JPH1128443A - Method for decomposing halogen compound - Google Patents
Method for decomposing halogen compoundInfo
- Publication number
- JPH1128443A JPH1128443A JP9197826A JP19782697A JPH1128443A JP H1128443 A JPH1128443 A JP H1128443A JP 9197826 A JP9197826 A JP 9197826A JP 19782697 A JP19782697 A JP 19782697A JP H1128443 A JPH1128443 A JP H1128443A
- Authority
- JP
- Japan
- Prior art keywords
- alkali metal
- org
- halogen compound
- dispersion
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- Fire-Extinguishing Compositions (AREA)
- Processing Of Solid Wastes (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は有機ハロゲン化合
物、たとえば、ポリ塩素化ビフェニール(以下、PCB
と略記する)類等の有機ハロゲン化合物をアルカリ金属
により、脱ハロゲン分解させて処理する方法に関するも
のである。The present invention relates to an organic halogen compound such as polychlorinated biphenyl (hereinafter referred to as PCB).
Abbreviated as above) and the like, and a method of dehalogenating and decomposing an organic halogen compound with an alkali metal.
【0002】[0002]
【従来の技術】有機ハロゲン化合物とアルカリ金属分散
体を反応させ、有機ハロゲン化合物を無害化する方法が
特開昭49−82570、特開昭59−20179等に
記載されている。これらの方法によるPCBの処理は、
PCBを脱塩素分解すると共に、重合体化することによ
り無害化するものである。2. Description of the Related Art JP-A-49-82570, JP-A-59-20179, and the like disclose methods of detoxifying an organic halogen compound by reacting an organic halogen compound with an alkali metal dispersion. The processing of the PCB by these methods is as follows:
It detoxifies PCB and detoxifies it by polymerizing it.
【0003】生成する重合物の処分にあたって、焼却処
分が考えられるが、この時、重合物中に塩素成分が残存
していると、再びPCBやダイオキシンといった有害な
有機塩素化合物が生成する可能性がある。したがって、
脱塩素分解による無害化処理においては、生成する重合
物中の塩素成分を可能な限り低減する必要がある。[0003] When disposing of the produced polymer, incineration is conceivable. At this time, if chlorine components remain in the polymer, harmful organic chlorine compounds such as PCB and dioxin may be formed again. is there. Therefore,
In the detoxification treatment by dechlorination, it is necessary to reduce the chlorine component in the produced polymer as much as possible.
【0004】特開昭59−20179の場合、生成する
重合物中の塩素成分に関する記述はない。また、特開昭
49−82570の場合は生成する塩素イオン量の測定
によると脱塩素率がほぼ100%であるけれども、活性
化剤としてアルコール等を添加しない場合は、反応速度
が遅く効率が悪かった。In the case of JP-A-59-20179, there is no description about a chlorine component in the produced polymer. In the case of JP-A-49-82570, although the dechlorination rate is almost 100% according to the measurement of the amount of chloride ions formed, the reaction rate is low and the efficiency is poor when no alcohol or the like is added as an activator. Was.
【0005】[0005]
【発明が解決しようとする課題】有機ハロゲン化合物を
アルカリ金属分散体により脱ハロゲン分解する方法にお
いて、本発明は生成する重合体中に有機塩素成分を残存
させない、効率の良い無害化処理方法を提供する。SUMMARY OF THE INVENTION In a method for dehalogenating and decomposing an organic halogen compound with an alkali metal dispersion, the present invention provides an efficient detoxification method which does not leave an organic chlorine component in a polymer to be produced. I do.
【0006】[0006]
【課題を解決するための手段】本発明は、デカヒドロナ
フタレン、もしくは、デカヒドロナフタレンを反応液全
体に占める濃度として15wt%以上含む溶媒中で、反
応液全体に占める濃度として1wt%から20wt%の
濃度の有機ハロゲン化合物と、分散状態にあるアルカリ
金属を反応させることを特徴とする、有機ハロゲン化合
物の脱ハロゲン分解方法である。According to the present invention, there is provided a method for preparing decahydronaphthalene or a solvent containing 15% by weight or more of decahydronaphthalene in the entire reaction solution in a concentration of 1 wt% to 20 wt% in the entire reaction solution. A method of dehalogenating and decomposing an organic halogen compound, which comprises reacting an organic halogen compound having a concentration of 1 with an alkali metal in a dispersed state.
【0007】本発明における有機ハロゲン化合物は例え
ば、PCB、ダイオキシン類、ジベンゾフラン類、ポリ
塩素化ベンゼン、塩化メチレン等、有機ハロゲン化合物
に広く適用できる。The organic halogen compound in the present invention can be widely applied to organic halogen compounds such as PCB, dioxins, dibenzofurans, polychlorinated benzene, and methylene chloride.
【0008】アルカリ金属分散体に用いるアルカリ金属
としては、ナトリウム、カリウム、リチウム、セシウ
ム、またはこれらの合金が挙げられ、その中で通常ナト
リウムが用いられる。分散体としてはこれらのアルカリ
金属をケロシン、トランスオイル、ベンゼン、キシレ
ン、テトラリン、デカヒドロナフタレンのような脂肪
族、芳香族炭化水素等の不活性有機溶媒中に、50μm
以下、好ましくは15μm以下の直径の粒子として分散
させたものが用いられる。The alkali metal used in the alkali metal dispersion includes sodium, potassium, lithium, cesium, and alloys thereof, and among them, sodium is usually used. As a dispersion, these alkali metals are dissolved in an inert organic solvent such as an aliphatic or aromatic hydrocarbon such as kerosene, trans oil, benzene, xylene, tetralin, or decahydronaphthalene in a concentration of 50 μm.
Hereinafter, those dispersed as particles having a diameter of preferably 15 μm or less are used.
【0009】アルカリ金属分散体は公知の方法により製
造できる。例えばホモジナイザーを用いた方法などが適
用できる。[0009] The alkali metal dispersion can be produced by a known method. For example, a method using a homogenizer can be applied.
【0010】反応に使用する溶媒は、前記のアルカリ金
属分散体を製造するのに用いることができた溶媒を、同
様に用いることができる。As the solvent used in the reaction, the same solvents as those used for producing the above-mentioned alkali metal dispersion can be used.
【0011】本発明は、デカヒドロナフタレン単独もし
くはデカヒドロナフタレンを反応液全体に占める濃度と
して15wt%以上、好ましくは50wt%以上の溶媒
中で行われる。The present invention is carried out in a solvent having a concentration of 15% by weight or more, preferably 50% by weight or more of decahydronaphthalene alone or in a concentration of decahydronaphthalene in the whole reaction solution.
【0012】デカヒドロナフタレン単独溶媒で行う場合
は、当然アルカリ金属分散体を製造する際の溶媒もデカ
ヒドロナフタレンとなる。混合溶媒で行う場合、デカヒ
ドロナフタレンは、アルカリ金属分散体製造時の溶媒、
有機ハロゲン化合物を溶解させる溶媒、あるいは、反応
溶媒として反応系に添加、いずれの方法で添加してもよ
い。When a single solvent of decahydronaphthalene is used, the solvent used for producing the alkali metal dispersion is naturally decahydronaphthalene. When performed in a mixed solvent, decahydronaphthalene is a solvent at the time of production of the alkali metal dispersion,
A solvent for dissolving the organic halogen compound or a reaction solvent may be added to the reaction system, and any method may be used.
【0013】反応に使用する溶媒の使用量は、アルカリ
金属分散体を添加した時点で、有機ハロゲン化合物の混
合液全体に占める濃度が1wt%から20wt%となる
のに必要な量であり、より好ましくは1wt%から15
wt%である。アルカリ金属分散体と有機ハロゲン化合
物の添加順序に、特に制限はなく、有機ハロゲン化合物
を溶媒に溶解した後に、アルカリ金属分散体を添加して
も良く、アルカリ金属分散体を溶媒中に希釈分散した後
に、有機ハロゲン化合物を添加しても良い。The amount of the solvent used in the reaction is an amount necessary for the concentration of the organic halogen compound in the whole mixed solution to be from 1 wt% to 20 wt% when the alkali metal dispersion is added. Preferably 1 wt% to 15
wt%. The order of addition of the alkali metal dispersion and the organic halogen compound is not particularly limited, and after dissolving the organic halogen compound in the solvent, the alkali metal dispersion may be added, and the alkali metal dispersion is diluted and dispersed in the solvent. Later, an organic halogen compound may be added.
【0014】アルカリ金属分散体の添加量は有機ハロゲ
ン化合物のハロゲン原子に対して、ナトリウム量として
2から50倍モル、好ましくは2.5から10倍モルが
用いられる。The amount of the alkali metal dispersion added is 2 to 50 times, preferably 2.5 to 10 times, the molar amount of sodium relative to the halogen atom of the organic halogen compound.
【0015】有機ハロゲン化合物を分解するときの温度
に制限はないが、温度が低いと反応時間が長くなる傾向
がある。通常、室温から、使用している溶媒の沸点の温
度範囲で反応を行うが、加圧下で分解処理を行う場合に
はこの限りではない。但し、あまり反応温度が高いと危
険であるので50℃から110℃で行うのが好ましい。
反応時間は反応を行う温度やアルカリ金属分散体の使用
量により決定される。反応中の反応液の撹拌に関して制
限はないが、撹拌羽根等を用いて撹拌することが望まし
い。The temperature at which the organic halogen compound is decomposed is not limited, but a lower temperature tends to increase the reaction time. Usually, the reaction is carried out in a temperature range from room temperature to the boiling point of the solvent used, but this is not the case when the decomposition treatment is performed under pressure. However, since it is dangerous if the reaction temperature is too high, the reaction is preferably performed at 50 ° C to 110 ° C.
The reaction time is determined by the temperature at which the reaction is carried out and the amount of the alkali metal dispersion used. There is no limitation on the stirring of the reaction solution during the reaction, but it is preferable to stir using a stirring blade or the like.
【0016】本発明は安全のため、アルゴン、窒素等の
不活性ガスの雰囲気下で行うことが望ましい。The present invention is preferably carried out in an atmosphere of an inert gas such as argon or nitrogen for safety.
【0017】[0017]
【発明の実施の形態】以下に実施例により説明するが、
本発明はこれに限定されるものではない。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described by way of examples.
The present invention is not limited to this.
【0018】[実施例1]200mlの反応容器に平均
塩素付加数が4のPCBであるKC400を5.09g
仕込んで、デカヒドロナフタレン64.83gにより溶
解した。反応容器中を窒素により置換した後、デカヒド
ロナフタレンを溶媒として製造した40%の金属ナトリ
ウム分散体、34gを添加し、撹拌混合した。混合液を
70℃まで加熱し、その温度で2時間維持した。混合液
の一部を抜き取り、上澄み液にシリカゲルカラムによる
前処理を施した後、ECD検出器付ガスクロマトグラフ
により分析したところ、PCB濃度は検出限界以下(1
ppm)であった。混合液を抜き取り正確に計量し、水
により残存の金属ナトリウムを分解した後、生成してい
た重合物を濾過により分離した。回収した重合物とデカ
ヒドロナフタレン層を水により充分に洗浄抽出した。使
用した全ての水を回収、合わせて重量を測定し、その水
の一部を抜き取り計量して、硝酸で中和した後、0.0
1mol/lの硝酸銀水溶液により電位差滴定した。計
算により塩素イオンの生成量を求めた結果、PCBに含
まれていた塩素量の98%であった。Example 1 5.09 g of KC400 which is a PCB having an average chlorine addition number of 4 was placed in a 200 ml reaction vessel.
It was charged and dissolved with 64.83 g of decahydronaphthalene. After the atmosphere in the reaction vessel was replaced with nitrogen, 34 g of a 40% metal sodium dispersion prepared using decahydronaphthalene as a solvent was added, followed by stirring and mixing. The mixture was heated to 70 ° C. and maintained at that temperature for 2 hours. A part of the mixed solution was withdrawn, and the supernatant was subjected to a pretreatment with a silica gel column and analyzed by gas chromatography with an ECD detector.
ppm). The mixed solution was withdrawn, accurately weighed, and the remaining metallic sodium was decomposed with water, and then the produced polymer was separated by filtration. The recovered polymer and decahydronaphthalene layer were sufficiently washed and extracted with water. All the water used was collected, the combined weight was measured, a part of the water was withdrawn and weighed, and neutralized with nitric acid.
Potentiometric titration was performed with a 1 mol / l silver nitrate aqueous solution. As a result of calculating the generation amount of chlorine ions by calculation, it was 98% of the amount of chlorine contained in the PCB.
【0019】[実施例2]200mlの反応容器中を窒
素で置換しつつ、デカヒドロナフタレンを溶媒として製
造した40%の金属ナトリウム分散体33gを仕込み、
デカヒドロナフタレン50.4gにより希釈した。そこ
に、5.056gのKC400を20.36gのデカヒ
ドロナフタレンにより希釈した溶液を滴下し、70℃で
4時間維持した。実施例1と同様の方法によりPCB濃
度を測定したところ、PCB濃度は検出限界以下であっ
た。実施例1と同様の方法により塩素イオン生成量を測
定したところ、塩素イオン生成量はPCBに含まれてい
た塩素量のほぼ100%であった。Example 2 While replacing the inside of a 200 ml reaction vessel with nitrogen, 33 g of a 40% metal sodium dispersion prepared using decahydronaphthalene as a solvent was charged.
Diluted with 50.4 g of decahydronaphthalene. A solution obtained by diluting 5.056 g of KC400 with 20.36 g of decahydronaphthalene was added dropwise thereto, and the mixture was maintained at 70 ° C. for 4 hours. When the PCB concentration was measured by the same method as in Example 1, the PCB concentration was below the detection limit. When the amount of chloride ion generation was measured in the same manner as in Example 1, the amount of chloride ion generation was almost 100% of the amount of chlorine contained in the PCB.
【0020】[実施例3]200mlの反応容器にKC
400を10.04g仕込んで、デカヒドロナフタレン
59.79gにより溶解した。反応容器中を窒素により
置換した後、ケロシンを溶媒として製造した40%の金
属ナトリウム分散体、30.63gを添加し、撹拌混合
した。混合液を110℃まで加熱し、その温度で3時間
維持した。実施例1と同様の方法によりPCB濃度を測
定したところ、PCB濃度は検出限界以下であった。実
施例1と同様の方法により塩素イオン生成量を測定した
ところ、塩素イオン生成量はPCBに含まれていた塩素
量のほぼ100%であった。Example 3 KC was added to a 200 ml reaction vessel.
4004 was charged and dissolved with 59.79 g of decahydronaphthalene. After the atmosphere in the reaction vessel was replaced with nitrogen, 30.63 g of a 40% metal sodium dispersion prepared using kerosene as a solvent was added thereto, followed by stirring and mixing. The mixture was heated to 110 ° C. and maintained at that temperature for 3 hours. When the PCB concentration was measured by the same method as in Example 1, the PCB concentration was below the detection limit. When the amount of chloride ion generation was measured in the same manner as in Example 1, the amount of chloride ion generation was almost 100% of the amount of chlorine contained in the PCB.
【0021】[比較例]200mlの反応容器にKC4
00を5.078g仕込んで、ケロシン65.11gに
より溶解した。反応容器中を窒素により置換した後、ケ
ロシンを溶媒として製造した40%の金属ナトリウム分
散体、34gを添加し、撹拌混合した。混合液を70℃
まで加熱し、その温度で4時間維持した。実施例1と同
様の方法によりPCB濃度を測定したところ、PCB濃
度は検出限界以下であった。実施例1と同様の方法によ
り塩素イオン生成量を測定したところ、塩素イオン生成
量はPCBに含まれていた塩素量の約89%であり、実
施例1、実施例2、実施例3よりも低い値であった。[Comparative Example] KC4 was added to a 200 ml reaction vessel.
Was charged with 65.11 g of kerosene. After the atmosphere in the reaction vessel was replaced with nitrogen, 34 g of a 40% metal sodium dispersion prepared using kerosene as a solvent was added thereto, followed by stirring and mixing. Mixture at 70 ° C
And maintained at that temperature for 4 hours. When the PCB concentration was measured by the same method as in Example 1, the PCB concentration was below the detection limit. When the amount of chlorine ion generation was measured by the same method as in Example 1, the amount of chlorine ion generation was about 89% of the amount of chlorine contained in the PCB, which was lower than that in Examples 1, 2 and 3. It was a low value.
【0022】[0022]
【発明の効果】有機ハロゲン化合物をアルカリ金属分散
体により脱塩素分解する方法において、本発明は生成す
る重合体中に有機塩素成分を残存させない、効率の良い
無害化処理方法を提供する。According to the present invention, in a method for dechlorinating and decomposing an organic halogen compound with an alkali metal dispersion, the present invention provides an efficient detoxification method in which an organic chlorine component does not remain in a produced polymer.
Claims (3)
ヒドロナフタレンを反応液全体に占める濃度として15
wt%以上含む溶媒中で、反応液全体に占める濃度とし
て1wt%から20wt%の濃度の有機ハロゲン化合物
と、分散状態にあるアルカリ金属を反応させることを特
徴とする、有機ハロゲン化合物の脱ハロゲン分解方法。1. Decahydronaphthalene or decahydronaphthalene having a concentration of 15% in the whole reaction solution.
a dehalogenation decomposition of an organic halogen compound characterized by reacting an organic halogen compound having a concentration of 1 wt% to 20 wt% with respect to the whole reaction solution and an alkali metal in a dispersed state in a solvent containing not less than wt%. Method.
1記載の分解方法。2. The method according to claim 1, wherein the alkali metal is sodium.
ニルである請求項1又は2記載の分解方法。3. The method according to claim 1, wherein the organic halogen compound is polychlorinated biphenyl.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9197826A JPH1128443A (en) | 1997-07-08 | 1997-07-08 | Method for decomposing halogen compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9197826A JPH1128443A (en) | 1997-07-08 | 1997-07-08 | Method for decomposing halogen compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH1128443A true JPH1128443A (en) | 1999-02-02 |
Family
ID=16380992
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9197826A Pending JPH1128443A (en) | 1997-07-08 | 1997-07-08 | Method for decomposing halogen compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH1128443A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003001220A (en) * | 2001-06-25 | 2003-01-07 | Kansai Electric Power Co Inc:The | Method for separating polychlorinated aromatic compound from contaminated material |
JP2006257034A (en) * | 2005-03-17 | 2006-09-28 | Nippon Oil Corp | De-halogenation solvent for halogenated aromatic compound, and method for de-halogenating the halogenated aromatic compound |
JP2006257035A (en) * | 2005-03-17 | 2006-09-28 | Nippon Oil Corp | De-halogenation solvent for halogenated aromatic compound, and method for de-halogenating the halogenated aromatic compound |
-
1997
- 1997-07-08 JP JP9197826A patent/JPH1128443A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003001220A (en) * | 2001-06-25 | 2003-01-07 | Kansai Electric Power Co Inc:The | Method for separating polychlorinated aromatic compound from contaminated material |
JP2006257034A (en) * | 2005-03-17 | 2006-09-28 | Nippon Oil Corp | De-halogenation solvent for halogenated aromatic compound, and method for de-halogenating the halogenated aromatic compound |
JP2006257035A (en) * | 2005-03-17 | 2006-09-28 | Nippon Oil Corp | De-halogenation solvent for halogenated aromatic compound, and method for de-halogenating the halogenated aromatic compound |
JP4719489B2 (en) * | 2005-03-17 | 2011-07-06 | Jx日鉱日石エネルギー株式会社 | Solvent for dehalogenation of halogenated aromatic compound and method for dehalogenation of halogenated aromatic compound |
JP4722516B2 (en) * | 2005-03-17 | 2011-07-13 | Jx日鉱日石エネルギー株式会社 | Solvent for dehalogenation of halogenated aromatic compound and method for dehalogenation of halogenated aromatic compound |
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A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20071205 |