JPH11288912A - Scrubbing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a scrubbing device which can scrub a scrubbed body at high level without damaging it. SOLUTION: On one circumferential edge part side of a recessed part 21 of an abutting member 1, two guide grooves 3 and 4 extending in both the lengthwise edge parts of the abutting member 1 are provided at a proper distance in the circumferential direction. Both the guide grooves 3 and 4 form a nearly V-shape, which have its center part positioned closer to the bottom part side of an arc than both the end parts. On the other circumferential edge side of the recessed part 2, a groove 6 which is slightly shorter than the size between both the edge parts is provided along the length of the abutting member 1, and plural holes for jetting scrubbing liquid are bored in the bottom part of the groove 6 at proper distances along the length. Each hole communicates with a liquid path 8 reaching the outside surface of the abutting member 1 and a liquid feed pipe 9, which supplies the scrubbing liquid with proper pressure, is coupled with the part which surrounding the opening of the liquid feed path 8 bored in the external surface of the abutting member 1.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a scrub cleaning apparatus for bringing a roll brush into contact with a surface of a semiconductor wafer or a substrate for a photomask or the like and mechanically cleaning the roll brush.

[0002]

2. Description of the Related Art When manufacturing VLSI and ULSI devices, it is important to remove fine particles (particles) adhered to the surface of a semiconductor wafer or a photomask substrate. In order to remove contaminants such as particles, organic substances, inorganic substances or microorganisms, there are a cleaning apparatus for chemically removing contaminants by a cleaning liquid or a cleaning gas, and a cleaning apparatus for mechanically removing contaminants by collision or vibration. Both types of cleaning equipment have been developed depending on the type of contaminants. Since it is difficult to remove the above-described particles by a chemical cleaning device, a scrub cleaning device that mechanically removes the particles by rolling a cylindrical roll brush on the surface of the substrate is used.

FIG. 8 is a schematic side view showing the structure of a scrub cleaning device disclosed in Japanese Utility Model Publication No. 6-9949.
In the figure, W is a disk-shaped wafer. The wafer W is mounted on a circular trapezoidal chuck 40, and the chuck 40 is rotatably supported by a rotating shaft 41 suspended at the center of the lower surface. A hole communicating with a suction device (not shown) is formed in a portion of the chuck 40 facing the wafer W,
The wafer W is fixed to the chuck 40 by suction by the suction device.

[0004] On the chuck 40, a cylindrical roll brush 30 provided with a woven fabric of synthetic fibers woven in a mohair shape is provided all around.
The central axis is arranged in the diameter direction of the chuck 40. The roll brush 30 is attached near one end of the rod-shaped arm member 33 so that the center axis of the roll brush 30 and the arm member 33 are orthogonal to each other, and is rotated in a direction indicated by an arrow by a driving device (not shown). Has become. On the wafer W, at a position slightly separated from the roll brush 30, a substantially nozzle-shaped first nozzle 31 is provided, and pure water is supplied from the first nozzle 31 to the surface of the wafer W.

[0005] At a position separated from the other end of the arm member 33 by a predetermined distance, a water receiving tank 36 having a drain pipe 37 connected to the bottom is disposed. The arm member 33 is cantilevered by a drive shaft 34 that is mounted near the other end, and the arm member 33 and the roll brush 30 are rotated by the drive shaft 34 so that the roll brush 30 It is rotated until it is inserted at the depth position. Above the roll brush 30 inserted into the water receiving tank 36, a substantially L-shaped second nozzle 32 for injecting pure water to the roll brush 30 has a tip portion at a predetermined distance from the peripheral surface of the roll brush 30. It is arranged in parallel with the roll brush 30 at a distance. The tip of the second nozzle 32 has substantially the same length as the roll brush 30, and a plurality of water holes are opened at an appropriate distance in the longitudinal direction.

[0006] At the bottom of the water receiving tank 36, a sword-shaped auxiliary tool 47 having a plurality of pins 46, 46,... Erected on a top surface of a rectangular pedestal 45 having substantially the same length as the roll brush 30 is provided. The peripheral surface of the roll brush 30 inserted into the water receiving tank 36 is brought into contact with the pins 46 of the auxiliary tool 47.

In order to clean the surface of the wafer W with such a scrub cleaning apparatus, the rotating shaft 41 is rotated to rotate the chuck 40 and the wafer W suction-fixed to the chuck 40, and the roll brush 30 Rotate
Further, pure water is supplied from the first nozzle 31 onto the wafer W.
Then, the drive shaft 34 is driven to rotate the arm member 33 and the roll brush 30 to bring the roll brush 30 into contact with the wafer W, thereby mechanically cleaning particles fixed on the surface of the wafer W.

When the cleaning of the wafer W is completed, the drive shaft 34
By rotating the arm member 33 and the roll brush 30, the roll brush 30 is inserted into the water receiving tank 36. At this time, after the water in the water receiving tank 36 is drained from the drain pipe 37, pure water is supplied from the second nozzle 32 to the water receiving tank 36 until it reaches an appropriate depth. Then, while rotating the roll brush 30, pure water is ejected from the second nozzle 32 and the peripheral surface of the roll brush 30 is brought into contact with the pins 46, 46,.
Particles attached to the peripheral surface of the roll brush 30 are removed.

During this time, the cleaned wafer W is
, And the unwashed wafer W is fixed on the chuck 40 by suction. When the cleaning of the roll brush 30 is completed, the arm member 33 and the roll brush 30 are rotated toward the wafer W by the drive shaft 34, and the wafer W is cleaned by the roll brush 30 as before.

[0010]

SUMMARY OF THE INVENTION
In the scrub cleaning apparatus disclosed in JP-A-6-9491, particles removed from the object to be cleaned by cleaning the object to be cleaned, such as a wafer, are taken into the peripheral surface of the roll brush, and the particles are rotated by the rotation of the roll brush. Since the particles in the portion are re-fixed to the surface of the object to be cleaned, there is a problem that the degree of cleaning of the object to be cleaned is low. In addition, particles taken into the roll brush abut on the object to be cleaned by rotation of the roll brush, and the surface of the object to be cleaned may be damaged.

The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a cleaning solution in which a contact member is brought into contact with a brush portion of a roll brush during cleaning of an object to be cleaned, and the brush portion is impregnated. An object of the present invention is to provide a scrub cleaning device capable of highly cleaning without damaging an object to be cleaned by employing a configuration in which the object is scattered.

[0012]

A scrub cleaning apparatus according to a first aspect of the present invention rotates a roll brush provided with a cylindrical brush portion, injects a cleaning liquid into a cleaning portion of an object to be cleaned, and cleans the brush portion. In a scrub cleaning apparatus for cleaning an object to be cleaned by contacting a cleaning portion of the object to be cleaned, a contact member for contacting a brush portion of the roll brush is provided. The cleaning device is characterized in that the member is brought into contact with the brush portion so that the cleaning liquid impregnated in the brush portion is scattered.

In a scrub cleaning apparatus according to a second aspect of the present invention, a roll brush provided with a cylindrical brush portion is rotated to inject a cleaning liquid into a cleaning portion of the object to be cleaned, and the brush portion is cleaned by the cleaning portion of the object to be cleaned. A scrubbing device for cleaning the object to be cleaned by contacting the brush member with a contact member having a semi-cylindrical concave portion to be brought into contact with the brush portion; A support member for supporting the contact member such that the concave portion comes into contact with the brush portion in an appropriate region except for a region in contact with the cleaning portion of the cleaning object, wherein the concave portion has a cleaning liquid attached to the concave portion; And a guide groove for guiding the concave portion to the edge of the concave portion in the axial direction of the roll brush.

[0014] The scrub cleaning apparatus according to the third invention comprises a second scrub cleaning apparatus.
In the invention, the concave portion is longer than a dimension of the roll brush in the axial direction.

A scrub cleaning apparatus according to a fourth aspect of the present invention comprises
Or in the third invention, the brush portion is cylindrical,
A radius of curvature of the concave portion is smaller than a radius of an outer periphery of the brush portion.

A scrub cleaning apparatus according to a fifth aspect of the present invention comprises
In any one of the fourth to fourth inventions, the guide groove is formed in a substantially V-shape extending in the rotation direction of the roll brush.

[0017] The scrub cleaning apparatus according to the sixth invention comprises a second scrub cleaning apparatus.
In any one of the fifth to fifth aspects, a plurality of the guide grooves are provided at a distance in a circumferential direction of the roll brush.

The scrub cleaning apparatus according to the seventh invention is a
In any one of the sixth to sixth inventions, a hole for injecting a cleaning liquid is provided at a position of the concave portion on the upstream side of the guide groove in the rotation direction of the roll brush.

The scrub cleaning apparatus according to the eighth invention is characterized in that
In any one of the thirteenth to seventh aspects, a projection is provided in the recess.

FIG. 7 is a schematic perspective view showing an example of the embodiment of the present invention, in which S is a disk-shaped object to be cleaned.
On the cleaning surface side of the article to be cleaned S, a roll brush 10 provided with a brush portion 12 around the entire circumference of a cylindrical tube portion 11 is provided.
The central axis 10 is arranged so as to be on the diameter of the object S to be cleaned. The dimension in the axial direction of the roll brush 10 is substantially the same as the diameter of the object S to be cleaned, and the roll brush 10 is configured such that the peripheral surface of the brush unit 12 is in contact with one surface of the object S to be cleaned.

In the area around the roll brush 10 and on the opposite side of the object S to be cleaned, a semi-cylindrical contact member 1 is arranged with its concave portion 2 in contact with the brush portion 12. . Recess 2
A guide groove 3 is provided on the inner surface of the concave portion 2 toward both edges of the roll brush 11 in the axial direction of the roll brush 11.

The cleaning object S is mechanically cleaned by rotating the roll brush 10 while supplying a cleaning liquid such as pure water to the cleaning surface of the cleaning object S. At this time, the sewage liquid containing particles removed from the cleaning surface of the cleaning target S penetrates into the brush portion 11 of the roll brush 10, but the brush portion 11 is brought into contact with the contact member 1 by the impact of the brush portion. The sewage liquid that has entered the part 11 is scattered from the roll brush 10.

In the scrub cleaning device of the first invention,
As described above, the brush portion is brought into contact with the contact member, and the sewage liquid that has entered the brush portion due to the impact is scattered from the roll brush. Therefore, since the roll brush is purified, the sewage liquid that has entered the brush portion due to the rotation of the roll brush is suppressed from adhering to the object to be cleaned, and the cleaning degree of the object to be cleaned is improved, and the sewage liquid in the sewage liquid is improved. The object to be cleaned is prevented from being damaged by particles.

In the scrub cleaning device of the second invention,
As shown in FIG. 7, the sewage liquid that has entered the brush portion 12 is scattered by the impact of the brush portion 12 abutting on the contact member 10. In addition, the brush portion 12 that has entered the recess 2 forms the guide groove 3.
Is reached, so-called rubbing and washing is performed there, and the remaining sewage liquid enters the guide groove 3 by the rotational force of the roll brush 10, and is discharged from both ends of the guide groove 3 to the outside. This further suppresses the sewage liquid from adhering to the object to be cleaned, improves the degree of cleaning of the object to be cleaned, and prevents damage to the object to be cleaned by particles in the sewage liquid.

In the scrub cleaning apparatus of the third invention,
As shown in FIG. 7, since the concave portion 2 is longer than the axial length of the roll brush 10, contamination that has entered the brush portion 10 from the entire circumference of the brush portion 10 as the roll brush 10 rotates. The water can be removed, and the re-infiltration of the removed contaminated water into the brush portion 12 is prevented.

In the scrub cleaning apparatus of the fourth invention,
Since the radius of curvature of the concave portion of the contact member is smaller than the radius of the outer periphery of the cylindrical brush portion, the density of the brush portion that has entered the concave portion is high, and the massage and washing effect is high. As a result, the degree of purification of the brush part is improved, and the degree of cleaning of the object to be cleaned is further improved.

In the scrub cleaning apparatus of the fifth invention,
As shown in FIG. 7, since the guide groove 3 is formed in a substantially V-shape that expands in the rotation direction of the roll brush 10, the sewage liquid that has entered the brush portion 12 is easily scattered from the roll brush 10, and The purification degree of 12 is further improved.

In the scrub cleaning apparatus of the sixth invention,
Since a plurality of guide grooves are provided at a distance in the circumferential direction of the roll brush, the degree of purification of the brush portion is further improved.

[0029] In the scrub cleaning apparatus of the seventh invention,
The cleaning liquid is injected into the brush portion from a hole provided in the concave portion at a position upstream of the guide groove in the rotation direction of the roll brush.
Thereby, the degree of purification of the brush part can be further improved by diluting the sewage liquid entering the brush part and causing particles in the sewage liquid entering the brush part to float.

[0030] In the scrub cleaning apparatus of the eighth invention,
The protrusions provided in the recesses of the contact member can also scatter the sewage liquid that has entered the brush portion, and the degree of purification of the brush portion is further improved.

[0031]

Embodiments of the present invention will be specifically described below with reference to the drawings. (Embodiment 1) FIG. 1 is a side view showing a main part of a scrub cleaning apparatus according to the present invention, and FIG. 2 is a plan view of the scrub cleaning apparatus shown in FIG. A pair of roll brushes 1
0, 10 have their central axes arranged vertically parallel, and a disk-shaped wafer W having a diameter substantially the same as their axial length is held between the two roll brushes 10, 10 substantially horizontally. Have been. The roll brush 10 is provided with a woven fabric made of a synthetic fiber such as nylon fiber or polyvinyl alcohol fiber in a mohair shape around a cylindrical tube portion 11. Both ends of a rotating shaft 13 fitted inside the tube portion 11 are provided. Are rotatably supported by a pair of arms 15, 15.

The upper arms 15, 15 are adapted to be rotated in a vertical plane by a rotation device (not shown), and the upper arms 15, 15 are turned by the rotation device. After rotating in the direction away from the arms 15, 15, the wafer W is placed on the lower roll brush 10, and the upper arm 15, 15 approaches the lower arm 15, 15 by the rotating device. The two brushes 10, 10
The wafer W is supported between them.

The two roll brushes 10, 10 are driven to rotate in opposite directions by a rotary driving device (not shown), whereby the wafer W held between the roll brushes 10, 10 is moved in one direction. It is pushed out to. In the direction in which the wafer W is extruded and at a position separated from the central axis of the roll brushes 10 by a substantially radial dimension of the wafer W, drum-shaped drive rollers 20 and 20 have their rotation axes set in the vertical direction. The bottom of the peripheral surface is arranged at the same height as the height of the wafer W, and the peripheral edge of the wafer W extruded from the roller brushes 10 contacts the peripheral surface of the drive rollers 20. Then, the wafer W is driven to rotate in a substantially horizontal plane by the drive rollers 20 and 20.

In the vicinity of the driving rollers 20, nozzles 23, which inject the cleaning liquid, are disposed opposite to the upper and lower surfaces of the wafer W, respectively. Then, while injecting the cleaning liquid from the nozzles 23, 23 to the upper and lower surfaces of the wafer W, the roll brushes 10, 10
Is rotated to clean the portion of the wafer W where the roll brushes 10 and 10 are in contact with each other, and the entire area on both surfaces of the wafer W is cleaned by rotating the wafer W by the drive rollers 20 and 20.

As a result of the cleaning of the wafer W, a part of the sewage liquid containing particles removed from the wafer W penetrates into the brush portions 12 and 12 of the roll brushes 10 and 10, and the sewage liquid is removed by the roll brushes 10 and 10. The wafer W is attached again by the rotation. In order to prevent this, in the scrub cleaning apparatus according to the present invention, the roll brush 10 is provided in an appropriate area around the above-mentioned roll brushes 10 and excluding the area where the brush parts 12 and 12 come into contact with the wafer W. , 10 brush parts 12,
Contact members 1 and 1 are provided for contacting and purifying the contact member 12.

The contact members 1, 1 have roll brushes 10, 10,
A semi-cylindrical concave portion 2, 2 longer than the axial length of the concave portion 2, 2 is provided. The radius of curvature of the concave portion 2, 2 is smaller than the radius of the outer periphery of the brush portions 12, 12, and It is larger than the radius of the circumference. The contact members 1, 1 have both ends protruding from both ends of the roll brushes 10, 10, and are provided with recesses 2, 2.
Are arranged so as to be concentric with the roll brushes 10, 10, and the contact members 1, 1 have recesses 2, 2 formed in the roll brushes 10, 10.
Arm 15,15,15,15 so that it contacts brush part 12,12 of
It is supported by 15.

FIG. 3 is an enlarged side view of the contact member 1 shown in FIG. 1, and FIG. 4 is an inner surface developed view of the contact member 1 shown in FIG. Two guides extending across both edges in the longitudinal direction of the contact member 1 are provided on one edge side in the circumferential direction of the concave portion 2 of the contact member 1 (downstream in the rotation direction of the roll brush rotating in the arrow direction). The grooves 3 and 4 are provided at appropriate intervals in the circumferential direction. Each of the guide grooves 3 and 4 has a substantially V-shape in which the central portion is located closer to the bottom of the arc than both ends.

On the other edge side of the concave portion 2 in the circumferential direction (upstream in the rotation direction of the roll brush rotating in the arrow direction),
A groove 6 slightly shorter than the distance between both edges is provided in the longitudinal direction of the contact member 1, and a plurality of holes 7, 7,... It is set up separately. Each of the holes 7, 7,... Communicates with a liquid passage 8 penetrating the outer surface of the contact member 1, and a portion surrounding the opening of the liquid passage 8 formed on the outer surface of the contact member 1 has a cleaning liquid. Is connected with a liquid supply pipe 9 for supplying the pressure at an appropriate pressure.

Then, as shown in FIG. 1, the roll brushes 10 and 10 are rotated to clean the wafer W, and the cleaning liquid is supplied from the liquid supply pipes 9 and 9 to open the holes formed in the contact members 1 and 1. The cleaning liquid is injected from 7, 7, ..., 7, 7, ... to the roll brushes 10, 10. As mentioned above, the roll brush 10,
When the portion of the brush parts 12, 12 into which the sewage liquid has penetrated comes into contact with the edges of the contact members 1, 1 by the rotation of the brush part 1, the brush part 1
A part of the infiltrated sewage liquid is scattered from the brush parts 12 and 12 due to the centrifugal force caused by the rotation of the gears 12 and the impact due to the contact.

When the portions of the brush portions 12, 12 into which the sewage liquid has penetrated enter the recesses 2, 2 of the abutting members 1, 1 by the rotation of the roll brushes 10, 10, the cleaning liquid is there.
The sewage liquid that is injected into the brush parts 12 and 12 and remains on the brush parts 12 and 12 is diluted, and pressure is applied to the brush parts 12 and 12 that are in contact with the recesses 2 and 2. In addition, roll brush
When the rotating portions 10 and 10 reach the positions of the guide grooves 3, 3, 4 and 4 of the abutting members 1, the portions of the brush portions 12, into which the sewage liquid has entered, are pushed into the recesses 2, 2. Brush part 12,12
Is slightly swelled, so-called rubbing and washing is performed, and the sewage liquid contained in the brush portions 12, 12 penetrates into the guide grooves 3, 3, 4, 4 and is contacted by the guide grooves 3, 3, 4, 4. It is guided to the edge of the contact member 1, 1 and is scattered from there. The brush portions 12, 12 thus purified come into contact with the wafer W again to clean it.

In the present embodiment, both surfaces of the wafer W are cleaned. However, the present invention is not limited to this, and the present invention can be applied to a scrub cleaning apparatus for cleaning one surface of the wafer W. Needless to say.

(Embodiment 2) FIG. 5 is a partially enlarged side view showing another embodiment, and FIG. 6 is an inner surface developed view of the contact member shown in FIG. 3 and 4 in the drawings.
The same reference numerals are given to the portions corresponding to the portions shown in FIG. In the present embodiment, as shown in FIGS. 5 and 6, between the groove 6 provided in the concave portion 2 of the contact member 1 and the guide groove 3, and between the guide groove 3 and the guide groove 4, A plurality of semi-elliptical protrusions 5, 5,... Are provided in a zigzag manner between them.
As a result, the brush-washing effect of the brush portion 12 (see FIG. 1) of the roller brush 10 is improved.

[0043]

As described above in detail, in the scrub cleaning apparatus according to the first aspect of the present invention, the brush portion is brought into contact with the contact member so that the sewage liquid entering the brush portion is scattered from the roll brush. In order to purify the roll brush, the rotation of the roll brush prevents the sewage liquid that has entered the brush portion from re-adhering to the object to be cleaned, improving the degree of cleaning of the object to be cleaned and improving the cleaning efficiency of the sewage liquid. The object to be cleaned is prevented from being damaged.

In the scrub cleaning device of the second invention,
By the impact of the brush portion abutting on the contact member, the sewage liquid penetrating into the brush portion is scattered, and the brush portion that has entered the concave portion reaches the guide groove, where it is rubbed and washed by the rotational force of the roll brush. Since the sewage liquid enters the guide groove and is released from both ends of the guide groove, the sewage liquid is further prevented from adhering to the object to be cleaned, and the degree of cleaning of the object to be cleaned is improved. Damage to the object to be cleaned by particles in the sewage liquid is prevented.

In the scrub cleaning device of the third invention,
Since the concave portion is longer than the axial length of the roll brush, contaminated water that has entered the brush portion from the entire circumference of the brush portion with the rotation of the roll brush can be scattered, and the scattered contamination Water is prevented from re-entering the brush.

In the scrub cleaning apparatus of the fourth invention,
Since the radius of curvature of the concave portion of the contact member is smaller than the radius of the outer periphery of the brush portion, the density of the brush portion that has entered the concave portion is high, and the massage and washing effect is high. As a result, the degree of purification of the brush part is improved, and the degree of cleaning of the object to be cleaned is further improved.

In the scrub cleaning apparatus of the fifth invention,
Since the guide groove is formed in a substantially V-shape that expands in the rotation direction of the roll brush, the sewage liquid that has entered the brush portion is easily scattered from the roll brush, and the degree of purification of the brush portion is further improved.

In the scrub cleaning apparatus of the sixth invention,
Since a plurality of guide grooves are provided at a distance in the circumferential direction of the roll brush, the kneading and washing effect increases, and the degree of purification of the brush portion further improves.

In the scrub cleaning apparatus of the seventh invention,
The cleaning liquid is injected into the brush portion from a hole provided in the concave portion at a position upstream of the guide groove in the rotation direction of the roll brush.
Thereby, the degree of purification of the brush part can be further improved by diluting the sewage liquid entering the brush part and causing particles in the sewage liquid entering the brush part to float.

In the scrub cleaning apparatus of the eighth invention,
The protrusion provided in the concave portion of the contact member further enhances the rubbing and washing effect, and also allows the protrusion to disperse sewage liquid that has entered the brush portion, thereby further improving the degree of purification of the brush portion. The invention has excellent effects.

[Brief description of the drawings]

FIG. 1 is a side view showing a main part configuration of a scrub cleaning apparatus according to the present invention.

FIG. 2 is a plan view of the scrub cleaning device shown in FIG.

FIG. 3 is an enlarged side view of the contact member shown in FIG. 1;

FIG. 4 is an inner developed view of the contact member shown in FIG. 3;

FIG. 5 is a partially enlarged side view showing another embodiment.

FIG. 6 is an inner developed view of the contact member shown in FIG. 5;

FIG. 7 is a schematic perspective view showing an example of an embodiment of the present invention.

FIG. 8 is a schematic side view showing the configuration of a scrub cleaning device disclosed in Japanese Utility Model Publication No. 6-9491.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Contact member 2 Depression 3 Guide groove 4 Guide groove 5 Projection 6 Groove 7 Hole 9 Liquid supply pipe 10 Roll brush 11 Tubular part 12 Brush part 15 Arm member W Wafer

Claims (8)

[Claims] 1. A roll brush provided with a cylindrical brush portion is rotated to inject a cleaning liquid into a cleaning portion of an object to be cleaned.
In the scrub cleaning device for cleaning the object to be cleaned by bringing the brush portion into contact with the cleaning portion of the object to be cleaned, a contact member for contacting the brush portion of the roll brush is provided, and A scrub cleaning device, wherein the abutment member is brought into contact with the brush portion so that the cleaning liquid impregnated in the brush portion is scattered. 2. A cleaning device according to claim 1, further comprising: rotating a roll brush provided with a cylindrical brush portion, injecting a cleaning liquid into a cleaning portion of an object to be cleaned,
A scrub cleaning device for cleaning the object to be cleaned by bringing the brush portion into contact with a cleaning portion of the object to be cleaned; a contact member having a semi-cylindrical concave portion to be brought into contact with the brush portion; and the roll brush Around the periphery, in a suitable area except the area where the brush portion is in contact with the cleaning portion of the object to be cleaned, a supporting member that supports the contact member so that the concave portion contacts the brush portion, A scrub cleaning apparatus, wherein a guide groove is provided in the concave portion for guiding the cleaning liquid attached to the concave portion to an edge of the concave portion in the axial direction of the roll brush. 3. The scrub cleaning apparatus according to claim 2, wherein the recess is longer than a dimension of the roll brush in the axial direction. 4. The scrub cleaning apparatus according to claim 2, wherein the brush portion is cylindrical, and a radius of curvature of the concave portion is smaller than a radius of an outer periphery of the brush portion. 5. The scrub cleaning apparatus according to claim 2, wherein said guide groove is formed in a substantially V-shape extending in a rotation direction of the roll brush. 6. The scrub cleaning device according to claim 2, wherein a plurality of the guide grooves are provided at a distance in a circumferential direction of the roll brush. 7. The scrub cleaning apparatus according to claim 2, wherein a hole for injecting a cleaning liquid is opened at a position upstream of the guide groove in the rotation direction of the roll brush in the concave portion. 8. The scrub cleaning apparatus according to claim 2, wherein a projection is provided in the concave portion.