JPH1126648A - Semiconductor device and lead frame thereof - Google Patents

Semiconductor device and lead frame thereof

Info

Publication number
JPH1126648A
JPH1126648A JP18776897A JP18776897A JPH1126648A JP H1126648 A JPH1126648 A JP H1126648A JP 18776897 A JP18776897 A JP 18776897A JP 18776897 A JP18776897 A JP 18776897A JP H1126648 A JPH1126648 A JP H1126648A
Authority
JP
Japan
Prior art keywords
chip
lead frame
resin
lead
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18776897A
Other languages
Japanese (ja)
Other versions
JP2956659B2 (en
Inventor
Kenichi Kurihara
健一 栗原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP9187768A priority Critical patent/JP2956659B2/en
Publication of JPH1126648A publication Critical patent/JPH1126648A/en
Application granted granted Critical
Publication of JP2956659B2 publication Critical patent/JP2956659B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/4826Connecting between the body and an opposite side of the item with respect to the body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73215Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01078Platinum [Pt]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

Landscapes

  • Lead Frames For Integrated Circuits (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To allow the package to be small and improve the stability and reliability by sealing it with protrusion end faces exposed from the surface of a seal resin, and mounting outer terminals on the exposed end faces. SOLUTION: Bumps 10 are provided on inner leads 4, the element surface of a chip 1 is adhered to the back sides of the leads 4 through adhesives 3, the leads 4 are electrically connected to electrodes of a chip 1 through Au or other wires, the chip and inner leads are sealed with a resin so as to expose one main surface of the bump 10, and solder balls 6 are mounted on the one main surface of the bump 10. As no Dp processing is applied to the leads 4, there is no variation of the steps between the leads 4 and lead terminals. Thus a more small size product can be obtained, than a small package using a lead frame and lead terminals can be stably exposed after resin sealing.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体装置に関
し、特に、底面に外部端子となる半田ボールを格子状に
配列した樹脂封止型半導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, and more particularly, to a resin-encapsulated semiconductor device in which solder balls serving as external terminals are arranged in a lattice on a bottom surface.

【0002】[0002]

【従来の技術】この種の従来の樹脂封止型半導体装置に
ついて図6を参照して説明する。図6(a)は断面図、
図6(b)は端子面側(裏面側)から見た平面図であ
る。なお、図6(a)は図6(b)のA−A′線断面図
である。
2. Description of the Related Art A conventional resin-sealed semiconductor device of this type will be described with reference to FIG. FIG. 6A is a sectional view,
FIG. 6B is a plan view seen from the terminal surface side (back surface side). FIG. 6A is a cross-sectional view taken along line AA ′ of FIG. 6B.

【0003】図6を参照すると、この半導体装置は、内
部リード4の先端を一段低くする加工であるDp(ディ
ンプル)加工を施したリードフレームを用いている。そ
して、Dp加工を施したリードフレーム(「アンランド
部」ともいう)の裏面に、接着剤3を介してチップ1を
固着し、内部リード4とパッドをワイヤー7を接続する
リードがチップ上にあるLOC(Lead on Ch
ip)構造となっており、また端子部14が樹脂2から
露出するように、封止を行っている。
Referring to FIG. 6, this semiconductor device uses a lead frame which has been subjected to a Dp (dimple) process, which is a process for lowering the tip of an internal lead 4 by one step. Then, the chip 1 is fixed to the back surface of the Dp-processed lead frame (also referred to as an “unland portion”) via an adhesive 3, and the lead for connecting the internal lead 4 and the pad 7 to the wire 7 is on the chip. LOC (Lead on Ch
The sealing is performed so that the terminal portion 14 is exposed from the resin 2.

【0004】この場合、リードフレームにDp加工を施
しているのでDp加工部13の近傍は加工時の金型の傷
跡が内部リード4についてしまうため、内部リード4を
長くする必要がある。また、Dp加工部13のスプリン
グバックにより、端子部14が平面に対してDp加工部
側が浮き易く、樹脂封止の際に端子部14の表面に樹脂
バリが出きやすくなる。
In this case, since the lead frame is subjected to the Dp processing, a scar of the mold at the time of the processing is applied to the internal lead 4 in the vicinity of the Dp processing portion 13, so that it is necessary to lengthen the internal lead 4. In addition, due to the spring back of the Dp processing part 13, the terminal part 14 easily floats on the Dp processing part side with respect to the plane, and resin burrs easily emerge on the surface of the terminal part 14 during resin sealing.

【0005】さらに、端子部14はパッケージ端に並ぶ
ため、端子が片側一列にしか配置できないので、パッケ
ージ長は端子数と端子ピッチにより決定され、チップサ
イズに対して、大きなパッケージとなるという問題点が
あった。
Further, since the terminal portions 14 are arranged at the package end, the terminals can be arranged only in one line on one side. Therefore, the package length is determined by the number of terminals and the terminal pitch, and the package becomes large with respect to the chip size. was there.

【0006】また、この従来の半導体装置を実装した場
合、パッケージと実装基板の間隔は実装時の半田ペース
ト分しかなく、実装後の応力を緩和することが難しく、
実装部にクラックが入り、オープン不良が発生するとい
う問題点もあった。
In addition, when this conventional semiconductor device is mounted, the distance between the package and the mounting board is only the amount of solder paste at the time of mounting, and it is difficult to reduce the stress after mounting.
There is also a problem that cracks occur in the mounting portion and open defects occur.

【0007】次に、図7を参照して、別の従来の半導体
装置について説明する。図7は、フィルムキャリヤを用
いて樹脂封止を行うことによって小型化を図る半導体装
置であり、特開平5−82586号公報に提案される構
成を示すものである。
Next, another conventional semiconductor device will be described with reference to FIG. FIG. 7 shows a semiconductor device which is miniaturized by performing resin sealing using a film carrier, and shows a configuration proposed in Japanese Patent Application Laid-Open No. 5-82586.

【0008】図7を参照すると、この半導体装置は、パ
ッケージの小型化を図るために、バンプ10が形成され
たフィルムキャリヤ16とチップ1を接続しており、フ
ィルムキャリヤ16上に配線17が施され、ビアホール
19を通して突起状パッド18と接続している。
Referring to FIG. 7, in this semiconductor device, in order to reduce the size of a package, a chip 1 is connected to a film carrier 16 on which bumps 10 are formed, and a wiring 17 is provided on the film carrier 16. And is connected to the protruding pad 18 through the via hole 19.

【0009】この場合、まず組立資材に注目すると、フ
ィルムキャリヤを用いてビアホールのようなスルーホー
ルを設けると、リードフレームに比べてコストが10倍
以上になる。
In this case, paying attention to assembling materials, if a through hole such as a via hole is provided by using a film carrier, the cost is ten times or more as compared with a lead frame.

【0010】次に、組立については、従来のSOP(Sm
all Outline Package)などのリードフレームを用い
る樹脂封止型半導体装置と内部構造が異なるため、既存
の設備を共用することが不可能であり、特殊な設備を導
入せねばならず、組立コストが大幅に高くなるという問
題点があった。なお、同様なものとして、特開平7−3
21157号公報には、チップサイズがほぼパッケージ
サイズとなるようなフィルムキャリアを用いた半導体装
置が提案されている。
Next, regarding the assembly, the conventional SOP (Sm
Because the internal structure is different from resin-encapsulated semiconductor devices that use lead frames such as all outline packages, it is impossible to share existing equipment, special equipment must be introduced, and assembly costs are large. There was a problem that it becomes high. In addition, as the same, Japanese Patent Application Laid-Open No. 7-3
Japanese Patent Application No. 21157 proposes a semiconductor device using a film carrier having a chip size substantially equal to a package size.

【0011】[0011]

【発明が解決しようとする課題】以上説明したように、
従来の半導体装置においては、下記記載の問題点を有し
ている。
As described above,
The conventional semiconductor device has the following problems.

【0012】第1の問題点として、図6及び図7を参照
して説明した従来の半導体装置は、チップサイズが大き
く、ピン数の少ないチップしか組立することができない
ので、より小型のパッケージの実現が困難である、とい
うことである。また、封入時にリード端子を安定して露
出することがむずかしい。
As a first problem, the conventional semiconductor device described with reference to FIGS. 6 and 7 has a large chip size and can assemble only a chip with a small number of pins. It is difficult to realize. In addition, it is difficult to stably expose the lead terminals during encapsulation.

【0013】その理由は、リードフレームにDp加工を
施しており、パッケージ外部に出るリード端子が単列に
しか並べられない、からである。また、Dp加工の加工
精度と安定性が必要である、ためである。
[0013] The reason is that the lead frame is subjected to Dp processing, and the lead terminals extending outside the package can be arranged only in a single row. Further, the processing accuracy and stability of the Dp processing are required.

【0014】第2の問題点として、図8を参照して説明
した従来の半導体装置等のように、テープ(フィルムキ
ャリヤ)タイプの場合、組立コストが高い、ということ
である。
A second problem is that a tape (film carrier) type, such as the conventional semiconductor device described with reference to FIG. 8, has a high assembling cost.

【0015】その理由は、従来の組立設備を共用できな
い、ためである。また、テープフィルムキャリヤ材その
ものの、材料及び加工コストが高いことによる。
The reason is that conventional assembly equipment cannot be shared. Also, the material and processing cost of the tape film carrier material itself is high.

【0016】したがって、本発明は、上記問題点に鑑み
てなされたものであって、その目的は、大きさをチップ
サイズにちかくしてパケージの小型化を可能とすると共
に、安定性、信頼性を向上し、且つ、好ましくは従来の
組立ラインをそのまま利用しすることを可能としコスト
の上昇を回避した樹脂封止型の半導体装置を提供するこ
とにある。
Accordingly, the present invention has been made in view of the above problems, and an object of the present invention is to reduce the size of a package close to a chip size, and to improve stability and reliability. It is an object of the present invention to provide a resin-encapsulated semiconductor device which is improved, and which can preferably utilize a conventional assembly line as it is and which avoids an increase in cost.

【0017】[0017]

【課題を解決するための手段】前記目的を達成するた
め、本発明の半導体装置は、リードフレームの内部リー
ドの一方の面に接着剤を介し半導体素子(以下「チッ
プ」という)を固着し、前記チップの電極端子(以下
「パッド」という)と前記内部リードとをワイヤーで電
気的に接続し樹脂封止してなる半導体装置において、前
記内部リードの前記接着剤で前記チップに固着される面
と反対の面に突起部を備え、前記突起部端面が封止樹脂
の表面から露出するように封止され、前記露出した突起
部端面に外部端子が取り付けられてなる、ことを特徴と
する。
In order to achieve the above object, in a semiconductor device according to the present invention, a semiconductor element (hereinafter referred to as a "chip") is fixed to one surface of an internal lead of a lead frame via an adhesive. In a semiconductor device in which electrode terminals of the chip (hereinafter referred to as "pads") and the internal leads are electrically connected by wires and sealed with a resin, a surface of the internal leads fixed to the chip with the adhesive. A projection is provided on the opposite side to the projection, and the projection end face is sealed so as to be exposed from the surface of the sealing resin, and an external terminal is attached to the exposed projection end face.

【0018】また、本発明は、リードフレームの内部リ
ードの一方の面に接着剤を介し半導体素子(以下「チッ
プ」という)を固着し、前記チップの電極端子(以下
「パッド」という)と前記内部リードとをワイヤーで電
気的に接続し樹脂封止してなる半導体装置に用いられる
リードフレームにおいて、前記内部リードの前記接着剤
で前記チップに固着される面と反対の表面に、金属箔を
打ち抜くとともに前記内部リード表面に該金属箔を圧着
する打ち抜きバンプ法によって突起を備えたことを特徴
とする。
Further, according to the present invention, a semiconductor element (hereinafter, referred to as "chip") is fixed to one surface of an internal lead of a lead frame via an adhesive, and an electrode terminal (hereinafter, referred to as "pad") of the chip is connected to the chip. In a lead frame used for a semiconductor device which is electrically connected to an internal lead with a wire and sealed with a resin, a metal foil is formed on a surface of the internal lead opposite to a surface fixed to the chip with the adhesive. A projection is provided by punching and punching the metal foil on the surface of the internal lead.

【0019】[作用]本発明の作用について説明する
と、本発明においては、リードフレームの内部リード上
面に突起を設け、前記突起を露出するように樹脂封止す
るため、リードフレームにDp加工を施す必要がなくD
pの加工しろが不要となり、かつ前記突起は複数列に配
置することもできるため、従来よりも小型のパッケージ
となる。
[Operation] The operation of the present invention will be described. In the present invention, a protrusion is provided on the upper surface of the internal lead of the lead frame, and the lead frame is subjected to Dp processing in order to seal the protrusion with a resin. No need for D
Since the margin for processing p is unnecessary and the protrusions can be arranged in a plurality of rows, the package is smaller than before.

【0020】また、リードフレームを用いて従来のLO
C組立ラインが使用できるため、テープ(フィルムキャ
リヤ)タイプの小型パッケージに比べ、資材費および組
立コストが大幅に安くなる。
In addition, a conventional LO is used by using a lead frame.
Since the C assembly line can be used, material costs and assembling costs are greatly reduced as compared with a small tape (film carrier) type package.

【0021】[0021]

【発明の実施の形態】本発明の実施の形態について図面
を参照して以下に説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0022】図1は本発明の実施の形態の構成を示す図
であり、図1(a)は断面図、図1(b)は半田ボール
取付面側から見た平面図であり、図1(a)は図1
(b)のA−A線の断面図である。
FIG. 1 is a view showing the configuration of an embodiment of the present invention. FIG. 1 (a) is a sectional view, and FIG. 1 (b) is a plan view seen from the solder ball mounting surface side. (A) is FIG.
It is sectional drawing of the AA line of (b).

【0023】図1を参照すると、本発明の実施の形態で
は、内部リード4上に突起5を設け、突起の裏面側に接
着剤3を用いてチップ1の素子面と接着されており、ワ
イヤー7を介してパッド20と内部リード4とが電気的
に接続した後、突起5が樹脂2の表面から露出するよう
にして封止され、露出した突起5に、半田ボール6が取
付けられている。
Referring to FIG. 1, in the embodiment of the present invention, a projection 5 is provided on an internal lead 4, and is bonded to the element surface of the chip 1 using an adhesive 3 on the back side of the projection. After the pad 20 and the internal lead 4 are electrically connected via the, the projection 5 is sealed so as to be exposed from the surface of the resin 2, and the solder ball 6 is attached to the exposed projection 5. .

【0024】ワイヤーボンディングが突起5側で行なわ
れるので、ワイヤー露出防止のために突起5の高さはワ
イヤー高さ以上とされる。また、安定したボンディング
を行うためには、突起の高さとしては、10μm以上が
望ましい。
Since the wire bonding is performed on the protrusion 5 side, the height of the protrusion 5 is set to be equal to or higher than the wire height in order to prevent wire exposure. Further, in order to perform stable bonding, the height of the projection is desirably 10 μm or more.

【0025】図1に示すように、本発明の実施の形態で
は、端子を片側に複数列配置することが可能であり、例
えば片側2列配置の場合、単列配置に比べて同じ端子ピ
ッチなら2倍の端子数を有することができ、同じ端子数
にするならパッケージの全長は約半分の長さにすること
ができる。このため、従来のリードフレームを用いた小
型パッケージに較べ、より小型でかつ多くの端子を有す
る樹脂封止半導体装置を実現できる。
As shown in FIG. 1, in the embodiment of the present invention, terminals can be arranged in a plurality of rows on one side. For example, in the case of two rows on one side, if the terminal pitch is the same as compared to the single row arrangement, It can have twice the number of terminals, and if the number of terminals is the same, the total length of the package can be reduced to about half. Therefore, as compared with a conventional small package using a lead frame, a resin-sealed semiconductor device having a smaller size and more terminals can be realized.

【0026】また、本発明の実施の形態に係る樹脂封止
半導体装置を実装した場合、実装基板と半導体装置の間
には、半田ペーストと半田ボールの高さがあり、従来技
術に比べ、実装後の実装部にかかる応力の緩和効果があ
り、実装部にクラックが入ることを防止することも可能
である。
In the case where the resin-sealed semiconductor device according to the embodiment of the present invention is mounted, the height of the solder paste and the solder ball is between the mounting substrate and the semiconductor device. There is an effect of reducing the stress applied to the later mounted portion, and it is also possible to prevent cracks from being generated in the mounted portion.

【0027】次に、本発明の実施の形態に係る樹脂封止
型半導体装置は、リードフレームを用いてLOC構造を
採用しているため、従来のLOC構造の半導体装置など
で使用されている組立ライン設備をそのまま共用するこ
とができる。このため、テープ(フィルムキャリヤ)タ
イプのように特殊な設備を導入する必要がなく、従来の
リードフレームを用いた樹脂封止型半導体装置と同等以
下の組立コストで組立を行うことが可能である。
Next, since the resin-encapsulated semiconductor device according to the embodiment of the present invention employs a LOC structure using a lead frame, an assembly used in a conventional semiconductor device having a LOC structure or the like. Line equipment can be shared as it is. Therefore, there is no need to introduce special equipment such as a tape (film carrier) type, and assembly can be performed at an assembly cost equal to or less than that of a resin-encapsulated semiconductor device using a conventional lead frame. .

【0028】本発明の実施の形態では、SOPなどの工
程と比較すると半田ボールを取付ける工程が増えるが、
リード成形工程が不要であり、工程数も従来と変わるこ
とはない。
In the embodiment of the present invention, the number of steps for mounting the solder ball is increased as compared with the steps such as the SOP.
No lead forming step is required, and the number of steps is not different from the conventional one.

【0029】次に、本発明の実施の形態の樹脂封止型半
導体装置の製造方法について説明する。
Next, a method of manufacturing the resin-sealed semiconductor device according to the embodiment of the present invention will be described.

【0030】内部リードを少なくとも有する従来の樹脂
封止型半導体装置と同様のリードフレームを準備し、内
部リードの所定の位置に突起を形成する。突起の形成方
法としては、金属片を圧着して突起とする方法、半田ボ
ールを接合する方法等により行われる。
A lead frame similar to that of a conventional resin-encapsulated semiconductor device having at least internal leads is prepared, and projections are formed at predetermined positions on the internal leads. As a method of forming the protrusion, a method of pressing a metal piece into a protrusion, a method of bonding a solder ball, and the like are performed.

【0031】次に、内部リードの突起を形成した面の反
対面に、単層の接着剤または絶縁テープの両面に接着剤
を塗布した3層テープを貼り付ける。これらの接着層
は、従来のLOC構造のリードフレームに使用されるも
のと同一のものが使用可能であり、この時点で、本発明
の実施の形態に係るリードフレームは、従来の接着剤層
の付いたLOC構造のリードフレームに対し、接着剤層
の付いた面の反対面に突起を有すること以外、ほぼ同一
の構造となっている。
Next, a three-layer tape in which a single layer of adhesive or an insulating tape is applied to both sides of an insulating tape is attached to the surface opposite to the surface on which the protrusions of the internal leads are formed. These adhesive layers can be the same as those used for a conventional LOC structure lead frame, and at this time, the lead frame according to the embodiment of the present invention is replaced with the conventional adhesive layer. It has almost the same structure as the attached LOC structure lead frame except that it has a protrusion on the surface opposite to the surface with the adhesive layer.

【0032】次に、図1に示すように、従来のLOC構
造のリードフレーム同様、接着剤層の付いたリードフレ
ームに対し、半導体チップ1の素子面を接着剤3を介し
てリードフレームの内部リード4に貼り付け、半導体チ
ップ1の電極20と内部リードとをワイヤー7でボンデ
ィングする。内部リード4には、ワイヤーボンディング
を考慮して、AgやAu等のメッキをあらかじめ施して
おく。
Next, as shown in FIG. 1, similarly to a conventional lead frame having a LOC structure, the element surface of the semiconductor chip 1 is applied to the inside of the lead frame via an adhesive 3 with respect to a lead frame provided with an adhesive layer. The electrodes 20 of the semiconductor chip 1 and the internal leads are bonded to the leads 4 by wires 7. The internal leads 4 are previously plated with Ag, Au, or the like in consideration of wire bonding.

【0033】次に、従来の樹脂封止型半導体装置の製造
方法と同様に、トランスファーモールド法によって、チ
ップ1や内部リード4等をエポキシ樹脂2等で樹脂封止
すると同時に、リードフレームに形成された突起5の一
主面を樹脂2から露出させる。
Next, similarly to the conventional method of manufacturing a resin-encapsulated semiconductor device, the chip 1, the internal leads 4 and the like are resin-encapsulated with the epoxy resin 2 and the like at the same time as being formed on the lead frame by transfer molding. One main surface of the protrusion 5 is exposed from the resin 2.

【0034】ついで、樹脂表面に捺印を施し、露出した
突起5の表面上に半田ボール6をリフロー法等で取り付
け、金型等で半導体装置外形を切断してリードフレーム
から分離し、電気選別等を実施して、半導体装置が完成
する。
Then, the resin surface is stamped, solder balls 6 are mounted on the exposed surfaces of the projections 5 by a reflow method or the like, and the outer shape of the semiconductor device is cut off with a mold or the like, separated from the lead frame, and separated from the lead frame. Is performed to complete the semiconductor device.

【0035】[0035]

【実施例】上記した本発明の実施の形態について更に詳
細に説明すべく、本発明の実施例を図面を参照して以下
に説明する。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a block diagram showing an embodiment of the present invention;

【0036】[実施例1]図2は、本発明の第1の実施
例の構成を示す図である。図2を参照すると、本発明の
第1の実施例は、内部リード4上に突起であるバンプ1
0が設けられ、内部リードの裏面側には接着剤3を介し
てチップ1の素子面側が接着されており、チップ1の電
極と内部リード4とはAu等からなるワイヤーで電気的
に接続されており、バンプ10の一主面が露出するよう
にチップや内部リード等が樹脂で封止され、露出してい
るバンプ10の一主面に半田ボール6が取り付けられて
いる。
[First Embodiment] FIG. 2 is a diagram showing a configuration of a first embodiment of the present invention. With reference to FIG. 2, a first embodiment of the present invention
0 is provided, the element surface side of the chip 1 is adhered to the back surface side of the internal lead via an adhesive 3, and the electrode of the chip 1 and the internal lead 4 are electrically connected by a wire made of Au or the like. The chip, internal leads, and the like are sealed with resin so that one main surface of the bump 10 is exposed, and the solder ball 6 is attached to the one main surface of the exposed bump 10.

【0037】ここで、バンプ10はワイヤー7が樹脂裏
面から露出しないように、100μm以上に形成され、
内部リードとの接合面には接合性を考慮したAuやAg
等の金属層を、半田ボールの取り付け面には、半田付性
を考慮したAuや半田等の金属層を設けることが望まし
い。
Here, the bump 10 is formed to have a thickness of 100 μm or more so that the wire 7 is not exposed from the back surface of the resin.
Au or Ag in consideration of bondability on the bonding surface with the internal lead
It is desirable to provide a metal layer such as Au or a solder on the mounting surface of the solder ball in consideration of solderability.

【0038】次に、本発明の第1の実施例に係る半導体
装置の製造方法について説明する。
Next, a method of manufacturing the semiconductor device according to the first embodiment of the present invention will be described.

【0039】一方の面に突起であるバンプを設け、反対
の面に接着剤層が設けられた内部リードを少なくとも有
するリードフレームを準備し、次に図2に示すように、
チップ1の素子面に対し接着剤3を介して内部リード4
を接着し、チップ1の電極と内部リード4とをワイヤー
7で接合後、バンプ10の一主面が露出するように樹脂
2で封止する。ついで捺印工程と半田ボール6を露出し
たバンプ10に取り付ける工程と半導体装置外形を切断
してリードフレームから分離する工程と電気選別工程等
を経て半導体装置が完成する。
A lead frame having at least an internal lead provided with a bump as a projection on one surface and an adhesive layer on the opposite surface is prepared. Next, as shown in FIG.
Internal leads 4 are attached to the element surface of chip 1 via adhesive 3.
After bonding the electrodes of the chip 1 and the internal leads 4 with the wires 7, the bumps 10 are sealed with the resin 2 so that one main surface is exposed. Next, the semiconductor device is completed through a stamping process, a process of attaching the solder balls 6 to the exposed bumps 10, a process of cutting the outer shape of the semiconductor device to separate it from the lead frame, an electrical sorting process, and the like.

【0040】ここで、バンプ10の形成方法は、金属箔
を金型のポンチで打ち抜きと同時に内部リードの所定の
位置に圧着する打ち抜きバンプ方式で行う。金属箔を選
択することで、CuやAu等の単一材料でも半田を両面
に形成したCu等の複合材料でも自由に選択できるとい
う利点がある。この場合は、Cu等の単一材料でも可能
であるが、内部リード面に圧着するバンプの面はAuや
Ag等の圧着性を考慮したメッキを施し、半田ボール6
を取り付けるバンプ10の面は、Auや半田等の半田付
性を考慮したメッキを施したCuや42合金等の複合材
料を用いることもできる。また、これらのメッキはいず
れか一方のみでも良く、メッキ以外の金属箔のクラッド
材の使用による方法での形成でも良い。
Here, the bump 10 is formed by a punched bump method in which a metal foil is punched out with a die punch and simultaneously pressed against a predetermined position of an internal lead. By selecting a metal foil, there is an advantage that a single material such as Cu or Au or a composite material such as Cu in which solder is formed on both surfaces can be freely selected. In this case, a single material such as Cu can be used, but the surface of the bump to be pressed against the internal lead surface is plated with Au, Ag or the like in consideration of the pressure resistance, and the solder ball 6 is pressed.
The surface of the bump 10 to which the solder is attached may be made of a composite material such as Cu or a 42 alloy plated with Au or solder in consideration of solderability. Further, only one of these platings may be used, and the plating may be formed by a method using a metal foil clad material other than the plating.

【0041】さらに、本発明の第1の実施例において
は、金属箔の打ち拭きによる形成であるため、バンプ高
さは金属箔の厚みを選択することで自由に選択すること
ができ、バンプ高さのバラツキも少ないという利点があ
り、樹脂封止時にバンプの一主面を露出する時に樹脂バ
リの発生が少ないという作用効果もある。
Further, in the first embodiment of the present invention, since the bump is formed by wiping the metal foil, the bump height can be freely selected by selecting the thickness of the metal foil. There is also an advantage that there is little variation in the thickness, and there is also an operational effect that there is little occurrence of resin burrs when one main surface of the bump is exposed during resin sealing.

【0042】なお、本発明の第1の実施例において、突
起以外については従来の樹脂封止型半導体装置と同様の
材料であり、内部リードとチップとを接着する接着剤は
従来のLOC構造のリードフレームと同一の熱硬化性樹
脂または熱可塑性樹脂をベースにした接着剤を使用し、
接着剤の単層またはポリイミド等の絶縁テープの両面に
上記接着剤を塗布した3層のテープを使用する。また、
内部リードを形成するリードフレームも特殊な加工をす
ること無く、従来のエッチング法またはプレス法によっ
て製造可能である。
In the first embodiment of the present invention, except for the projections, the same material as that of the conventional resin-encapsulated semiconductor device is used, and the adhesive for bonding the internal lead and the chip is formed of the conventional LOC structure. Using an adhesive based on the same thermosetting resin or thermoplastic resin as the lead frame,
A single layer of adhesive or a three-layer tape in which the above adhesive is applied to both sides of an insulating tape such as polyimide is used. Also,
The lead frame forming the internal leads can also be manufactured by a conventional etching method or press method without special processing.

【0043】[実施例2]次に、本発明の第2の実施例
について説明する。図3は、本発明の第2の実施例の構
成を示す断面図である。
Second Embodiment Next, a second embodiment of the present invention will be described. FIG. 3 is a sectional view showing the configuration of the second embodiment of the present invention.

【0044】図3を参照すると、本発明の第2の実施例
においては、内部リード4上の突起をCu等の金属を芯
とし、周囲に半田等を被覆したコアボール8で形成した
半導体装置の断面図である。コアボールの内部リードへ
の取り付けは、芯に被覆された半田を介して行う。半田
付性を考慮して、内部リード上のコアボール取り付け部
にはAuや半田等の金属をメッキ等で施しておくことが
望ましい。
Referring to FIG. 3, in a second embodiment of the present invention, a semiconductor device in which a projection on an internal lead 4 is formed of a core ball 8 made of a metal such as Cu as a core and the periphery of which is coated with solder or the like. FIG. Attachment of the core ball to the internal lead is performed via solder coated on the core. In consideration of solderability, it is desirable to apply a metal such as Au or solder to the core ball attachment portion on the internal lead by plating or the like.

【0045】ワイヤー7の高さを確保するために、コア
ボール8の径は100μm以上のものを使用することが
望ましい。
In order to secure the height of the wire 7, it is desirable to use a core ball 8 having a diameter of 100 μm or more.

【0046】本実施例では、コアボール8の芯を硬い材
料とすることで、突起としてのコアボール高さが安定
し、且つ、突起形成は全突起に対し同時に行うことがで
きるという利点がある。
In this embodiment, there is an advantage that the core of the core ball 8 is made of a hard material, so that the height of the core ball as the projection is stable and the projection can be formed on all the projections at the same time. .

【0047】[実施例3]図4は、本発明の第3の実施
例の構成を示す断面図である。図4を参照すると、本発
明の第3の実施例においては、突起を導電性ペースト1
1で形成している。ボンディング前までに、スクリーン
印刷などにより、CuペーストやAgペーストなどの導
電性ペーストを内部リード4上に印刷し、リフローなど
で硬化し突起を形成する。
[Embodiment 3] FIG. 4 is a sectional view showing the structure of a third embodiment of the present invention. Referring to FIG. 4, in a third embodiment of the present invention, the protrusions are
1 is formed. Before bonding, a conductive paste such as a Cu paste or an Ag paste is printed on the internal leads 4 by screen printing or the like, and cured by reflow or the like to form protrusions.

【0048】[実施例4]図5は、本発明の第4の実施
例の構成を示す断面図である。図4を参照すると、本発
明の第4の実施例においては、突起を内部リード4をプ
レス加工し、凸部を設けることにより形成している。曲
げや絞り加工などのプレス加工で内部リード4の一部に
プレス加工部12を設けて突起を形成している。リード
フレームパターンのプレス加工と共に行うことにより、
安価な突起付リードフレームの提供が可能となる。
[Embodiment 4] FIG. 5 is a sectional view showing the structure of a fourth embodiment of the present invention. Referring to FIG. 4, in the fourth embodiment of the present invention, the projection is formed by pressing the internal lead 4 and providing a projection. Pressing portions 12, such as bending and drawing, are provided with a press-formed portion 12 on a part of the internal lead 4 to form a projection. By performing it together with the press processing of the lead frame pattern,
An inexpensive lead frame with a projection can be provided.

【0049】[0049]

【発明の効果】以上説明したように、本発明によれば下
記記載の効果を奏する。
As described above, according to the present invention, the following effects can be obtained.

【0050】本発明の第1の効果は、従来のリードフレ
ームを用いた小型パッケージに比べて、より小型化で
き、且つ、リード端子を樹脂封入後安定して露出でき
る、ということである。
The first effect of the present invention is that, compared to a conventional small package using a lead frame, the size can be further reduced and the lead terminals can be stably exposed after encapsulating the resin.

【0051】その理由は、本発明においては、内部リー
ドにDp加工を施さないので、内部リードとリード端子
との段差のバラツキがないからである。
The reason is that, in the present invention, since the internal leads are not subjected to Dp processing, there is no variation in the level difference between the internal leads and the lead terminals.

【0052】本発明の第2の効果は、資材費および組立
コストが大幅に低減できる、ということである。
A second effect of the present invention is that material costs and assembly costs can be significantly reduced.

【0053】その理由は、本発明においては、テープタ
イプと異なり、リードフレームを用いており、従来の組
立設備を共用することができるからである。
The reason is that, unlike the tape type, a lead frame is used in the present invention, and the conventional assembly equipment can be shared.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態の構成を示す図であり、
(a)は断面図、(b)は平面図である。
FIG. 1 is a diagram showing a configuration of an embodiment of the present invention;
(A) is a sectional view, and (b) is a plan view.

【図2】本発明の第1の実施例の構成を示す断面図であ
る。
FIG. 2 is a sectional view showing a configuration of a first exemplary embodiment of the present invention.

【図3】本発明の第2の実施例の構成を示す断面図であ
る。
FIG. 3 is a sectional view showing a configuration of a second exemplary embodiment of the present invention.

【図4】本発明の第3の実施例の構成を示す断面図であ
る。
FIG. 4 is a sectional view showing a configuration of a third exemplary embodiment of the present invention.

【図5】本発明の第4の実施例の構成を示す断面図であ
る。
FIG. 5 is a sectional view showing a configuration of a fourth embodiment of the present invention.

【図6】従来の樹脂封止小型半導体装置の構成を示す図
であり、(a)は断面図、(b)は平面図である。
6A and 6B are diagrams showing a configuration of a conventional resin-sealed small semiconductor device, wherein FIG. 6A is a cross-sectional view and FIG. 6B is a plan view.

【図7】別の従来の小型半導体装置の構成を示す断面図
である。
FIG. 7 is a cross-sectional view showing the configuration of another conventional small semiconductor device.

【符号の説明】[Explanation of symbols]

1 チップ 2 樹脂 3 接着剤 4 内部リード 5 突起 6 半田ボール 7 ワイヤー 8 コアボール 9 導電性接着剤 10 バンプ 11 導電性ペースト 12 プレス加工部 13 Dp加工部 14 端子部 15 電極 16 フィルムキャリヤ 17 配線 18 突起状パッド 19 ビアホール 20 パッド DESCRIPTION OF SYMBOLS 1 Chip 2 Resin 3 Adhesive 4 Internal lead 5 Projection 6 Solder ball 7 Wire 8 Core ball 9 Conductive adhesive 10 Bump 11 Conductive paste 12 Press processing part 13 Dp processing part 14 Terminal part 15 Electrode 16 Film carrier 17 Wiring 18 Projecting pad 19 Via hole 20 Pad

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】リードフレームの内部リードの一方の面に
接着剤を介し半導体素子(以下「チップ」という)を固
着し、前記チップの電極端子(以下「パッド」という)
と前記内部リードとをワイヤーで電気的に接続し樹脂封
止してなる半導体装置において、 前記内部リードの、前記接着剤で前記チップに固着され
る面と反対の面に、突起部を備え、前記突起部端面が封
止樹脂の表面から露出するように封止され、前記露出し
た突起部端面に外部端子が取り付けられてなる、ことを
特徴とする樹脂封止型半導体装置。
A semiconductor element (hereinafter, referred to as "chip") is fixed to one surface of an internal lead of a lead frame via an adhesive, and electrode terminals of the chip (hereinafter, referred to as "pads").
And a resin device which is electrically connected to the internal lead with a wire and sealed with a resin. The semiconductor device further comprises a protrusion on a surface of the internal lead opposite to a surface fixed to the chip with the adhesive. A resin-encapsulated semiconductor device, wherein the protrusion end surface is sealed so as to be exposed from the surface of a sealing resin, and an external terminal is attached to the exposed protrusion end surface.
【請求項2】リードフレームの内部リードの一方の面に
接着剤を介し半導体素子(以下「チップ」という)を固
着し、前記チップの電極端子(以下「パッド」という)
と前記内部リードとをワイヤーで電気的に接続し樹脂封
止してなる半導体装置に用いられるリードフレームにお
いて、 前記内部リードの、前記接着剤で前記チップに固着され
る面と反対の表面に、金属箔を打ち抜くとともに前記内
部リード表面に該金属箔を圧着する打ち抜きバンプ法に
よって形成されてなる突起を備えたことを特徴とするリ
ードフレーム。
2. A semiconductor element (hereinafter, referred to as "chip") is fixed to one surface of an internal lead of a lead frame via an adhesive, and an electrode terminal of the chip (hereinafter, referred to as "pad").
And a lead frame used in a semiconductor device which is electrically connected to the internal lead with a wire and sealed with a resin, wherein the internal lead has a surface opposite to a surface fixed to the chip with the adhesive, A lead frame comprising a projection formed by punching a metal foil and pressing the metal foil onto the surface of the internal lead by a punching bump method.
【請求項3】リードフレームの内部リードの一方の面に
接着剤を介し半導体素子(以下「チップ」という)を固
着し、前記チップの電極端子(以下「パッド」という)
と前記内部リードとをワイヤーで電気的に接続し樹脂封
止してなる半導体装置に用いられるリードフレームにお
いて、 前記内部リードの前記接着剤で前記チップに固着される
面と反対の表面に、Cu等の金属を芯とし半田等を被覆
したコアボールを取り付けてなる突起を備えた、ことを
特徴とするリードフレーム。
3. A semiconductor element (hereinafter, referred to as "chip") is fixed to one surface of an internal lead of a lead frame via an adhesive, and an electrode terminal of the chip (hereinafter, referred to as "pad").
And a lead frame used in a semiconductor device which is electrically connected to the internal lead with a wire and sealed with a resin, wherein a surface of the internal lead opposite to a surface fixed to the chip with the adhesive is Cu A lead frame provided with a projection formed by attaching a core ball coated with solder or the like using a metal such as a core as a core.
【請求項4】リードフレームの内部リードの一方の面に
接着剤を介し半導体素子(以下「チップ」という)を固
着し、前記チップの電極端子(以下「パッド」という)
と前記内部リードとをワイヤーで電気的に接続し樹脂封
止してなる半導体装置に用いられるリードフレームにお
いて、 前記リードフレームの前記接着剤で前記チップに固着さ
れる面と反対の表面に、スクリーン印刷などを用いてC
uペーストなどの金属ペーストにより形成されてなる突
起を備えている、ことを特徴とするリードフレーム。
4. A semiconductor element (hereinafter, referred to as "chip") is fixed to one surface of an internal lead of a lead frame via an adhesive, and an electrode terminal of the chip (hereinafter, referred to as "pad").
And a lead frame used in a semiconductor device formed by electrically connecting a resin to the internal lead with a wire and sealing with a resin. A screen is provided on a surface of the lead frame opposite to a surface fixed to the chip with the adhesive. C using printing
A lead frame comprising a projection formed by a metal paste such as a u paste.
【請求項5】前記内部リード表面の突起が、打ち抜きバ
ンプ法によって形成され、前記突起の一方の面は、前記
内部リードとの圧着性を考慮した、AuやAg等の金属
膜が形成され、他方の面は半田付性を考慮した、Auや
半田等の金属膜が形成されていることを特徴とする請求
項2記載のリードフレーム。
5. A projection on the surface of the internal lead is formed by a punching bump method, and one surface of the projection is formed with a metal film of Au, Ag, or the like in consideration of the pressure bonding property with the internal lead. 3. The lead frame according to claim 2, wherein a metal film such as Au or solder is formed on the other surface in consideration of solderability.
【請求項6】リードフレームの内部リードの一方の面に
接着剤を介し半導体素子(以下「チップ」という)を固
着し、前記チップの電極端子(以下「パッド」という)
と前記内部リードとをワイヤーで電気的に接続し樹脂封
止してなる半導体装置に用いられるリードフレームにお
いて、 前記内部リードの前記接着剤で前記チップに固着される
側と反対方向に凸形状となるように、絞り加工、曲げ加
工などのプレス加工技術を用いて形成される突起を備え
た、ことを特徴とするリードフレーム。
6. A semiconductor element (hereinafter, referred to as "chip") is fixed to one surface of an internal lead of a lead frame via an adhesive, and an electrode terminal of the chip (hereinafter, referred to as "pad").
And a lead frame used in a semiconductor device which is electrically connected to the internal lead with a wire and sealed with a resin. The lead frame has a convex shape in a direction opposite to a side of the internal lead fixed to the chip with the adhesive. A lead frame, comprising: a projection formed by using a press working technique such as drawing and bending.
【請求項7】前記請求項2〜6のいずれか一に記載のリ
ードフレームを用いたことを特徴とする樹脂封止型半導
体装置。
7. A resin-sealed semiconductor device using the lead frame according to any one of claims 2 to 6.
【請求項8】前記突起部が、バンプ、導電性樹脂で前記
内部リードと接合されるコアボール、導電性ペースのい
ずれか一よりなることを特徴とする請求項1記載の樹脂
封止型半導体装置。
8. The resin-encapsulated semiconductor according to claim 1, wherein the protrusion is made of one of a bump, a core ball joined to the internal lead by a conductive resin, and a conductive pace. apparatus.
【請求項9】前記突起部が、前記内部リードを機械的に
加工して形成されている、ことを特徴とする請求項1記
載の樹脂封止型半導体装置。
9. The resin-encapsulated semiconductor device according to claim 1, wherein said projection is formed by mechanically processing said internal lead.
JP9187768A 1997-06-27 1997-06-27 Semiconductor device and its lead frame Expired - Fee Related JP2956659B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9187768A JP2956659B2 (en) 1997-06-27 1997-06-27 Semiconductor device and its lead frame

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9187768A JP2956659B2 (en) 1997-06-27 1997-06-27 Semiconductor device and its lead frame

Publications (2)

Publication Number Publication Date
JPH1126648A true JPH1126648A (en) 1999-01-29
JP2956659B2 JP2956659B2 (en) 1999-10-04

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030012191A (en) * 2001-07-31 2003-02-12 주식회사 심텍 A printed circuit board for a window chip scale package having copper dots of preventing die tilt
JP2003243600A (en) * 2001-12-14 2003-08-29 Hitachi Ltd Semiconductor device and method of manufacturing the same
KR100578660B1 (en) * 1999-03-25 2006-05-11 주식회사 하이닉스반도체 structure for semiconductor-package and manufacture method of it
EP1659628A1 (en) * 2004-11-23 2006-05-24 Optium Care International Tech. Inc. High lead density electronic device
WO2009059883A1 (en) * 2007-11-08 2009-05-14 Cambridge Silicon Radio Limited Chip packaging
JP2010183122A (en) * 2010-05-27 2010-08-19 Texas Instr Japan Ltd Semiconductor device and production method therefor

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100578660B1 (en) * 1999-03-25 2006-05-11 주식회사 하이닉스반도체 structure for semiconductor-package and manufacture method of it
KR20030012191A (en) * 2001-07-31 2003-02-12 주식회사 심텍 A printed circuit board for a window chip scale package having copper dots of preventing die tilt
JP2003243600A (en) * 2001-12-14 2003-08-29 Hitachi Ltd Semiconductor device and method of manufacturing the same
EP1659628A1 (en) * 2004-11-23 2006-05-24 Optium Care International Tech. Inc. High lead density electronic device
WO2009059883A1 (en) * 2007-11-08 2009-05-14 Cambridge Silicon Radio Limited Chip packaging
US8508032B2 (en) 2007-11-08 2013-08-13 Cambridge Silicon Radio Limited Chip packaging
JP2010183122A (en) * 2010-05-27 2010-08-19 Texas Instr Japan Ltd Semiconductor device and production method therefor

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