JPH11248419A - 干渉計及びそれを備えた露光装置 - Google Patents
干渉計及びそれを備えた露光装置Info
- Publication number
- JPH11248419A JPH11248419A JP10073148A JP7314898A JPH11248419A JP H11248419 A JPH11248419 A JP H11248419A JP 10073148 A JP10073148 A JP 10073148A JP 7314898 A JP7314898 A JP 7314898A JP H11248419 A JPH11248419 A JP H11248419A
- Authority
- JP
- Japan
- Prior art keywords
- light
- interferometer
- measurement
- photoelectric detector
- aberration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10073148A JPH11248419A (ja) | 1998-03-06 | 1998-03-06 | 干渉計及びそれを備えた露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10073148A JPH11248419A (ja) | 1998-03-06 | 1998-03-06 | 干渉計及びそれを備えた露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11248419A true JPH11248419A (ja) | 1999-09-17 |
| JPH11248419A5 JPH11248419A5 (enExample) | 2005-10-20 |
Family
ID=13509827
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10073148A Pending JPH11248419A (ja) | 1998-03-06 | 1998-03-06 | 干渉計及びそれを備えた露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11248419A (enExample) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004012245A1 (ja) * | 2002-07-31 | 2004-02-05 | Nikon Corporation | 位置計測方法、位置制御方法、露光方法及び露光装置、並びにデバイス製造方法 |
| JP2007078605A (ja) * | 2005-09-16 | 2007-03-29 | Matsushita Electric Ind Co Ltd | 界面の位置測定方法及び位置測定装置 |
| JP2011119303A (ja) * | 2009-11-30 | 2011-06-16 | Nikon Corp | 干渉計システム、ステージ装置及び露光装置 |
| JP2011145232A (ja) * | 2010-01-16 | 2011-07-28 | Canon Inc | 計測装置及び露光装置 |
| CN102374844A (zh) * | 2010-08-20 | 2012-03-14 | 上海微电子装备有限公司 | 一种测量工件台垂向位置的装置 |
| JP2019516133A (ja) * | 2016-05-09 | 2019-06-13 | エーエスエムエル ネザーランズ ビー.ブイ. | 位置測定システム、較正方法、リソグラフィ装置及びデバイス製造方法 |
-
1998
- 1998-03-06 JP JP10073148A patent/JPH11248419A/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004012245A1 (ja) * | 2002-07-31 | 2004-02-05 | Nikon Corporation | 位置計測方法、位置制御方法、露光方法及び露光装置、並びにデバイス製造方法 |
| JP2007078605A (ja) * | 2005-09-16 | 2007-03-29 | Matsushita Electric Ind Co Ltd | 界面の位置測定方法及び位置測定装置 |
| JP2011119303A (ja) * | 2009-11-30 | 2011-06-16 | Nikon Corp | 干渉計システム、ステージ装置及び露光装置 |
| JP2011145232A (ja) * | 2010-01-16 | 2011-07-28 | Canon Inc | 計測装置及び露光装置 |
| CN102374844A (zh) * | 2010-08-20 | 2012-03-14 | 上海微电子装备有限公司 | 一种测量工件台垂向位置的装置 |
| JP2019516133A (ja) * | 2016-05-09 | 2019-06-13 | エーエスエムエル ネザーランズ ビー.ブイ. | 位置測定システム、較正方法、リソグラフィ装置及びデバイス製造方法 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0956518B1 (en) | Interferometer system and lithographic apparatus comprising such a system | |
| US6252667B1 (en) | Interferometer having a dynamic beam steering assembly | |
| US6122058A (en) | Interferometer system with two wavelengths, and lithographic apparatus provided with such a system | |
| US6631004B1 (en) | Single-pass and multi-pass interferometry systems having a dynamic beam-steering assembly for measuring distance, angle, and dispersion | |
| US6813000B1 (en) | Exposure method and apparatus | |
| US6762845B2 (en) | Multiple-pass interferometry | |
| US6084673A (en) | Lithographic apparatus for step-and-scan imaging of mask pattern with interferometer mirrors on the mask and wafer holders | |
| JP3064433B2 (ja) | 位置合わせ装置およびそれを備えた投影露光装置 | |
| US6819434B2 (en) | Multi-axis interferometer | |
| US6509971B2 (en) | Interferometer system | |
| JPH11504724A (ja) | 差分干渉計システム及びこのシステムを具えたリソグラフステップアンドスキャン装置 | |
| US7106452B2 (en) | Measuring device and measuring method | |
| US5585923A (en) | Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means | |
| US7139080B2 (en) | Interferometry systems involving a dynamic beam-steering assembly | |
| JPH0455243B2 (enExample) | ||
| JP2001160535A (ja) | 露光装置、及び該装置を用いるデバイス製造方法 | |
| JPH11248419A (ja) | 干渉計及びそれを備えた露光装置 | |
| JP3832681B2 (ja) | ステージ装置及び該装置を備えた露光装置 | |
| JPH08219718A (ja) | 面位置検出装置 | |
| JPH09153452A (ja) | 投影露光装置 | |
| JPH11248418A (ja) | 光波干渉測定方法および装置、およびそれを備えた露光装置 | |
| US20250347537A1 (en) | Displacement detecting apparatus | |
| KR100637639B1 (ko) | 레이저 간섭계, 위치측정장치 및 측정방법, 노광장치, 및 그들의 제조방법 | |
| JPH10281715A (ja) | レーザ干渉計及びステージ装置 | |
| JP2004165417A (ja) | ステージ装置及び露光装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050303 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050614 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20071115 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20071127 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20080325 |