JPH11256288A - Silicon steel sheet with low residual magnetic flux density - Google Patents

Silicon steel sheet with low residual magnetic flux density

Info

Publication number
JPH11256288A
JPH11256288A JP7862198A JP7862198A JPH11256288A JP H11256288 A JPH11256288 A JP H11256288A JP 7862198 A JP7862198 A JP 7862198A JP 7862198 A JP7862198 A JP 7862198A JP H11256288 A JPH11256288 A JP H11256288A
Authority
JP
Japan
Prior art keywords
flux density
magnetic flux
residual magnetic
concentration gradient
steel sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7862198A
Other languages
Japanese (ja)
Other versions
JP3460569B2 (en
Inventor
Yoshiichi Takada
芳一 高田
Misao Namikawa
操 浪川
Hironori Ninomiya
弘憲 二宮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Engineering Corp
Original Assignee
NKK Corp
Nippon Kokan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NKK Corp, Nippon Kokan Ltd filed Critical NKK Corp
Priority to JP07862198A priority Critical patent/JP3460569B2/en
Publication of JPH11256288A publication Critical patent/JPH11256288A/en
Application granted granted Critical
Publication of JP3460569B2 publication Critical patent/JP3460569B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a silicon steel sheet stably exhibiting low residual magnetic flux density and excellent in the balance of magnetic property among magnetic properties. SOLUTION: The silicon steel sheet with low residual magnetic flux density is obtained by providing a composition containing, by weight, <=0.02% C, 0.05-0.5% Mn, <=0.01% P, <=0.02% S, 0.001-0.06% sol. Al, <=0.01% N, and <=7%, on average, of Si, providing a concentration gradient of Si in a sheet thickness direction, and making the concentration gradient to >=3 wt.%/mm.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、偏磁による突入電
流が間題となるトランス、リアクトル、変成器(CT)
やモータなどの鉄心として用いられる残留磁束密度の低
い珪素鋼板に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transformer, a reactor, and a transformer (CT) in which an inrush current due to magnetic bias is a problem.
The present invention relates to a silicon steel sheet having a low residual magnetic flux density used as an iron core of a motor or a motor.

【0002】[0002]

【従来の技術】トランス、モータ等の鉄心に使用される
珪素鋼板は、磁束密度を高め、鉄損を低下させる方向で
研究が行われ、角形比の大きい材料が開発されてきた。
しかし、その結果、残留磁束密度が大きくなり、トラン
ス等の機器とした場合、偏磁によりさまざまな問題が発
生している。
2. Description of the Related Art Research has been conducted on silicon steel sheets used for iron cores of transformers, motors and the like to increase the magnetic flux density and reduce iron loss, and materials having a large squareness ratio have been developed.
However, as a result, the residual magnetic flux density becomes large, and in the case of a device such as a transformer, various problems occur due to the magnetic polarization.

【0003】そこで、本発明者らは、先に、偏磁の原因
である残留磁束密度を低下させるには板厚方向にSiの
濃度勾配を形成することが有効なことを見出し、特許出
願した(特開平9−184051号公報)。また、板厚
方向にSiの濃度勾配を形成することは特開昭62−2
27033号から特開昭62−227036号公報、お
よび特開平4−246157号公報に開示されている。
The inventors of the present invention have previously found that it is effective to form a Si concentration gradient in the thickness direction to reduce the residual magnetic flux density, which is a cause of magnetic bias, and filed a patent application. (JP-A-9-184051). Also, forming a Si concentration gradient in the thickness direction is disclosed in
No. 27033 to JP-A-62-227036 and JP-A-4-246157.

【0004】しかし、特開平9−184051号公報に
開示されたように確かに残留磁束密度は低下するもの
の、珪素鋼板において所望の低残留磁束密度を達成する
ために必要なSi濃度勾配の値自体は不明であった。こ
のため、Si濃度勾配が形成されていても十分な低残留
磁束密度が達成されない場合や、低残留磁束密度は達成
されるものの鉄損が増大し、透磁率が低下する問題が発
生する場合がある。
[0004] However, as disclosed in Japanese Patent Application Laid-Open No. 9-184051, although the residual magnetic flux density certainly decreases, the value of the Si concentration gradient required to achieve a desired low residual magnetic flux density in a silicon steel sheet itself is reduced. Was unknown. For this reason, there is a case where a sufficiently low residual magnetic flux density is not achieved even if a Si concentration gradient is formed, or a case where a low residual magnetic flux density is achieved but iron loss is increased and magnetic permeability is reduced occurs. is there.

【0005】一方、上記特開昭62−227033号か
ら特開昭62−227036号公報、および特開平4−
246157号公報において板板厚方向にSi濃度勾配
を形成する目的は、浸珪法(CVD法)で製造する6.
5wt.%珪素鋼板の生産効率の向上、鉄損の向上、お
よび加工性の向上であり、低残留密度特性については全
く触れられていない。
On the other hand, JP-A-62-27033 to JP-A-62-227036, and
In 246157, the purpose of forming a Si concentration gradient in the thickness direction of the sheet is to manufacture the silicon by a siliconizing method (CVD method).
5 wt. % Silicon steel sheet production efficiency, iron loss and workability, and no mention is made of low residual density characteristics.

【0006】[0006]

【発明が解決しようとする課題】本発明はかかる事情に
鑑みてなされたものであって、安定して低い残留磁束密
度を示し、磁気特性バランスの優れた珪素鋼板を提供す
ることを目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a silicon steel sheet which shows a low residual magnetic flux density stably and has an excellent magnetic property balance. .

【0007】[0007]

【課題を解決するための手段】本発明者らは、所望の低
残留磁束密度を達成するために必要なSi濃度勾配の解
析と実験とを行った。上記特開平9−184051号公
報に開示されている残留磁束密度低下のメカニズムは磁
区構造から検討したものである。そこに開示されたよう
な磁区構造となる理由を磁気弾性エネルギーから解析し
た。その結果、エネルギー的見地からはSi濃度勾配に
より低残留磁束密度化するのは以下のような理由による
と推定される。
Means for Solving the Problems The present inventors conducted analysis and experiments on the Si concentration gradient necessary for achieving a desired low residual magnetic flux density. The mechanism of the reduction of the residual magnetic flux density disclosed in the above-mentioned Japanese Patent Application Laid-Open No. 9-184051 has been studied from the magnetic domain structure. The reason for the magnetic domain structure as disclosed therein was analyzed from magnetoelastic energy. As a result, from an energy point of view, it is estimated that the lower residual magnetic flux density due to the Si concentration gradient is attributable to the following reasons.

【0008】Siの濃度勾配により板厚方向に磁歪の分
布が形成される。磁歪に分布があると、磁化された時に
板厚方向の表層と内部で応力が発生し、磁気弾性エネル
ギーが高まる。残留磁化も磁化状態であるため残留磁気
が大きいとエネルギー的に不利となるため、磁歪分布す
なわち濃度勾配があると残留磁気が小さい磁区構造とな
ると推定される。
The distribution of magnetostriction is formed in the thickness direction by the concentration gradient of Si. If there is a distribution in magnetostriction, when magnetized, stress is generated in the surface layer and inside in the thickness direction, and the magnetoelastic energy increases. Since the remanent magnetization is also in a magnetized state, if the remanence is large, it is disadvantageous in terms of energy. Therefore, it is estimated that a magnetostriction distribution, that is, a concentration gradient, results in a magnetic domain structure having a small remanence.

【0009】このように、低残留磁束密度化する上で、
Siの濃度勾配の値自体が重要な因子の一つであり、本
発明はこのような検討結果に基づき、所望の低残留磁束
密度を得ることができるSi濃度勾配を把握したもので
ある。
Thus, in order to reduce the residual magnetic flux density,
The value of the Si concentration gradient itself is one of the important factors, and the present invention has ascertained the Si concentration gradient from which a desired low residual magnetic flux density can be obtained based on the results of such studies.

【0010】すなわち、本発明は、C≦0.02wt.
%、0.05wt.%≦Mn≦0.5wt.%、P≦
0.01wt.%、S≦0.02wt.%、0.001
wt.%≦sol.Al≦0.06wt.%、N≦0.
01wt.%であり、Siを平均7wt.%以下含有
し、板厚方向にSiの濃度勾配を有し、濃度勾配が3w
t.%/mm以上であることを特徴とする、残留磁束密
度が低い珪素鋼板を提供する。Siの濃度勾配のさらに
好ましい範囲は、4.5wt.%/mm以上である。
That is, according to the present invention, C ≦ 0.02 wt.
%, 0.05 wt. % ≦ Mn ≦ 0.5 wt. %, P ≦
0.01 wt. %, S ≦ 0.02 wt. %, 0.001
wt. % ≦ sol. Al ≦ 0.06 wt. %, N ≦ 0.
01 wt. % And an average of 7 wt. % Or less, and has a Si concentration gradient in the thickness direction, and the concentration gradient is 3w.
t. % / Mm or more, characterized by having a low residual magnetic flux density. A more preferred range of the Si concentration gradient is 4.5 wt. % / Mm or more.

【0011】[0011]

【発明の実施の形態】以下、本発明について具体的に説
明する。上述したように、鉄心材料として用いられる珪
素鋼板は残留磁束密度が低いことが必要であり、そのた
めに本発明では板厚方向のSiの濃度勾配を規定する。
すなわち、上述したようにSi濃度勾配が存在すると残
留磁気が小さい磁区構造となる推定され、低残留磁束密
度化する上で、Si濃度勾配の値自体が重要な因子とな
る。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described specifically. As described above, the silicon steel sheet used as the iron core material needs to have a low residual magnetic flux density. Therefore, in the present invention, the concentration gradient of Si in the thickness direction is specified.
That is, as described above, the existence of the Si concentration gradient is presumed to result in a magnetic domain structure having a small residual magnetism, and the value of the Si concentration gradient itself is an important factor in reducing the residual magnetic flux density.

【0012】そこで、どの程度のSi濃度勾配があれば
所望の低残留磁束密度が得られるかを検討した。その結
果を表1に示す。なお、表1に示す濃度勾配(wt.%
/mm)はSi濃度が傾斜している部分における板厚方
向のSi濃度差(wt.%)を板厚方向の距離(mm)
で割った値であり、その例を図1または図2に示す。図
1は鋼板表層部と中心部にSi濃度一定の領域がある場
合であり、図2はSi濃度一定の領域がない場合であ
る。
Therefore, it was examined how much the Si concentration gradient required to obtain a desired low residual magnetic flux density. Table 1 shows the results. The concentration gradient (wt.%) Shown in Table 1 was used.
/ Mm) is the Si concentration difference (wt.%) In the thickness direction at the portion where the Si concentration is inclined is the distance (mm) in the thickness direction.
The example is shown in FIG. 1 or FIG. FIG. 1 shows a case where there is a region having a constant Si concentration in the surface layer portion and the central portion of the steel plate, and FIG. 2 shows a case where there is no region having a constant Si concentration.

【0013】[0013]

【表1】 [Table 1]

【0014】表1に示すように、残留磁束密度を実用的
な0.4T以下とするためにはSi濃度勾配が3wt.
%/mm以上であればよい。また、Si濃度勾配が4.
5wt.%/mm以上であれば、残留磁束密度は0.3
T以下のより好ましい値となる。
As shown in Table 1, in order to reduce the residual magnetic flux density to a practical value of 0.4 T or less, a Si concentration gradient of 3 wt.
% / Mm or more. Further, the Si concentration gradient is 4.
5 wt. % / Mm or more, the residual magnetic flux density is 0.3
It becomes a more preferable value of T or less.

【0015】低残留磁束密度化に必要とされるSi濃度
勾配値は、製品板厚が0.05〜0.65mmの間で変
化しても大きくは変わらないが、板厚が薄い場合はより
大きな値が必要とされる傾向にある。
The Si concentration gradient value required for lowering the residual magnetic flux density does not largely change even if the product plate thickness changes between 0.05 and 0.65 mm, but the Si concentration gradient value becomes smaller when the plate thickness is small. Large values tend to be required.

【0016】本発明において、平均Si濃度は7wt.
%以下とするが、これは7wt.%を超えると加工性が
劣化し、部品加工が不可能となるからである。
In the present invention, the average Si concentration is 7 wt.
% Or less, which is 7 wt. %, The workability is degraded, and component processing becomes impossible.

【0017】次に、Si以外の元素の限定理由について
説明する。Cは多量に含有されると磁気時効を引き起こ
すため、その上限を0.02wt.%とする。その下限
は特に規定されないが、経済的に除去する観点からはそ
の下限を0.001wt.%とすることが好ましい。
Next, the reasons for limiting elements other than Si will be described. If C is contained in a large amount, it causes magnetic aging, so the upper limit is 0.02 wt. %. The lower limit is not particularly defined, but from the viewpoint of economical removal, the lower limit is 0.001 wt. % Is preferable.

【0018】Mnは多量に含有されると鋼板が脆くなる
ため、その上限を0.5wt.%とする。ただし、その
含有量が低く過ぎると、熱延工程で破断や表面キズを誘
発するため、その下限を0.05wt.%とする。
If Mn is contained in a large amount, the steel sheet becomes brittle, so the upper limit is 0.5 wt. %. However, if the content is too low, breakage and surface flaws are induced in the hot rolling step, so the lower limit is 0.05 wt. %.

【0019】Pは磁気特性から見ると好ましい元素であ
るが、多量に含有されると鋼板の加工性を劣化させるた
め、その上限を0.01wt.%とする。その下限は特
に規定されないが、経済的に除去する観点からはその下
限を0.001wt.%とすることが好ましい。
P is a preferable element from the viewpoint of magnetic properties. However, when P is contained in a large amount, the workability of the steel sheet is deteriorated. %. The lower limit is not particularly defined, but from the viewpoint of economical removal, the lower limit is 0.001 wt. % Is preferable.

【0020】Sは加工性を劣化させるため、その上限を
0.02wt.%とする必要がある。その下限は特に規
定されないが、経済的に除去する観点からはその下限を
0.001wt.%とすることが好ましい。
Since S deteriorates workability, its upper limit is 0.02 wt. %. The lower limit is not particularly defined, but from the viewpoint of economical removal, the lower limit is 0.001 wt. % Is preferable.

【0021】sol.A1は同じく加工性を害するた
め、その上限を0.06wt.%とする。一方、脱酸剤
としての必要性からその下限を0.001wt.%とす
る。
Sol. A1 also impairs processability, so its upper limit is 0.06 wt. %. On the other hand, the lower limit is 0.001 wt. %.

【0022】Nは多量に含有されると窒化物を形成して
磁気特性を劣化させるため、その上限を0.01wt.
%とする必要がある。その下限は特に規定されないが、
現在の製鋼技術を考慮すると事実上0.0001wt.
%が下限となる。
If N is contained in a large amount, it forms nitrides and deteriorates magnetic properties.
%. The lower limit is not specified, but
Considering current steelmaking technology, practically 0.0001 wt.
% Is the lower limit.

【0023】本発明に係るSiの濃度勾配を有する珪素
鋼板は種々の方法で製造することができ、その製造方法
は限定されない。例えば、化字気相蒸着(CVD、浸珪
処理)法、物理気相蒸着(PVD)法、クラツド技術、
めっき技術によって製造することが可能である。
The silicon steel sheet having a concentration gradient of Si according to the present invention can be manufactured by various methods, and the manufacturing method is not limited. For example, chemical vapor deposition (CVD, siliconizing), physical vapor deposition (PVD), cladding technology,
It can be manufactured by plating technology.

【0024】例としてCVD法での製造方法を説明す
る。まず、例えば3wt.%珪素鋼の冷間圧延コイルを
通常の鋼板製造プロセスで製造する。このコイルをCV
D処理してSi濃度勾配を有する鋼板とする。すなわ
ち、非酸化性雰囲気中で1100℃以上に加熱してSi
化合物ガス、例えばSiCl4ガスと反応させ表面に高
Si濃度のSi層を形成する。引き続き拡散処理を行
い、Siを鋼板内部に必要量拡散させ、目的とする平均
Si量およびSi濃度勾配を有する珪素鋼板を製造す
る。
As an example, a manufacturing method by the CVD method will be described. First, for example, 3 wt. % Cold rolled steel is manufactured by a normal steel sheet manufacturing process. This coil is CV
D treatment is performed to obtain a steel sheet having a Si concentration gradient. That is, heating to 1100 ° C. or more in a non-oxidizing atmosphere
By reacting with a compound gas, for example, a SiCl 4 gas, a Si layer having a high Si concentration is formed on the surface. Subsequently, a diffusion process is performed to diffuse a required amount of Si into the inside of the steel sheet, thereby producing a silicon steel sheet having a target average Si amount and a Si concentration gradient.

【0025】なお、本発明において平均Siとは全板厚
に対するSi濃度の平均値を意味し、例えば製品厚さの
まま化学分析することにより得ることができる値であ
る。また、Si濃度の最大と最小は、全板厚をEPMA
分析して得られるSi濃度プロファイルから決定するこ
とができる。さらに、各元素の濃度は製品での濃度であ
る。さらにまた、残留磁束密度は、直流で1.2T励磁
後の値である。
In the present invention, the average Si means the average value of the Si concentration with respect to the total thickness, and is, for example, a value that can be obtained by chemical analysis with the product thickness. In addition, the maximum and minimum of the Si concentration are determined by EPMA
It can be determined from the Si concentration profile obtained by analysis. Furthermore, the concentration of each element is the concentration in the product. Furthermore, the residual magnetic flux density is a value after a DC excitation of 1.2 T.

【0026】[0026]

【実施例】表2に示す組成(Si以外は商品となった時
点での組成。SiはCVD処理前の組成)の板厚0.0
5〜0.5mmの鋼板を通常の鉄鋼製造プロセスで製造
した。これをCVD処理して種々のSi平均濃度と濃度
分布を持つ鋼板を得た。表3にその際の平均Si濃度と
Si濃度勾配を示す。そして、これら鋼板の残留磁束密
度を測定した。その結果を表3に併記する。
EXAMPLE The thickness of the composition shown in Table 2 (except for Si, the composition at the time of commercialization; Si is the composition before CVD treatment) is 0.0.
Steel sheets of 5-0.5 mm were manufactured by the usual steel making process. This was subjected to CVD treatment to obtain steel sheets having various Si average concentrations and concentration distributions. Table 3 shows the average Si concentration and the Si concentration gradient at that time. And the residual magnetic flux density of these steel plates was measured. The results are also shown in Table 3.

【0027】[0027]

【表2】 [Table 2]

【0028】[0028]

【表3】 [Table 3]

【0029】表3に示すように、Si濃度勾配が3w
t.%/mm以上の本発明材は、0.4T以下の低い残
留磁束密度を示すことが確認された。
As shown in Table 3, the Si concentration gradient was 3 w
t. % / Mm or more of the present invention material was confirmed to exhibit a low residual magnetic flux density of 0.4 T or less.

【0030】[0030]

【発明の効果】以上説明したように、本発明によれば、
安定して低い残留磁束密度を示し、磁気特性バランスの
優れた珪素鋼板を得ることができる。
As described above, according to the present invention,
It is possible to obtain a silicon steel sheet which shows a low residual magnetic flux density stably and has an excellent balance of magnetic properties.

【図面の簡単な説明】[Brief description of the drawings]

【図1】鋼板表層および中心部に濃度一定領域を有する
場合のSi濃度勾配の定義を説明するための図。
FIG. 1 is a diagram for explaining the definition of a Si concentration gradient in a case where a constant concentration region is provided in a surface layer and a central portion of a steel sheet.

【図2】濃度一定領域のない場合のSi濃度勾配の定義
を説明するための図。
FIG. 2 is a diagram for explaining the definition of a Si concentration gradient when there is no constant concentration region.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 C≦0.02wt.%、0.05wt.
%≦Mn≦0.5wt.%、P≦0.01wt.%、S
≦0.02wt.%、0.001wt.%≦sol.A
l≦0.06wt.%、N≦0.01wt.%であり、
Siを平均7wt.%以下含有し、板厚方向にSiの濃
度勾配を有し、濃度勾配が3wt.%/mm以上である
ことを特徴とする、残留磁束密度が低い珪素鋼板。
1. The method according to claim 1, wherein C ≦ 0.02 wt. %, 0.05 wt.
% ≦ Mn ≦ 0.5 wt. %, P ≦ 0.01 wt. %, S
≦ 0.02 wt. %, 0.001 wt. % ≦ sol. A
l ≦ 0.06 wt. %, N ≦ 0.01 wt. %
7 wt. % Or less, and has a Si concentration gradient in the thickness direction, and the concentration gradient is 3 wt. % / Mm or more, characterized by having a low residual magnetic flux density.
【請求項2】 Siの濃度勾配が4.5wt.%/mm
以上であることを特徴とする、請求項1に記載の残留磁
束密度が低い珪素鋼板。
2. The method according to claim 2, wherein the concentration gradient of Si is 4.5 wt. % / Mm
The silicon steel sheet having a low residual magnetic flux density according to claim 1, characterized in that:
JP07862198A 1998-03-12 1998-03-12 Silicon steel sheet with low residual magnetic flux density Expired - Fee Related JP3460569B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP07862198A JP3460569B2 (en) 1998-03-12 1998-03-12 Silicon steel sheet with low residual magnetic flux density

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106591708A (en) * 2016-12-21 2017-04-26 山东钢铁股份有限公司 Production method for producing low-carbon low-silicon and aluminum-containing steel through short process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106591708A (en) * 2016-12-21 2017-04-26 山东钢铁股份有限公司 Production method for producing low-carbon low-silicon and aluminum-containing steel through short process

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