JP2009300095A - Device for measuring contamination concentration - Google Patents
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本発明は、水晶振動子を用いた汚染濃度計測装置に関するものである。 The present invention relates to a contamination concentration measuring apparatus using a crystal resonator.
近年、半導体や液晶デバイスの生産・開発用クリーンルームでは、各種の分子状又はガス状の汚染物質（以下、「ケミカル汚染物質」という）の室内空気中濃度の低減が要求されている。 In recent years, clean rooms for production and development of semiconductors and liquid crystal devices have been required to reduce the concentration of various molecular or gaseous pollutants (hereinafter referred to as “chemical pollutants”) in the indoor air.
特に、シリコンウエハ、液晶パネル用基板や光学系レンズ等に吸着して悪影響を及ぼすことが知られている樹脂用可塑剤（ジブチルフタレート（ＤＢＰ）、ジオクチルフタレート（ＤＯＰ））、酸化防止剤（ジブチルヒドロキシトルエン（ＢＨＴ））、難燃剤（リン酸エステル類）や低分子環状シロキサン類の除去が課題となっている。 In particular, plasticizers for resins (dibutyl phthalate (DBP), dioctyl phthalate (DOP)), antioxidants (dibutyl), which are known to adversely affect silicon wafers, liquid crystal panel substrates and optical lenses, etc. Removal of hydroxytoluene (BHT)), flame retardants (phosphate esters) and low-molecular cyclic siloxanes has become a problem.
ところで、これらケミカル汚染物質の濃度測定は、シリコンウエハ等の基板をクリーンルーム内の適宜の場所に設置し、基板表面にケミカル汚染物質を吸着させ、あるいはクリーンルームの内部空気を直接サンプリングし、これをガスクロマトグラフ（ＧＣ）やガスクロマトグラフ質量分析装置（ＧＣ−ＭＳ）等を使用して定性・定量分析することにより行っていた。 By the way, these chemical pollutant concentrations are measured by placing a substrate such as a silicon wafer at an appropriate location in the clean room, adsorbing the chemical pollutant on the surface of the substrate, or directly sampling the air inside the clean room and using this as a gas chromatograph. Qualitative and quantitative analysis was performed using a gas chromatograph mass spectrometer (GC-MS) or the like.
しかしながら、これらの濃度測定は、ケミカル汚染物質をサンプリングした後にクリーンルーム外に取り出して測定するために測定時間がかかるという問題と、ケミカル汚染物質を連続的に測定することができないという問題を有している。 However, these concentration measurements have the problem that it takes a long time to sample chemical pollutants after sampling them out of the clean room, and the problem that chemical pollutants cannot be measured continuously. Yes.
このような問題を解決すべく、分子状又はガス状の汚染物質を吸着するシリコンウエハを電極に積層した水晶振動子をクリーンルームの内部に配置し、そのシリコンウエハがケミカル汚染物質を吸着したことにより生じる重量変化を水晶振動子の共振周波数の変化として出力することにより、ケミカル汚染物質の濃度を測定する方法が提案されている（たとえば、特許文献１参照）。 In order to solve such a problem, a quartz crystal unit in which a silicon wafer that adsorbs molecular or gaseous contaminants is stacked on an electrode is placed inside a clean room, and the silicon wafer adsorbs chemical contaminants. There has been proposed a method of measuring the concentration of chemical contaminants by outputting the resulting weight change as a change in the resonance frequency of the crystal resonator (see, for example, Patent Document 1).
しかしながら、シリコンウエハにはケミカル汚染物質のほか、塵芥のような微粒子も吸着される。このように吸着された微粒子も水晶振動子の共振周波数の変化に影響を与えるので、ケミカル汚染物質の汚染濃度を正確に測定することができなかった。 However, in addition to chemical contaminants, fine particles such as dust are adsorbed on the silicon wafer. Since the fine particles adsorbed in this way also affect the change in the resonance frequency of the crystal resonator, the contamination concentration of the chemical contaminant cannot be accurately measured.
本発明は、上記に鑑みてなされたものであって、シリコンウエハへの微粒子の吸着を低減させ、ケミカル汚染物質の汚染濃度をより正確に測定できる汚染濃度計測装置を提供することを目的とする。 The present invention has been made in view of the above, and an object of the present invention is to provide a contamination concentration measuring apparatus that can reduce the adsorption of fine particles to a silicon wafer and more accurately measure the contamination concentration of chemical contaminants. .
上述した課題を解決し、目的を達成するために、本発明は、一端部に計測対象となる空気を導入する空気導入部を設け、他端部に導入した空気を排出する空気排出部を設けたケーシングと、該ケーシングの内部に装填された水晶振動子とを備えた汚染濃度計測装置であって、導入する空気から微粒子を除去するフィルタを前記空気導入部に備えたことを特徴とする。 In order to solve the above-described problems and achieve the object, the present invention provides an air introduction part that introduces air to be measured at one end and an air discharge part that exhausts the air introduced at the other end. A contamination concentration measuring device comprising a casing and a quartz crystal resonator loaded in the casing, wherein the air introduction part is provided with a filter for removing fine particles from the introduced air.
本発明は、上記発明において、導入した空気を冷却する冷却手段を前記ケーシングの周りに配設したことを特徴とする。 The present invention is characterized in that, in the above invention, cooling means for cooling the introduced air is arranged around the casing.
本発明は、上記発明において、前記空気排出部に接続され、前記空気排出部から空気を強制的に排出させる空気排出手段を備えたことを特徴とする。 The present invention is characterized in that in the above-mentioned invention, an air discharge means is provided which is connected to the air discharge portion and forcibly discharges air from the air discharge portion.
本発明にかかる汚染濃度計測装置は、導入する空気から微粒子を除去するフィルタを計測対象となる空気を導入する導入部に備えたので、導入する空気から塵芥のような微粒子が除去される。したがって、シリコンウエハへの微粒子の吸着が低減され、ケミカル汚染物質の汚染濃度をより正確に測定できる。 In the contamination concentration measuring apparatus according to the present invention, the filter for removing the fine particles from the air to be introduced is provided in the introduction portion for introducing the air to be measured, so that the fine particles such as dust are removed from the introduced air. Therefore, the adsorption of fine particles to the silicon wafer is reduced, and the contamination concentration of chemical contaminants can be measured more accurately.
まず、図１及び図２に基づいて、本発明の実施の形態である汚染濃度計測装置を詳細に説明する。図１は、本発明の実施の形態である汚染濃度計測装置を示す概念図であり、図２は、図１に示した汚染濃度計測装置を用いて計測した計測結果を示す図である。 First, based on FIG.1 and FIG.2, the contamination density | concentration measuring apparatus which is embodiment of this invention is demonstrated in detail. FIG. 1 is a conceptual diagram showing a contamination concentration measuring apparatus according to an embodiment of the present invention, and FIG. 2 is a diagram showing measurement results measured using the contamination concentration measuring apparatus shown in FIG.
図１に示す汚染濃度計測装置１は、半導体や液晶デバイスの生産・開発用のクリーンルームの内部に設置され、ケミカル汚染物質をリアルタイムで計測できるようにしたものである。 A contamination concentration measuring apparatus 1 shown in FIG. 1 is installed in a clean room for production and development of semiconductors and liquid crystal devices, and can measure chemical contaminants in real time.
図１に示すように、汚染濃度計測装置１は、ケーシング２の内部に水晶振動子（ＱＣＭ）３を装填したものである。 As shown in FIG. 1, a contamination concentration measuring device 1 is a device in which a quartz resonator (QCM) 3 is loaded inside a casing 2.
ケーシング２は、筒状をした箱体であって、一端部にクリーンルームの室内空気を導入する空気導入部２１を設け、他端部に導入した空気を排出する空気排出部２２を設けてある。空気導入部２１は、クリーンルームに臨む開口であって、ＨＥＰＡ（High Efficiency Particulate Air Filter）またはＵＬＰＡ（Ultra Low Penetration Air Filter）等のフィルタ２１ａが装着してある。フィルタ２１ａは、クリーンルームから導入した空気から塵芥等の微粒子を取り除くものであって、微粒子を除去する一方、計測対象となるケミカル汚染物質を通過させるようになっている。空気排出部２２は、吸引ポンプ（空気排出手段）に接続される開口であって、吸引ポンプを稼働すると、空気導入部２１を介してケーシング２の内部にクリーンルームの室内空気が一定速度で強制的に導入され、その後、空気排出部２２を介してケーシング２の外部に空気が排出されるようになっている。 The casing 2 is a cylindrical box, and is provided with an air introduction part 21 that introduces clean room indoor air at one end and an air discharge part 22 that exhausts the introduced air at the other end. The air introduction part 21 is an opening facing a clean room, and is equipped with a filter 21a such as HEPA (High Efficiency Particulate Air Filter) or ULPA (Ultra Low Penetration Air Filter). The filter 21a removes fine particles such as dust from the air introduced from the clean room. The filter 21a removes the fine particles and allows chemical contaminants to be measured to pass therethrough. The air discharge part 22 is an opening connected to a suction pump (air discharge means). When the suction pump is operated, the room air in the clean room is forced into the casing 2 through the air introduction part 21 at a constant speed. After that, air is discharged to the outside of the casing 2 through the air discharge portion 22.
水晶振動子３は、水晶片３１と、水晶片３１の両側の表面に設けられた一対の電極３２と、電極の少なくとも一方に積層されたシリコンウエハとを有しており、ケミカル汚染物質はシリコンウエハに吸着されるようになっている。 The crystal unit 3 has a crystal piece 31, a pair of electrodes 32 provided on both surfaces of the crystal piece 31, and a silicon wafer laminated on at least one of the electrodes, and the chemical contaminant is silicon. It is attracted to the wafer.
水晶振動子３の電極３２には、共振回路４１が接続されている。共振回路４１は、水晶振動子３を共振させるもので、電源４２が接続され、電源４２から電力が供給されるようになっている。また、共振回路４１には、周波数カウンタ４３が接続され、水晶振動子３が共振した周波数をカウントするようになっている。 A resonance circuit 41 is connected to the electrode 32 of the crystal unit 3. The resonance circuit 41 resonates the crystal unit 3 and is connected to a power source 42 so that power is supplied from the power source 42. Further, a frequency counter 43 is connected to the resonance circuit 41 so as to count the frequency at which the crystal resonator 3 resonates.
周波数カウンタ４３には、データ処理装置（ＰＣ）４４が接続されている。データ処理装置４４は、シリコンウエハがケミカル汚染物質を吸着することにより生じる重量変化を算出するようになっている。すなわち、周波数カウンタ４３は、シリコンウエハが汚染物質を吸着することにより生じる重量変化に基づいた水晶振動子３の共振周波数変化を計測し、これを元にデータ処理装置４４は、ケミカル汚染物質吸着量を算出する。 A data processing device (PC) 44 is connected to the frequency counter 43. The data processing device 44 calculates a change in weight caused by the silicon wafer adsorbing chemical contaminants. That is, the frequency counter 43 measures the change in the resonance frequency of the crystal unit 3 based on the weight change caused by the silicon wafer adsorbing the contaminant, and based on this, the data processing unit 44 determines the chemical contaminant adsorbed amount. Is calculated.
また、図１に示すように、汚染濃度計測装置１は、温湿度センサ５０と冷却装置（冷却手段）５１とを備えている。温湿度センサ５０は、ケーシング２の内部を通過する空気の温度と湿度を計測するものであり、コントローラ５２に接続されている。冷却装置５１は、ケーシング２の内部の空気を冷却するものであり、たとえば、ケーシング２の周りに配設したペルチェ素子で構成されている。 Further, as shown in FIG. 1, the contamination concentration measuring apparatus 1 includes a temperature / humidity sensor 50 and a cooling device (cooling means) 51. The temperature / humidity sensor 50 measures the temperature and humidity of the air passing through the inside of the casing 2, and is connected to the controller 52. The cooling device 51 cools the air inside the casing 2 and is composed of, for example, a Peltier element disposed around the casing 2.
冷却装置５１は、電源５３を介して、コントローラ５２に接続されており、温湿度センサ５０から取得した温度及び湿度に基づいて電源５３をオン・オフ制御することにより、ケーシング２の内部を通過する空気を適温に維持するようになっている。 The cooling device 51 is connected to the controller 52 via the power source 53, and passes through the inside of the casing 2 by performing on / off control of the power source 53 based on the temperature and humidity acquired from the temperature / humidity sensor 50. The air is maintained at an appropriate temperature.
上述した汚染濃度計測装置１は、図２に示すように、時間の経過とともに汚染物質の吸着量（重量）が増加する。そして、単位時間あたりの変化量（吸着速度）と空気量との関係からケミカル汚染物質の空気中濃度が推定できる。たとえば、平均的な吸着量変化のデータを用意しておき、これと日々のデータを比較することによって、異常事態の発生や室内汚染物質濃度の変動を感知する。 As shown in FIG. 2, the contamination concentration measuring apparatus 1 described above increases the amount of adsorption (weight) of contaminants over time. The concentration of chemical contaminants in the air can be estimated from the relationship between the amount of change per unit time (adsorption rate) and the amount of air. For example, data on the average amount of adsorption change is prepared, and this is compared with daily data to detect the occurrence of an abnormal situation and fluctuations in the indoor pollutant concentration.
上述した汚染濃度計測装置１は、空気導入部２１にフィルタ２１ａを装着しているので、水晶振動子３に付着する微粒子の影響を排除し、ケミカル汚染物質の濃度をより正確に計測できる。また、吸引ポンプを稼働すると、ケーシング２の内部にクリーンルームの室内空気が一定速度で強制的に導入されるので、短時間で多くのケミカル汚染物質をシリコンウエハに吸着させることができ、クリーンルーム中の汚染物質濃度を短時間に精度よく評価できる。 Since the contamination concentration measuring apparatus 1 described above has the filter 21a attached to the air introduction part 21, it is possible to eliminate the influence of fine particles adhering to the crystal resonator 3 and measure the concentration of chemical contaminants more accurately. Further, when the suction pump is operated, the indoor air of the clean room is forcibly introduced into the casing 2 at a constant speed, so that a large amount of chemical contaminants can be adsorbed on the silicon wafer in a short time. Contaminant concentration can be accurately evaluated in a short time.
また、汚染濃度計測装置１は、冷却装置５１を備えているので、ケーシング２の内部の空気を冷却することにより、ケミカル汚染物質の吸着を促進することができる。これは、ケーシング２の内部の空気が冷却されると、分子状又はガス状のケミカル汚染物質の運動エネルギーが小さくなることにより、吸着されやすくなることによるものである。なお、露点以下まで冷却すると水晶振動子３の表面に結露が生じ、ケミカル汚染物質を測定できなくなるので、温湿度センサ５０によって監視し、結露が生じないように冷却装置５１を制御することが要求される。 Moreover, since the contamination concentration measuring apparatus 1 is provided with the cooling device 51, the adsorption of chemical contaminants can be promoted by cooling the air inside the casing 2. This is due to the fact that when the air inside the casing 2 is cooled, the kinetic energy of the molecular or gaseous chemical pollutant is reduced, so that it is easily adsorbed. In addition, since condensation will occur on the surface of the crystal unit 3 if it is cooled below the dew point, and it becomes impossible to measure chemical contaminants, it is necessary to monitor the temperature and humidity sensor 50 and control the cooling device 51 so that condensation does not occur. Is done.
上述した汚染濃度計測装置１を設置したクリーンルームによれば、突発的なケミカル汚染物質濃度の増大が生じた場合に、適切な対応（製造ラインの停止、濃度低減対策の実施等）をとることができる。 According to the clean room in which the above-described contamination concentration measuring device 1 is installed, it is possible to take appropriate measures (stopping the production line, implementing concentration reduction measures, etc.) when sudden increases in the concentration of chemical contaminants occur. it can.
また、ケミカルフィルタ等の空気清浄化装置の連続的な性能評価が可能となり、メンテナンス時期の予測等、計画的な製造スケジュールが立案、実行できるようになる。 In addition, continuous performance evaluation of an air cleaning device such as a chemical filter can be performed, and a planned production schedule such as prediction of maintenance time can be formulated and executed.
さらに、予め設定された管理濃度との比較により、空調設備運転の最適化が実行できるようになり、ランニングコストの低減を図ることができる。 Further, the air conditioning equipment operation can be optimized by comparison with a preset management concentration, and the running cost can be reduced.
１ 汚染濃度計測装置
２ ケーシング
２１ 空気導入部
２１ａ フィルタ
２２ 空気排出部
３ 水晶振動子
３１ 水晶片
３２ 電極
４１ 共振回路
４２ 電源
４３ 周波数カウンタ
４４ データ処理装置
５０ 温湿度センサ
５１ 冷却装置
５２ コントローラ
５３ 電源
DESCRIPTION OF SYMBOLS 1 Contamination density | concentration measuring apparatus 2 Casing 21 Air introduction part 21a Filter 22 Air discharge part 3 Crystal oscillator 31 Crystal piece 32 Electrode 41 Resonant circuit 42 Power supply 43 Frequency counter 44 Data processing apparatus 50 Temperature / humidity sensor 51 Cooling apparatus 52 Controller 53 Power supply
Claims (3)
導入する空気から微粒子を除去するフィルタを前記空気導入部に備えたことを特徴とする汚染濃度計測装置。 Provided with an air introduction part for introducing air to be measured at one end part, a casing provided with an air discharge part for exhausting air introduced at the other end part, and a crystal resonator loaded inside the casing Contamination concentration measuring device
A contamination concentration measuring apparatus comprising a filter for removing fine particles from air to be introduced in the air introduction section.
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| JP7370915B2 (en) | 2020-03-26 | 2023-10-30 | 日本電波工業株式会社 | sensing sensor |
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| US9395334B2 (en) | 2011-03-30 | 2016-07-19 | Fujitsu Limited | Atmospheric environment measuring apparatus, atmospheric environment measuring method and atmospheric environment measuring system |
| JP2014224758A (en) * | 2013-05-16 | 2014-12-04 | 清水建設株式会社 | Method for measuring mass concentration of particulate matter in air |
| JP2014228484A (en) * | 2013-05-24 | 2014-12-08 | 富士通株式会社 | Environmental measurement instrument and environmental measurement method |
| KR102159941B1 (en) * | 2019-06-10 | 2020-09-25 | 울산과학기술원 | Electronic particle analyzer comprising quartz crystal microbalance sensor |
| JP7370915B2 (en) | 2020-03-26 | 2023-10-30 | 日本電波工業株式会社 | sensing sensor |
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