JPH11238855A - 半導体装置およびその製造方法 - Google Patents

半導体装置およびその製造方法

Info

Publication number
JPH11238855A
JPH11238855A JP10037719A JP3771998A JPH11238855A JP H11238855 A JPH11238855 A JP H11238855A JP 10037719 A JP10037719 A JP 10037719A JP 3771998 A JP3771998 A JP 3771998A JP H11238855 A JPH11238855 A JP H11238855A
Authority
JP
Japan
Prior art keywords
film
insulating film
interlayer insulating
forming
ferroelectric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10037719A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11238855A5 (enExample
Inventor
Sadahiro Kishii
貞浩 岸井
Naoya Sajita
直也 佐次田
Hisashi Miyazawa
久 宮沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10037719A priority Critical patent/JPH11238855A/ja
Publication of JPH11238855A publication Critical patent/JPH11238855A/ja
Publication of JPH11238855A5 publication Critical patent/JPH11238855A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Semiconductor Memories (AREA)
  • Non-Volatile Memory (AREA)
JP10037719A 1998-02-19 1998-02-19 半導体装置およびその製造方法 Pending JPH11238855A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10037719A JPH11238855A (ja) 1998-02-19 1998-02-19 半導体装置およびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10037719A JPH11238855A (ja) 1998-02-19 1998-02-19 半導体装置およびその製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2005096275A Division JP2005203813A (ja) 2005-03-29 2005-03-29 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPH11238855A true JPH11238855A (ja) 1999-08-31
JPH11238855A5 JPH11238855A5 (enExample) 2004-12-02

Family

ID=12505329

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10037719A Pending JPH11238855A (ja) 1998-02-19 1998-02-19 半導体装置およびその製造方法

Country Status (1)

Country Link
JP (1) JPH11238855A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6509593B2 (en) 2000-06-19 2003-01-21 Fujitsu Limited Semiconductor device and method of manufacturing the same
US6700147B1 (en) 2002-08-30 2004-03-02 Fujitsu Limited Semiconductor device and method of manufacturing the same
US6911686B1 (en) 1999-06-17 2005-06-28 Fujitsu Limited Semiconductor memory device having planarized upper surface and a SiON moisture barrier
JPWO2007102214A1 (ja) * 2006-03-08 2009-07-23 富士通マイクロエレクトロニクス株式会社 半導体装置及びその製造方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6911686B1 (en) 1999-06-17 2005-06-28 Fujitsu Limited Semiconductor memory device having planarized upper surface and a SiON moisture barrier
US7074625B2 (en) 1999-06-17 2006-07-11 Fujitsu Limited Semiconductor device and method of manufacturing the same
US6509593B2 (en) 2000-06-19 2003-01-21 Fujitsu Limited Semiconductor device and method of manufacturing the same
US6700147B1 (en) 2002-08-30 2004-03-02 Fujitsu Limited Semiconductor device and method of manufacturing the same
JPWO2007102214A1 (ja) * 2006-03-08 2009-07-23 富士通マイクロエレクトロニクス株式会社 半導体装置及びその製造方法
US8148798B2 (en) 2006-03-08 2012-04-03 Fujitsu Semiconductor Limited Semiconductor device and method for manufacturing the same

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