JPH11258801A5 - - Google Patents

Info

Publication number
JPH11258801A5
JPH11258801A5 JP1998065598A JP6559898A JPH11258801A5 JP H11258801 A5 JPH11258801 A5 JP H11258801A5 JP 1998065598 A JP1998065598 A JP 1998065598A JP 6559898 A JP6559898 A JP 6559898A JP H11258801 A5 JPH11258801 A5 JP H11258801A5
Authority
JP
Japan
Prior art keywords
group
substituent
independently represent
cycloalkylene
hydrogen atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998065598A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11258801A (ja
JP3821570B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP06559898A priority Critical patent/JP3821570B2/ja
Priority claimed from JP06559898A external-priority patent/JP3821570B2/ja
Publication of JPH11258801A publication Critical patent/JPH11258801A/ja
Publication of JPH11258801A5 publication Critical patent/JPH11258801A5/ja
Application granted granted Critical
Publication of JP3821570B2 publication Critical patent/JP3821570B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP06559898A 1998-03-16 1998-03-16 ネガ型レジスト組成物 Expired - Lifetime JP3821570B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP06559898A JP3821570B2 (ja) 1998-03-16 1998-03-16 ネガ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06559898A JP3821570B2 (ja) 1998-03-16 1998-03-16 ネガ型レジスト組成物

Publications (3)

Publication Number Publication Date
JPH11258801A JPH11258801A (ja) 1999-09-24
JPH11258801A5 true JPH11258801A5 (cg-RX-API-DMAC7.html) 2005-02-24
JP3821570B2 JP3821570B2 (ja) 2006-09-13

Family

ID=13291626

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06559898A Expired - Lifetime JP3821570B2 (ja) 1998-03-16 1998-03-16 ネガ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP3821570B2 (cg-RX-API-DMAC7.html)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4648526B2 (ja) * 1999-09-02 2011-03-09 富士通株式会社 ネガ型レジスト組成物、レジストパターンの形成方法及び電子デバイスの製造方法
US6506534B1 (en) * 1999-09-02 2003-01-14 Fujitsu Limited Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices
JP2002006501A (ja) * 1999-11-09 2002-01-09 Sumitomo Chem Co Ltd 化学増幅型レジスト組成物
JP4105371B2 (ja) * 2000-07-28 2008-06-25 富士フイルム株式会社 ネガ型感光性平版印刷版
KR100840635B1 (ko) 2001-11-30 2008-06-24 와코 쥰야꾸 고교 가부시키가이샤 비스이미드 화합물, 이것을 이용한 산 발생제 및 레지스트조성물 및 해당 조성물을 이용한 패턴 형성 방법
JP2004126050A (ja) 2002-09-30 2004-04-22 Fuji Photo Film Co Ltd 平版印刷版原版
EP1857276A3 (en) * 2002-09-30 2007-12-05 FUJIFILM Corporation Planographic printing plate precursor
JP4137577B2 (ja) 2002-09-30 2008-08-20 富士フイルム株式会社 感光性組成物
JP4150261B2 (ja) 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP2004252201A (ja) 2003-02-20 2004-09-09 Fuji Photo Film Co Ltd 平版印刷版原版
JP4299639B2 (ja) 2003-07-29 2009-07-22 富士フイルム株式会社 重合性組成物及びそれを用いた画像記録材料
JP2005099284A (ja) 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 感光性組成物及び平版印刷版原版
ES2961372T3 (es) * 2015-07-10 2024-03-11 Arkema France Composiciones curables que comprenden acrilatos monofuncionales

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