JPH11248419A5 - - Google Patents

Info

Publication number
JPH11248419A5
JPH11248419A5 JP1998073148A JP7314898A JPH11248419A5 JP H11248419 A5 JPH11248419 A5 JP H11248419A5 JP 1998073148 A JP1998073148 A JP 1998073148A JP 7314898 A JP7314898 A JP 7314898A JP H11248419 A5 JPH11248419 A5 JP H11248419A5
Authority
JP
Japan
Prior art keywords
light
interferometer
measurement
photoelectric detector
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998073148A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11248419A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10073148A priority Critical patent/JPH11248419A/ja
Priority claimed from JP10073148A external-priority patent/JPH11248419A/ja
Publication of JPH11248419A publication Critical patent/JPH11248419A/ja
Publication of JPH11248419A5 publication Critical patent/JPH11248419A5/ja
Pending legal-status Critical Current

Links

JP10073148A 1998-03-06 1998-03-06 干渉計及びそれを備えた露光装置 Pending JPH11248419A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10073148A JPH11248419A (ja) 1998-03-06 1998-03-06 干渉計及びそれを備えた露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10073148A JPH11248419A (ja) 1998-03-06 1998-03-06 干渉計及びそれを備えた露光装置

Publications (2)

Publication Number Publication Date
JPH11248419A JPH11248419A (ja) 1999-09-17
JPH11248419A5 true JPH11248419A5 (enExample) 2005-10-20

Family

ID=13509827

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10073148A Pending JPH11248419A (ja) 1998-03-06 1998-03-06 干渉計及びそれを備えた露光装置

Country Status (1)

Country Link
JP (1) JPH11248419A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2004012245A1 (ja) * 2002-07-31 2005-11-24 株式会社ニコン 位置計測方法、位置制御方法、露光方法及び露光装置、並びにデバイス製造方法
JP4609257B2 (ja) * 2005-09-16 2011-01-12 パナソニック株式会社 界面の位置測定方法及び位置測定装置
JP5370106B2 (ja) * 2009-11-30 2013-12-18 株式会社ニコン 干渉計システム、ステージ装置及び露光装置
JP5787483B2 (ja) * 2010-01-16 2015-09-30 キヤノン株式会社 計測装置及び露光装置
CN102374844A (zh) * 2010-08-20 2012-03-14 上海微电子装备有限公司 一种测量工件台垂向位置的装置
NL2018737A (en) * 2016-05-09 2017-11-15 Asml Netherlands Bv Position measurement system, calibration method, lithographic apparatus and device manufacturing method

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