JPH11274263A - Substrate conveyer and substrate processor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate conveyer, with which the transfer of a substrate can be stopped safely by without lowering throughput when a worker opens the cover for work of each processing unit, and a substrate processor using the said substrate conveyer. SOLUTION: When the covers of respective processing units 21a, 21b, 22... are opened, the opening of the covers is detected by a magnet sensor 56. This detecting signal is sent from unit controllers 51a, 51b, 52... to a main controller 50 and the stop signals of conveyer arms 17, 18 and 19 accessing the cover opened processing units 21a, 21b, 22... are generated. This stop signal is sent to conveyer arm controllers 47, 48 and 49 for controlling the conveyer arms 17, 18 and 19 and these conveyer arms 17, 18 and 19 are stopped.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate transport apparatus for transporting a substrate such as an LCD substrate, and a substrate processing apparatus using such a substrate transport apparatus.

[0002]

2. Description of the Related Art In manufacturing a liquid crystal display (LCD), a photoresist liquid is applied to a glass LCD substrate to form a resist film, the resist film is exposed in accordance with a circuit pattern, and developed. That is, a circuit pattern is formed by a so-called photolithography technique.

Conventionally, such a series of coating and developing processes have been performed by a system in which processing devices for performing these processes are integrated. In such a system, a cleaning process, a coating process, A transfer device is provided for transferring a substrate to and from each processing unit that performs each process such as a development process and a heating process.

Such a transfer apparatus includes a transfer arm movably provided along a transfer path extending between a plurality of processing units, and the transfer arm is provided with a transfer arm received from a cassette station before processing. Is transferred to each processing unit, and the substrate is transferred to each processing unit.
The processed substrates are received from each processing unit, and the substrates that have been processed in the plurality of processing units are returned to the cassette station.

In such a coating / developing system, an operator sometimes opens a work cover of each processing unit. In such a case, the transfer arm is
The transfer of the substrate is continued without stopping, the substrate is carried into each processing unit, and the substrate is transferred from each processing unit. In some cases, an interlock device is provided for the entire system. In this case, when the operator opens the work cover of each processing unit, not only does the transfer arm stop but also the operation of each processing unit. Is also stopped, and the entire system is stopped.

On the other hand, in such a coating / developing processing system, the processing capability of each processing unit, that is, the processing time is measured, and each processing unit is evaluated. After confirming the substrate receiving system, the operator transfers the substrate to each processing unit by the transfer arm, performs predetermined processing such as coating and development on the substrate, and measures the processing time until the substrate is unloaded by the stopwatch by the operator. doing.

[0007]

However, when the operator opens the work cover of each processing unit,
If the transfer arm continues the transfer of the substrate without stopping, there is a possibility that the transfer arm may cause troubles such as contact with an operator while transferring the substrate in the processing unit with the work cover opened. is there. When an interlock device is provided, not only the operation of the transfer arm but also the operation of each processing unit is stopped, and the entire system is stopped. Therefore, the operator merely opens the work cover. Nevertheless, it takes time to restart the entire system, and the throughput is reduced.

In addition, when the processing time of each processing unit is measured by a stopwatch by an operator, there is an individual difference between workers to be measured, so that the processing time of each processing unit cannot be accurately measured. That the operating time cannot be measured in the area covered by the cover, etc., because the measurement is performed visually by the operator, and that the measuring operation itself requires a great deal of time and labor. And so on.

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and it is an object of the present invention to stop the transfer of a substrate safely and without lowering the throughput when an operator opens a work cover of each processing unit. And a substrate processing apparatus using the same.

It is another object of the present invention to provide a substrate processing apparatus capable of accurately and easily measuring the processing time of each processing unit.

[0011]

In order to solve the above-mentioned problems, a first aspect of the present invention is provided with a plurality of processing units which perform a predetermined process on a substrate and are covered with an openable / closable cover. A substrate transfer device that moves a transfer path and transfers a substrate to the plurality of processing units, the main body being movable along the transfer path, the substrate being supported, and loading of the substrate into the plurality of processing units. A transfer arm for performing output, detection means for detecting the opening of the cover when the cover of each processing unit is opened, and outputting a detection signal, and processing for opening the cover based on the detection signal. And a control unit for stopping the operation of the transfer arm for transferring the substrate into and out of the unit.

According to a second aspect, in the substrate transport apparatus of the first aspect, the control means includes a plurality of unit controllers for transmitting and receiving a control signal to each processing unit to control each processing unit, and a plurality of unit controllers. A plurality of block controllers each storing the
A main controller for controlling the unit controllers by transmitting and receiving control signals to and from a plurality of unit controllers housed in the block controllers;
The present invention provides a substrate transfer device having the following.

According to a third aspect of the present invention, in the substrate transport apparatus of the second aspect, the cover opening detection signal is input to the unit controller and sent to the main controller, and the substrate is carried into and out of the processing unit with the cover opened. The present invention provides a substrate transfer apparatus characterized in that a stop signal of a transfer arm is generated, the stop signal is sent to a transfer apparatus controller that controls the transfer arm, and the transfer arm is stopped.

According to a fourth aspect of the present invention, there is provided the substrate transfer apparatus according to any one of the first to third aspects, wherein the detecting means is a magnet sensor for detecting opening and closing of the cover. .

According to a fifth aspect of the present invention, there is provided a transport path, a plurality of processing units provided along the transport path for performing a predetermined process on a substrate, an openable cover for covering each processing unit, A substrate transfer device that transfers a substrate to the plurality of processing units, the substrate transfer device supporting the substrate, the substrate being movable along a transfer path, and carrying the substrate in and out of the plurality of processing units. A transfer arm, a detecting means for detecting the opening of the cover when the work cover of each processing unit is opened and outputting a detection signal, and a processing unit having the cover opened based on the detection signal. And a control means for stopping the operation of the transfer arm that carries the substrate in and out.

According to a sixth aspect of the present invention, in the substrate processing apparatus according to the fifth aspect, the control means of the substrate transport device includes a plurality of unit controllers for transmitting and receiving control signals to and from each processing unit to control each processing unit; A plurality of block controllers accommodating a plurality of unit controllers for each block, and a main controller for transmitting and receiving control signals to and from the plurality of unit controllers accommodated in the block controllers to control the unit controllers A substrate processing apparatus characterized by the following.

According to a seventh aspect of the present invention, in the substrate processing apparatus of the sixth aspect, the cover opening detection signal is input to the unit controller and sent to the main controller, and the substrate is carried into and out of the processing unit with the cover opened. The present invention provides a substrate processing apparatus, wherein a stop signal of a transfer arm is generated, the stop signal is sent to a transfer device controller that controls the transfer arm, and the transfer arm is stopped.

According to an eighth aspect of the present invention, in the substrate processing apparatus according to any one of the fifth to seventh aspects, the detecting means of the substrate transfer device is a magnet sensor for detecting opening and closing of a cover. Provide equipment.

According to a ninth aspect of the present invention, there are provided a plurality of processing units for performing predetermined processing on a substrate, a transfer device for transferring the substrate to the plurality of processing units, a timer for generating a time pulse signal, When confirming the substrate receiving system, the operation of the time pulse signal from the timer is started, the substrate is loaded into each processing unit by the transport device, a predetermined process is performed on the substrate, and the processed substrate is transported by the transport arm. A control means for terminating the operation of the time pulse signal from the timer when the completion of the processing is confirmed by carrying out from each processing unit, and obtaining the processing time from the elapsed time from the start to the end of the operation. A substrate processing apparatus is provided.

According to the first invention and the fifth invention, when the cover of each processing unit is opened, the opening of the cover is detected by the detecting means, and based on the detection signal, the processing unit with the cover opened is detected. Since the operation of the transport arm that is being accessed is stopped, the transport arm does not cause troubles such as contact with the operator while transporting the substrate in the processing unit. Since the entire system is not stopped in a short time, only the transfer arm that is accessing the processing unit can be stopped, and it does not take much time to start up the entire system and lower the throughput.

Actually, as in the second invention, the third invention, the sixth invention and the seventh invention, in the control means including the unit controller, the block controller and the main controller, the detection signal of the opening of the cover is A signal is input to the controller and sent to the main controller. A stop signal is generated for the transfer arm that carries the substrate into and out of the processing unit with the cover opened, and the stop signal is sent to the transfer device controller that controls the transfer arm. , The transfer arm is reliably stopped.

According to the fourth or eighth aspect, since the detecting means is a magnet sensor for detecting the opening and closing of the cover, the opening and closing of the cover can be detected extremely accurately and easily.

According to the ninth aspect, when the system for receiving the substrate of each processing unit is confirmed, the operation of the time pulse signal from the timer is started, the substrate is carried into each processing unit by the transfer arm, and the predetermined time is transferred to the substrate. When the processing is carried out and the processed substrate is unloaded by the transfer arm and the completion of the processing is confirmed, the calculation of the time pulse signal from the timer is terminated, and the time elapsed from the start to the end of this calculation is automatically determined. Since the processing time can be obtained in a specific way, unlike the case where the worker measures the processing time with a stopwatch, there is no possibility that the processing time cannot be accurately measured due to the individual difference of the worker who measures the time. Since it is not measured visually by the operator, it is possible to measure the operation time of the part covered by the cover or the like, and furthermore, the measurement operation itself is often performed. It is not such as to require time and effort such. Therefore, the processing time of each processing unit can be measured accurately and in detail.

[0024]

Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a plan view showing an LCD substrate coating / developing processing system to which the present invention is applied.

This coating / developing processing system includes a cassette station 1 on which a cassette C accommodating a plurality of substrates G is mounted, and a plurality of processing units for performing a series of processes including resist coating and developing on the substrates G. A processing unit 2 and an interface unit 3 for transferring a substrate G between the exposure unit (not shown) and a cassette station 2 and an interface 3 at both ends of the processing unit 2, respectively. Have been.

The cassette station 1 includes a transport mechanism 10 for transporting the LCD substrate between the cassette C and the processing section 2. And cassette station 1
, A cassette C is loaded and unloaded. The transport mechanism 10 includes a transport arm 11 that can move on a transport path 10 a provided along the direction in which the cassettes are arranged. The transport arm 11 allows the substrate G to be moved between the cassette C and the processing unit 2.
Is carried out.

The processing section 2 is divided into a front section 2a, a middle section 2b, and a rear section 2c.
2, 13 and 14, and each processing unit is disposed on both sides of these transport paths. Then, relay portions 15 and 16 are provided between them.

The front section 2a includes a main transfer device 17 movable along the transfer path 12. On one side of the transfer path 12, two cleaning units (SCRs) 21a and 21b are arranged. UV irradiation on the other side of the transport path 12
A cooling unit (UV / COL) 25, a heat treatment unit (HP) 26 and a cooling unit (COL) 27, each of which is stacked in two layers, are arranged.

The middle section 2b includes a main transfer device 18 movable along the transfer path 13. On one side of the transfer path 13, a resist coating unit (CT) 22 and the periphery of the substrate G are provided. An edge remover (ER) 23 for removing a portion of the resist is provided integrally with the transport path 1.
On the other side of the heat treatment unit 3, a heat treatment unit (HP) 28 having two stacked layers, and a heat treatment / cooling unit (HP /
COL) 29, and an adhesion processing / cooling unit (AD / COL) 30 in which an adhesion processing unit and a cooling unit are vertically stacked.

Further, the rear section 2c is provided with a main transport device 19 movable along the transport path 14,
On one side, three development processing units 24a, 24
b and 24c are arranged, and on the other side of the transport path 14, a heat treatment unit 31 that is stacked in two layers vertically and two heat treatment units that are stacked vertically in a heat treatment unit and a cooling unit. Cooling unit (HP / CO
L) 32, 33 are arranged.

The processing section 2 includes a cleaning processing unit 21a and a resist processing unit 2 on one side of the transport path.
2. Only a spinner unit such as the development processing unit 24a is arranged, and only a heat processing unit such as a heating processing unit or a cooling processing unit is arranged on the other side.

A chemical solution supply unit 34 is disposed at a portion of the relay units 15 and 16 on the side where the spinner system unit is disposed, and further, a space 35 is provided in which the main transport device can be taken in and out.

The main transfer unit 17 transfers the substrate G to and from the arm 11 of the transfer mechanism 10, and loads and unloads the substrate G to and from each processing unit in the former stage 2 a. It has a function of transferring the substrate G between the two. Further, the main transfer device 18 is connected to the relay unit 1.
5 and transfer the substrate G to the middle section 2
b has a function of loading / unloading the substrate G to / from each processing unit and transferring the substrate G to / from the relay unit 16. Further, the main transfer device 19 transfers the substrate G to and from the relay unit 16, and loads and unloads the substrate G to and from each processing unit in the subsequent unit 2 c, and transfers the substrate G to and from the interface unit 3. Has the function of performing Note that the relay sections 15 and 16 also function as cooling plates.

The interface unit 3 includes an extension 36 for temporarily holding the substrate when transferring the substrate to and from the processing unit 2, and two buffer stages 37 provided on both sides thereof for disposing a buffer cassette. , Two buffer stages 37, and a transport mechanism 38 for loading and unloading the substrate G between these and an exposure apparatus (not shown). The transfer mechanism 38 includes a transfer arm 3 movable on a transfer path 38 a provided along the direction in which the extension 36 and the buffer stage 37 are arranged.
The transfer arm 39 transfers the substrate G between the processing unit 2 and the exposure apparatus.

By consolidating and integrating the processing units in this manner, space can be saved and processing efficiency can be improved.

In the coating / developing processing system configured as described above, the substrate G in the cassette C is transported to the processing section 2, where the ultraviolet irradiation / cooling unit (UV) / COL) 25, after the surface modification / cleaning treatment and subsequent cooling, the cleaning unit (S
After the scrubber cleaning is performed in CR) 21a and 21b, and is heated and dried in one of the heat treatment units (HP) 26,
It is cooled by one of the cooling units (COL) 27.

Thereafter, the substrate G is transported to the middle section 2b,
In order to enhance the fixability of the resist, the upper part of the unit 30 is subjected to a hydrophobic treatment (HMDS treatment) in the adhesion processing unit (AD), and is cooled in the cooling unit (COL). The resist is applied, and an excess resist on the periphery of the substrate G is removed by an edge remover (ER) 23. Thereafter, the substrate G is pre-baked in one of the heat processing units (HP) in the middle section 2b, and is cooled in the lower cooling unit (COL) of the unit 29 or 30.

Thereafter, the substrate G is transferred from the relay unit 16 to the exposure device via the interface unit 3 by the main transfer unit 19, where a predetermined pattern is exposed. And
The substrate G is carried in again via the interface unit 3,
Development processing is performed in any of the development processing units (DEV) 24a, 24b, and 24c, and a predetermined circuit pattern is formed. The developed substrate G is subjected to post-baking in any one of the heat treatment units (HP) in the subsequent section 2c, and then cooled in the cooling unit (COL). Then, the sheet is stored in a predetermined cassette on the cassette station 1 by the transport mechanism 10.

Next, with reference to FIG. 2, a control device of the coating / developing processing system for the LCD substrate will be described. FIG.
FIG. 2 is a control block diagram of an LCD substrate coating / developing processing system.

First, the host computer (not shown) is L
The main controller 50 controlled by the host computer is configured to control the entire coating / developing processing system shown in FIG. 1.

As the lower-level control of the main controller 31, the front part 2a and the middle part 2 of the processing unit 2 shown in FIG.
b, and three block controllers 55a, 55b,
55c are provided.

A plurality of unit controllers for transmitting and receiving control signals to and from each processing unit of the preceding section 2a and controlling each processing unit are accommodated in the block controller 55a corresponding to the preceding section 2a of the processing section 2. ing. That is, a unit controller 51a for controlling the cleaning processing unit (SCR) 21a, a unit controller 51b for controlling the cleaning processing unit (SCR) 21b,... And a transport device controller 47 for controlling the transport device 17. Are stored in the block controller 55a.

The block controller 55b corresponding to the middle section 2b contains a plurality of unit controllers for transmitting and receiving control signals to and from each processing unit of the middle section 2b to control each processing unit. . That is, a unit controller 52 for controlling the resist coating unit (CT) 22 and a unit controller 5 for controlling the edge remover (ER) 23
.., And a transport device controller 48 for controlling the transport device 18 are housed in the block computer 55b.

Further, a plurality of unit controllers for transmitting and receiving control signals to and from each processing unit of the subsequent stage 2c and controlling each processing unit are accommodated in the block controller 55c corresponding to the latter stage 2c. .
That is, a unit controller 54a for controlling the development processing unit (DEV) 24a, a unit controller 54b for controlling the development processing unit (DEV) 24b,..., And a transport device controller 49 for controlling the transport device 19. Is a block computer 5
5c.

The unit controller 51
are configured to be controlled by control signals output from the main controller 50 to each of the block controllers 55a, 55b, and 55c.

Next, with reference to FIG. 3, a description will be given of a main transfer device for transferring a substrate when performing the above-described series of processing.
FIG. 3 is a perspective view showing a schematic configuration of a transport device in the coating and developing system.

The main transport unit 17 includes an apparatus main body 41 movable along the transport path 12, a base member 42 movable vertically and pivotally with respect to the apparatus main body 41, and a base member 4.
And two upper and lower substrate support arms 43a and 43b which can move independently along the horizontal direction on the upper side of the substrate support arm 43a, 43b.

As described above, the apparatus main body 41 is
The base member 42 mounted on the apparatus main body 41 is moved up and down in the Z-axis direction, and is pivotally moved in the θ-axis direction.
The substrate support arms 43a and 43b mounted on the second unit 2 are moved forward and backward in the X-axis direction with respect to each of the processing units 21a,. The transfer devices 18 and 19 have the same configuration.

Next, with reference to FIGS. 4 and 5, the X-axis drive mechanism of the substrate support arms 43a and 43b and the Z-axis vertical movement mechanism of the base member 42 will be described. FIG. 4 is a partial cross-sectional side view showing a drive mechanism of a substrate support arm of the transfer device and a vertical movement mechanism of a base member, and FIG.
It is sectional drawing by A 'arrow. In addition, Y of the device main body 41
The description of the structures of the shaft drive mechanism and the θ-axis turning mechanism of the base member 42 is omitted.

As an X-axis drive mechanism for the substrate support arms 43a and 43b, a base plate 61 extends horizontally in the base member 42, and is provided on the lower surface of the end of the base plate 61 on the front end side of the substrate support arm. Is equipped with two motors 65a and 65b. Pulleys 66a and 66b are attached to the rotating shafts of the motors 65a and 65b, respectively, and belts 68a and 68b are wound therearound. The belts 68a and 68b are provided on the base plate 61. Pulleys 67a and 67b. Pulleys 63a and 63b are fixed in parallel to the pulleys 67a and 67b, respectively. On the other hand, pulleys 62a and 62b are provided at opposite ends on the base plate 61 in correspondence with the pulleys 63a and 63b.
A belt 64a is wound around 2a, and a belt 64b is wound around pulleys 63b and 62b. Therefore, the rotation of the motors 65a and 65b
a, 66b, belts 68a, 68b, pulley 67a,
The power is transmitted to pulleys 63a and 63b via 67b, and belts 64a and 64b are driven.

On the base plate 61, a pair of rails 72 are provided on both outer sides, and a pair of rails 74 are provided inside thereof along the moving direction of the substrate support arms 43a and 43b. The guide member 71 travels and the rail 7
The guide member 73 runs on the upper surface 4. The guide member 71 is connected to the upper substrate support arm 43a by overhanging the lower substrate support arm 43b, and is connected to the belt 64a by a connection member (not shown). The guide member 73 is connected to the lower substrate support arm 43b, and is connected to the belt 64b by a connecting member (not shown). Therefore,
The upper substrate support arm 43a is moved by driving the motor 65a, and the lower substrate support arm 43b is moved by driving the motor 65b.

As the Z-axis vertical movement mechanism of the base member 42, as shown in FIG. 4, a ball screw shaft 81 is provided in the apparatus main body 41 so as to be rotatable in the vertical direction.
It is screwed into a ball nut (not shown) provided in a connecting portion 44 connecting the device 2 and the apparatus main body 41. A belt 85 is stretched between a pulley 82 provided at a lower end of the ball screw shaft 81 and a pulley 84 of a motor 83 for vertical movement drive. Therefore, when the motor 83 for vertical movement drive is driven, the belt 85 is rotated, the ball screw shaft 81 is rotated, and the ball nut (not shown) in the connection part 44 is moved up and down, so that the connection part 44 and the base member 42 is raised and lowered.

Further, when the base member 42 is moved up and down and pivoted, and when the substrate support arms 43a and 43b are driven, an operation is performed to transfer a large substrate with high throughput and high transfer stability. S-shaped drive is adopted in which the speed is changed so as to draw an S-shape instead of a linear one when rising and stopping. In addition, from the viewpoint of improving the throughput, a pass operation for starting the next operation before one operation is completed is adopted. further,
From the viewpoint of transport stability, when multiple axes move, the multi-axis synchronization that the other axis moves according to the end point of the axis that controls the speed, and the auto accelerator that controls the acceleration / deceleration value when the movement distance is short is adopted. .

As described above, the main transfer device 17 having the above-described configuration is adjusted to a predetermined position by the base member 42 moving up and down and turning while the device main body 41 moves along the transfer path 12. The substrate G is transferred to and from the arm 11 of the transport mechanism 10 by the substrate support arms 43a and 43b, and the substrate G is loaded into and unloaded from each processing unit in the front section 2a, and is further transferred to and from the relay section 15. The transfer of the substrate G is performed.

Similarly, the main transfer device 18 is adjusted to a predetermined position by the base member 42 moving up and down and turning while the device main body 41 moves on the transfer path 13, and is adjusted by the substrate support arms 43 a and 43 b. The transfer of the substrate G to and from the relay unit 15 is performed, and the transfer and transfer of the substrate G to and from the respective processing units of the middle unit 2b. I have.

Similarly, the main transfer device 19 is adjusted to a predetermined position by the base member 42 moving up and down and turning while the device main body 41 moves on the transfer path 14, and is adjusted by the substrate support arms 43 a and 43 b. The transfer of the substrate G to and from the relay unit 16 is performed, and the transfer and transfer of the substrate G to and from the respective processing units in the subsequent stage unit 2c, and the transfer of the substrate G to and from the interface unit 3 are performed. I have.

Next, referring to FIG. 2, in the control device of the LCD substrate coating / developing processing system, the transport device 1
8 and 19 are stopped, and the processing units 21 and
The case of calculating the processing time of 22 will be described.

In this embodiment, the entire system is covered with a cover, and the spinner-based processing units 21a, 21a
1b, 22, 23, 24a, 24b and 24c are provided with doors for opening and closing the cover, and a magnet sensor 56 (detection means) for detecting the opening and closing of these doors. Then, when any one of the covers is opened, a cover opening signal detected by the magnet sensor 56 is transmitted to the unit controllers 51 a and 51.
1b, 52, 53, 54a, and 54b are configured to be input to the unit corresponding to the processing unit whose cover is opened.

Each of the unit controllers 51a, 51b,
The detection signals input to 52, 53, 54a, 54b are sent to the main controller 50 and
When it is necessary to stop 7, 18, and 19, the main controller 50 generates a stop control signal for the transfer device, and the signal is transmitted to the transfer device controller 4.
7, 48, 49, and are transferred to the main transfer devices 17, 18, 19
Is to be stopped. More specifically, when the main controller 50 receives a signal to open the cover of a processing unit while the main transfer devices 17, 18, and 19 are accessing a certain processing unit, the main controller 5
From 0, a stop signal is output to the transport device controller corresponding to the accessing transport device, and the accessing transport device is stopped.

For example, taking the middle section 2b as an example, as shown in FIG. 6, a resist coating unit (CT)
22 and edge remover (ER) 23 cover 9
1 and a door 92 which can be slidably opened and closed on its side.
The door 92 is provided with a magnet sensor 56 at the open / close portion. As shown in FIG. 7A, the magnet sensor 56 includes a magnet 94 and a detection unit 95. The magnet 94 is attached to the door 92, and the detection unit 95 is attached to the support 93 of the door 92. When the door 92 is opened, that is, when the cover 91 is opened, as shown in FIG. 7B, the magnet 94 that has been close to the detection unit 95 in the closed state is separated from the detection unit 95 and is separated from the detection unit 95. Since the magnetic field detected by 95 changes, it is detected that the door 92 has been opened. This open signal is output to the main controller 50, and if the main transport unit 18 has access to the processing unit with the door opened, that is, the resist coating unit (CT) 22 or the edge remover (ER) 23, the transport is performed from the main controller 50. A stop control signal is output to the device controller 48, and the operation of the main transport device 18 is stopped.

As described above, in this embodiment, when any one of the processing units 21a, 21b, 22... Is opened, the main transport device accessing the processing unit with the opened cover is opened. Are stopped, the processing units 21a, 21b, 22...
.., There is no trouble that the operator comes into contact with the transfer arm. In addition, since the entire system is not stopped unlike the interlock device, only the main transport device accessing the processing units 21a, 21b, 22... Can be stopped, and time is required for starting up the entire system. There is no decrease in throughput due to the necessity.

Further, since the opening / closing of the cover is detected by the magnet sensor 56, the opening / closing of the cover can be detected extremely accurately and easily.

On the other hand, in the present embodiment, a timer 57 for inputting a time pulse signal to each of the unit controllers 51a, 51b, 52... Is provided. The timer 57 is provided for each of the unit controllers 51a, 51
, 52,... are arranged on the same board.

Based on the time pulse signal from the timer 57, the processing time of each processing unit 21a, 21b, 22... Is calculated, and the processing capability of each processing unit is evaluated.

Specifically, each unit controller 51
a, 51b, 52 ... are the processing units 21a, 21
.. b, 22... the receiving system of the substrate G is checked, and from this time, the calculation of the processing time is started based on the time pulse signal from the timer 57.

Next, the substrates G are carried into the respective processing units 21a, 21b, 22... By the transporting devices 17, 18, 19, and the substrates G are subjected to predetermined processing.
8 and 19, the processed substrate G is processed by each processing unit 21,
22 ...

When the substrate G is unloaded, the completion of the processing of the substrate G is confirmed by the unit controllers 51a, 51b, 52,..., The processing units 21a, 21b, 22,. With the confirmation of the completion of the processing, the calculation of the processing time based on the time pulse signal is ended. Thus, the processing time of each of the processing units 21a, 21b, 22... Is obtained.

As described above, in the present embodiment, the processing time of each processing unit 21a, 21b, 22... Is automatically obtained by software, so that the processing time is measured by an operator using a stopwatch. In addition, there is no possibility that the processing time cannot be accurately measured due to the individual difference of the operator who performs the measurement, and since the measurement is not performed by the visual observation of the operator, the operation time in a portion covered with a cover or the like cannot be visually observed. Can be measured, and the measurement operation itself does not require much time and labor. Therefore, the processing time of each processing unit can be measured accurately and in detail.

Each unit controller 51a, 5
1b, 52... Calculated by the processing units 21a, 2
The processing times of 1b, 22... Can be sent to the main controller 50, and the main controller 50 can collect the processing times of the respective processing units and grasp the processing times of the entire coating / developing processing system.

Next, another embodiment will be described. In the above embodiment, the cover of the spinner-based processing unit is provided so as to be openable and closable, but the heating processing unit (HP), the cooling unit (COL), and the adhesion processing unit (A
Although an example in which the thermal unit such as D) cannot open and close the cover has been described, this embodiment shows an example in which a thermal unit that can open and close the cover is used.

As described above, the thermal system unit is configured by being stacked in two stages, upper and lower, and both have almost the same structure. For example, the heat processing unit 26 is configured as shown in FIG. That is, in the heat treatment unit 26, the upper unit 26a and the lower unit 26b are fitted in a common box 100. Outside the upper unit 26a is a top plate 102 that can be opened and closed with a housing 101a.
a, and the outside of the lower unit 26b is
01b and a top plate 102b that can be opened and closed. That is, the casings 101a, 101b and the top plates 102a, 1
02b forms a cover for these units 26a and 26b.

Inside the upper unit 26a, the base member 1 is provided.
The hot plate 103a is provided in a state of being placed on the substrate 05a, and the substrate G is placed on the hot plate 103a and subjected to heat treatment. Around the hot plate 103a, there is a shutter 10 that can surround the substrate G in order to enhance the uniformity of heating.
4a is provided so as to be able to move up and down. Also, the top plate 102
A is formed with a passage 106a for exhausting heated air. Similarly, the lower unit 26b also includes the base member 105
b, a hot plate 103b is provided.
A shutter 104b is provided around it so as to be vertically movable. The top plate 102b is also provided with an air passage 106b.

The top plates 102a and 102b are provided so as to be slidable with respect to the housings 101a and 101b, respectively, and by pulling them out, the cover is opened. In the present embodiment, such a top plate 102
Opening of a and 102b by a magnet sensor (detection means)
Detect at 110.

The upper unit 26a will be described as an example. As shown in FIG.
10 includes a magnet 111 and a detection unit 112. The magnet 94 is attached to the top plate 102a, and the detection unit 112 is attached to the housing 101a. When the top plate 102a is pulled out, the cover is opened. In the closed state, as shown in FIG. 9B, in the closed state, the magnet 111 which was close to the detection unit 112 is separated from the detection unit 112 and the magnetic field detected by the detection unit 112 changes. It is detected that the plate 102a has been opened. This open signal is output to the main controller 50, and if the main transport device 17 is accessing this unit, a stop control signal is output from the main controller 50 to the transport device controller 47, and the operation of the main transport device 18 is stopped. You. The same applies to the lower unit 26b.

As described above, in this embodiment, even when the cover of the thermal system unit is opened, the main transfer device accessing the unit is stopped in the same manner as in the above-described embodiment. Similar effects can be obtained, such as preventing unexpected troubles in the unit.

The present invention is not limited to the above embodiment, but can be variously modified. For example, in the above-described embodiment, an example in which the present invention is applied to a resist coating / developing system has been described. However, the present invention is not limited to this and can be applied to other processes. In the above embodiment, L is used as the substrate.
Although the case where a CD substrate is used has been described, it is needless to say that the present invention is not limited to this and can be applied to the case of processing other substrates.

[0077]

As described above, according to the first and fifth aspects of the present invention, when the work cover of each processing unit is opened, the opening of the cover is detected by the detecting means, and based on this detection signal. Since the operation of the transfer arm accessing the processing unit with the cover opened is stopped, troubles such as the transfer arm contacting the operator while transferring the substrate in the processing unit may be caused. And it does not stop the entire system like an interlock device, so only the transfer arm that is accessing the processing unit can be stopped, which takes time to start up the entire system and lowers throughput. I won't let you.

According to the fourth or eighth aspect, since the detecting means is a magnet sensor for detecting the opening and closing of the cover, the opening and closing of the cover can be detected very accurately and easily.

According to the ninth aspect, when confirming the substrate receiving system of each processing unit, the operation of the time pulse signal from the timer is started, the substrate is carried into each processing unit by the transfer arm, and the predetermined time is transferred to the substrate. When the processing is carried out and the processed substrate is unloaded by the transfer arm and the completion of the processing is confirmed, the calculation of the time pulse signal from the timer is terminated, and the time elapsed from the start to the end of this calculation is automatically determined. Since the processing time can be obtained in a timely manner, there is no error due to individual differences between operators, and since the measurement is not performed visually by an operator, the operation time in a portion covered by a cover or the like can be reduced. Measurement can be performed, and the measurement operation itself does not require much time and labor. Therefore, the processing time of each processing unit can be measured accurately and in detail.

[Brief description of the drawings]

FIG. 1 is a plan view showing a resist coating / developing system to which a substrate transfer apparatus according to the present invention is applied.

FIG. 2 is a control block diagram of an LCD substrate coating / developing processing system.

FIG. 3 is a perspective view showing a transport device in the coating and developing system of FIG. 1;

FIG. 4 is a partial cross-sectional side view showing an X-axis drive mechanism of a substrate support arm of the transfer device and a Z-axis vertical movement mechanism of a base member.

FIG. 5 is a sectional view taken along the line A-A ′ in FIG. 5;

FIG. 6 is a side view showing the spinner unit side of the system of FIG. 1;

FIG. 7 is a view for explaining the detection principle of the magnet sensor when the cover of the spinner unit is opened.

FIG. 8 is a cross-sectional view showing a heat treatment unit to which another embodiment of the present invention is applied.

FIG. 9 is a view for explaining the detection principle of the magnet sensor when the cover of the heat treatment unit is opened.

[Explanation of symbols]

 12, 13, 14; transport paths 17, 18, 19; transport devices 47, 48, 49; transport device controllers 21a, 21b, 22 ...; each processing unit 51a, 51b, 52 ... unit controller 50; main controller 55a, 55b, 55c; block controllers 56, 110; magnet sensor (detection means) 57; timer 41; transport device main body 42; base members 43a, 43b;

Claims (9)

[Claims] A substrate is subjected to a predetermined process, and is moved along a transport path provided along a plurality of processing units covered with a cover that can be opened and closed, and the substrate is transported to the plurality of processing units. A substrate transfer device, comprising: a main body movable along a transfer path; a transfer arm that supports the substrate and transfers a substrate into and out of the plurality of processing units; and a cover of each of the processing units is opened. Detecting means for detecting the opening of the cover and outputting a detection signal, and, based on the detection signal, stopping the operation of the transfer arm for carrying the substrate in and out of the processing unit with the cover opened. And a control means for causing the substrate to be transferred. 2. The control means includes: a plurality of unit controllers for transmitting and receiving control signals to and from each processing unit to control each processing unit; and a plurality of block controllers each containing a plurality of unit controllers for each block. A main controller for controlling the unit controllers by transmitting and receiving control signals to and from a plurality of unit controllers housed in the block controllers;
The substrate transfer device according to claim 1, further comprising: 3. The cover opening detection signal is input to the unit controller and sent to the main controller, and a stop signal is generated for the transfer arm that carries the substrate into and out of the processing unit with the cover open. 3. The substrate transfer device according to claim 2, wherein the signal is sent to a transfer device controller that controls the transfer arm, and the transfer arm is stopped. 4. The apparatus according to claim 1, wherein said detecting means is a magnet sensor for detecting opening and closing of the cover.
The substrate transfer device according to claim 3. 5. A transport path, a plurality of processing units provided along the transport path and performing predetermined processing on a substrate, an openable / closable cover for covering each processing unit, and a substrate for each processing unit. A substrate transfer device that performs transfer of the substrate, the substrate transfer device includes a main body that is movable along a transfer path, a transfer arm that supports the substrate, and transfers the substrate into and out of the plurality of processing units. Detecting means for detecting the opening of the cover when the cover of each processing unit is opened, and outputting a detection signal; and A substrate processing apparatus comprising: a control unit configured to stop the operation of the transport arm being carried in and out. 6. A control means of the substrate transfer apparatus, comprising: a plurality of unit controllers for transmitting / receiving control signals to / from each processing unit to control each processing unit; and a plurality of unit controllers each containing a plurality of unit controllers for each block. A block controller; a main controller for transmitting and receiving control signals to and from the plurality of unit controllers housed in the block controllers to control the unit controllers;
The substrate processing apparatus according to claim 5, comprising: 7. The detection signal of the cover opening is input to the unit controller and sent to the main controller, and a stop signal of the transfer arm for loading and unloading the substrate into and from the processing unit with the cover opened is generated. 7. The substrate processing apparatus according to claim 6, wherein the signal is sent to a transfer device controller that controls the transfer arm, and the transfer arm is stopped. 8. The substrate processing apparatus according to claim 5, wherein the detection unit of the substrate transfer device is a magnet sensor that detects opening / closing of a cover. 9. A plurality of processing units for performing predetermined processing on a substrate, a transport device for transporting the substrate to the plurality of processing units, a timer for generating a time pulse signal, and a substrate receiving system of each processing unit. , The calculation of the time pulse signal from the timer is started, the substrate is carried into each processing unit by the transfer device, the substrate is subjected to a predetermined process, and the processed substrate is processed by the transfer arm into each processing unit. Control means for terminating the calculation of the time pulse signal from the timer when the completion of the processing is confirmed by carrying out the processing from the timer, and calculating the processing time by the elapsed time from the start to the end of the calculation. Substrate processing apparatus.