JPH11216317A - Substrate treatment system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate treatment system capable of preventing deterioration of the detection precision of a detector installed in a ventilation route to a substrate treatment apparatus due to dust in air. SOLUTION: An air conditioning unit 17 and a rotary type coating apparatus 1 are connected by an air blowing pipeline 13 and an air introducing part 8. A chemically adsorptive filter 16 is installed in the air conditioning unit 17 and an ULPA filter 9 is installed in the boundary part of the rotary type coating apparatus 1 and the air introducing part 8. A temperature and humidity detector 10 is installed near the joining part of the air blowing pipeline 13 and the air introducing part 8 and a HEPA filter 12 is installed in the upstream side of the temperature and humidity detector 10. After being passed through the chemically adsorptive filter 16 and adjusted to have proper temperature and humidity by a temperature and humidity adjusting part 14, air flows in the air blowing pipeline 13 and reaches the HEPA filter 12. The HEPA filter 12 collects and removes dust in air which deteriorates the detection precision of the temperature and humidity detector 10.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a substrate processing apparatus for performing predetermined processing on a substrate and a substrate processing system including an air conditioning unit for supplying clean air to the substrate processing apparatus.

[0002]

2. Description of the Related Art A substrate processing apparatus is used to perform predetermined processing on a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display device, a glass substrate for a photomask, and a glass substrate for an optical disk. One of the substrate processing apparatuses is a rotary coating apparatus. A rotary coating apparatus is an apparatus that supplies a resist solution to a substrate and spin-coats to form a uniform resist thin film on the surface of the substrate.

FIG. 5 is a schematic sectional view of a substrate processing system provided with a conventional rotary coating apparatus. In FIG. 5, the substrate processing system includes a rotary coating device 30 and an air conditioning unit 4.
1 and an air duct 45.

[0004] The air conditioning unit 41 includes a chemical adsorption filter 4.
2, a fan 43 and a temperature / humidity adjusting unit 44 are provided. One end of an air duct 45 is connected to the outlet side of the temperature / humidity adjusting unit 44. The other end of the air duct 45 is connected to the air inlet 37. A damper 39 for adjusting the air volume is provided in the vicinity of a connection portion of the air introduction section 37 with the air duct 45. In the vicinity of the damper 39, a temperature / humidity detector 40 for detecting the temperature and humidity of the air guided into the air inlet 37 is arranged. Further, a ULPA (Ultra Low Pe) is provided at the boundary between the rotary coating device 30 and the air introduction unit 37.
netration Air) filter 38 is provided.

[0005] The rotary coating apparatus 30 has a rotary unit 31 disposed inside a housing 36. Rotating unit 31
Are a substrate holder 33 for holding the substrate W, and a substrate holder 3
3 is provided with a rotating motor 32 for driving the rotation of the substrate 3 and a cup 34 for preventing the processing liquid from scattering from the substrate W. An exhaust pipe 35 is formed on the lower surface of the cup 34. Various components (not shown) for supplying a resist solution and a rinsing solution to the substrate W are arranged in the rotary coating device 30.

At the time of processing by the rotary coating device 30, external air is taken into the air conditioning unit 41 by the rotation of the fan 43. The air removes solvents and alkali components harmful to the substrate processing by the chemical adsorption filter 42 of the air conditioning unit 41, and the temperature and humidity are adjusted to predetermined values by the temperature and humidity adjustment unit 44. After that, the air passes through the air duct 45 and is supplied to the air introduction unit 3 disposed above the rotary coating device 30.
It is sent to 7.

A temperature / humidity detector 40 is mounted in the air inlet 37. The temperature and humidity detector 40 detects the temperature and humidity of the air sent from the air conditioning unit 41,
The detection signal is output to the temperature / humidity adjusting unit 44. Based on this detection signal, the temperature / humidity adjustment unit 44 performs feedback control on the temperature and humidity of the air sent toward the rotary coating device 30 to adjust them to predetermined values. The air supplied to the air introduction unit 37 is removed of dust by passing through the ULPA filter 38, and then descends in the housing 36 and is supplied into the cup 34.

In the rotation unit 31, a clean air flow that has passed through the ULPA filter 38 is supplied to the surface of the substrate W that is driven to rotate. Since the temperature and humidity of this clean airflow are adjusted to predetermined values, the state of the processing atmosphere of the substrate W, such as the temperature, is kept constant. This prevents unevenness in the thickness of the resist film due to uneven temperature around the substrate and the like, and the resist film is formed to have a uniform thickness.

Further, the clean air flow supplied to the substrate W is caused by the mist (splash) of the resist solution scattered from the substrate W.
And particles (particles) are washed away and discharged outside through an exhaust pipe 35. Thereby, the periphery of the substrate W is kept clean, and mist and particles are prevented from re-adhering to the surface of the substrate W, thereby preventing defects.

[0010]

In the conventional substrate processing system shown in FIG. 5, a chemical adsorption filter 42 is disposed on the upstream side of the air passage of the air introduced into the rotary coating apparatus 30, and the ULPA filter is disposed on the downstream side. 38 are arranged.
The chemical adsorption filter 42 is provided corresponding to a case where a chemically amplified resist is used. When an ammonia component is present in the atmosphere, the chemically amplified resist reacts with the ammonia component and deteriorates. For this reason, a chemical adsorption filter 42 is provided to remove alkali components and the like from the air introduced into the rotary coating device 30. In the chemical adsorption filter 42, the dust 4 contained in the air is removed.
6 cannot be sufficiently removed.

The chemical adsorption filter 42 has a relatively short life and needs to be replaced frequently. For this reason, it is arranged above the air-conditioning unit 41 placed separately from the rotary coating device 30 so that the replacement operation is easy.

On the other hand, the ULPA filter 38 disposed above the rotating unit 31 is provided with dust 46 contained in the air.
Is provided to eliminate the As a result, clean air that has passed through the chemical adsorption filter 42 and the ULPA filter 38 is supplied to the rotating unit 31.

However, the temperature / humidity detector 40 is disposed between the chemical adsorption filter 42 and the ULPA filter 38. The temperature / humidity detector 40 has a temperature detection unit and a humidity detection unit, and the humidity detection unit is configured to detect a potential difference between two separated electrodes and output the detected potential difference as an analog signal. I have. For this reason, if the dust 46 floats in the air near the electrode of the humidity detecting unit or the dust 46 adheres to the electrode, the detection accuracy decreases. Therefore, the temperature / humidity adjusting unit 44 based on the output signal from the temperature / humidity detector 40
, The humidity of the air supplied to the rotation unit 31 of the rotary coating device 30 changes from a predetermined value. This adversely affects the formation of the resist film on the substrate W.

FIG. 6 is a schematic sectional view for explaining another operation state in the conventional substrate processing system.
Part of the chemically amplified resist supplied to the substrate W in the rotation unit 31 is scattered around the substrate W and floats above the rotation unit 31. ULPA filter 38 does not have the ability to remove gaseous components. For this reason, the gaseous specific component 47 in the scientific amplification type resist passes through the ULPA filter 38 and enters the air inlet 37. When the temperature and humidity detectors diffuse around the temperature and humidity detector 40, the temperature and humidity detection units of the temperature and humidity detector 40 are affected by the specific component 47 in the chemically amplified resist, thereby lowering the temperature and humidity detection accuracy. I do. As a result, the adjustment state of the temperature / humidity adjustment unit 44 fluctuates, which adversely affects the spin coating process of the substrate W in the rotation unit 31 of the spin coating device 30.

Further, when a specific component 47 in the chemically amplified resist that has entered the air introducing section 37 flows backward through the blowing line 45 and enters the air conditioning unit 41, the temperature / humidity adjusting section 44.
Inconveniences such as the corrosion of the copper pipe by acting on the copper pipe disposed therein are caused.

It is an object of the present invention to provide a substrate processing system in which the detection accuracy of a detector provided in a ventilation path to a substrate processing apparatus does not decrease due to dust or the like in the air.

Another object of the present invention is to provide a substrate processing system in which the detection accuracy of a detector provided in a ventilation path is not reduced by a gas component of a processing liquid flowing backward from a substrate processing apparatus. .

[0018]

A substrate processing system according to a first aspect of the present invention includes an air conditioning unit, a substrate processing apparatus, and a ventilation path for guiding air from the air conditioning unit to the substrate processing apparatus. The processing apparatus includes a processing unit that performs predetermined processing on the substrate, and a first dust removal filter inserted between the air passage and the processing unit, and the air conditioning unit includes a first dust removal filter.
A chemical adsorption filter, adjusting means for adjusting a predetermined property of the air passing through the first chemical adsorption filter, and blowing air for forming a flow of air from the first chemical adsorption filter to the ventilation path via the adjusting means. Means, and in the ventilation path,
A detector for detecting a predetermined property of air is provided, and a second dust removal filter is disposed upstream of the detector.

In the substrate processing system according to the first invention, components harmful to substrate processing such as solvent and alkali components in the air are removed by the first chemical adsorption filter, and furthermore, the first dust removal filter removes the components in the air. To remove dust
The air is cleaned and led to the substrate processing equipment. further,
The air guided to the substrate processing apparatus has a predetermined property adjusted by an air conditioning unit. For this reason, in the substrate processing apparatus, the substrate is processed in an optimum processing atmosphere by supplying purified air adjusted to a predetermined property and cleaned.

In addition, by providing a detector in the ventilation path and arranging a second dust removal filter upstream of the detector, dust in the air may approach or adhere to the detector. Preventing. As a result, the detection accuracy of the detector is prevented from lowering due to the attachment of dust or the like, and the predetermined property of air can be accurately adjusted to a desired value based on the detection result of the detector. Thereby, the substrate processing in the processing section can be performed in an optimal atmosphere.

According to a second aspect of the present invention, in the substrate processing system according to the first aspect, a second chemical adsorption filter is provided downstream of the detector.

In this case, the second chemical adsorption filter provided downstream of the detector adsorbs and removes harmful gas components flowing backward from the substrate processing apparatus. For this reason, a harmful gas component acts on the detector, thereby preventing the detection accuracy of the detector from lowering. Further, it is possible to prevent the harmful gas component from flowing backward through the ventilation path and adversely affecting the inside of the air conditioning unit.

A substrate processing system according to a third aspect of the present invention includes an air conditioning unit, a substrate processing apparatus, and a ventilation path for guiding air from the air conditioning unit to the substrate processing apparatus. A processing unit to be performed, and a first dust removal filter inserted between the ventilation path and the processing unit,
An air conditioning unit configured to adjust a predetermined property of air passing through the first chemisorption filter, the first chemisorption filter, and air flowing from the first chemisorption filter to the ventilation path via the adjustment means. And a blower for forming a flow of air, a detector for detecting a predetermined property of air is provided in the ventilation path, and a second chemical adsorption filter is provided on the downstream side of the detector. is there.

In the substrate processing system according to the third invention, components harmful to substrate processing such as solvent and alkali components in the air are removed by the first chemical adsorption filter, and furthermore, the first dust removal filter removes components in the air. To remove dust
The air is cleaned and led to the substrate processing equipment. further,
The air guided to the substrate processing apparatus has a predetermined property of air adjusted by an air conditioning unit. For this reason, in the substrate processing apparatus, the substrate is processed in an optimum processing atmosphere by supplying purified air adjusted to a predetermined property and cleaned. In addition, a detector is provided in the ventilation path, and a second chemical adsorption filter is disposed downstream of the detector. The second chemical adsorption filter adsorbs and removes harmful gas components flowing backward from the substrate processing apparatus. For this reason, a harmful gas component acts on the detector, thereby preventing the detection accuracy of the detector from lowering. Further, it is possible to prevent the harmful gas component from flowing backward through the ventilation path and adversely affecting the inside of the air conditioning unit.

A substrate processing system according to a fourth aspect of the present invention includes an air conditioning unit, a substrate processing apparatus, and a ventilation path for guiding air from the air conditioning unit to the substrate processing apparatus. A processing unit to be performed, and a first dust removal filter inserted between the ventilation path and the processing unit,
An air conditioning unit configured to adjust a predetermined property of air passing through the first chemisorption filter, the first chemisorption filter, and air flowing from the first chemisorption filter to the ventilation path via the adjustment means. Blower means for forming a flow of air, the ventilation path has a main pipe and a bypass pipe bypassing the main pipe, and a detector for detecting a predetermined property of air is provided in the bypass pipe, A second dust removal filter is provided upstream of the detector, and a second chemical adsorption filter is provided downstream of the detector.

In the substrate processing system according to the fourth aspect of the present invention, components harmful to substrate processing such as solvent and alkali components in the air are removed by the first chemical adsorption filter, and the components in the air are removed by the first dust removal filter. To remove dust
The air is cleaned and led to the substrate processing equipment. further,
The air guided to the substrate processing apparatus has a predetermined property adjusted by an air conditioning unit. For this reason, in the substrate processing apparatus, the substrate is processed in an optimum processing atmosphere by supplying purified air adjusted to a predetermined property and cleaned.

In this case, the second dust removal filter provided on the upstream side of the detector removes dust in the air sent from the air conditioning unit. Thus, it is possible to prevent dust in the air from approaching or adhering to the detector disposed downstream of the second dust removal filter, thereby reducing detection accuracy. Further, the second chemical adsorption filter provided downstream of the detector adsorbs and removes harmful gas components flowing backward from the substrate processing apparatus. Thus, it is possible to prevent a harmful gas component from acting on the detector and lowering the detection accuracy. The detection accuracy of the detector is maintained by the second dust removal filter and the second chemical adsorption filter.

According to a fifth aspect of the present invention, in the configuration of the substrate processing system according to any one of the first to fourth aspects, the adjusting means adjusts a predetermined property of air based on an output of the detector. It is to adjust.

In this case, by controlling the adjusting operation of the predetermined property of the air by the adjusting means based on the output of the detector, it becomes possible to adjust the property of the air to a predetermined value accurately and promptly, so that the substrate processing can be performed. The processing state of the substrate in the apparatus can be stabilized.

A substrate processing system according to a sixth aspect of the present invention is the substrate processing system according to any one of the first to fifth aspects, wherein the first chemical adsorption filter is provided on the upstream side of the blowing means. It is.

In this case, the first position is set at a position where the operator can easily handle.
It is possible to arrange the chemical adsorption filter of
Maintenance work of the chemical adsorption filter becomes easy.

[0032]

FIG. 1 is a schematic sectional view of a substrate processing system according to a first embodiment of the present invention. In FIG. 1, the substrate processing system includes a rotary coating device 1, an air conditioning unit 17, and an air duct 13.

The air conditioning unit 17 includes a temperature / humidity adjusting unit 14, a fan 15, and a chemical adsorption filter 16. The chemical adsorption filter 16 is provided for removing an alkaline component and a solvent contained in air taken in from the outside. The fan 15 sends air to the temperature / humidity adjusting unit 14,
Through the rotary coating device 1.

The temperature / humidity adjusting section 14 includes an air cooler or an air heater for adjusting the temperature of the air taken in by the fan 15, and a humidifier for adjusting the humidity of the air. The air cooler, the air heater, and the humidifier are feedback-controlled based on an output signal from a temperature and humidity detector 12 described later.

The outlet side of the temperature / humidity adjusting unit 14 is
Are connected at one end. In addition, the other end of the air duct 13 is connected to the air introduction unit 8 disposed above the rotary coating device 1.
It is connected to the. A damper 11 that adjusts the flow rate of air is provided at a connection portion between the air duct 13 and the air introduction unit 8. Further, on the downstream side of the damper 11, HEPA (High Efficiency Particulate Air) for removing dust is provided.
) A filter 12 is provided. The HEPA filter 12 captures and removes dust in the air.

Further, the HEPA in the air introduction section 8
A temperature and humidity detector 10 is mounted downstream of the filter 12. The temperature / humidity detector 10 has a temperature detecting unit for detecting the temperature of the air introduced into the air introducing unit 8 and a humidity detecting unit for detecting the humidity of the air. Then, it outputs the temperature detection signal and the humidity detection signal to the temperature / humidity adjusting unit 14, respectively.

A ULPA filter 9 is provided at a boundary between the air introduction unit 8 and the upper surface of the rotary coating device 1. The ULPA filter 9 removes dust in the air similarly to the HEPA filter 12. The ULPA filter 9 can remove dust having smaller particles at a higher collection rate than the HEPA filter 12. This ULPA
By passing through the filter 9, dust can be sufficiently removed from the air introduced into the rotary coating device 1.

In the rotary coating apparatus 1, the rotary unit 2 is disposed inside the housing 7. The rotation unit 2 includes a substrate holding unit 4 that holds the substrate W, a rotation motor 3 that drives the substrate holding unit 4 to rotate, and a cup 5 that prevents the processing liquid from scattering from the substrate W. An exhaust pipe 6 is formed on the lower surface of the cup 5. Further, the rotary coating apparatus 1 is provided with various components (not shown) for supplying a resist liquid and a rinsing liquid to the substrate W.

In the substrate processing system having the above configuration, air is supplied to the rotary coating apparatus 1 through the air conditioning unit 17, the air duct 13, and the air introduction unit 8. Also,
In this substrate processing system, the chemical adsorption filter 16, the HEPA filter 12, and the ULPA filter 9 are arranged from the upstream side of the air flow path. Then, the solvent and the alkali component in the air are removed by the chemical adsorption filter 16, and the dust in the air is further removed by the HEPA filter 12 and the ULPA filter 9. Further, the temperature and humidity of the air are adjusted to predetermined values by the temperature and humidity adjustment unit 14. As a result, a clean airflow whose temperature and humidity are adjusted to predetermined values is supplied to the rotating unit 2 of the rotary coating device 1.

The temperature and humidity detector 10 is disposed between the HEPA filter 12 and the ULPA filter 9.
Therefore, the dust that has passed through the chemical adsorption filter 16 is HE
It is removed by the PA filter 12. For this reason, it is possible to prevent dust in the air from adhering to the temperature / humidity detector 10 and reduce detection accuracy.

In the present embodiment and the following embodiments, the air conditioning unit 17 corresponds to the air conditioning unit of the present invention, the rotary coating apparatus 1 corresponds to the substrate processing apparatus, and the ventilation pipe line 13 and the air introduction section 8 have ventilation. The ULPA filter 9 corresponds to a first dust removal filter, the chemical adsorption filter 16 corresponds to a first chemical adsorption filter, and the temperature and humidity detector 10 corresponds to a detector. Further, in the present embodiment, the HEPA filter 12 corresponds to a second dust removing filter of the present invention.

FIG. 2 is a schematic sectional view of a substrate processing system according to a second embodiment of the present invention. In the substrate processing system according to the second embodiment, a gaseous specific component contained in the chemically amplified resist used in the rotary coating apparatus 1 flows back through the air introduction unit 8 or the air duct 13 to the temperature and humidity adjustment unit 14. A chemical adsorption filter 20 is provided to prevent intrusion.

The chemical adsorption filter 20 is mounted on the ULPA filter 9 in an overlapping manner. In the rotary coating apparatus 1, a specific component contained in the chemically amplified resist applied to the substrate W rises in the housing 7. UL on the upper surface of the housing 7
A PA filter 9 is provided. However, UL
The PA filter 9 is a filter for capturing and removing particles such as dust, and a specific component in the chemically amplified resist is ULPA.
It passes through the filter 9. Therefore, by stacking the chemical adsorption filter 20 on the upper surface of the ULPA filter 9,
Specific components in the chemically amplified resist that has passed through the LPA filter 9 can be removed by adsorption.

This prevents specific components in the chemically amplified resist from approaching the temperature / humidity detector 10 in the air introducing section 8 and lowering the temperature and humidity detection accuracy. Further, the airflow component flows backward through the airflow duct 13, and the temperature / humidity adjusting unit 1
Inconveniences such as corrosion of the copper pipe in 4 are prevented.

In this embodiment, the chemical adsorption filter 20
Corresponds to the second chemical adsorption filter of the present invention.

FIG. 3 is a schematic sectional view of a substrate processing system according to a third embodiment of the present invention. The substrate processing apparatus according to the third embodiment has a combination of the filters in the substrate processing system according to the first embodiment and the substrate processing system according to the second embodiment.

That is, the chemical adsorption filter 16, the HEPA filter, the chemical adsorption filter 21, and the ULPA filter 9 are arranged in this order from the upstream side of the air flow path. As a result, H is located upstream of the temperature and humidity detector 10.
An EPA filter 12 is provided, and a chemical adsorption filter 20 is provided downstream. Therefore, dust contained in the air flowing from outside through the chemical adsorption filter 17 is removed by the HEPA filter 12 and does not reach the temperature and humidity detector 10. In addition, a specific component of the chemically amplified resist flowing backward from the rotary coating device 1 is removed by the chemical adsorption filter 20 and does not reach the temperature and humidity detector 10. This prevents the measurement accuracy of the temperature / humidity detector 10 from deteriorating due to dust in the air or specific components in the chemically amplified resist. Further, adverse effects due to the backflow of the specific component of the chemically amplified resist to the temperature / humidity adjusting unit 14 are prevented.

In this embodiment, the HEPA filter 12
Corresponds to the second dust removal filter of the present invention, and the chemical adsorption filter 20 corresponds to the second chemical adsorption filter of the present invention.

FIG. 4 is a schematic sectional view of a substrate processing system according to a fourth embodiment of the present invention. 4, in the substrate processing system according to the fourth embodiment, the middle of the air duct 13 is branched into a main duct 13a and a bypass duct 13b, and the temperature / humidity detector 10 is mounted in the bypass duct 13b. Have been. Further, an HEPA filter 22 for removing dust is disposed on the upstream side of the temperature and humidity detector 10, and a chemical adsorption filter 23 is disposed on the downstream side. The HEPA filter 22 removes dust contained in the air passing through the chemical adsorption filter 16. This allows
The measurement accuracy of the temperature and humidity detector 10 is prevented from lowering due to the adhesion of dust and the like.

Further, the chemical adsorption filter 23 removes a specific component of the chemically amplified resist flowing backward from the rotary coating device 1. This prevents the measurement accuracy of the temperature / humidity detector 10 from being lowered by the specific components of the chemically amplified resist.

In this embodiment, the HEPA filter 22
Corresponds to the second dust removal filter of the present invention, and the chemisorption filter 23 corresponds to the second chemisorption filter.

In the above embodiment, an example in which the rotary coating apparatus 1 is used as the substrate processing apparatus has been described. However, the present invention is not limited to this, and may be applied to other substrate processing apparatuses such as a developing apparatus. can do.

Further, in the present invention, the temperature and humidity detector 10
As the dust removal filter provided on the upstream side of the above, not only the HEPA filters 12 and 22 as in the above embodiment, but also a dust removal filter such as an ULPA filter may be used.

[Brief description of the drawings]

FIG. 1 is a schematic sectional view of a substrate processing system according to a first embodiment of the present invention.

FIG. 2 is a schematic sectional view of a substrate processing system according to a second embodiment of the present invention.

FIG. 3 is a schematic sectional view of a substrate processing system according to a third embodiment of the present invention.

FIG. 4 is a schematic sectional view of a substrate processing system according to a fourth embodiment of the present invention.

FIG. 5 is a schematic sectional view of a conventional substrate processing system.

FIG. 6 is a schematic cross-sectional view for explaining a processing state in a conventional substrate processing system.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Rotary coating device 2 Rotary unit 8 Air introduction part 9 ULPA filter 10 Temperature / humidity detector 12, 22 HEPA filter 13 Ventilation line 13a Main line 13b Bypass line 14 Temperature / humidity adjustment part 15 Fan 16, 20, 23 Chemical adsorption Filter 17 Air conditioning unit

Continued on the front page (51) Int.Cl. ⁶ Identification code FI H01L 21/027 H01L 21/30 564

Claims (6)

[Claims] An air conditioning unit, a substrate processing apparatus, and a ventilation path for guiding air from the air conditioning unit to the substrate processing apparatus, wherein the substrate processing apparatus performs a predetermined process on a substrate; A first dust removal filter interposed between an air passage and the processing unit, wherein the air conditioning unit includes a first chemisorption filter, and a predetermined air filter that passes through the first chemisorption filter. Adjusting means for adjusting the properties of the air, and blowing means for forming a flow of air from the first chemical adsorption filter to the ventilation path via the adjusting means. A substrate processing system, comprising: a detector for detecting the properties of the substrate; and a second dust removal filter disposed upstream of the detector. 2. The substrate processing system according to claim 1, wherein a second chemical adsorption filter is provided downstream of the detector. 3. An air conditioning unit, a substrate processing apparatus, and a ventilation path for guiding air from the air conditioning unit to the substrate processing apparatus, wherein the substrate processing apparatus performs a predetermined process on a substrate; A first dust removal filter interposed between an air passage and the processing unit, wherein the air conditioning unit includes a first chemisorption filter, and a predetermined air filter that passes through the first chemisorption filter. Adjusting means for adjusting the properties of air, and air blowing means for forming a flow of air from the first chemical adsorption filter to the ventilation path via the adjusting means. A substrate processing system, comprising: a detector for detecting a property of the substrate; and a second chemical adsorption filter provided downstream of the detector. 4. An air conditioning unit, a substrate processing apparatus, and a ventilation path for guiding air from the air conditioning unit to the substrate processing apparatus, wherein the substrate processing apparatus performs a predetermined process on a substrate; A first dust removal filter interposed between an air passage and the processing unit, wherein the air conditioning unit includes a first chemisorption filter, and a predetermined air filter that passes through the first chemisorption filter. Adjusting means for adjusting the properties of the first chemical adsorption filter and air blowing means for forming a flow of air from the first chemical adsorption filter to the ventilation path via the adjusting means, wherein the ventilation path includes a main pipe and the main pipe. A bypass pipe that bypasses a path, a detector that detects a predetermined property of the air is provided in the bypass pipe, and a second dust removal filter is provided on an upstream side of the detector. Downstream of the detector A second chemical adsorption filter is provided on the substrate processing system. 5. The substrate processing system according to claim 1, wherein said adjusting means adjusts a predetermined property of air based on an output of said detector. 6. The method according to claim 1, wherein the first chemical adsorption filter is provided on an upstream side of the blower.
6. The substrate processing system according to any one of 5.