JPH11326626A - Production of color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve the quality of a color filter by obtaining a process for producing the color filter which is capable of well removing development residues, even with a large-diameter substrate without making stages complicated. SOLUTION: This process for producing a color filter consists in subjecting a photosensitive colored pigment resist applied on the substrate 1 to pattern exposure via an optical mask, then applying a developer 7 by using high-pressure fine injection nozzles 9a, 8b to the photosensitive colored pigment resist. At this time, the substrate 1 is left standing for a prescribed period of time after the developer 7 has been applied and is then rotated, and fluid is sprayed in mist form to the substrate 1 from 2 or more units of the high-pressure fine injection nozzles 9a, 8b.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter using a photosensitive colored pigment resist, and more particularly to an improvement in a method for removing a development residue.

[0002]

2. Description of the Related Art Hitherto, color filters used in solid-state imaging devices and the like have generally been formed by a dyeing method for dyeing an organic film such as casein or gelatin. However, in recent years,
Due to demands for improving characteristics such as light resistance, heat resistance, and chemical resistance of LCDs and CCDs, the number of methods for manufacturing color filters using a photosensitive colored pigment resist has increased in place of the dyeing method. This photosensitive colored pigment resist uses a finely divided pigment as a pigment, and the pigment satisfies various characteristics required for LCDs and CCDs, and thus has become widely used.

In a method of manufacturing a color filter using a photosensitive color pigment resist, first, a UV curable photosensitive color pigment resist is applied on a substrate such as glass, and ultraviolet rays are applied to the resist through an optical mask. Irradiation and pattern exposure. Next, by performing a developing process by spraying a developing solution onto the pattern exposure surface on the substrate by, for example, a spray developing method or the like, only a portion not masked by the optical mask remains on the substrate to obtain a colored pattern. .

[0004]

However, it is known that a photosensitive colored pigment resist containing a pigment has some problems. One of them is that pigment particles are hard to be miniaturized. Originally, pigment particles have a large particle size,
Even though it can be used for LCDs, there is a problem that the size is too large for the color filters of the CCD, making it difficult to use.
Another problem is that even if the pigment particles can be made smaller, they will agglomerate when they are mixed in the photosensitive solution solvent,
That is, it becomes a so-called gel. Therefore, various exposure and development methods have been proposed in order to eliminate the disadvantageous characteristics of the photosensitive color pigment resist.

For example, in a method for manufacturing a color filter disclosed in Japanese Patent Publication No. 2-118662, a transparent developer is inclined by spraying a pressurized developer to perform development. In the method of manufacturing a color filter disclosed in Japanese Patent Publication No. 4-314002, the developing process is performed at least twice with developing solutions having different concentrations. This is to prevent the photosensitive color pigment resist containing the pigment from leaving particles as residues on the substrate and causing black defects.
As a means for removing this residue, JP-B-63-29824
In the method for manufacturing a color filter disclosed in Japanese Patent Publication No.
After the development, an ultraviolet ozone treatment or an oxygen plasma treatment is performed to decompose and remove the organic pigment fine particles remaining on the substrate.
According to this method, although the pigment residue can be removed, the number of operations for simultaneously shaving the color filter increases, and there is a problem that the process becomes complicated.

When removing the pigment residue using a high-pressure jet, if the target substrate is too large (about 8 inches), it is difficult to cover the entire substrate with one nozzle. That is, if the jet fluid is enlarged so that the entire substrate can be covered by one high-pressure jet, the pressure uniformity deteriorates. As a result, various problems such as residue residue and peeling occurred.

The present invention has been made in view of the above circumstances, and provides a method of manufacturing a color filter capable of removing development residues satisfactorily even on a large-diameter substrate without complicating the process. An object is to improve the quality of a color filter.

[0008]

According to a first aspect of the present invention, there is provided a method of manufacturing a color filter, comprising the steps of: exposing a photosensitive color pigment resist applied on a substrate to a pattern through an optical mask; And then applying a developing solution to the photosensitive color pigment resist using a high-pressure fine spray nozzle. In the method for manufacturing a color filter, after applying the developing solution and leaving it for a predetermined time, rotating the substrate and A fluid is sprayed from the high-pressure fine jet nozzle to the substrate in a spray state.

In this method of manufacturing a color filter, a fluid is sprayed onto a rotating substrate from two high-pressure fine spray nozzles, so that a developing process removes development residues in a series of processes in a rinsing step. Becomes possible. At this time, by spraying the fluid in a spray form from two or more high-pressure fine spray nozzles, it is possible to perform the spraying at a suitable pressure uniformly over a wide range.

According to a second aspect of the invention, there is provided a color filter manufacturing method.
The high-pressure fine injection nozzle is one of a one-fluid nozzle that applies pressure to pure water and sprays it in a mist state, and a two-fluid nozzle that mixes and sprays pure water and a gas.

In this method of manufacturing a color filter, when a one-fluid nozzle is used as the high-pressure fine jet nozzle, pure water is jetted in a spray state by pressure, and water particles collide with the development residue. Further, when a two-fluid nozzle is used as the high-pressure fine injection nozzle, pure water is mixed with gas and injected in a spray form,
Water particles collide with the development residue.

According to a third aspect of the invention, there is provided a color filter manufacturing method.
The height from the substrate to the discharge port of the high-pressure fine spray nozzle is in a range of 3 to 25 cm, and pure water is blown perpendicular to the substrate surface.

In this method of manufacturing a color filter, the height from the substrate to the discharge port of the high-pressure fine spray nozzle is 3 to 2
When the diameter is in the range of 5 cm, the spray pressure of the fluid is easily optimized, the removal effect is maximized, and the pattern does not peel off.

According to a fourth aspect of the present invention, there is provided a color filter manufacturing method.
The first high-pressure fine spray nozzle sprays pure water in the form of fine spray from a center of the substrate to a first circular region having a predetermined radius,
The second high-pressure fine spray nozzle sprays pure water in the form of fine spray onto a second circular area centered on the injection center between the center and the end of the substrate, and the first circular area and the A second circular region partially overlaps, and a sum of a radius of the first circular region and a diameter of the second circular region is at least larger than a radius of the substrate. .

In this method of manufacturing a color filter, the two high-pressure fine jet nozzles can cover the entire area in the radial direction of the substrate, and the boundary between the areas covered by the respective high-pressure fine jet nozzles has a non-contact area. No injection area occurs.

According to a fifth aspect of the present invention, there is provided a color filter manufacturing method comprising:
The first high-pressure fine injection nozzle and the second high-pressure fine injection nozzle simultaneously perform injection, and the pure water pressure at each nozzle is 20 to 80 kgf / cm ² , and the pure water flow rate is 50 to 500 ml / min. It is characterized by being a range.

In this method for producing a color filter, pure water is jetted at an optimum pressure and flow rate, so that water particles accurately collide with a development residue and the removal rate is improved.

According to a sixth aspect of the present invention, there is provided a color filter manufacturing method.
When the high-pressure fine spray nozzle is operated, the substrate performs a constant rotational movement in a range of 30 to 500 rpm.

In this method for manufacturing a color filter, the substrate is rotated at an optimum rotation speed, so that the development residue is completely removed, and no dropout occurs. Further, the atmosphere of the developing unit does not deteriorate.

According to a seventh aspect of the present invention, there is provided a color filter manufacturing method,
The injection time of the high-pressure fine injection nozzle is 30 to 180 s
ec.

In this method of manufacturing a color filter, the high-pressure fine jet nozzle is jetted for an optimum jetting time, so that the residue can be sufficiently removed and the pattern does not peel off.

[0022] The method of manufacturing a color filter according to claim 8 is as follows.
The fluid pressure, flow rate, and nozzle height of the first high-pressure fine injection nozzle and the second high-pressure fine injection nozzle are individually changed.

In this method of manufacturing a color filter, the fluid pressure, flow rate, and nozzle height of the first and second high-pressure fine injection nozzles are individually changed to achieve different residue removal conditions for each position of the high-pressure fine injection nozzle. On the other hand, flexible adjustment becomes possible.

[0024]

Preferred embodiments according to the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a view for explaining the procedure of the manufacturing method according to the present invention, and FIG. 2 is a view for explaining the injection conditions of the high-pressure fine injection nozzle of FIG.

As shown in FIG. 1A, a substrate (for example, a silicon wafer) 1 onto which a predetermined pattern has been transferred by applying a photosensitive coloring pigment resist and irradiating ultraviolet rays through an optical mask. Is placed and fixed on the rotary table 3. The rotary table 3 has a vacuum suction port on the upper surface, and is configured to suck and fix the lower surface of the substrate 1. The rotary table 3 is rotated via a vertical shaft 3a by, for example, a pulse motor capable of controlling the rotation speed.

A developing solution 7 is sprayed onto the upper surface of the substrate 1 fixed to the rotary table 3 by using a developing solution application nozzle 5 to apply the solution. Next, after the application of the developing solution 7, as shown in FIG. 1B, the substrate 1 is left for a certain period of time to accelerate the development reaction of the photosensitive color pigment resist on which the pattern has been transferred.

After leaving for a certain period of time, as shown in FIG. 1C, the rotation of the turntable 3 is started, and the two high-pressure fine spray nozzles (the first high-pressure fine spray nozzle 9a and the second high-pressure fine spray nozzle 9a, Pure water and gas are sprayed from the fine spray nozzle 9b) and sprayed on the upper surface of the substrate 1.

The high-pressure fine spray nozzles 9a and 9b are either one-fluid nozzles for spraying pure water with pressure and spraying them in mist, or two-fluid nozzles for mixing pure water and gas for spraying. Good. When the high-pressure fine injection nozzles 9a and 9b are two-fluid nozzles, the gas sprayed with pure water from the high-pressure fine injection nozzles 9a and 9b uses nitrogen having a large inert element or dry air.

As shown in FIG. 2, the first high-pressure fine spray nozzle 9a sprays pure water in the form of fine spray from the center of the substrate 1 to a first circular area c1 having a predetermined radius r1. The second high-pressure fine spray nozzle 9b sprays pure water in the form of fine spray onto a second circular area c2 having a predetermined radius r2 and centered on the spray center located between the center and the end of the substrate 1. At this time, the high-pressure fine injection nozzles 9a and 9b perform injection so that the first circular area c1 and the second circular area c2 partially overlap (overlap). In addition, high-pressure fine injection nozzles 9a, 9b
Performs ejection in a range where the sum of the radius r1 of the first circular region c1 and the diameter of the second circular region c2 is at least larger than the radius R of the substrate 1.

In this embodiment, the first circular area c1 and the second circular area c2 have substantially the same radius. The injection center of the second high-pressure fine injection nozzle 9b is located near the circumference of the first circular area c1. Therefore, between the high-pressure fine injection nozzles 9a and 9b, two circular areas c
1, an overlapping jet intersection 11 of c2 is formed.

As described above, in the rinsing step after the application of the developing solution 7, the fluid (pure water or the like) is sprayed onto the substrate 1 in a spray state, so that the developing solution 7 is removed while the resist or pigment fine particles are removed. Perform removal.

At this time, there are optimum values for various conditions for spraying the fluid. The conditions mainly include the height h from the substrate 1 to the discharge ports of the high-pressure fine jet nozzles 9a and 9b, the amount of intersection of the jet intersections 11, the pressure of pure water, the flow rate of pure water, the rotation speed of the substrate 1, There are driving times of the substrate 1 and the high-pressure fine jet nozzles 9a and 9b.

When these conditions exceed the optimum values, the pattern is peeled off while the development residue is removed. Further, if the value does not reach the optimum value, the development residue cannot be sufficiently removed. That is, if the height h of the high-pressure fine injection nozzles 9a and 9b is too high, the blowing pressure of the fluid becomes small, and the effect of removing the residue is reduced. On the other hand, if the distance is too close, the pressure on the photosensitive color pigment resist will increase, and the pattern of the color filter will be peeled off.

When the pure water pressure and the liquid amount are not appropriate and the spray is mainly composed of water, the water particles do not accurately collide with the developing residue,
The removal rate decreases. Conversely, even when the spray is mainly composed of gas, the water particles do not hit the development residue, and the removal rate decreases.

If the rotation of the substrate 1 is slow, the removal of the entire development residue will not be widespread, and if it is too early, it will be missed and the atmosphere of the development unit will be deteriorated.

If the rotation time of the substrate 1 is short, the removal of the entire development residue is not sufficiently performed, and if the rotation time is long, the pattern is peeled off.

If the injection time of the high-pressure fine injection nozzles 9a and 9b is short, the residue cannot be sufficiently removed, and if it is too long, pattern peeling may occur.

If the widening width of the high-pressure fine spray nozzles 9a and 9b is too large, the pressure of pure water is reduced, and the removing effect is reduced. Conversely, if it is too small, it becomes localized and causes peeling of the color filter. As a guide, the radius size of the substrate 1 is suitable.

The second high-pressure fine injection nozzle 9b is located between the first high-pressure fine injection nozzle 9a and the end of the substrate. However, if the second high-pressure fine injection nozzle 9b is too close to the center, the effect of removing the development residue at the end decreases.
On the other hand, if it is too close to the end, the spread of the jet jet is suppressed, and the jet intersection portion 11 becomes small, which causes a residue or peeling.

In the method of manufacturing the color filter according to the present embodiment, by setting these various conditions to predetermined values, the resist can be removed while removing the developing solution and preventing the pattern from peeling even on a large-diameter substrate. The removal of the development residue composed of fine particles and pigment fine particles was made sufficient. Further, in the present embodiment, these predetermined values are obtained from those that are suitable for actually manufacturing a color filter.

As a result, the substrate 1 is 8 inches (about 2 inches in diameter).
00 mm) In the case of a silicon wafer, various condition values were as follows. That is, the high-pressure fine spray nozzles 9a, 9
The height b to the discharge port was in the range of 3 to 25 cm. The pressure of pure water was 20 to 80 kgf / cm ² , and the flow rate of pure water was 50 to 500 ml / min.
Substrate 1 when high-pressure fine spray nozzles 9a and 9b are operating
Was a constant rotational movement in the range of 30 to 500 rpm. When the substrate 1 is an 8-inch silicon wafer, the rotation time of the substrate 1 and the high-pressure fine jet nozzles 9a, 9
The spraying time from b was in the range of 30 to 180 seconds. The spread width of the high-pressure fine injection nozzles 9a and 9b is 110
mm or more and within 120 mm.

As described above, according to the above-described method of manufacturing a color filter, when a color filter of a solid-state imaging device or a liquid crystal display device is formed using a photosensitive colored pigment resist,
Pure water is sprayed from the high-pressure fine spray nozzles 9a and 9b while rotating the substrate 1 using two high-pressure fine spray nozzles 9a and 9b, so that the development residue can be reduced without complicating the process. It can be removed well. Then, since pure water is sprayed in a spray state, a new liquid can be sprayed at all times, and the efficiency of removing the development residue can be increased. As a result, the removal time can be shortened.

By setting the various condition values for spraying the sprayed pure water within the above-described optimum range, the removal efficiency of the development residue can be maximized while preventing the pattern peeling.

The high-pressure fine jet nozzles 9a and 9b are reciprocated horizontally at the same time as the rotation of the substrate 1 at a constant height h from the end of the substrate 1 at least in a range passing through the center of rotation. It may be something.

[0045]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, specific embodiments of the manufacturing method according to the present invention will be described. 8 inch silicon wafer (200m diameter
m), a UV-curable photosensitive coloring pigment resist was applied to form a resist layer, and then a pre-baking treatment was performed at a predetermined heating temperature. Next, the pattern was transferred to the resist layer by irradiating ultraviolet rays through an optical mask. The wafer after pattern transfer is placed and fixed on a rotary table,
The developer was applied by a developer application nozzle.

After the application of the developing solution, the developing reaction of the resist layer was allowed to proceed by being left for a certain period of time. Thereafter, the wafer was rotated at 100 rpm, and simultaneously, spraying of pure water from the two high-pressure fine spray nozzles was started. At this time, the conditions for spraying pure water were as follows. Rotation time 60 sec Spray spreading width w 110 to 120 mm Position of first high-pressure fine injection nozzle Center of wafer Position of second high-pressure fine injection nozzle Near circumference of first circular area Nozzle height h 15cm ・ Pure water pressure 40kgf / cm ²・ Liquid volume 300ml / min ・ Driving time of high pressure fine injection nozzle 60sec

After the wafer and the high-pressure fine spray nozzle were driven under the above conditions, the driving of the wafer and the high-pressure fine spray nozzle was stopped, and the wafer was washed with a pure water nozzle shower to complete the residue removal process.

FIG. 3 shows a color filter pattern formed under the above optimization conditions and a color filter pattern formed before the optimization of the conditions. Compared to the color filter pattern 13a before optimization shown in FIG.
The color filter pattern 13b after optimization shown in FIG.
It was found that the amount of the residue 15 was smaller and was smaller. The size of the residue in FIG.
It was 0.1 to 0.3 μm.

Further, the nozzle height h and the pure water injection time were variously changed, and the relationship between these values and the occurrence of defects was examined.
The number of defective pixels was determined by performing white display using a CCD having predetermined pixels (350,000 pixels) and generating defective pixels. The case where the number of defective pixels is about 100 or less is regarded as a good practical range of the color filter.

As a result, the height h of the two nozzles is as shown in FIG.
As shown in FIG. 5, the number of defective pixels is about 100 at 3 cm, the number of defective pixels is 10 at 15 cm,
cm, the number of defective pixels was about 80. That is, it was found that the optimum value of the nozzle height h was in the range of 3 to 25 cm.

As shown in FIG. 6, the intersection amount at the jet intersection is 10 mm, the number of defective pixels is about 100, and the intersection amount is 50 cm.
With, the number of defective pixels was a minimum of 10 and at 80 cm, the number of defective pixels was about 25. That is, it was found that the optimal value of the amount of intersection was in the range of 10 to 80.

When the substrate is an 8-inch silicon wafer, the rotation time of the wafer and the time of spraying from the high-pressure fine spray nozzle are 30 seconds and the number of defective pixels is 1 as shown in FIG.
00, the number of defective pixels becomes 25 in 60 seconds,
The number of defective pixels was minimized to 10 in 100 seconds, and was reduced to about 40 in 180 seconds. That is, the injection time of pure water is 30
It has been found that a range of about to 180 seconds is an optimum value.

[0053]

As described above in detail, the method for manufacturing a color filter according to the present invention is applicable to the formation of a color filter for a solid-state imaging device or a liquid crystal display device using a photosensitive colored pigment resist. Using a high-pressure fine jet nozzle, spraying pure water in a spray while rotating the substrate makes it possible to remove development residues even in large-diameter substrates by a series of processes without complicating the process. can do. As a result, the quality of the color filter can be improved, and the yield at the time of manufacturing the color filter can be improved.

[Brief description of the drawings]

FIG. 1 is a diagram illustrating a procedure of a manufacturing method according to the present invention.

FIG. 2 is a diagram illustrating injection conditions of a high-pressure fine injection nozzle of FIG. 1;

FIG. 3 is a comparison diagram of a color filter from which residues are removed under conditions before optimization and a color filter from which residues are removed under conditions after optimization.

FIG. 4 is a correlation diagram showing a relationship between the height of a first high-pressure fine injection nozzle and the number of defects.

FIG. 5 is a correlation diagram showing a relationship between the height of a second high-pressure fine injection nozzle and the number of defects.

FIG. 6 is a correlation diagram showing a relationship between the amount of intersection at a jet intersection and the number of defects.

FIG. 7 is a correlation diagram showing the relationship between the two-fluid ejection time and the number of defects.

[Explanation of symbols]

Reference Signs List 1 ... Substrate, 7 ... Developer, 9a ... First high-pressure fine spray nozzle (high-pressure fine spray nozzle), 9b ... Second high-pressure fine spray nozzle (high-pressure fine spray nozzle)

Claims (8)

[Claims] 1. A method of manufacturing a color filter, comprising pattern-exposing a photosensitive color pigment resist applied on a substrate through an optical mask and applying a developing solution to the photosensitive color pigment resist using a high-pressure fine jet nozzle. In the method, after the developer is applied and left for a predetermined time, the substrate is rotated, and a fluid is sprayed from the two or more high-pressure fine jet nozzles onto the substrate in a spray form. Method. 2. The high-pressure fine spray nozzle is one of a one-fluid nozzle that applies pressure to pure water and sprays it in a mist state, and a two-fluid nozzle that mixes and sprays pure water and gas. The method for manufacturing a color filter according to claim 1, wherein: 3. A height from the substrate to a discharge port of the high-pressure fine spray nozzle is in a range of 3 to 25 cm, and pure water is blown perpendicular to the substrate surface. 2. The method for producing a color filter according to 1. 4. The first high-pressure fine spray nozzle sprays pure water in a fine spray form from a center of the substrate to a first circular region having a predetermined radius, and the second high-pressure fine spray nozzle includes: Pure water is sprayed in the form of fine spray to a second circular area centered on the injection center between the center and the end of the first circular area and the second circular area partially overlap, 4. The method according to claim 3, wherein the sum of the radius of the first circular region and the diameter of the second circular region is at least larger than the radius of the substrate. 5. The first high-pressure fine injection nozzle and the second high-pressure fine injection nozzle simultaneously perform injection, and the pure water pressure at each nozzle is 20 to 80 kgf / c.
m ^2, the method for producing a color filter according to claim 4, wherein the pure water flow rate is in the range of 50 to 500 ml / min. 6. The method for manufacturing a color filter according to claim 5, wherein the substrate performs a constant rotational movement in a range of 30 to 500 rpm during the operation of the high-pressure fine spray nozzle. 7. The injection time of the high-pressure fine injection nozzle is 3
7. The method according to claim 6, wherein the time is in a range of 0 to 180 sec. 8. The color filter according to claim 1, wherein the fluid pressure, flow rate, and nozzle height of the first high-pressure fine injection nozzle and the second high-pressure fine injection nozzle are individually changed. Production method.