JPH11343566A - Substrate treatment device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate treatment device which facilitates the maintenance of a treatment chamber interior and permits the reduction of the occupancy area of the device in a clean room. SOLUTION: A chamber lid 6 is connected to the treatment chamber 2 with hinges 61, 62. The hinges 61, 62 are provided with mutually rotatably linked fixed pieces 64 and insertible and separable pieces 65. The fixed pieces 64 are fixed to the top end parts of side walls 23, 25 with machine screws. The insertible and separable pieces 65 are fitted as insertible into/separable from the end surfaces 6A, 6B of the chamber lid 6. Thus, the chamber lid 6 is opened by drawing the treatment chamber 2 from an outside cover 1 and releasing the fixing of the insertible and separable pieces 65 of the hinges 61, 62 on one sides to the chamber lid 6 with the hinges 61, 62 on the other side as the center.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a substrate processing apparatus for performing processing on various substrates to be processed such as a semiconductor wafer, a glass substrate for a liquid crystal display device, and a glass substrate for a plasma display panel (PDP).

[0002]

2. Description of the Related Art For example, in a manufacturing process of a liquid crystal display device, a substrate processing apparatus for performing a process such as a heat treatment on a glass substrate is used. In some of such substrate processing apparatuses, a substrate is accommodated in a processing chamber, and the substrate is processed in the processing chamber.

FIG. 9 is a perspective view showing the structure of a conventional substrate processing apparatus. The substrate processing apparatus shown in FIG. 9 has an exterior cover 102 having an opening 101 formed on the front surface. Inside the outer cover 102, a front opening 1 of the outer cover 102 is provided.
The slide plate 103 is provided so as to be able to be pulled out from the side 01 to the near side. A processing chamber 104 for accommodating the substrate and performing the processing is disposed on the slide plate 103, and the processing chamber 104 is exposed from the inside of the outer cover 102 by pulling the slide plate 103 toward the near side of the outer cover 102. It can be made to be.

In the processing chamber 104, components necessary for processing the substrate (for example, a heat-treating plate, a plurality of components provided through the heat-treating plate to lift and lower the substrate with respect to the heat-treating plate) are provided. Lift pin mechanism). As these components are used and the inner surface of the processing chamber 104, a chemical solution component evaporated from the substrate and particles flowing into the processing chamber 104 from the outside adhere to the components and the processing chamber 104.
The mounting position of the components inside may slightly shift due to aging. Therefore, on the upper surface of the processing chamber 104, maintenance such as cleaning of the components inside the processing chamber 104 and the inner surface of the processing chamber, and adjustment and replacement of the mounting position of the components inside the processing chamber 104 can be performed. , A maintenance opening 105 is formed. Further, a chamber lid 106 for opening and closing the maintenance opening 105 is provided in connection with the maintenance opening 105. The chamber lid 106 is hinged to the upper end of the side wall 107 on the rear side of the processing chamber 104, and can be opened by lifting a handle 108 attached to the front end.

When the maintenance inside the processing chamber 104 is performed, the maintenance worker
2, the slide plate 103 is pulled out to the near side, and the processing chamber 104 is exposed from the exterior cover 102. Then, the handle 108 attached to the chamber lid 106 is lifted from the front side of the processing chamber 104 to open the maintenance opening 105 on the upper surface of the processing chamber 104, and a hand is put into the processing chamber 104 from the maintenance opening 105. Work.

[0006]

However, in the above-described configuration, since the worker must work while standing in front of the processing chamber 104, the worker needs to work near the rear side wall 107 in the processing chamber 104. It was difficult to reach and it was difficult to maintain this part.

Further, in the above configuration, the outer cover 102
It is necessary to further secure a space on the front side of the processing chamber 104 drawn out from the space for an operator to work. For this reason, a large maintenance work space is required on the front side of the exterior cover 102, and there is also a problem that the area occupied by the apparatus in a clean room in which the substrate processing apparatus is installed is large.

In particular, in recent years, the processing chamber 104 has been increased in size as the size of the substrate to be processed has increased, and the above-mentioned problems have become more pronounced.

Therefore, in the conventional substrate processing apparatus, the chamber lid 106 is moved in the sliding direction L of the processing chamber 104.
Is hinged near one upper edge.
According to this configuration, it is possible to open the maintenance opening 105 of the processing chamber 104 by lifting the chamber lid 106 from the side of the processing chamber 104. Therefore, there is no need to secure a space for the operator to work on the front side of the processing chamber 104, and the exterior cover 10
2, the maintenance work space on the near side can be reduced.

However, even in this configuration, it is difficult to access a portion near the side wall of the processing chamber 104 to which the chamber lid 106 is connected, and it is difficult to perform maintenance on this portion.

In order to solve the above-mentioned problems,
It is conceivable that the chamber lid 106 is configured so as to be detachable from the processing chamber 104, and that the chamber lid 106 is detached from the processing chamber 104 during maintenance work. However, generally, the chamber lid 106
Is heavy and difficult to remove. In addition, it is not preferable to remove the chamber lid 106 from the processing chamber 104 during maintenance because an operator may drop the removed chamber lid 106.

An object of the present invention is to provide a substrate processing apparatus capable of easily performing maintenance such as replacement and cleaning of components disposed in a processing chamber and reducing the occupied area of the apparatus in a clean room. It is to provide.

[0013]

Means for Solving the Problems and Effects of the Invention According to the first aspect of the present invention, there is provided an apparatus having a maintenance opening on an upper surface and accommodating a substrate therein for performing processing. The processing chamber, a lid for opening and closing the opening of the upper surface of the processing chamber, and a slide member for sliding the processing chamber with respect to a predetermined frame member, the processing chamber and the lid, In a state where the processing chamber is pulled out from the frame member, maintenance of the inside of the processing chamber can be performed through the opening from both sides of the processing chamber with respect to the sliding direction of the processing chamber. A substrate processing apparatus.

According to this configuration, an operator performing maintenance in the processing chamber can reach into the processing chamber from both sides of the processing chamber through the openings formed in the upper surface of the processing chamber. Therefore, it is possible to reach the entire area in the processing chamber, and maintenance in the processing chamber can be easily performed.

Further, the maintenance worker can work on the side of the processing chamber pulled out from the frame member.
There is no need to secure space for workers to stand in front of the processing chamber. Therefore, the area occupied by the apparatus in the clean room where the substrate processing apparatus is installed can be reduced.

[0016] More specifically, as described in claim 2, the lid is provided with the processing chamber pulled out of the frame member with respect to a sliding direction of the processing chamber. It is preferably connected to the processing chamber so that it can be opened and closed from both sides.

Further, the lid may be connected to the processing chamber so that the lid can be opened about two axes substantially parallel to the sliding direction of the processing chamber.

Further, the lid is divided into a plurality of portions, and each of the divided portions is rotatable about an axis substantially parallel to a sliding direction of the processing chamber.
It may be connected to the processing chamber.

Further, the lid is divided into a plurality of portions, and each of the divided portions is rotatable about an axis along a direction substantially orthogonal to the sliding direction of the processing chamber. It may be connected to the processing chamber.

By employing the above configuration, the lid for opening and closing the opening on the upper surface of the processing chamber can be opened from both sides of the processing chamber pulled out from the frame member. Hands can be inserted into the processing chamber from both sides of the processing chamber to perform maintenance in the processing chamber.

Further, it is preferable that the lid is connected to the processing chamber so that the lid can be moved toward and away from the processing chamber while maintaining a state substantially parallel to the upper surface of the processing chamber. By doing so, the lid can be moved in parallel above the processing chamber, so that two maintenance workers can perform maintenance work simultaneously from both sides of the processing chamber. Therefore, the efficiency of maintenance work can be improved.

[0022]

Embodiments of the present invention will be described below in detail with reference to the accompanying drawings.

FIG. 1 is a perspective view showing the configuration of the substrate processing apparatus according to the first embodiment of the present invention. FIG.
FIG. 2 is a sectional view when the substrate processing apparatus is cut along a cutting line II-II in FIG. 1. This substrate processing apparatus is an apparatus for performing processing on a substrate such as a glass substrate for a liquid crystal display device.
It has. The exterior cover 1 is formed in a substantially rectangular parallelepiped shape having an opening 11 on its front surface (the front surface in FIG. 1) 1A, and is fixed on the floor of a clean room where the substrate processing apparatus is installed. To be precise,
The exterior cover 1 mainly includes a frame framed in a substantially rectangular parallelepiped shape, and a cover member attached around the frame.

A processing chamber 2 for housing a substrate to be processed and performing processing is housed in the outer cover 1. The processing chamber 2 has an opening 11 at the front of the exterior cover 1.
Can be pulled out to the near side of the exterior cover 1 via the. Specifically, a slide plate 3 on which the processing chamber 2 is mounted is provided in the exterior cover 1. The slide plate 3 includes a pair of slide members 4 attached to both ends along the front-back direction L of the substrate processing apparatus.
Thereby, it can be pulled out to the near side from the opening 11 on the front surface of the exterior cover 1. The slide member 4 is connected to the slide plate 3 via a slide bracket 3A.

A front plate 5 is connected to the front edge of the slide plate 3 so as to be orthogonal to the slide plate 3. Front panel 5
Is formed to be larger than the opening 11 on the front surface of the outer cover 1, and the opening 1 on the front surface of the outer cover 1 is stored in a state where the slide plate 3 (the processing chamber 2) is housed in the outer cover 1.
1 can be closed. A handle 5 </ b> A is attached to the front of the front plate 5 for the maintenance worker to grasp when sliding the slide plate 3. With the above configuration, the maintenance worker grasps the handle 5A attached to the front plate 5, pulls out the slide plate 3 toward the front side, and thereby places the processing chamber 2 on the outer cover 1.
Can be pulled out to the near side.

The processing chamber 2 has a bottom plate 21 having a substantially rectangular planar shape, and side walls 22, 23, 24, and 25 erected from the periphery of the bottom surface 21 upward. It is formed in an opened substantially rectangular parallelepiped shape. For example, when the substrate processing apparatus is an apparatus for performing a heat treatment on a substrate, a heat treatment plate or the like for heating or cooling the substrate placed on the upper surface is disposed in the processing chamber 2.

A slot-like substrate passage 27 for loading / unloading a substrate into / from the processing chamber 2 is formed on the inner side wall 22 of the processing chamber 2. The substrate to be processed is processed by a substrate transfer robot (not shown) disposed on the back side of the outer cover 1 through the substrate passage opening 27.
It is carried into or out of the processing chamber 2.

Regarding the upper surface opening 26 of the processing chamber 2,
A chamber lid 6 for opening and closing the upper opening 26 is provided. The chamber lid 6 is formed in a flat plate shape having substantially the same outer shape as the processing chamber 2 in a plan view, and is in close contact with the upper end edges of the side walls 22 to 25 of the processing chamber 2 to open the upper surface opening 26 of the processing chamber 2. Can be closed.

The chamber lid 6 is fixed to the side walls 2 along the sliding direction L of the processing chamber 2 by hinges 61 and 62.
3, 25 are connected to the upper end. Hinge 61, 62
Are provided, each having a fixing piece 64 and a detachable piece 65 that are rotatably connected to each other about a hinge pin 63. Fixing piece 64
Are fixed to the upper end portions of the outer surfaces of the side walls 23 and 25 with screws 66.

A notch 67 is formed in the detachable piece 65 at the edge along the hinge pin 63. On the other hand, the end faces 6A and 6B of the chamber lid 6 along the front-rear direction L are respectively attached to and detached from the notch 67 of the detachable piece 65 with the upper opening 26 of the processing chamber 2 closed. Two fastening screws 68 for fixing the piece 65 to the chamber lid 6 are provided. Thus, with the tightening screw 68 fitted into the notch 67, the tightening screw 6
8 into the chamber lid 6 so that the hinge 6
1 and 62 can be fixed to the chamber lid 6. Also, by loosening the tightening screw 68,
The fixing of the detachable piece 65 to the chamber lid 6 can be released.

When performing maintenance in the processing chamber 2, the maintenance worker firstly performs
From the exterior cover 1. Next, for example, standing at a position facing the side wall 23 of the processing chamber 2 (to the right of the processing chamber 2), the two fastening screws 68 attached to the one end surface 6 </ b> A of the chamber lid 6 are loosened, and The fixing of the detachable piece 65 of the hinge 61 is released. Then, the user grips the handle 69 attached to the one end surface 6A of the chamber lid 6 and lifts the handle 69. As a result, the chamber lid 6 tilts around the hinge pin 63 of the hinge 62 connected to the other end surface 6B,
The upper opening 26 of the processing chamber 2 is opened. Therefore, the operator can operate the components arranged near the side wall 23 in the processing chamber 2 from the side facing the side wall 23 of the processing chamber 2 through the upper opening 26 of the processing chamber 2, and the inner surface of the processing chamber 2. The maintenance of the inner surface of the chamber lid 6 and the like can be performed.

When performing maintenance on the components arranged near the side wall 25 in the processing chamber 2, the operator is required to position the component facing the side wall 25 of the processing chamber 2 (left side of the processing chamber 2). Stand on. Then, the two tightening screws 68 attached to the other end surface 6B of the chamber lid 6
And lift the handle 69 attached to the other end surface 6B of the chamber lid 6. Thereby, the chamber lid 6
Is tilted about the hinge pin 63 of the hinge 61 connected to the one end surface 6A, and the upper surface opening 26 of the processing chamber 2 is opened.
Is released. Therefore, the worker can use the processing chamber 2
Of the components disposed near the side wall 25 in the processing chamber 2, the inner surface of the processing chamber 2, the inner surface of the chamber lid 6, etc. It can be performed.

The processing chamber 2 is provided with a fixed rod 28 whose base end is rotatably connected to the upper end surfaces of the side walls 23, 25. By engaging with a concave portion formed on the lower surface of the chamber 6, the chamber lid 6 can be held in an opened state.

As described above, according to the configuration of this embodiment, the chamber lid 6 for opening and closing the upper surface opening 26 of the processing chamber 2 is opened from both sides of the processing chamber 2 drawn out of the exterior cover 1. be able to. That is, the chamber lid 6 includes hinges 61 and 62 connecting the one end surface 6A of the chamber lid 6 and the side wall 23 of the processing chamber 2.
Hinge pin 63 and the other end surface 6B of the chamber lid 6
Hinges 61 connecting the side walls 25 of the processing chamber 2
The two hinge pins 63 can be opened at both sides. This allows maintenance workers to:
Since the hands can be inserted into the processing chamber 2 from both sides of the processing chamber 2, the hand can reach the entire area of the processing chamber 2, and maintenance in the processing chamber 2 can be performed easily.

Further, the maintenance worker can stand and work on the side of the processing chamber 2 pulled out from the outer cover 1, so that a space for the worker to work on the front side of the processing chamber 2 is secured. No need. Therefore, the area occupied by the apparatus in the clean room in which the substrate processing apparatus is installed can be reduced.

FIG. 3 is a perspective view showing the structure of the slide member 4. The slide member 4 has three rail structures 40 arranged in parallel in the vertical direction in FIG.

The rail structure 40 includes a fixed side rail 41 attached to the outer cover 1 and the slide bracket 3.
A movable side rail 42 attached to A, and an intermediate member 43 provided between the fixed side rail 41 and the movable side rail 42. The fixed-side rail 41, the movable-side rail 42, and the intermediate member 43 of each rail structure 40 are integrated by being connected by connecting plates 44, 45, 46, respectively.

The fixed side rail 41 is formed by bending a band-shaped metal plate into a substantially C-shaped cross section, and has ball guide portions 41A, 41 having arc-shaped cross sections at its upper and lower edges.
B. Further, a screw hole 47 for fixing to the exterior cover 1 is formed in the fixed side rail 41,
For example, the fixed side rail 41 can be fixed to the inner side surfaces 12 and 13 (see FIG. 2) of the exterior cover 1 by screws.

The movable side rail 42 is formed by bending a band-shaped metal plate into a substantially C-shaped cross section so that the fixed side rail 41 is bent.
And ball guide portions 42A and 42B having an arc-shaped cross section at upper and lower edges. Further, a screw hole 48 for fixing to the slide plate 3 is formed in the moving side rail 42, and the moving side rail 42 is fixed to the slide bracket 3 </ b> A attached to the outer surface of the slide plate 3 by, for example, a screw. I can do it.

The intermediate member 43 includes a fixed-side facing member 49 facing the fixed-side rail 41 and a moving-side facing member 50 facing the moving-side rail 42. Ball support portions 49A and 49B having an arc-shaped cross section are formed at both ends in the vertical direction of the fixed side facing member 49 so as to face the ball guide portions 41A and 41B of the fixed side rail 41, respectively.
Further, ball support portions 50A, 50B having an arc-shaped cross section are provided at both ends in the vertical direction of the moving side facing member 50 so as to face the ball guide portions 42A, 42B of the moving side rail 42, respectively.
Are formed.

A fixed-side ball retainer 54 is provided between the fixed-side rail 41 and the fixed-side opposing member 49. The ball retainer 54 includes a retainer body 55 formed by bending a band-shaped metal plate. The upper and lower edge portions 55A, 55B of the retainer main body 55 have entered between the ball guide portion 41A and the ball support portion 49A and between the ball guide portion 41B and the ball support portion 49B, respectively. A plurality of balls 56 are rotatably held in the portion. In other words, a plurality of balls 56 are interposed between the ball guide 41A and the ball support 49A and between the ball guide 41B and the ball support 49B. Thereby, the fixed side rail 41 and the fixed side facing member 49 can be relatively slid along the sliding direction L.

A moving-side ball retainer 57 is provided between the moving-side rail 42 and the moving-side opposing member 50. The ball retainer 57 includes a retainer body 58 formed by bending a band-shaped metal plate. The upper and lower edge portions 58A, 58B of the retainer main body 58 have entered between the ball guide portion 42A and the ball support portion 50A and between the ball guide portion 42B and the ball support portion 50B, respectively. A plurality of balls 59 are rotatably held in the portion. In other words, a plurality of balls 59 are interposed between the ball guide portion 42A and the ball support portion 50A and between the ball guide portion 42B and the ball support portion 50B. Thereby, the moving side rail 42 and the moving side facing member 50 can be relatively slid along the sliding direction L.

As described above, the fixed-side rail 41 and the fixed-side opposing member 49 can be relatively slid.
Since the movable side rail 42 and the movable side facing member 50 can be relatively slid, the movable side rail 42 can be slid with respect to the fixed side rail 41.
Therefore, the slide plate 3 connected to the moving side rail 42 via the slide bracket 3A can be pulled out from the exterior cover 1 to which the fixed side rail 41 is fixed, or can be accommodated in the exterior cover 1.

FIG. 4 is a view showing another example of the structure for opening the chamber lid 6 in both directions, and shows a cross section when the processing chamber 2 and the chamber lid 6 are cut along a plane perpendicular to the sliding direction L. ing.

In this configuration, rod-shaped support members 71 and 72 each having a substantially U-shaped plane are attached to the end surfaces 6A and 6B of the chamber lid 6, respectively. Each of the support members 71 and 72 connects the rotating shaft 73 extending in the sliding direction L (a direction perpendicular to the paper surface of FIG. 4), and both ends of the rotating shaft 73 and the chamber lid 6. Connecting part 7
And 4.

At the uppermost ends of the side walls 23 and 25 of the processing chamber 2, support members 7 are respectively provided on upper end surfaces 2 A and 2 B extending substantially horizontally toward the outside of the processing chamber 2.
Brackets 75 and 76 capable of rotatably holding the rotating shaft portions 73 of the first and second rotating shafts 72 are provided. At least two or more brackets 75 and 76 are provided. Each of the brackets 75 and 76 has a holding hole 77 for holding the rotating shaft 73 and a holding hole 7 for holding the rotating shaft 73.
A guide path 78 for guiding the vehicle 7 is formed. The guide path 78 of the bracket 75 is formed along an arc centered on the rotation shaft 73 inserted into the holding hole 77 of the bracket 76. On the other hand, the guideway 78 of the bracket 76
Are formed along an arc centered on the rotation shaft 73 inserted through the holding hole 77 of the bracket 75.

The rotating shaft 73 of the support members 71, 72
Of the brackets 75 and 76 for holding the rotating shaft 73 is formed in a cross-sectional shape excluding a circular arc portion facing each other from a circle, and the major axis direction of the cross-section is the bracket 7.
When crossing the guide paths 78 of the brackets 5 and 76, the brackets 75 and 76 do not fall out of the holding holes 77.

When the chamber lid 6 is opened from the side facing the side wall 23 of the processing chamber 2, the support members 71, 72
From the state in which the rotation shaft 73 is held in the holding holes 77 of the brackets 75 and 76, respectively.
Lift the side. Then, the rotation shaft portion 73 of the support member 71
Is separated from the holding hole 77 while being guided by the guide path 78 of the bracket 75. Thus, the chamber lid 6 can be tilted about the rotation shaft 73 of the support member 72,
The upper opening 26 of the processing chamber 2 can be opened.

On the other hand, when opening the chamber lid 6 from the side facing the side wall 25 of the processing chamber 2, the chamber lid 6
The end face 6B of the support member 72 is lifted to
3 is removed from the holding hole 77 of the bracket 76. Thus, the chamber lid 6 can be tilted about the rotation shaft 73 of the support member 71, and the upper opening 26 of the processing chamber 2 can be opened.

Therefore, according to the configuration shown in FIG. 4, the processing chamber 2 pulled out to the near side of the outer cover 1 is also provided.
The maintenance inside the processing chamber 2 can be performed from both sides.

FIG. 5 is a diagram for explaining a second embodiment of the present invention. The processing chamber 20 and the chamber lid 60 shown in FIG. 5 are to be used instead of the processing chamber 2 and the chamber lid 6 shown in FIG. In FIG. 5, parts corresponding to the respective parts shown in FIG. 1 are denoted by the same reference numerals as in FIG.

In the configuration according to the above-described first embodiment, the chamber lid 6 can be inclined with respect to the processing chamber 2 to open the upper opening 26 of the processing chamber 2. On the other hand, in the configuration according to the second embodiment, the chamber lid 60 can be brought into contact with or separated from the upper surface of the processing chamber 20 while being substantially parallel to the upper surface.

The chamber lid 60 has four parallel holding mechanisms 8.
To the processing chamber 20. The two parallel holding mechanisms 8 are provided on the inner side wall 22 of the processing chamber 20.
(See FIG. 1) and the end face on the back side of the chamber lid 6, and the other two parallel holding mechanisms 8 are connected to the processing chamber 20.
The front side wall 24 and the front end face of the chamber lid 60 are connected to each other.

The parallel holding mechanism 8 has two lower rotating rods 82 and 83 one end of which is rotatably attached to the processing chamber 20 by pins 81. Lower pivot rods 82, 83
Connecting rods 84 and 85 having a length approximately twice as long as the lower rotating rods 82 and 83 are rotatably connected to each other in a state of crossing each other. One ends of two upper pivot rods 87, 88 are connected to the ends of the connecting rods 84, 85, and the other ends of the upper pivot rods 87, 88 have pins 86 at one end.
To the chamber lid 60 so as to be rotatable. With this configuration, the parallel holding mechanism 8 can expand and contract between a contracted state in which the pins 81 and 86 are close to each other and an extended state (a state shown in FIG. 5) in which the pins 81 and 86 are largely separated from each other. it can.

An engaging piece 89 having a recess engageable with an engaging pin 83A protruding from the lower rotating rod 83 is rotatably attached to the lower rotating rod 82. By engaging the engagement piece 89 with the engagement pin 83A, the parallel holding mechanism 8 can be held in an extended state.

According to the configuration of the second embodiment, the maintenance worker grasps the handle 80 provided on the upper surface of the chamber lid 60 and pulls the chamber lid 60 upward, thereby moving the chamber lid 60 to the processing chamber. 20 while being substantially parallel to the upper surface. Then, with the chamber cover 60 separated from the upper surface of the processing chamber 20 by a predetermined distance, the engaging piece 89 is engaged with the engaging pin 83A, thereby holding the chamber lid 60 separated from the processing chamber 20. can do. Thus, the maintenance worker can perform the maintenance work from both sides of the processing chamber 20 with the upper opening 26 of the processing chamber 20 opened.

In the second embodiment, since the chamber cover 60 is moved in parallel above the processing chamber 20, two maintenance workers simultaneously perform maintenance work from both sides of the processing chamber 20. It can be carried out. Therefore, the efficiency of maintenance work can be improved.

Although the two embodiments of the present invention have been described above, the present invention can be embodied in modes other than the above-described two embodiments. For example, the first
In the embodiment, the chamber lid 6 composed of one sheet is provided.
Is openably connected to the processing chamber 2, but as shown in FIG. 6, the chamber lid 6 is divided into two by a straight line along the sliding direction L, and each of the divided portions 601 and 602 is moved along the sliding direction L. May be attached to the processing chamber 2 so as to be rotatable about the respective axes. In this case, it is preferable that the rotation axis of each of the divided portions 601 and 602 is set at the center of the processing chamber 2 in the direction orthogonal to the sliding direction L.

As shown in FIG. 7, the chamber lid 6 is divided into two parts by a straight line perpendicular to the sliding direction L, and each of the divided parts 603 and 604 is
Alternatively, it may be rotatably attached to the upper end of the side wall 24 on the near side. Even when the configuration shown in FIGS. 6 and 7 is adopted, the maintenance worker can open the chamber lid 6 from both sides of the processing chamber 2 and perform maintenance work in the processing chamber 2. it can.

Further, in the above-described first embodiment, the chamber lid 6 is provided with two hinges 61 and 62, respectively.
Is connected to the upper ends of the side walls 23 and 25 along the sliding direction L of the processing chamber 2, but may be connected to the side walls 23 and 25 by one hinge each. As shown in FIG. 8, for example, as a hinge used in this configuration, a detachable piece 91 formed long in the sliding direction L, and near both ends of the detachable piece 91,
One having two fixed pieces 92 and 93 rotatably coupled to the detachable piece 91 can be exemplified.

As a structure for allowing the chamber cover 6 to be opened from both sides, in addition to the structure described with reference to FIGS. 1 and 4, for example, a door described in Japanese Patent Application Laid-Open No. Hei 7-120135. An opening and closing device (for example, see FIG. 10 of the above-mentioned publication) can also be applied. Also, applying the structure of the refrigerator door of Japanese Utility Model Publication No. 37-5486, for example, one end of a frame is rotatably connected to the upper end of the side wall 23 of the processing chamber 2, and the other end of the frame is By connecting the chamber lid 6 to the edge, the upper opening 27 of the processing chamber 2 may be opened from both sides of the processing chamber 2.

Further, the structure of the refrigerator door disclosed in Japanese Utility Model Publication No. 37-7484 is applied, and the end faces 6A, 6B of the chamber lid 6 are formed.
, Two bearings may be provided, and bearings to which the two rotating shafts can be attached and detached may be provided at the upper ends of the side walls 23 and 25 of the processing chamber 2. According to this configuration, the engagement between the one rotation shaft and the bearing can be released, and the chamber lid 6 can be lifted around the other rotation shaft. Can be opened.

Further, in the above-described embodiment, a glass substrate for a liquid crystal display device is exemplified as an example of a substrate to be processed. However, the present invention is not limited to the case where a glass substrate for a photomask or a semiconductor wafer is processed. It is also applicable to an apparatus for performing

In addition, various design changes can be made within the technical scope described in the claims.

[Brief description of the drawings]

FIG. 1 is a perspective view illustrating a configuration of a substrate processing apparatus according to a first embodiment of the present invention.

FIG. 2 is a cross-sectional view of the substrate processing apparatus taken along a cutting line II-II in FIG.

FIG. 3 is a perspective view illustrating a configuration of a slide member.

FIG. 4 is a cross-sectional view showing another configuration example for making the chamber lid double-openable.

FIG. 5 is a diagram for describing a second embodiment of the present invention.

FIG. 6 is a diagram for explaining a modification of the first embodiment.

FIG. 7 is a diagram for explaining another modification of the first embodiment.

FIG. 8 is a view for explaining another configuration example of the hinge for connecting the chamber lid and the processing chamber.

FIG. 9 is a perspective view illustrating a configuration of a conventional substrate processing apparatus.

[Explanation of symbols]

 Reference Signs List 1 exterior cover (frame member) 2 processing chamber (processing chamber) 26 opening (opening for maintenance) 4 sliding member 6, 60 chamber lid (lid) L sliding direction

Claims (2)

[Claims] A processing chamber having an opening for maintenance on an upper surface, for accommodating a substrate therein for performing processing; a lid for opening and closing an opening on an upper surface of the processing chamber; A sliding member for sliding the processing chamber with respect to a predetermined frame member, wherein the processing chamber and the lid are configured such that the processing chamber is pulled out from the frame member, A substrate processing apparatus configured to perform maintenance of the inside of the processing chamber from both sides through the opening. 2. The processing chamber is connected to the processing chamber so that the processing chamber can be opened and closed from both sides of the processing chamber in a sliding direction of the processing chamber when the processing chamber is pulled out of the frame member. The substrate processing apparatus according to claim 1, wherein: