate). As shown in FIG. Two rails 2 and 2 which are horizontal along the Y-axis direction and a ball screw 3 are provided between the rails 2 and 2 at the upper and lower positions of the movable frame 1, and a bracket 4 is attached to the rails 2 and 2. The bracket 4 is mounted so as to be movable in the Y-axis direction along
A head 5 is provided movably in the vertical Z-axis direction as shown in FIG.

【0016】上記ブラケット4は、背面に設けたナット
6がボールねじ3に外嵌螺合し、図示省略したが、ボー
ルねじ3をモータで正逆回転させることにより、Y軸方
向へ往復移動する。
The bracket 4 is reciprocated in the Y-axis direction by rotating the ball screw 3 forward and reverse by a motor, although a nut 6 provided on the back surface is externally screwed to the ball screw 3 and not shown in the figure. .

【0017】このブラケット4の前面に設けた垂直のレ
ール7にヘッド5の昇降部材8が取り付けられ、例えば
シリンダ等を用いて該昇降部材8を上下Z軸方向に移動
させるようになっている。
An elevating member 8 of the head 5 is mounted on a vertical rail 7 provided on the front surface of the bracket 4, and the elevating member 8 is moved in the vertical Z-axis direction using, for example, a cylinder.

【0018】ヘッド5は、昇降部材8の前面に、上下に
対向する水平のアーム9と10を突設し、上部アーム9
に固定したモータ11の出力軸12が該アーム9の下面
側に突出していると共に、下部アーム10には出力軸1
2に対して偏心した位置に、下部アーム10を上下に貫
通する回転枠13が軸受14を介して回転自在に取り付
けられ、この回転枠13の軸心に軸受15を介して位置
する固定軸16の上端が上部アーム9に固定されてい
る。
The head 5 has horizontal arms 9 and 10 projecting upward and downward from the front surface of the elevating member 8.
The output shaft 12 of the motor 11 fixed to the lower arm 10 projects from the lower surface of the arm 9 and the output shaft 1
A rotating frame 13 vertically penetrating the lower arm 10 is rotatably mounted at a position eccentric to the lower arm 2 via a bearing 14, and a fixed shaft 16 positioned at a shaft center of the rotating frame 13 via a bearing 15. Is fixed to the upper arm 9.

【0019】上記出力軸12に固定した歯車17と回転
枠13の上端に固定した歯車18が互いに噛み合い、モ
ータ11の起動によって回転枠13に回転が付与される
と共に、回転枠13の下部で固定軸16に対して偏心し
た位置に、軸受19を介して回転軸20を回転自在に取
り付け、前記固定軸16の下端に固定した歯車21と回
転軸20の上端に固定した歯車22を互いに噛み合わせ
ている。
A gear 17 fixed to the output shaft 12 and a gear 18 fixed to the upper end of the rotary frame 13 mesh with each other, and the rotation of the rotary frame 13 is given by the activation of the motor 11 and fixed at the lower portion of the rotary frame 13. A rotating shaft 20 is rotatably mounted at a position eccentric to the shaft 16 via a bearing 19, and a gear 21 fixed to the lower end of the fixed shaft 16 and a gear 22 fixed to the upper end of the rotating shaft 20 mesh with each other. ing.

【0020】前記回転枠13はモータ11の起動で固定
軸16を中心に回転し、固定軸16とこれに固定した歯
車21は回転しないのに対し、回転枠13の下部に設け
た回転軸20は固定軸16の回りを公転し、このとき、
歯車22を歯車21の周囲を公転し、両歯車21と22
は互いに噛み合っているので、回転軸20に自転を生じ
させることになる。
The rotating frame 13 rotates around the fixed shaft 16 when the motor 11 is started, and the fixed shaft 16 and the gear 21 fixed thereto do not rotate, whereas the rotating shaft 20 provided below the rotating frame 13 is rotated. Revolves around the fixed shaft 16, at which time
The gear 22 revolves around the gear 21, and the two gears 21 and 22
Are engaged with each other, so that the rotation shaft 20 rotates.

【0021】上記回転軸20の下端に、下面が水平でフ
ラットな円盤状の回転体23が固定され、該回転体23
の下面に、基板A上に付着したカレットを除去するため
の弾性質の布状素材24が貼着固定されている。
At the lower end of the rotating shaft 20, a disk-shaped rotating body 23 having a flat lower surface is fixed.
An elastic cloth-like material 24 for removing cullet adhering to the substrate A is adhered and fixed to the lower surface of the substrate A.

【0022】この布状素材24は、例えば、ポリエステ
ル系不織布にポリウレタンを含浸させ、微細なエンボス
(網目)加工を施し、空孔率を高めた素材であり、基板
Aが大型化してその表面にうねりや凹凸がある場合で
も、これを弾性繊維で吸収しながら除去作業を行うこと
ができるという利点がある。
The cloth material 24 is, for example, a material in which a polyester nonwoven fabric is impregnated with polyurethane and subjected to fine embossing (mesh) to increase the porosity. Even if there are undulations and irregularities, there is an advantage that the removal operation can be performed while absorbing these with elastic fibers.

【0023】図2は、基板Aの表面に付着したカレット
及び封止剤の除去に適した異物除去装置の第2の実施の
形態の要部を示している。なお、先の第1の実施の形態
と同一部分に同一符号を付し、相違点のみを説明する。
FIG. 2 shows a main part of a second embodiment of a foreign matter removing apparatus suitable for removing cullet and a sealant adhered to the surface of the substrate A. The same parts as those in the first embodiment are denoted by the same reference numerals, and only different points will be described.

【0024】この第2の実施の形態におけるヘッド5
は、回転軸20を内部中空とすると共に、この回転軸2
0の下端に固定した第1回転体23aも下面で開口する
筒状に形成し、該第1回転体23a内に収納した第2回
転体23bを回転軸20内に収納したエアシリンダや電
磁ソレノイド(図示省略)で上下動させるようにすると
共に、第1回転体23aの下面に弾性質の布状素材24
を貼着固定し、第2回転体23bの下面に、上記布状素
材やスポンジ等の弾性体25を介して研磨シート材26
を貼着固定した構造になっており、第1回転体23aに
対して第2回転体23bは、下面の研磨シート材26が
布状素材24よりも上方にある上昇位置と、研磨シート
材26が布状素材24よりも下方に突出する下降位置と
の間を上下動することになる。
The head 5 according to the second embodiment
Is to make the rotating shaft 20 hollow inside,
The first rotary body 23a fixed to the lower end of the first rotary body 23 is also formed in a cylindrical shape open at the lower surface, and the second rotary body 23b housed in the first rotary body 23a is stored in the rotary shaft 20 in an air cylinder or an electromagnetic solenoid. (Not shown), and an elastic cloth-like material 24 is provided on the lower surface of the first rotating body 23a.
Is adhered and fixed, and a polishing sheet material 26 is attached to the lower surface of the second rotating body 23b via the elastic body 25 such as the cloth-like material or sponge.
The second rotator 23b is attached to and fixed to the first rotator 23a at a raised position where the lower surface of the polishing sheet material 26 is higher than the cloth material 24, and Moves up and down between the lower position and the lower position protruding below the cloth material 24.

【0025】上記布状素材24は、先の第1の実施の形
態と同様、基板Aの表面に付着したカレットの除去を行
い、第2回転体23bの下面に設けた研磨シート材26
が基板Aの表面に付着した封止剤の除去を行うことにな
る。
The cloth-like material 24 removes the cullet adhered to the surface of the substrate A as in the first embodiment, and removes the abrasive sheet material 26 provided on the lower surface of the second rotating body 23b.
Removes the sealant attached to the surface of the substrate A.

【0026】ここで、封止剤は、基板Aの表面に薄い膜
状に付着している場合が殆どであり、このため、基板A
の表面を傷を付けないよう、研磨シート材26は基板A
の表面に接触するかしない程度で除去するようになって
いる。
Here, in most cases, the sealant is attached to the surface of the substrate A in a thin film form.
The polishing sheet material 26 is made of the substrate A so that the surface of the
To the extent that it does not contact the surface.

【0027】上記研磨シート材26は、ポリプロピレ
ン、ポリエチレン、ナイロン等のフィルムシート(厚み
0.1mm程度)に粒径20〜25μmの砥粒を接着さ
せたシートである。
The abrasive sheet material 26 is a sheet in which abrasive grains having a particle size of 20 to 25 μm are adhered to a film sheet (thickness: about 0.1 mm) of polypropylene, polyethylene, nylon, or the like.

【0028】図4と図5は、上記した両実施の形態の除
去装置を具体的に組み込み使用した装置の一例を示し、
水平となるテーブル31の一端側が基板Aの供給部3
2、他端が取出し部33で、その中間部上面が除去位置
34となり、このテーブル31上に、供給部32の基板
Aを吸着盤で吸持して除去位置34に搬送すると共に、
除去位置34の基板Aを取出し部33に移送する吸着ア
ーム35がガイドレール36に沿って移動するように配
置されている。なお、この吸着アーム35は、供給部3
2と除去位置34の間及び除去位置34と取出し部33
の間で個々に移動するように二台を配置してもよい。
FIGS. 4 and 5 show an example of an apparatus which specifically incorporates and uses the removing apparatuses of the above-described embodiments.
One end side of the horizontal table 31 is the supply unit 3 of the substrate A.
2. The other end is a take-out part 33, and the upper surface of the middle part is a removal position 34. On this table 31, the substrate A of the supply part 32 is sucked by a suction disk and transported to the removal position 34,
The suction arm 35 for transferring the substrate A at the removal position 34 to the take-out unit 33 is arranged to move along the guide rail 36. Note that the suction arm 35 is
2 and the removal position 34 and between the removal position 34 and the take-out portion 33
Two units may be arranged so as to move individually between them.

【0029】上記テーブル31の上面で基板Aの移送方
向に沿う両側の位置にレール37と37が平行状に固定
配置され、両レール37、37間の上部に、除去位置3
4に対して跨状となるフレーム1がスライダー38を介
してX軸方向に移動自在に架設され、該フレーム1に上
述した両実施の形態の除去装置がY軸方向及びZ軸方向
に移動自在となるよう装着されている。この、フレーム
1のX軸方向の移動は、シリンダやモータ等の駆動源を
用いて行えばよい。
Rails 37 and 37 are fixedly disposed in parallel on both sides of the upper surface of the table 31 along the transfer direction of the substrate A, and a removal position 3 is provided above the rails 37 and 37.
The frame 1 that straddles the frame 4 is movably mounted in the X-axis direction via a slider 38, and the removal device of each of the above-described embodiments is movably mounted on the frame 1 in the Y-axis direction and the Z-axis direction. It is attached to be. The movement of the frame 1 in the X-axis direction may be performed using a driving source such as a cylinder or a motor.

【0030】図5は、テーブル31の上面に水分の散布
手段39を配置し、除去位置34に供給した基板Aの異
物除去時に、該基板Aの表面に適量の水分を散布するよ
うにした例を示している。この散布手段39は、除去位
置34の基板Aに対して進退自在になっている。
FIG. 5 shows an example in which a water dispersing means 39 is disposed on the upper surface of the table 31 so that an appropriate amount of water is dispensed on the surface of the substrate A when foreign substances of the substrate A supplied to the removing position 34 are removed. Is shown. The dispersing means 39 can move forward and backward with respect to the substrate A at the removing position 34.

【0031】また、図示省略したが、布状素材24や研
磨シート材26に、適宜の手段で水分を供給して含ませ
るようにしてもよい。
Although not shown, the cloth-like material 24 and the polishing sheet material 26 may be supplied with water by appropriate means so as to be contained therein.

【0032】このように、基板Aの異物除去時に、該基
板Aの表面に適量の水分を散布するか、布状素材24や
研磨シート材26に、水分を含ませるようにすると、異
物除去時の静電気の発生をなくすと同時に、熱の発生を
防ぎ、滑りをよくすることができる。
As described above, when removing a foreign substance from the substrate A, an appropriate amount of moisture is sprayed on the surface of the substrate A, or the cloth-like material 24 or the polishing sheet material 26 is made to contain moisture. At the same time as preventing the generation of static electricity, preventing the generation of heat and improving the slip.

【0033】さらに、吸着性を増すため、カレット等の
異物を包みこむように取り除くことができ、異物の除去
効率が向上し、異物でガラス面に傷をつけることがない
という利点がある。
Furthermore, since the adsorptivity is increased, foreign substances such as cullet can be removed so as to envelop them, and there is an advantage that the foreign substance removing efficiency is improved and the glass surface is not damaged by the foreign substances.

【0034】この発明の除去装置は、上記のような構成
であり、テーブル31の除去位置34に基板Aを供給
し、この基板Aの表面に付着したカレットを除去するに
は、フレーム1に装着した除去装置を該基板Aの直上に
位置するよう停止させた状態で、除去装置のヘッド5を
Z軸方向に下降させて布状素材24を基材Aの表面に圧
接させ、モータ11を起動する。
The removing apparatus according to the present invention is configured as described above. In order to supply the substrate A to the removing position 34 of the table 31 and remove the cullet adhering to the surface of the substrate A, the removing apparatus is mounted on the frame 1. With the removed device stopped so as to be located immediately above the substrate A, the head 5 of the removed device is lowered in the Z-axis direction to press the cloth-like material 24 against the surface of the substrate A, and the motor 11 is started. I do.

【0035】このとき、図2で示した第2の実施の形態
においては、研磨シート材26を第1回転体23a内に
没入させておくと共に、布状素材24に水分を含ませる
か、基板Aの表面に水分を散布しておく。
At this time, in the second embodiment shown in FIG. 2, the polishing sheet material 26 is immersed in the first rotating body 23a, and the cloth material 24 is made to contain water or Water is sprayed on the surface of A.

【0036】モータ11の起動により、図3に示すよう
に、回転体23に取り付けた布状素材24は自転と公転
を行い、これと同時にフレーム1をX軸方向に前進移動
させ、布状素材24の自転と公転の最大径を幅として基
板Aの表面に付着しているカレットを除去していく。
When the motor 11 is started, as shown in FIG. 3, the cloth material 24 attached to the rotating body 23 rotates and revolves, and at the same time, the frame 1 is moved forward in the X-axis direction. The cullet adhering to the surface of the substrate A is removed with the maximum diameter of the rotation and revolution of 24 as a width.

【0037】布状素材24が基板AのX軸方向の端部に
達すると、除去装置のヘッド5をフレーム1に沿ってY
軸方向に所定量だけ横移動させ、この後フレーム1をX
軸方向に後退移動させる。
When the cloth material 24 reaches the end of the substrate A in the X-axis direction, the head 5 of the removing device is moved along the frame 1 in the Y direction.
The frame 1 is moved laterally by a predetermined amount in the axial direction.
Move backward in the axial direction.

【0038】以後、このような動作を繰り返すことによ
り、基板Aの表面全面に対し、カレットの除去が行え、
最終的にモータ11を停止させ、除去装置のヘッド5を
Z軸方向の上昇位置に戻す。
Thereafter, by repeating such an operation, cullet can be removed from the entire surface of the substrate A.
Finally, the motor 11 is stopped, and the head 5 of the removing device is returned to the raised position in the Z-axis direction.

【0039】カレットの除去において、回転体23に貼
着した布状素材24は、回転軸20の軸心を中心とする
自転と、固定軸16の軸心を中心とする公転とを行い、
かつ、基板Aに対するX軸方向及びY軸方向の移動とに
より、カレットの除去をロスタイムなく効率的に行える
と共に、布状素材24は弾性質であるため、基板Aが大
型でその表面にうねりや凹凸がある場合でも、これを弾
性質で吸収することができ、確実な除去が行える。ま
た、基板Aに対する封止剤の付着は、図3に鎖線で示す
ように、液晶の注入口がある両側の部分に限られること
になる。
In removing the cullet, the cloth-like material 24 adhered to the rotating body 23 rotates around the axis of the rotating shaft 20 and revolves around the axis of the fixed shaft 16.
In addition, the cullet can be efficiently removed without loss time by moving the substrate A in the X-axis direction and the Y-axis direction, and since the cloth material 24 is elastic, the substrate A is large and undulates on its surface. Even if there are irregularities, they can be absorbed by the elastic material and can be reliably removed. Further, the adhesion of the sealing agent to the substrate A is limited to the portions on both sides where the liquid crystal injection port is provided, as shown by the chain line in FIG.

【0040】この封止剤を除去するには、図2で示した
第2の実施の形態の除去装置を用い、第1回転体23a
に対して第2回転体23bを下降動させ、研磨シート材
26を布状素材24よりも下方に突出させて基板Aの表
面に軽く接触状とし、該研磨シート材26にモータ11
の起動で自転と公転を与え、かつ、封止剤の付着範囲内
でX軸方向及びY軸方向に移動させることにより行う。
To remove the sealant, the first rotating body 23a is used by using the removing apparatus of the second embodiment shown in FIG.
, The second rotating body 23b is moved downward to project the polishing sheet material 26 below the cloth-like material 24 so that the polishing sheet material 26 comes into light contact with the surface of the substrate A.
The rotation is performed by giving rotation and orbit by the start of, and moving in the X-axis direction and the Y-axis direction within the sealant attachment range.

【0041】なお、図示の実施の形態では、除去装置の
ヘッド5をX、Y、Zの軸方向に移動させたが、ヘッド
5は上下動だけとし、基板AをX、Yの軸方向に移動さ
せて除去を行うようにしてもよい。
In the illustrated embodiment, the head 5 of the removing device is moved in the X, Y, and Z axial directions. However, the head 5 is only moved up and down, and the substrate A is moved in the X and Y axial directions. The removal may be performed by moving.

【0042】[0042]

【発明の効果】以上のように、この発明によると、布状
素材に自転と公転を与えて異物を除去するようにしたの
で、異物除去時のロスタイムの少なくし、除去作業の能
率を向上させることができると共に、布状素材は弾性質
であるので、基板の表面形状に追従させることができ、
基板が大型化しても表面に傷を生じさせることなく、異
物を確実に除去することができる。
As described above, according to the present invention, the cloth-like material is rotated and revolved to remove the foreign matter, so that the loss time at the time of removing the foreign matter is reduced, and the efficiency of the removing operation is improved. And the cloth-like material is elastic, so it can follow the surface shape of the substrate,
Even if the size of the substrate is increased, the foreign matter can be reliably removed without causing any damage on the surface.

【0043】また、研磨シート材により、基板に付着し
た封止剤の除去が確実に行えると共に、布状素材と研磨
シート材に水分を含ませるか、基板の表面に水分を散布
することにより、除去時の静電気や熱の発生がなく、吸
着性の増大により、異物を包み込むようにしてとり除く
ことができ、基板の表面に傷を付けることもない。
Further, the abrasive sheet material can reliably remove the sealant adhered to the substrate, and the cloth-like material and the abrasive sheet material can be made to contain moisture, or by spraying moisture on the surface of the substrate. There is no generation of static electricity or heat at the time of removal, and due to the increase in adsorptivity, foreign substances can be removed in a wrapping manner, and the surface of the substrate is not damaged.

【図面の簡単な説明】[Brief description of the drawings]

【図1】除去装置の第1の実施の形態を示す縦断面図FIG. 1 is a longitudinal sectional view showing a first embodiment of a removing device.

【図2】除去装置の第2の実施の形態を示す縦断面図FIG. 2 is a longitudinal sectional view showing a second embodiment of the removing device.

【図3】除去装置の自転と公転を示す斜視図FIG. 3 is a perspective view showing rotation and revolution of the removing device.

【図4】除去装置を組み込んだ装置の平面図FIG. 4 is a plan view of an apparatus incorporating the removing apparatus.

【図5】図4の矢印V−Vに沿う断面図FIG. 5 is a sectional view taken along arrows VV in FIG. 4;

【符号の説明】[Explanation of symbols]

1 フレーム 2 レール 3 ボールねじ 4 ブラケット 5 ヘッド 6 ナット 8 昇降部材 11 モータ 12 出力軸 13 回転枠 16 固定軸 20 回転軸 23 回転体 24 布状素材 26 研磨シート材 31 テーブル 35 吸着アーム 39 散布手段 Reference Signs List 1 frame 2 rail 3 ball screw 4 bracket 5 head 6 nut 8 elevating member 11 motor 12 output shaft 13 rotating frame 16 fixed shaft 20 rotating shaft 23 rotating body 24 cloth material 26 polishing sheet material 31 table 35 suction arm 39 spraying means

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 昇降可能に支持した回転体の下面に弾性
質の布状素材を貼着し、この布状素材をガラス基板上に
接触させた状態で、上記回転体に自転と公転を与えて該
ガラス基板上の異物を取り除くようにした液晶ガラス基
板の異物除去装置。
1. An elastic cloth-like material is stuck to the lower surface of a rotating body supported so as to be able to move up and down, and the rotating body is rotated and revolved while the cloth-like material is in contact with a glass substrate. A liquid crystal glass substrate foreign matter removing apparatus for removing foreign matter on the glass substrate.
【請求項2】 回転体の下面に貼着した布状素材に適量
の水分を含ませるか、又はガラス基板上に適量の水分を
散布した状態で異物を取り除くようにした請求項1に記
載の液晶ガラス基板の異物除去装置。
2. The method according to claim 1, wherein a suitable amount of moisture is contained in the cloth-like material adhered to the lower surface of the rotating body, or foreign matter is removed while a suitable amount of water is sprayed on the glass substrate. Foreign matter removal device for liquid crystal glass substrate.
【請求項3】 下面に弾性質の布状素材を貼着した第1
の回転体と、下面に研磨シート材を貼着した第2の回転
体を互いに昇降可能に支持すると共に、これら第1及び
第2の回転体に自転と公転を与えながらガラス基板上に
付着したカレットを第1の回転体の布状素材で取り除
き、ガラス基板上に付着した封止剤を第2の回転体の研
磨シート材で取り除くようにした液晶ガラス基板の異物
除去装置。
3. A first material having an elastic cloth-like material attached to a lower surface thereof.
And a second rotator having an abrasive sheet material adhered to the lower surface thereof are supported so as to be able to move up and down, and adhered to the glass substrate while giving rotation and revolution to the first and second rotators. A foreign matter removing device for a liquid crystal glass substrate, wherein a cullet is removed with a cloth-like material of a first rotating body, and a sealant attached to the glass substrate is removed with a polishing sheet material of a second rotating body.
【請求項4】 第1の回転体の布状素材と第2の回転体
の研磨シート材に適量の水分を含ませるか、又はガラス
基板上に適量の水分を散布した状態で異物を取り除くよ
うにした請求項3に記載の液晶ガラス基板の異物除去装
置。
4. A method in which an appropriate amount of moisture is contained in the cloth-like material of the first rotating body and the polishing sheet material of the second rotating body, or foreign matters are removed in a state where an appropriate amount of moisture is sprayed on the glass substrate. 4. The apparatus for removing foreign matter from a liquid crystal glass substrate according to claim 3, wherein:
JP24185397A 1997-08-22 1997-08-22 Liquid crystal glass substrate foreign matter removal device Expired - Fee Related JP3148808B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24185397A JP3148808B2 (en) 1997-08-22 1997-08-22 Liquid crystal glass substrate foreign matter removal device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24185397A JP3148808B2 (en) 1997-08-22 1997-08-22 Liquid crystal glass substrate foreign matter removal device

Publications (2)

Publication Number Publication Date
JPH1164835A true JPH1164835A (en) 1999-03-05
JP3148808B2 JP3148808B2 (en) 2001-03-26

Family

ID=17080491

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24185397A Expired - Fee Related JP3148808B2 (en) 1997-08-22 1997-08-22 Liquid crystal glass substrate foreign matter removal device

Country Status (1)

Country Link
JP (1) JP3148808B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008008992A (en) * 2006-06-27 2008-01-17 Nippon Telegr & Teleph Corp <Ntt> Method and tool for cleaning end face of optical fiber
JP2008212862A (en) * 2007-03-06 2008-09-18 Hitachi High-Technologies Corp Method and device for cleaning panel and method for manufacturing flat panel display
CN106001007A (en) * 2016-06-16 2016-10-12 昆山金箭机械设备有限公司 Liquid crystal display screen detection device with cleaning function
CN107363001A (en) * 2017-09-22 2017-11-21 贵州合众玻璃有限公司 Glass washing device
CN109641242A (en) * 2016-08-22 2019-04-16 日本电气硝子株式会社 Glass sheet cleaning device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008008992A (en) * 2006-06-27 2008-01-17 Nippon Telegr & Teleph Corp <Ntt> Method and tool for cleaning end face of optical fiber
JP2008212862A (en) * 2007-03-06 2008-09-18 Hitachi High-Technologies Corp Method and device for cleaning panel and method for manufacturing flat panel display
CN106001007A (en) * 2016-06-16 2016-10-12 昆山金箭机械设备有限公司 Liquid crystal display screen detection device with cleaning function
CN109641242A (en) * 2016-08-22 2019-04-16 日本电气硝子株式会社 Glass sheet cleaning device
CN107363001A (en) * 2017-09-22 2017-11-21 贵州合众玻璃有限公司 Glass washing device

Also Published As

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