JPH1140457A - Manufacture of laminate ceramic electronic component - Google Patents

Manufacture of laminate ceramic electronic component

Info

Publication number
JPH1140457A
JPH1140457A JP19763697A JP19763697A JPH1140457A JP H1140457 A JPH1140457 A JP H1140457A JP 19763697 A JP19763697 A JP 19763697A JP 19763697 A JP19763697 A JP 19763697A JP H1140457 A JPH1140457 A JP H1140457A
Authority
JP
Japan
Prior art keywords
laminate
pressure
electronic component
film
ceramic electronic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19763697A
Other languages
Japanese (ja)
Other versions
JP4142132B2 (en
Inventor
Takashi Kamiya
貴志 神谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP19763697A priority Critical patent/JP4142132B2/en
Publication of JPH1140457A publication Critical patent/JPH1140457A/en
Application granted granted Critical
Publication of JP4142132B2 publication Critical patent/JP4142132B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Ceramic Capacitors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Press-Shaping Or Shaping Using Conveyers (AREA)

Abstract

PROBLEM TO BE SOLVED: To manufacture a high-quality laminate ceramic electronic component having no structural defect by fixing approximately one surface of a laminate to a support board, sealing it and forming with a hydraulic pressure of over a specified value. SOLUTION: A laminate composed of a support board 4, film 5 and laminate 3 is covered with a packing film 6 and vacuum-sealed around the film 6 to obtain a vacuum package 7. Using an isotropic pressure forming process composed of a receiving die 8 contg. a pressure medium, i.e., water 10 and press die, the vacuum packages 7 inserted in the die 8 with the water 10 are pressed by the die 9 to isotropically press and form them 7 at a water pressure f1 applied in all directions and hydrostatic pressure of 1000 kgf/cm<2> or more. Thereafter the laminates 3 are taken out from the packages 7 and cut and backed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、積層セラミック電子部
品の製造方法に関する。更に詳しくは、静水圧による等
方加圧手段を用いて積層セラミック電子部品を製造する
改良された方法に関するものである。
The present invention relates to a method for manufacturing a multilayer ceramic electronic component. More particularly, the present invention relates to an improved method for manufacturing a multilayer ceramic electronic component using isostatic pressing means by hydrostatic pressure.

【0002】[0002]

【従来の技術】積層コンデンサ、積層インダクタ、積層
アルミナ基板、積層バリスタまたは積層圧電(電歪)素
子などの電子部品の製造は、いずれもセラミック生シー
ト(以下セラミックグリ−ンシ−トと称する)を積層
し、加熱圧縮一体化(以下ラミネ−トと称する)を行う
工程を備えている。
2. Description of the Related Art In manufacturing electronic components such as a multilayer capacitor, a multilayer inductor, a multilayer alumina substrate, a multilayer varistor, and a multilayer piezoelectric (electrostrictive) element, a ceramic green sheet (hereinafter, referred to as a ceramic green sheet) is used. A step of laminating and performing heat compression integration (hereinafter referred to as lamination).

【0003】例えば積層コンデンサは、所定の内部電極
パタ−ンを印刷したセラミックグリ−ンシ−トを所定枚
数積層して積層体を構成し、ラミネ−ト後に切断し、脱
脂し、焼成する工程を経て製造される。
For example, in a multilayer capacitor, a predetermined number of ceramic green sheets on which predetermined internal electrode patterns are printed are laminated to form a laminated body, and after laminating, cutting, degreasing and firing are performed. Manufactured through

【0004】かかる製造方法において、積層体に構造的
欠陥(デラミネーション、クラック等)が生じないよう
にするための手段して、静水圧印加による等方向加圧成
形処理(以下CIP処理と称する)が知られている。例
えば、特開平5ー21268号公報は、接着フィルムを設けた
金属板の上にセラミック積層体を固定し、セラミック積
層体の積層方向に切断溝を設けた後、気密性のある袋中
に入れて、真空密封し、静水加圧して圧縮成形する手段
を開示している。
In such a manufacturing method, as a means for preventing structural defects (delamination, cracks, etc.) from occurring in the laminated body, isostatic pressing by applying a hydrostatic pressure (hereinafter referred to as CIP). It has been known. For example, JP-A-5-21268 discloses that a ceramic laminate is fixed on a metal plate provided with an adhesive film, cut grooves are provided in the laminating direction of the ceramic laminate, and then placed in an airtight bag. In addition, there is disclosed means for vacuum-sealing and compression-molding by applying hydrostatic pressure.

【0005】ところが、特開平5ー21268号公報に開示さ
れた技術では、静水圧が250kgf/cm2以上になると、
切断溝が閉じ、チップ同士が接着する恐れがあるので、
50〜250kgf/cm2に限定する必要があると記載され
ていることから明らかなように、250kgf/cm2が印加
できる静水圧の上限である。
However, according to the technique disclosed in Japanese Patent Application Laid-Open No. Hei 5-21268, when the hydrostatic pressure becomes 250 kgf / cm 2 or more,
Since the cutting groove closes and the chips may adhere to each other,
50~250kgf / cm 2 As is clear from what is described and it is necessary to limit to the an upper limit of hydrostatic pressure 250 kgf / cm 2 can be applied.

【0006】別の先行技術として、特開平7-176449号公
報は、セラミックグリ−ンシ−ト積層体の変形を避ける
ために、周囲に枠を設けた特殊な治具を用いる技術を開
示している。しかし、特開平7-176449号公報では、枠を
設けた特殊な治具が必要であるため、積層体を枠に出し
入れするための作業が煩雑で時間が掛かり作業性が悪
い。また、枠を使用するのでそのサイズが大きくなり、
一度に処理する積層体が少なくなってしまう欠点があ
る。
As another prior art, Japanese Patent Application Laid-Open No. 7-176449 discloses a technique using a special jig provided with a frame around the ceramic green sheet laminate in order to avoid deformation of the laminate. I have. However, in Japanese Patent Application Laid-Open No. 7-176449, since a special jig provided with a frame is required, the work for putting the laminate into and out of the frame is complicated, time-consuming, and poor in workability. Also, because the frame is used, its size increases,
There is a disadvantage that the number of laminates processed at one time is reduced.

【0007】別の先行技術として、特開平8-255728号公
報は、積層体をポリエチレンなどのプラスチックフイル
ムのパックに入れて、真空で熱シ−ルすることにより密
閉し、その後に60〜85℃の温度で100〜400Kg
f/cm2の圧力を加えてラミネ−トを行う技術を開示して
いる。しかし、特開平8-255728号公報に記載の技術も、
400kgf/cm2が印加できる静水圧の上限ある。
As another prior art, Japanese Patent Application Laid-Open No. 8-255728 discloses that a laminate is placed in a plastic film pack of polyethylene or the like, sealed by heat sealing in a vacuum, and then 60-85 ° C. 100-400Kg at the temperature of
A technique for performing lamination by applying a pressure of f / cm 2 is disclosed. However, the technology described in JP-A-8-255728 is also
There is an upper limit of the hydrostatic pressure at which 400 kgf / cm 2 can be applied.

【0008】[0008]

【発明が解決しようとする課題】本発明の課題は、高品
質の積層セラミック電子部品を製造し得る方法を提供す
ることである。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a method by which high quality multilayer ceramic electronic components can be manufactured.

【0009】本発明のもう一つの課題は、構造的欠陥の
ない積層セラミック電子部品を製造し得る方法を提供す
ることである。
Another object of the present invention is to provide a method capable of producing a multilayer ceramic electronic component without structural defects.

【0010】本発明の更にもう一つの課題は、積層セラ
ミックコンデンサ用グリ−ンシ−ト積層体等のように、
薄い積層体を、きわめて小さい形状変化でスタックでき
る積層セラミック電子部品の製造方法を提供することで
ある。
[0010] Still another object of the present invention is to provide a green sheet laminate for a multilayer ceramic capacitor.
An object of the present invention is to provide a method for manufacturing a multilayer ceramic electronic component that can stack a thin laminate with a very small shape change.

【0011】本発明の更にもう一つの課題は、超圧力下
でスタックでき、しかも、圧力選定幅が大きく、スタッ
ク圧力を製品特性に併せて選定でき、特性の安定した積
層セラミック電子部品を高歩留りで製造し得る製造方法
を提供することである。
Still another object of the present invention is to provide a multi-layer ceramic electronic component having stable characteristics, which can be stacked under super-pressure, has a large pressure selection range, and can select a stack pressure in accordance with product characteristics. To provide a production method that can be produced by

【0012】本発明の更にもう一つの課題は、枠等の特
殊な成形型使用する必要がなく、作業性に優れた積層セ
ラミック電子部品の製造方法を提供することである。
Still another object of the present invention is to provide a method of manufacturing a multilayer ceramic electronic component excellent in workability without using a special mold such as a frame.

【0013】[0013]

【課題を解決するための手段】上述した課題を解決する
ため、本発明に係る積層セラミック電子部品の製造方法
は、複数のセラミックグリ−ンシ−トを積層して得られ
た積層体を圧縮成型する。前記積層体を支持基板上に配
置した後、これを密閉化し、1000kgf/cm2以上の静
水圧により加圧成形する。
In order to solve the above-mentioned problems, a method of manufacturing a multilayer ceramic electronic component according to the present invention comprises compression-molding a laminate obtained by laminating a plurality of ceramic green sheets. I do. After disposing the laminate on a supporting substrate, it is hermetically sealed and molded under a hydrostatic pressure of 1000 kgf / cm 2 or more.

【0014】上述のように、積層体の少なくとも一面を
支持基板上に固定した後、これを密閉化し、静水圧によ
り加圧成形するので、真空処理時、加圧時及び工程移動
時に、積層体の歪み及び曲がり等が発生することがな
い。しかも、積層体が支持基板によって支持されている
ので、積層体の形状が安定であり、作業性及び歩留が向
上する。
As described above, after at least one surface of the laminate is fixed on the support substrate, it is hermetically sealed and subjected to pressure molding by hydrostatic pressure. No distortion or bending occurs. Moreover, since the laminate is supported by the support substrate, the shape of the laminate is stable, and the workability and yield are improved.

【0015】また、1000kgf/cm2以上の静水圧によ
り加圧成形すると、従来と比較して、構造的欠陥のない
高品質の積層セラミック電子部品を製造し得ることが解
った。 更に、従来と異なって、枠を使用しないため、
作業性に優れる。
Further, it has been found that a high-quality multilayer ceramic electronic component free from structural defects can be manufactured by pressure molding with a hydrostatic pressure of 1000 kgf / cm 2 or more, as compared with the related art. Furthermore, unlike the past, since no frame is used,
Excellent workability.

【0016】積層体は、複数のセラミックグリ−ンシ−
トを積層し、その積層体を仮スタックして得られる。
The laminate is formed of a plurality of ceramic green screens.
The stacks are laminated, and the laminate is obtained by temporary stacking.

【0017】支持基板上に配置した積層体を、更に、全
体をラミネ−トフィルム等で密閉包装して真空処理化
し、得られた真空包装体をCIP処理法で加圧してもよ
い。積層体は、例えば、サランラップ(登録商標)等で
包み込んでもよい。
The laminate placed on the supporting substrate may be further hermetically sealed with a laminate film or the like and subjected to vacuum processing, and the resulting vacuum package may be pressurized by CIP processing. The laminate may be wrapped with Saran Wrap (registered trademark), for example.

【0018】好ましくは、支持基板と、積層体との間に
有機質フィルムを介在させる。この場合、有機質フィル
ムは、表面に離型剤を有することが好ましい。
Preferably, an organic film is interposed between the supporting substrate and the laminate. In this case, the organic film preferably has a release agent on the surface.

【0019】[0019]

【発明の実施の形態】図1は一枚のセラミックグリーン
シートを示す斜視図である。セラミックグリーンシート
1は、例えば、平面積200mm×200mm、厚さ8μm
のディメンションを持ち、一面に複数の内部電極2を形
成してある。
FIG. 1 is a perspective view showing one ceramic green sheet. The ceramic green sheet 1 has, for example, a plane area of 200 mm × 200 mm and a thickness of 8 μm.
And a plurality of internal electrodes 2 are formed on one surface.

【0020】図2は図1に示したセラミックグリーンシ
ートを積層して得られた積層体の斜視図である。図2に
図示された積層体3は、図1に図示されたセラミックグ
リ−ンシ−ト1を、例えば300枚程重ねて構成されて
いる。積層体3は、必要枚数のセラミックグリ−ンシ−
ト1を積層した後、例えば一軸油圧プレスを用いて、1
00kg/cm2で加圧し、予備プレスすることが望ましい。
予備プレスを行なうと、1000kgf/cm2以上の超高圧
でCIP処理を行なった場合でも、積層体自身の歪みや
変形等の発生がなく、後の切断工程におけるパタ−ンズ
レによる特性不良や、焼成時にラミネ−ション等の発生
を防止し、高品質の積層セラミックコンデンサを製造す
ることができる。積層体3は、サランラップ(登録商
標)等で包んでもよい。
FIG. 2 is a perspective view of a laminate obtained by laminating the ceramic green sheets shown in FIG. The laminated body 3 shown in FIG. 2 is configured by stacking, for example, about 300 ceramic green sheets 1 shown in FIG. The laminate 3 is made up of a required number of ceramic green screens.
After the stack 1 is stacked, for example, using a uniaxial hydraulic press,
It is desirable to pressurize at 00 kg / cm 2 and pre-press.
When the pre-pressing is performed, even if the CIP processing is performed at an ultra-high pressure of 1000 kgf / cm 2 or more, there is no distortion or deformation of the laminated body itself, and characteristic failure due to pattern distortion in the subsequent cutting process and firing. Occurrence of lamination or the like is sometimes prevented, and a high-quality multilayer ceramic capacitor can be manufactured. The laminate 3 may be wrapped with Saran Wrap (registered trademark) or the like.

【0021】次に、図3に示すように、支持基板4の面
上に積層体3を配置する。実施例では、支持基板4と、
積層体3との間に有機質のフィルム5を介在させてあ
る。有機物フィルム5としては、PET(ポリエチレン
テレフタレート)フィルムを用いることができる。この
場合、フィルム5は、表面に離型剤を有することが望ま
しい。積層体3は、フィルム5に設けられた離型剤と接
するように重ねる。
Next, as shown in FIG. 3, the laminate 3 is arranged on the surface of the support substrate 4. In the embodiment, the support substrate 4 and
An organic film 5 is interposed between the laminate 3. As the organic film 5, a PET (polyethylene terephthalate) film can be used. In this case, the film 5 desirably has a release agent on the surface. The laminate 3 is stacked so as to be in contact with the release agent provided on the film 5.

【0022】支持基板4は、前述の大きさの積層体3に
対しては、例えば、大きさ205mm×205mm、厚さ
1.5mmのものが適している。但し、歪まなければ、厚
さはもっと薄くてもよく、例えば、1.5mm〜0.5mm
の厚み範囲のものであっても使用することができる。
The supporting substrate 4 is preferably of a size of, for example, 205 mm × 205 mm and a thickness of 1.5 mm for the laminate 3 having the above-mentioned size. However, if it is not distorted, the thickness may be thinner, for example, 1.5 mm to 0.5 mm.
Can be used.

【0023】支持基板4は、超加圧する関係で、歪みや
変形等が生じないような剛性を有することが必要であ
る。具体的には、5000kgf/cm2 の静水圧に対しても
形状変化が5%以内に納められるような剛性を有するこ
とが望ましい。支持基板4の形状変化が大きければ大き
い程、積層体3は大きく変形するおそれがある。
Since the supporting substrate 4 is subjected to super-pressing, distortion and
It is necessary to have rigidity to prevent deformation etc.
You. Specifically, 5000 kgf / cmTwo For the hydrostatic pressure of
Be rigid enough to keep the shape change within 5%
Is desirable. The larger the shape change of the support substrate 4 is, the larger
Indeed, the laminate 3 may be greatly deformed.

【0024】また、工程移動や真空密閉等の通常作業で
生じると考えられる荷重に対して支持基板4の歪み量が
最大でも、長軸方向に対して1%以下であることが望ま
しい。支持基板4の歪みが量が大きいと、積層体3の層
間剥離やひび割れ等が発生することになる。
Further, it is desirable that the maximum amount of distortion of the support substrate 4 be 1% or less with respect to the long axis direction with respect to a load considered to be generated in a normal operation such as process movement or vacuum sealing. When the amount of distortion of the support substrate 4 is large, delamination or cracking of the laminate 3 occurs.

【0025】更に、CIP処理法を実施する場合、水温
が稼働熱等で上昇するので、安全を考慮し、100℃の
温度においても上述の物性を維持し得る支持基板4であ
ることが好ましい。更に、経済的理由から、軽く、廉価
であり、加工性が良いものが望ましい。
Further, when the CIP processing method is performed, since the water temperature rises due to the operating heat or the like, it is preferable that the support substrate 4 be capable of maintaining the above-mentioned physical properties even at a temperature of 100 ° C. in consideration of safety. Furthermore, for economic reasons, it is desirable to use a material that is light, inexpensive and has good workability.

【0026】上述した条件を満たすため、支持基板4
は、金属、セラミックまたは硬質プラスチックのいずれ
かによって構成する。支持基板4を構成する金属材料と
しては、例えば、アルミニュウム、ステンレス、鉄、
銅、またはそれ等の合金等を挙げることができる。セラ
ミック材料としては、アルミナ、ガラス及び非酸化物セ
ラミック等を挙げることができる。プラスチック材料と
しては硬質プラスチック類が適している。これらの材質
は、積層体の大きさ、加圧力の大きさ及び経済性等を考
慮して選択される。
In order to satisfy the above conditions, the supporting substrate 4
Is made of any of metal, ceramic or hard plastic. Examples of the metal material forming the support substrate 4 include aluminum, stainless steel, iron, and the like.
Copper or an alloy thereof can be given. Ceramic materials include alumina, glass and non-oxide ceramics. Hard plastics are suitable as plastic materials. These materials are selected in consideration of the size of the laminated body, the magnitude of the pressing force, the economy, and the like.

【0027】次に、図5に示すように、支持基板4、フ
ィルム5および積層体3の積層体を、サランラップ(登
録商標)の有機質の包装用フイルム6上に置く。
Next, as shown in FIG. 5, the laminate of the support substrate 4, the film 5 and the laminate 3 is placed on an organic packaging film 6 of Saran Wrap (registered trademark).

【0028】次に図5に例示するように、包装用フィル
ム6を矢印a1のように持ち上げて、支持基板4、フィ
ルム5および積層体3の積層体に被せ、図6に示すよう
に、包装用フィルム6により支持基板4、フィルム5お
よび積層体3の積層体を包装用フィルム6で覆う。
Next, as illustrated in FIG. 5, the packaging film 6 is lifted up as indicated by an arrow a1 and covered with the support substrate 4, the film 5 and the laminate 3 and, as shown in FIG. The laminate of the support substrate 4, the film 5, and the laminate 3 is covered with the packaging film 6 with the packaging film 6.

【0029】次に、図7および図8に示すように、包装
用フィルム6の周囲を真空密閉Lし、真空包装体7を得
る。真空包装体7を構成する包装用フィルム6は、真空
吸引により、実際には、支持基板4、フィルム5および
積層体3に密着しており、真空包装体7の内部に空間は
形成されていない。
Next, as shown in FIGS. 7 and 8, the periphery of the packaging film 6 is vacuum-sealed L to obtain a vacuum package 7. The packaging film 6 constituting the vacuum package 7 is actually in close contact with the support substrate 4, the film 5 and the laminate 3 by vacuum suction, and no space is formed inside the vacuum package 7. .

【0030】図9は本発明に係わるCIP処理法の一例
を示す概略説明図である。図示するように、CIP処理
法は、2つの密閉型金型8、9を用いて行なわれる。金
型8、9は、加圧媒体となる水10を収納する受け金型
8と、加圧金型9とで構成される。図1〜8の工程を通
して得られた真空包装体7の複数個を、受け金型8内の
水10と共に挿置し、加圧金型9で加圧する。これによ
り、真空包装体7に対して、全方向から水圧f1が加わ
り、等方向加圧成形が実行される。CIP処理では、1
000kgf/cm2以上の静水圧により加圧成形する。
FIG. 9 is a schematic explanatory view showing an example of the CIP processing method according to the present invention. As shown, the CIP processing method is performed using two closed molds 8 and 9. The dies 8 and 9 include a receiving die 8 for storing water 10 serving as a pressurizing medium and a pressurizing die 9. A plurality of the vacuum packaging bodies 7 obtained through the steps of FIGS. 1 to 8 are inserted and placed together with the water 10 in the receiving die 8 and pressurized by the pressing die 9. As a result, the water pressure f1 is applied to the vacuum package 7 from all directions, and isotropic pressure molding is performed. In CIP processing, 1
Press molding with hydrostatic pressure of 000 kgf / cm 2 or more.

【0031】上述したCIP処理法を行なった後、真空
包装体7から積層体3を取り出し、積層体3に対して、
切断、焼成工程等を施す。これにより電子部品が製造さ
れる。CIP処理法を施した以降の工程は周知であるの
で、説明は省略する。
After performing the above-described CIP processing method, the laminate 3 is taken out from the vacuum package 7 and
A cutting and firing process is performed. Thus, an electronic component is manufactured. The steps after the CIP processing method are well-known, and thus the description is omitted.

【0032】次に、CIP処理法において、加圧力を1
000kgf/cm2、1500kgf/cm2、20000kgf/c
m2、30000kgf/cm2のように変えた場合の変形率、
厚さ縮率、構造的欠陥率、静電容量バラツキ及び電圧破
壊(Vb)のデ−タを表1に示す。
Next, in the CIP processing method, the pressing force is set to 1
000kgf / cm 2, 1500kgf / cm 2, 20000kgf / c
m 2 , deformation rate when changed as 30,000 kgf / cm 2 ,
Table 1 shows data of thickness reduction ratio, structural defect ratio, capacitance variation, and voltage breakdown (Vb).

【0033】表1の如く、本発明の実施例によれば、支
持基板4のない比較例1と比べて、室温一定条件で、積
層体の一辺の変形率は1/10以下に低減され、且つ、
最終製品の積層コンデンサの不良率も著しく改善され
る。支持基板4のない比較例1の場合は、変形が大きく
なり、積層コンデンサとするための切断が不可能にな
り、測定不能となってしまう。特に、構造的欠陥等の不
良率は、CIP処理しない比較例2や支持基板4を用い
ないCIP処理法(比較例1)に比べて、1/10以下
であり、本発明による方法は顕著な効果を得ることが分
かる。
As shown in Table 1, according to the embodiment of the present invention, the deformation rate of one side of the laminate is reduced to 1/10 or less under the constant room temperature condition, as compared with Comparative Example 1 having no support substrate 4. and,
The rejection rate of the final multilayer capacitor is also remarkably improved. In the case of Comparative Example 1 without the support substrate 4, the deformation becomes large, and it becomes impossible to cut the multilayer capacitor to make it impossible to measure. In particular, the defect rate such as a structural defect is 1/10 or less as compared with the comparative example 2 without the CIP treatment and the CIP treatment method without the support substrate 4 (comparative example 1), and the method according to the present invention is remarkable. It turns out that an effect is obtained.

【0034】また、加圧力の増加は、特に超高圧の場
合、デラミネ−ションやノンラミネ−ション等の構造的
欠陥が皆無になり、それに伴う静電容量バラツキや電圧
破壊(Vb)値も改善される。すなわち、図10に示し
たように、加圧力を上げると、セラミックシ−トの厚さ
寸法が減少し、グリ−ンシート密度が大きくなるので、
構造的欠陥がなくなり、それに伴う静電容量バラツキや
電圧破壊(Vb)値も改善される。本発明の場合、支持
基板4を用いるから、3000〜5000kgf/cm2にも
達する超高圧のCIP処理法が実現でき、従って、構造
的欠陥がなく、積層コンデンサの場合、改善された静電
容量バラツキおよび電圧破壊(Vb)値を得ることがで
きる。
In addition, when the pressure is increased, especially in the case of an ultra-high pressure, structural defects such as delamination and non-lamination are eliminated, and the capacitance variation and voltage destruction (Vb) value associated therewith are also improved. You. That is, as shown in FIG. 10, when the pressing force is increased, the thickness of the ceramic sheet decreases, and the green sheet density increases.
Structural defects are eliminated, and the resulting capacitance variation and voltage breakdown (Vb) value are also improved. In the case of the present invention, since the support substrate 4 is used, an ultra-high pressure CIP processing method of 3000 to 5000 kgf / cm 2 can be realized, and therefore, there is no structural defect, and in the case of a multilayer capacitor, an improved capacitance is achieved. Variations and voltage breakdown (Vb) values can be obtained.

【0035】[0035]

【発明の効果】【The invention's effect】

(a)高品質の積層セラミック電子部品を製造し得る製
造方法を提供することができる。 (b)構造的欠陥のない積層セラミック電子部品を製造
し得る方法を提供することができる。 (c)積層セラミックコンデンサ用グリ−ンシ−ト積層
体等のように、薄い積層体を、きわめて小さい形状変化
でスタックできる積層セラミック電子部品の製造方法を
提供することができる。 (d)超圧力下でスタックでき、しかも、圧力選定幅が
大きく、スタック圧力を製品特性に併せて選定でき、特
性の安定した積層セラミック電子部品を高歩留りで製造
し得る製造方法を提供することができる。 (e)枠等の特殊な成形型使用する必要がなく、作業性
に優れた積層セラミック電子部品の製造方法を提供する
ことができる。
(A) It is possible to provide a manufacturing method capable of manufacturing a high-quality multilayer ceramic electronic component. (B) It is possible to provide a method capable of manufacturing a multilayer ceramic electronic component free from structural defects. (C) It is possible to provide a method of manufacturing a multilayer ceramic electronic component that can stack a thin multilayer body with a very small shape change, such as a green sheet multilayer body for a multilayer ceramic capacitor. (D) To provide a manufacturing method capable of stacking under super-pressure, having a large pressure selection range, selecting a stack pressure in accordance with product characteristics, and manufacturing multilayer ceramic electronic components having stable characteristics at a high yield. Can be. (E) It is not necessary to use a special mold such as a frame, and a method for manufacturing a multilayer ceramic electronic component excellent in workability can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】一枚のセラミックグリーンシートを示す斜視図
である。
FIG. 1 is a perspective view showing one ceramic green sheet.

【図2】図1に示したセラミックグリーンシートを積層
して得られた積層体の斜視図である。
FIG. 2 is a perspective view of a laminate obtained by laminating the ceramic green sheets shown in FIG.

【図3】本発明に係る積層セラミック電子部品の製造工
程を示す斜視図である。
FIG. 3 is a perspective view showing a manufacturing process of the multilayer ceramic electronic component according to the present invention.

【図4】図3に示した工程と同一の工程を示す図であ
る。
FIG. 4 is a view showing the same step as the step shown in FIG. 3;

【図5】図3および図4に示した工程の後の工程を示す
斜視図である。
FIG. 5 is a perspective view showing a step after the step shown in FIGS. 3 and 4.

【図6】図5に示した工程の後の工程を示す斜視図であ
る。
FIG. 6 is a perspective view showing a step after the step shown in FIG. 5;

【図7】図6に示した工程の後の工程を示す斜視図であ
る。
FIG. 7 is a perspective view showing a step after the step shown in FIG. 6;

【図8】図7に示した工程と同一の工程を示す図であ
る。
FIG. 8 is a view showing the same step as the step shown in FIG. 7;

【図9】本発明に係るCIP処理法を示す図である。FIG. 9 is a diagram showing a CIP processing method according to the present invention.

【図10】加圧力に対するセラミックグリ−ンシ−トの
厚さ変化とグリ−ンシート密度との関係を示す図であ
る。
FIG. 10 is a graph showing a relationship between a change in thickness of a ceramic green sheet and a green sheet density with respect to a pressing force.

【符号の説明】[Explanation of symbols]

1 セラミックグリーンシート 3 積層体 4 支持基板 5 フィルム 6 有機質フィルム 7 真空包装体 8 受け型 9 加圧型 10 水 DESCRIPTION OF SYMBOLS 1 Ceramic green sheet 3 Laminated body 4 Support substrate 5 Film 6 Organic film 7 Vacuum package 8 Receiving type 9 Press type 10 Water

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 複数のセラミックグリ−ンシ−トを積層
して得られた積層体を圧縮成型する工程を含む積層セラ
ミック電子部品の製造方法であって、 前記積層体を支持基板上に配置した後、これを密閉化
し、1000kgf/cm2以上の静水圧により加圧成形する
積層セラミック電子部品の製造方法。
1. A method for manufacturing a multilayer ceramic electronic component, comprising a step of compression-molding a laminate obtained by laminating a plurality of ceramic green sheets, wherein the laminate is disposed on a support substrate. Thereafter, this is sealed, and a method for producing a multilayer ceramic electronic component is performed by pressure molding with a hydrostatic pressure of 1000 kgf / cm 2 or more.
【請求項2】 請求項1に記載された製造方法であっ
て、 前記支持基板は、金属、セラミックまたは硬質プラスチ
ックのいずれかである積層セラミック電子部品の製造方
法。
2. The method according to claim 1, wherein the support substrate is one of a metal, a ceramic, and a hard plastic.
【請求項3】 請求項1に記載された製造方法であっ
て、 前記支持基板と前記積層体との間に有機質フィルムを介
在させる積層セラミック電子部品の製造方法。
3. The method according to claim 1, wherein an organic film is interposed between the support substrate and the laminate.
【請求項4】 請求項3に記載された製造方法であっ
て、 前記有機質フィルムは、表面に離型剤を有する積層セラ
ミック電子部品の製造方法。
4. The method according to claim 3, wherein the organic film has a release agent on a surface thereof.
【請求項5】 請求項1に記載された製造方法であっ
て、 前記積層体は、50層以上の層数を有する積層セラミッ
ク電子部品の製造方法。
5. The method according to claim 1, wherein the multilayer body has 50 or more layers.
JP19763697A 1997-07-23 1997-07-23 Manufacturing method of multilayer ceramic electronic component Expired - Fee Related JP4142132B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19763697A JP4142132B2 (en) 1997-07-23 1997-07-23 Manufacturing method of multilayer ceramic electronic component

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19763697A JP4142132B2 (en) 1997-07-23 1997-07-23 Manufacturing method of multilayer ceramic electronic component

Publications (2)

Publication Number Publication Date
JPH1140457A true JPH1140457A (en) 1999-02-12
JP4142132B2 JP4142132B2 (en) 2008-08-27

Family

ID=16377789

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19763697A Expired - Fee Related JP4142132B2 (en) 1997-07-23 1997-07-23 Manufacturing method of multilayer ceramic electronic component

Country Status (1)

Country Link
JP (1) JP4142132B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003532595A (en) * 2000-05-11 2003-11-05 ザ、プロクター、エンド、ギャンブル、カンパニー Peelable sealable bag containing composite sheet material
JP2015189611A (en) * 2014-03-27 2015-11-02 シチズンファインデバイス株式会社 Method of producing ceramic molding
CN112885601A (en) * 2020-12-28 2021-06-01 苏州创浩新材料科技有限公司 Preparation method of MLCC capacitor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003532595A (en) * 2000-05-11 2003-11-05 ザ、プロクター、エンド、ギャンブル、カンパニー Peelable sealable bag containing composite sheet material
JP2015189611A (en) * 2014-03-27 2015-11-02 シチズンファインデバイス株式会社 Method of producing ceramic molding
CN112885601A (en) * 2020-12-28 2021-06-01 苏州创浩新材料科技有限公司 Preparation method of MLCC capacitor
CN112885601B (en) * 2020-12-28 2022-04-22 苏州创浩新材料科技有限公司 Preparation method of MLCC capacitor

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