JPH11214812A - High frequency wiring circuit board - Google Patents

High frequency wiring circuit board

Info

Publication number
JPH11214812A
JPH11214812A JP1705698A JP1705698A JPH11214812A JP H11214812 A JPH11214812 A JP H11214812A JP 1705698 A JP1705698 A JP 1705698A JP 1705698 A JP1705698 A JP 1705698A JP H11214812 A JPH11214812 A JP H11214812A
Authority
JP
Japan
Prior art keywords
frequency
ghz
wiring board
weight
value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1705698A
Other languages
Japanese (ja)
Other versions
JP3623093B2 (en
Inventor
Takeshi Okamura
健 岡村
Tetsuya Kishino
哲也 岸野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP01705698A priority Critical patent/JP3623093B2/en
Publication of JPH11214812A publication Critical patent/JPH11214812A/en
Application granted granted Critical
Publication of JP3623093B2 publication Critical patent/JP3623093B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Compositions Of Oxide Ceramics (AREA)
  • Inorganic Insulating Materials (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a high frequency wiring board capable of improving the high frequency transmission characteristics by using an insulation substrate having a low dielectric constant and a high Q value. SOLUTION: A high frequency wiring board has a wiring layer capable of transmitting a high frequency signal higher than 1 GHz on the surface or inside of an insulation board. The insulation board 1 is a compound oxide having B and Si as metal elements, and has a weight ratio composition of oxides of respective metal elements expressed as xB2 O3 .ySiO2 , where x and y satisfy 0.1<=x<=20, 80<=y<=99.9 and x+y=100, and a Q value at 10 GHz is over 2,000.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、高周波用配線基板
に関し、ストリップ線路、マイクロストリップ線路、コ
プレーナ線路、誘電体導波管線路等から構成された配線
層を有する高周波用配線基板に関するものである。
The present invention relates to a high-frequency wiring board, and more particularly to a high-frequency wiring board having a wiring layer composed of a strip line, a microstrip line, a coplanar line, a dielectric waveguide line and the like. .

【0002】[0002]

【従来技術】マイクロ波、ミリ波等の高周波で用いられ
る高周波回路においては、基板には比誘電率が低く誘電
損失(tanδ)が小さい(Q値が大きい)材料を使用
する必要がある。このため、従来、誘電体の材料として
は主として比誘電率が約10、測定周波数10GHzで
のQ値が20000以上のアルミナ磁器が採用されてい
た(例えば、特開昭62−103904号公報等参
照)。
2. Description of the Related Art In high-frequency circuits used at high frequencies such as microwaves and millimeter waves, it is necessary to use a material having a low relative dielectric constant and a small dielectric loss (tan δ) (a large Q value) for a substrate. For this reason, conventionally, as a dielectric material, alumina porcelain mainly having a relative dielectric constant of about 10 and a Q value of 20,000 or more at a measurement frequency of 10 GHz has been adopted (see, for example, JP-A-62-103904). ).

【0003】一方、比誘電率が低い材料としては、従
来、コージェライトが知られているが、焼成温度範囲が
極めて狭いことから緻密な焼結体が得難いため、ガラス
材を添加することによって、比誘電率が4〜6、測定周
波数10GHzでのQ値が1000程度のガラスセラミ
ックスを作製し、これを用いることが知られている(例
えば、特開昭61−234128号公報等参照)。
On the other hand, cordierite is conventionally known as a material having a low relative dielectric constant. However, since a sintering temperature range is extremely narrow, it is difficult to obtain a dense sintered body. It is known that a glass ceramic having a relative dielectric constant of 4 to 6 and a Q value of about 1000 at a measurement frequency of 10 GHz is produced and used (for example, see JP-A-61-234128).

【0004】[0004]

【発明が解決しようとする課題】しかしながら、低誘電
率材料として用いられているガラスセラミックス等の磁
器は比誘電率が4〜6と小さいが、Q値が10GHzで
1000程度であり、近年における高周波数帯の誘電体
共振器の普及にともない、より高いQ値の低誘電率材料
が求められていた。
However, porcelain such as glass ceramics used as a low dielectric constant material has a small relative dielectric constant of 4 to 6, but has a Q value of about 1000 at 10 GHz and has a high Q value in recent years. With the widespread use of dielectric resonators in the frequency band, there has been a demand for a low Q material having a higher Q value.

【0005】一方、アルミナ磁器は10GHzでのQ値
が20000以上と高いが、比誘電率が約10と比較的
高いため、例えば、図1に示すような高インピーダンス
のマイクロストリップラインを形成しようとすると、ラ
イン幅が小さくなりすぎて断線が生じたり、相対的なラ
イン幅のばらつきが大きくなりマイクロ波集積回路の不
良率が増大するという問題があった。またライン間が狭
くなることによりクロストークが発生するという問題が
あった。
On the other hand, alumina porcelain has a high Q value at 10 GHz of 20,000 or more, but has a relatively high relative dielectric constant of about 10, so that, for example, a high impedance microstrip line as shown in FIG. Then, there is a problem that the line width becomes too small to cause disconnection, and a relative line width variation becomes large, thereby increasing the defective rate of the microwave integrated circuit. In addition, there is a problem in that crosstalk occurs due to the narrow line interval.

【0006】他方、この種の磁器基板におけるマイクロ
ストリップラインのインピーダンスは、基板の厚さが一
定であれば、その比誘電率及びマイクロストリップライ
ンの幅にそれぞれ反比例するため、ライン幅を小さくす
る代わりに、比誘電率の低い基板材料を使用することに
よってもインピーダンスを高めることができ、このた
め、より低誘電率材料が求められていた。さらに、マイ
クロ波からミリ波へと伝送周波数がより高周波化した場
合、Q値が低いと急激に伝送損失が大きくなることか
ら、より低損失材料が求められていた。
On the other hand, the impedance of a microstrip line in this type of porcelain substrate is inversely proportional to the relative dielectric constant and the width of the microstrip line when the thickness of the substrate is constant. In addition, the impedance can be increased by using a substrate material having a low relative dielectric constant. For this reason, a material having a lower dielectric constant has been demanded. Furthermore, when the transmission frequency increases from microwaves to millimeter waves, the transmission loss increases rapidly when the Q value is low, so that a lower loss material has been demanded.

【0007】本発明は、絶縁基板材料として、低誘電率
で、かつ高Q値の焼結体を用いることにより、高周波伝
送特性を向上できる高周波用配線基板を提供することを
目的とする。
It is an object of the present invention to provide a high-frequency wiring board that can improve high-frequency transmission characteristics by using a sintered body having a low dielectric constant and a high Q value as an insulating substrate material.

【0008】[0008]

【課題を解決するための手段】本発明の高周波用配線基
板は、絶縁基板の表面あるいは内部に、周波数1GHz
以上の高周波信号が伝送可能な配線層を配設してなる高
周波用配線基板において、前記絶縁基板が、金属元素と
してB、Siからなる複合酸化物であって、各金属元素
酸化物による重量比組成式をxB2 3 ・ySiO2
表した時、前記x、yが0.1≦x≦20、80≦y≦
99.9、x+y=100を満足するとともに、10G
HzでのQ値が2000以上のものである。
According to the present invention, there is provided a high-frequency wiring board having a frequency of 1 GHz on or above an insulating substrate.
In the above-described high-frequency wiring board having a wiring layer capable of transmitting a high-frequency signal, the insulating substrate is a composite oxide including B and Si as metal elements, and a weight ratio of each metal element oxide. When the composition formula is expressed as xB 2 O 3 · ySiO 2 , the x and y are 0.1 ≦ x ≦ 20, 80 ≦ y ≦
99.9, x + y = 100 and 10G
The Q value at Hz is 2000 or more.

【0009】また、高周波用配線基板の絶縁基板が、金
属元素としてB、Siからなる複合酸化物であって、各
金属元素酸化物による重量比組成式をxB2 3 ・yS
iO2 と表した時、x、yが0.1≦x≦20、80≦
y≦99.9、x+y=100を満足する主成分と、該
主成分100重量部に対して周期律表第4a族元素のう
ち少なくとも1種を酸化物換算で0.1重量部以上、も
しくは希土類元素のうち少なくとも1種を酸化物換算で
0.1重量部以上含有するものである。ここで、主成分
100重量部に対して周期律表第4a族元素のうち少な
くとも1種を酸化物換算で0.1〜10重量部、もしく
は希土類元素のうち少なくとも1種を酸化物換算で0.
1〜15重量部含有することが望ましい。
Further, the insulating substrate of the high-frequency wiring substrate is a composite oxide comprising B and Si as metal elements, and the composition ratio by weight of each metal element oxide is xB 2 O 3 .yS.
When expressed as iO 2 , x and y are 0.1 ≦ x ≦ 20, 80 ≦
a main component satisfying y ≦ 99.9, x + y = 100, and at least one of Group 4a elements of the periodic table in an amount of 0.1% by weight or more in terms of oxide based on 100 parts by weight of the main component; or At least one of the rare earth elements is contained in an amount of 0.1 parts by weight or more in terms of oxide. Here, 0.1 to 10 parts by weight of at least one of Group 4a elements in the periodic table in terms of oxide or 100% by weight of at least one of rare earth elements with respect to 100 parts by weight of the main component. .
It is desirable to contain 1 to 15 parts by weight.

【0010】さらに、絶縁基板の表面あるいは内部に、
周波数1GHz以上の高周波信号が伝送可能な配線層を
配設してなる高周波用配線基板において、前記絶縁基板
が、金属元素としてMg、Siからなる複合酸化物であ
って、各金属元素酸化物によるモル比組成式をaMgO
・bSiO2 と表した時、前記a、bが15≦a≦3
9、61≦b≦85、a+b=100を満足するととも
に、クリストバライトを主結晶相とし、比誘電率が5未
満、かつ10GHzでのQ値が2000以上のものであ
る。
Further, on the surface or inside of the insulating substrate,
In a high-frequency wiring board provided with a wiring layer capable of transmitting a high-frequency signal having a frequency of 1 GHz or more, the insulating substrate is a composite oxide made of Mg and Si as metal elements, and is made of a metal oxide. The molar ratio composition formula is aMgO
-When expressed as bSiO 2 , the a and b are 15 ≦ a ≦ 3
9, 61 ≦ b ≦ 85, a + b = 100, cristobalite as a main crystal phase, a relative dielectric constant of less than 5, and a Q value at 10 GHz of 2,000 or more.

【0011】[0011]

【作用】本発明の高周波用配線基板では、絶縁基板が、
比誘電率が5未満、10GHzにおけるQ値が2000
以上の特性を得ることができ、また、このような低誘電
率、高Q値の誘電体磁器を絶縁基板として用いることに
より、高周波伝送特性を向上できる。
In the high frequency wiring board of the present invention, the insulating substrate is
The relative dielectric constant is less than 5, and the Q value at 10 GHz is 2000
The above characteristics can be obtained, and high-frequency transmission characteristics can be improved by using such a dielectric ceramic having a low dielectric constant and a high Q value as an insulating substrate.

【0012】[0012]

【発明の実施の形態】本発明の高周波用配線基板は、絶
縁基板の表面あるいは内部に、周波数1GHz以上の高
周波信号が伝送可能な配線層を配設してなるもので、例
えば、図1に示すように、絶縁基板1の表面に配線層
2、3を形成して構成されている。即ち、絶縁基板1の
下面に全面電極(グランド)2を、上面にマイクロスト
リップライン3を形成して構成されている。全面電極
(グランド)2とマイクロストリップライン3とから配
線層が構成される。この配線層には、高周波信号とし
て、1GHz以上、特には20GHz以上、さらには5
0GHz以上の高周波信号が伝送される。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A high-frequency wiring board according to the present invention is provided with a wiring layer capable of transmitting a high-frequency signal having a frequency of 1 GHz or higher on the surface or inside of an insulating substrate. As shown in FIG. 1, wiring layers 2 and 3 are formed on the surface of an insulating substrate 1. That is, the entire surface electrode (ground) 2 is formed on the lower surface of the insulating substrate 1 and the microstrip line 3 is formed on the upper surface. A wiring layer is composed of the entire surface electrode (ground) 2 and the microstrip line 3. In this wiring layer, as a high frequency signal, 1 GHz or more, particularly 20 GHz or more,
A high frequency signal of 0 GHz or more is transmitted.

【0013】図1では、絶縁基板1の表面にマイクロス
トリップ線路を形成した例について説明したが、例え
ば、ストリップ線路、コプレーナ線路、誘電体導波管線
路を形成しても良い。これらの配線層は、絶縁基板と同
時焼成により形成されることが望ましい。また、このよ
うな高周波用配線基板は、マイクロ波、ミリ波用等の高
周波で用いられるパッケージ、誘電体共振器、LCフィ
ルター、コンデンサ、誘電体導波路、誘電体アンテナ等
に用いることができる。
FIG. 1 illustrates an example in which a microstrip line is formed on the surface of the insulating substrate 1. However, for example, a strip line, a coplanar line, or a dielectric waveguide line may be formed. These wiring layers are desirably formed by simultaneous firing with the insulating substrate. Further, such a high-frequency wiring board can be used for a package, a dielectric resonator, an LC filter, a capacitor, a dielectric waveguide, a dielectric antenna, and the like, which are used at a high frequency such as a microwave and a millimeter wave.

【0014】そして、本発明の高周波用配線基板では、
絶縁基板1が、金属元素としてB、Siからなる複合酸
化物であって、各金属元素酸化物による重量比組成式を
xB2 3 ・ySiO2 と表した時、前記x、yが0.
1≦x≦20、80≦y≦99.9、x+y=100を
満足するものである。
In the high-frequency wiring board of the present invention,
When the insulating substrate 1, which expressed B as metal elements, a composite oxide comprising Si, the weight ratio composition formula by each metal element oxide and xB 2 O 3 · ySiO 2, wherein x, y is 0.
It satisfies 1 ≦ x ≦ 20, 80 ≦ y ≦ 99.9, x + y = 100.

【0015】絶縁基板1の成分組成を前記範囲に限定し
たのは、次の理由による。即ち、B2 3 の重量百分率
示すxを0.1≦x≦20(80≦y≦99.9)とし
たのはxが0.1よりも小さい場合(yが99.9より
も大きい場合)は焼結体が緻密化せず、xが20を越え
ると(yが80よりも小さい場合)良好な焼結体が得ら
れずQ値が低くなるからである。B2 3 量を示すx
は、Q値を3000以上とするという点から0.2〜1
0重量%(90≦y≦99.8)が望ましい。
The reason for limiting the component composition of the insulating substrate 1 to the above range is as follows. That is, x indicating the weight percentage of B 2 O 3 is set to 0.1 ≦ x ≦ 20 (80 ≦ y ≦ 99.9) when x is smaller than 0.1 (y is larger than 99.9). This is because the sintered body is not densified, and when x exceeds 20 (when y is smaller than 80), a good sintered body cannot be obtained and the Q value becomes low. X indicating the amount of B 2 O 3
Is from 0.2 to 1 in that the Q value is 3000 or more.
0% by weight (90 ≦ y ≦ 99.8) is desirable.

【0016】測定周波数10GHzでのQ値が2000
以上を満足することが望ましい理由は、Q値が2000
以上ある場合には、近年における高周波数帯の絶縁基板
に十分対応することができるからである。Q値は、高け
れば高い程望ましいが、特には、測定周波数10GHz
でのQ値が3000以上であることが望ましい。
When the Q value at a measurement frequency of 10 GHz is 2000
The reason why it is desirable to satisfy the above is that the Q value is 2000
This is because the above case can sufficiently cope with an insulating substrate in a high frequency band in recent years. The Q value is preferably as high as possible, but in particular, the measurement frequency is 10 GHz.
Is preferably 3000 or more.

【0017】また、基板を構成する焼結体は、主相はガ
ラス相であり、他に結晶相として、クリストバライト、
トリジマイト、クオーツ等が析出する場合があるが、組
成によってその析出相が異なる。本発明の誘電体磁器組
成物ではガラス相のみであってもよい。
In the sintered body constituting the substrate, the main phase is a glass phase, and in addition, cristobalite,
Tridymite, quartz, etc. may precipitate, but the precipitated phase differs depending on the composition. In the dielectric ceramic composition of the present invention, only the glass phase may be used.

【0018】本発明の絶縁基板は、原料粉末として、例
えば、B2 3 粉末,SiO2 粉末を用い、所定の割合
で秤量し、湿式混合した後乾燥し、得られた粉末に適量
のバインダを加えて成形し、この成形体を大気中125
0〜1400℃で焼成することにより得られる。
The insulating substrate of the present invention uses, for example, B 2 O 3 powder and SiO 2 powder as raw material powders, weighs them at a predetermined ratio, wet-mixes them, and then dries them. , And the molded product is placed in the atmosphere 125
It is obtained by firing at 0 to 1400 ° C.

【0019】尚、本発明の絶縁基板は、金属元素として
B、Siからなるものであるが、例えば、粉砕ボールや
原料粉末の不純物として、Al、Ca、Ba、Zr、N
i、Fe、Cr、P、Na、Ti等が混入する場合があ
るが、この場合も、上記組成を満足する限り低誘電率
で、高Q値の磁器を得ることができる。
The insulating substrate of the present invention is made of B or Si as a metal element. For example, Al, Ca, Ba, Zr, N
In some cases, i, Fe, Cr, P, Na, Ti and the like may be mixed. In this case, too, a ceramic having a low dielectric constant and a high Q value can be obtained as long as the above composition is satisfied.

【0020】また、本発明の高周波用配線基板の絶縁基
板は、金属元素としてB、Siからなる複合酸化物であ
って、各金属元素酸化物による重量比組成式をxB2
3 ・ySiO2 と表した時、前記x、yが0.1≦x≦
20、80≦y≦99.9、x+y=100を満足する
主成分と、該主成分100重量部に対して周期律表第4
a族元素のうち少なくとも1種を酸化物換算で0.1重
量部以上含有するものであっても良い。
The insulating substrate of the high-frequency wiring board according to the present invention is a composite oxide comprising B and Si as metal elements, and the weight ratio composition formula of each metal element oxide is xB 2 O.
When expressed as 3 · ySiO 2 , the x and y are 0.1 ≦ x ≦
20, 80 ≦ y ≦ 99.9, x + y = 100, and 100 parts by weight of the main component with respect to the fourth part of the periodic table.
At least one of group a elements may be contained in an amount of 0.1 part by weight or more in terms of oxide.

【0021】ここで、主成分をこのような組成に限定し
たのは上記理由による。そして、この高周波用配線基板
では、主成分100重量部に対して周期律表第4a族元
素のうち少なくとも1種を酸化物換算で0.1重量部以
上、好ましくは0.1〜10重量部含有するものであ
る。
Here, the main component is limited to such a composition for the above reason. In this high-frequency wiring board, at least one of Group 4a elements in the periodic table is 0.1 parts by weight or more, preferably 0.1 to 10 parts by weight in terms of oxide, based on 100 parts by weight of the main component. It contains.

【0022】このように主成分100重量部に対して、
周期律表第4a族元素のうち少なくとも1種を酸化物換
算で0.1重量部以上含有せしめたのは、この範囲なら
ばQ値がさらに向上するからである。一方、0.1重量
部よりも少ない場合にはその添加効果が小さいからであ
る。比誘電率を4以下とするためには、0.1〜10重
量部含有することが望ましい。周期律表第4a族元素と
しては、Ti、Zr、Hfがあるが、そのうちでも、原
料が安価で、Q値が高いという点からTiが望ましい。
Thus, for 100 parts by weight of the main component,
The reason that at least one element of Group 4a of the periodic table is contained in an amount of 0.1 part by weight or more in terms of oxide is that the Q value is further improved in this range. On the other hand, if it is less than 0.1 part by weight, the effect of the addition is small. In order to make the relative dielectric constant 4 or less, it is desirable to contain 0.1 to 10 parts by weight. Examples of Group 4a elements of the periodic table include Ti, Zr, and Hf. Among them, Ti is desirable because the raw material is inexpensive and the Q value is high.

【0023】本発明の高周波用配線基板の絶縁基板は、
原料粉末として、例えば、B2 3粉末、SiO2
末、TiO2 粉末、ZrO2 粉末、HfO2 粉末を用
い、所定の割合で秤量し、湿式混合した後乾燥し、得ら
れた粉末に適量のバインダを加えて成形し、この成形体
を大気中1250〜1400℃で焼成することにより得
られる。
The insulating substrate of the high-frequency wiring board of the present invention comprises:
As a raw material powder, for example, B 2 O 3 powder, SiO 2 powder, TiO 2 powder, ZrO 2 powder, and HfO 2 powder are weighed at a predetermined ratio, wet-mixed, dried, and dried. , And molding is performed by firing the molded body at 1250 to 1400 ° C. in the air.

【0024】また、本発明の絶縁基板では、主相がガラ
ス相であり、他に結晶相として、クリストバライト、ト
リジマイト、クオーツ、Ti、Zr、Hf元素の酸化物
等が析出する場合があるが、組成によってその析出相が
異なる。
In the insulating substrate of the present invention, the main phase is a glass phase, and in addition, cristobalite, tridymite, quartz, oxides of Ti, Zr, and Hf elements may be precipitated as crystal phases. The precipitation phase differs depending on the composition.

【0025】尚、本発明の高周波用配線基板の絶縁基板
は、金属元素として、B、SiおよびTi、Zr、Hf
元素を含有するものであるが、例えば、粉砕ボールや原
料粉末の不純物としてAl、Ba、Ni、Fe、Cr、
Ca、P、Na等が混入する場合があるが、この場合
も、上記組成を満足する限り低誘電率で、高Q値の磁器
を得ることができる。
It should be noted that the insulating substrate of the high-frequency wiring board of the present invention comprises B, Si and Ti, Zr, Hf as metal elements.
Although containing elements, for example, Al, Ba, Ni, Fe, Cr,
In some cases, Ca, P, Na, and the like are mixed. In this case, too, a ceramic having a low dielectric constant and a high Q value can be obtained as long as the above composition is satisfied.

【0026】本発明の高周波用配線基板の絶縁基体とし
ては、上記主成分100重量部に対して、さらに希土類
元素のうち少なくとも1種を酸化物換算で0.1重量部
以上含有するものであっても良い。主成分100重量部
に対して、さらにYおよび希土類元素のうち少なくとも
1種を酸化物換算で0.1重量部以上含有せしめたの
は、この範囲ならばQ値がさらに向上するからである。
一方、0.1重量部よりも少ない場合にはその添加効果
が小さいからである。そして、比誘電率を4以下とする
ためには、0.1〜15重量部含有することが望まし
い。
The insulating base of the high-frequency wiring board according to the present invention contains at least one rare earth element in an amount of 0.1% by weight or more in terms of oxide based on 100 parts by weight of the main component. May be. The reason that at least one of Y and the rare earth element is further included in an amount of 0.1 part by weight or more based on 100 parts by weight of the main component is that the Q value is further improved in this range.
On the other hand, if it is less than 0.1 part by weight, the effect of the addition is small. And, in order to make the relative dielectric constant 4 or less, it is desirable to contain 0.1 to 15 parts by weight.

【0027】希土類元素は、Q値向上、より低誘電率と
いう観点から、上記主成分100重量部に対して酸化物
換算で0.1〜10重量部含有することが特に望まし
い。
From the viewpoint of improving the Q value and lowering the dielectric constant, it is particularly desirable that the rare earth element be contained in an amount of 0.1 to 10 parts by weight in terms of oxide based on 100 parts by weight of the main component.

【0028】希土類元素としては、Sc、Y、La、C
e、Pr、Nd、Pm、Sm、Eu、Gd、Tb、D
y、Ho、Er、Tm、Yb、Luがあり、これらのう
ちY、La、Nd、Sm、Dy、Yb、Luが高Q値と
いう理由で最も望ましい。
As rare earth elements, Sc, Y, La, C
e, Pr, Nd, Pm, Sm, Eu, Gd, Tb, D
There are y, Ho, Er, Tm, Yb, and Lu. Of these, Y, La, Nd, Sm, Dy, Yb, and Lu are most desirable because of their high Q value.

【0029】本発明の高周波用配線基板の絶縁基体は、
原料粉末として、例えば、B2 3粉末、SiO2
末、希土類元素のうち少なくとも1種の酸化物粉末を用
い、所定の割合で秤量し、湿式混合した後乾燥し、得ら
れた粉末に適量のバインダを加えて成形し、この成形体
を大気中1250〜1400℃で焼成することにより得
られる。
The insulating base of the high-frequency wiring board of the present invention comprises:
As a raw material powder, for example, at least one oxide powder of B 2 O 3 powder, SiO 2 powder, and rare earth element is used, weighed at a predetermined ratio, wet-mixed, dried, and dried. , And molding is performed by firing the molded body at 1250 to 1400 ° C. in the air.

【0030】また、本発明の高周波用配線基板の絶縁基
板では、主相がガラス相であり、他に結晶相として、ク
リストバライト、トリジマイト、クオーツ、希土類元素
とSiとが化合した酸化物等が析出する場合があるが、
組成によってその析出相が異なる。
In the insulating substrate of the high-frequency wiring board according to the present invention, the main phase is a glass phase, and other crystal phases such as cristobalite, tridymite, quartz, and oxides in which a rare earth element is combined with Si are precipitated. May be
The precipitation phase differs depending on the composition.

【0031】尚、本発明の高周波用配線基板の絶縁基板
は、金属元素として、B、Siおよび希土類元素を含有
するものであるが、例えば、粉砕ボールや原料粉末の不
純物としてAl、Ba、Zr、Ni、Fe、Cr、C
a、P、Na、Ti等が混入する場合があるが、この場
合も、上記組成を満足する限り低誘電率で、高Q値の磁
器を得ることができる。
The insulating substrate of the high-frequency wiring board according to the present invention contains B, Si and a rare earth element as metal elements. For example, Al, Ba, Zr as impurities in pulverized balls or raw material powders. , Ni, Fe, Cr, C
Although a, P, Na, Ti and the like may be mixed in this case, a ceramic having a low dielectric constant and a high Q value can be obtained as long as the above composition is satisfied.

【0032】さらにまた、本発明の高周波用配線基板の
絶縁基板1として、金属元素としてMg、Siからなる
複合酸化物であって、各金属元素酸化物によるモル比組
成式をaMgO・bSiO2 と表した時、前記a、bが
15≦a≦39、61≦b≦85、a+b=100を満
足するものであっても良い。
Further, the insulating substrate 1 of the high-frequency wiring board according to the present invention is a composite oxide comprising Mg and Si as metal elements, wherein the molar ratio composition formula of each metal element oxide is aMgO.bSiO 2 . When expressed, a and b may satisfy 15 ≦ a ≦ 39, 61 ≦ b ≦ 85, and a + b = 100.

【0033】絶縁基板の成分組成を前記範囲に限定した
のは、次の理由による。すなわち、MgOのモル百分率
示すaを15≦a≦39(61≦b≦85)としたのは
aが15よりも小さい場合(bが85よりも大きい場
合)は焼結体が緻密化せず、aが39を越えると(bが
61よりも小さい場合)比誘電率が5以上となるからで
ある。また、良好な焼結体が得られずQ値が低くなるか
らである。特にMgO量を示すaは、Q値を3000以
上とするという点から20≦a≦39(61≦b≦8
0)が望ましい。特に、比誘電率を小さくQ値を300
0以上とするという点からは20≦a≦30(70≦b
≦80)が望ましい。
The reason for limiting the component composition of the insulating substrate to the above range is as follows. That is, the molar percentage of MgO, a, is set to 15 ≦ a ≦ 39 (61 ≦ b ≦ 85) when a is smaller than 15 (b is larger than 85) without densification of the sintered body. , A exceeds 39 (when b is less than 61), the relative dielectric constant becomes 5 or more. Also, a good sintered body cannot be obtained and the Q value becomes low. In particular, a indicating the amount of MgO is 20 ≦ a ≦ 39 (61 ≦ b ≦ 8) from the viewpoint that the Q value is 3000 or more.
0) is desirable. In particular, the relative permittivity is small and the Q value is 300
From the viewpoint of being 0 or more, 20 ≦ a ≦ 30 (70 ≦ b
≦ 80) is desirable.

【0034】また、基板を構成する焼結体は、主結晶相
はクリストバライトであり、他に結晶相として、トリジ
マイト、クオーツ等が析出する場合があるが、組成によ
ってその析出相が異なる。
In the sintered body constituting the substrate, the main crystal phase is cristobalite, and in addition, tridymite, quartz, or the like may be precipitated as a crystal phase, but the precipitated phase differs depending on the composition.

【0035】本発明の絶縁基板は、原料粉末として、例
えば、MgCO3 粉末,SiO2 粉末を用い、所定の割
合で秤量し、湿式混合した後乾燥し、この混合物を大気
中において1100〜1300℃で0.5〜3時間仮焼
した後、粉砕した。得られた粉末に適量のバインダを加
えて成形し、この成形体を大気中1400〜1500℃
で0.5〜3時間焼成することにより得られる。
The insulating substrate of the present invention uses, for example, MgCO 3 powder and SiO 2 powder as raw material powders, weighs them at a predetermined ratio, wet-mixes them, and then dries them. And then pulverized for 0.5 to 3 hours. An appropriate amount of a binder is added to the obtained powder to form a compact.
For 0.5 to 3 hours.

【0036】そして、aMgO・bSiO2 系の組成物
において、焼結が困難であったMgOが39モル%より
も少ない範囲の組成物の焼結性を向上するため原料粉末
や焼成条件の制御が必要となる。例えば、SiO2 粉末
として非晶質SiO2 粉末を用いることによっても焼結
性を向上できる。つまり、本発明者等が先に出願した特
願平7−339780号においては緻密化出来なかった
上記組成物を緻密化できるのである。
In the aMgO.bSiO 2 -based composition, control of the raw material powder and the sintering conditions is performed to improve the sinterability of the composition in which the sintering is difficult in a range of less than 39 mol% of MgO. Required. For example, it is also improved sinterability by using amorphous SiO 2 powder as SiO 2 powder. That is, the above-mentioned composition which could not be densified in Japanese Patent Application No. 7-339780 filed by the present inventors previously can be densified.

【0037】尚、本発明の絶縁基板は、金属元素として
Mg、Si等からなるものであるが、例えば、粉砕ボー
ルや原料粉末の不純物として、Al、Ca、Ba、Z
r、Ni、Fe、Cr、P、Na、Ti等が混入する場
合があるが、この場合も、上記組成を満足する限り低誘
電率で、高Q値の磁器を得ることができる。
The insulating substrate of the present invention is composed of Mg, Si, or the like as a metal element. For example, Al, Ca, Ba, Z
In some cases, r, Ni, Fe, Cr, P, Na, Ti and the like may be mixed. In this case, too, a ceramic having a low dielectric constant and a high Q value can be obtained as long as the above composition is satisfied.

【0038】[0038]

【実施例】実施例1 原料粉末として純度95%のB2 3 、純度99%のS
iO2 粉末を用い、これらを焼結体が表1に示す組成と
なるように秤量し、15時間湿式混合した後、乾燥し、
得られた粉末に適量のバインダを加えて造粒し、これを
1000kg/cm2 の圧力の下で成形して直径60m
m厚さ5mmの成形体を得た。この成形体を大気中表1
に示す温度で2時間焼成して直径50mm厚さ0.2m
mに研磨し基板とした。この基板の一面にCuからなる
全面電極(グランド)を、他面に0.4mm幅のCuか
らなるマイクロストリップラインを形成し、図1に示す
高周波伝送線路を作製し、20GHzでの伝送損失を測
定した。
EXAMPLES Example 1 95% pure B 2 O 3 and 99% pure S as raw material powders
Using iO 2 powders, these were weighed so that the sintered body had the composition shown in Table 1, wet-mixed for 15 hours, and then dried.
The obtained powder was granulated by adding an appropriate amount of a binder, and this was molded under a pressure of 1000 kg / cm 2 to have a diameter of 60 m.
A molded product having a thickness of 5 mm was obtained. Table 1
Baking for 2 hours at the temperature shown in the table, diameter 50mm, thickness 0.2m
The substrate was polished to m. A whole surface electrode (ground) made of Cu is formed on one surface of the substrate, and a microstrip line made of Cu having a width of 0.4 mm is formed on the other surface, and the high frequency transmission line shown in FIG. It was measured.

【0039】比誘電率、Q値の測定は、直径10mm、
厚さ約5mmの焼結体を作製して、これを誘電体共振器
法で20GHzにおいて測定した。Q値に関してはQf
=一定とみなして10GHzにおけるQ値を求めた。そ
の結果を表1に示す。
The relative permittivity and the Q value were measured with a diameter of 10 mm,
A sintered body having a thickness of about 5 mm was prepared and measured at 20 GHz by the dielectric resonator method. Qf is Qf
= The Q value at 10 GHz was determined assuming that it was constant. Table 1 shows the results.

【0040】[0040]

【表1】 [Table 1]

【0041】表1によれば、本発明で用いられる絶縁基
板は測定周波数10GHzでのQ値が2000以上と高
い値を示し、20GHzでの伝送損失15dB以下であ
ることが判る。しかも、比誘電率が3.8以下と低いこ
とが判る。
According to Table 1, the insulating substrate used in the present invention has a high Q value of 2000 or more at a measurement frequency of 10 GHz, and a transmission loss of 15 dB or less at 20 GHz. Moreover, it can be seen that the relative permittivity is as low as 3.8 or less.

【0042】比較例として、比誘電率が4であり、測定
周波数10GHzでのQ値が1000であるガラスから
なる基板を用い、図1に示す高周波伝送線路での周波数
約20GHzにおいて伝送損失を測定したところ24d
B/mであった。これから、本発明の試料では、比較例
よりも伝送損失が小さく、高周波伝送特性が良好である
ことが判る。
As a comparative example, a transmission loss was measured at a frequency of about 20 GHz in the high-frequency transmission line shown in FIG. 1 using a glass substrate having a relative dielectric constant of 4 and a Q value of 1000 at a measurement frequency of 10 GHz. 24d
B / m. This shows that the sample of the present invention has smaller transmission loss and better high-frequency transmission characteristics than the comparative example.

【0043】実施例2 原料粉末として純度95%のB2 3 、純度99%のS
iO2 粉末、純度99%以上のTiO2 粉末、ZrO2
粉末、HfO2 粉末を用い、これらを焼結体が表2に示
す組成となるように秤量し、15時間湿式混合した後、
乾燥し、得られた粉末に適量のバインダを加えて造粒
し、これを1000kg/cm2 の圧力の下で成形して
直径60mm厚さ5mmの成形体を得た。この成形体を
表2に示す温度で2時間焼成して、直径50mm厚さ
0.2mmに研磨し基板とした。この基板の一面にCu
からなる全面電極(グランド)を、他面に0.4mm幅
のCuからなるマイクロストリップラインを形成し、図
1に示す高周波伝送線路を作製し、20GHzでの伝送
損失を測定した。
Example 2 B 2 O 3 having a purity of 95% and S having a purity of 99% were used as raw material powders.
iO 2 powder, purity of 99% or more of the TiO 2 powder, ZrO 2
Powder and HfO 2 powder were weighed so that the sintered body had the composition shown in Table 2, and wet-mixed for 15 hours.
The resulting powder was dried, granulated by adding an appropriate amount of a binder to the powder, and molded under a pressure of 1000 kg / cm 2 to obtain a molded body having a diameter of 60 mm and a thickness of 5 mm. The molded body was fired at the temperature shown in Table 2 for 2 hours and polished to a diameter of 50 mm and a thickness of 0.2 mm to obtain a substrate. Cu on one side of this substrate
On the other surface, a 0.4 mm-width Cu microstrip line was formed on the other surface electrode (ground), and the high-frequency transmission line shown in FIG. 1 was manufactured, and the transmission loss at 20 GHz was measured.

【0044】比誘電率、Q値の測定は、直径10mm、
厚さ約5mmの焼結体を作製して、これを誘電体共振器
法で20GHzにおいて測定した。Q値に関してはQf
=一定とみなして10GHzにおけるQ値を求めた。そ
の結果を表2に示す。
The relative permittivity and Q value were measured with a diameter of 10 mm,
A sintered body having a thickness of about 5 mm was prepared and measured at 20 GHz by the dielectric resonator method. Qf is Qf
= The Q value at 10 GHz was determined assuming that it was constant. Table 2 shows the results.

【0045】[0045]

【表2】 [Table 2]

【0046】この表2より、本発明の試料では、10G
HzにおけるQ値が2000以上であり、20GHzで
の伝送損失15dB以下であることが判る。さらに、4
a族元素酸化物が0.〜10重量部では比誘電率が4以
下であり、マイクロストリップラインの幅を広くできる
ことが判る。
As can be seen from Table 2, the sample of the present invention has a capacity of 10 G
It can be seen that the Q value in Hz is 2000 or more and the transmission loss at 20 GHz is 15 dB or less. In addition, 4
Group a element oxide is 0. At 10 to 10 parts by weight, the relative dielectric constant is 4 or less, indicating that the width of the microstrip line can be increased.

【0047】実施例3 原料粉末として純度95%のB2 3 、純度99%のS
iO2 粉末、純度99%以上の希土類元素の酸化物粉末
を用い、これらを焼結体が表3に示す組成となるように
秤量し、15時間湿式混合した後、乾燥し、得られた粉
末に適量のバインダを加えて造粒し、これを1000k
g/cm2 の圧力の下で成形して直径60mm厚さ5m
mの成形体を得た。この成形体を表3に示す温度で2時
間焼成して、直径50mm厚さ0.2mmに研磨し基板
とした。この基板の一面にCuからなる全面電極(グラ
ンド)を、他面に0.4mm幅のCuからなるマイクロ
ストリップラインを形成し、図1に示す高周波伝送線路
を作製し、20GHzでの伝送損失を測定した。
Example 3 As raw material powder, 95% pure B 2 O 3 and 99% pure S
Using iO 2 powder and oxide powder of a rare earth element having a purity of 99% or more, these were weighed so that the sintered body had the composition shown in Table 3, wet-mixed for 15 hours, and dried, and the obtained powder was obtained. Add an appropriate amount of binder and granulate,
Molded under pressure of g / cm 2 , diameter 60 mm, thickness 5 m
m was obtained. This molded body was fired at the temperature shown in Table 3 for 2 hours and polished to a diameter of 50 mm and a thickness of 0.2 mm to obtain a substrate. A full-surface electrode (ground) made of Cu is formed on one surface of this substrate, and a microstrip line made of 0.4 mm-width Cu is formed on the other surface. The high-frequency transmission line shown in FIG. 1 is manufactured, and transmission loss at 20 GHz is reduced. It was measured.

【0048】比誘電率、Q値の測定は、直径10mm、
厚さ約5mmの焼結体を作製して、これを誘電体共振器
法で20GHzにおいて測定した。Q値に関してはQf
=一定とみなして10GHzにおけるQ値を求めた。そ
の結果を表3に示す。
The relative permittivity and the Q value were measured with a diameter of 10 mm,
A sintered body having a thickness of about 5 mm was prepared and measured at 20 GHz by the dielectric resonator method. Qf is Qf
= The Q value at 10 GHz was determined assuming that it was constant. Table 3 shows the results.

【0049】[0049]

【表3】 [Table 3]

【0050】この表3より、本発明の試料では、10G
HzにおけるQ値が2000以上であり、20GHzで
の伝送損失15dB以下であることが判る。さらに、希
土類元素酸化物の添加量が0.1〜15重量部では比誘
電率が4以下であり、マイクロストリップラインの幅を
広くできることが判る。
As shown in Table 3, the sample of the present invention has a
It can be seen that the Q value in Hz is 2000 or more and the transmission loss at 20 GHz is 15 dB or less. Furthermore, when the added amount of the rare earth element oxide is 0.1 to 15 parts by weight, the relative dielectric constant is 4 or less, which indicates that the width of the microstrip line can be increased.

【0051】実施例4 原料粉末として純度99%のMgCO3 、純度99%の
SiO2 粉末を用い、これらを焼結体が表4に示す組成
となるように秤量し、15時間湿式混合した後、乾燥
し、この混合物を1200℃で2時間仮焼した後、粉砕
した。得られた粉末に適量のバインダを加えて造粒し、
これを1000kg/cm2 の圧力の下で成形して直径
60mm厚さ5mmの成形体を得た。この成形体を大気
中表4に示す温度で2時間焼成して直径50mm厚さ
0.2mmに研磨し基板とした。
EXAMPLE 4 MgCO 3 having a purity of 99% and SiO 2 powder having a purity of 99% were used as raw material powders, weighed so that the sintered body had the composition shown in Table 4, and wet-mixed for 15 hours. The mixture was dried, calcined at 1200 ° C. for 2 hours, and then pulverized. Add an appropriate amount of binder to the obtained powder and granulate,
This was molded under a pressure of 1000 kg / cm 2 to obtain a molded body having a diameter of 60 mm and a thickness of 5 mm. The molded body was fired in the atmosphere at a temperature shown in Table 4 for 2 hours and polished to a diameter of 50 mm and a thickness of 0.2 mm to obtain a substrate.

【0052】この基板の一面にCuからなる全面電極
(グランド)を、他面に0.3mm幅のCuからなるマ
イクロストリップラインを形成し、図1に示す高周波伝
送線路を作製し、20GHzでの伝送損失を測定した。
比誘電率、Q値の測定は、直径10mm、厚さ約5mm
の焼結体を作製して、誘電体共振器法にて10GHzで
のQ値を測定し、結果を表4に示す。
A whole-surface electrode (ground) made of Cu was formed on one surface of this substrate, and a microstrip line made of Cu having a width of 0.3 mm was formed on the other surface. The high-frequency transmission line shown in FIG. Transmission loss was measured.
Measurement of relative permittivity and Q value is 10mm in diameter and about 5mm in thickness
Was prepared, and the Q value at 10 GHz was measured by the dielectric resonator method. The results are shown in Table 4.

【0053】[0053]

【表4】 [Table 4]

【0054】表4によれば、本発明に用いられる絶縁基
板は、比誘電率が5未満と低く、しかも測定周波数10
GHzでのQ値が2000以上と高い値を示し、20G
Hzでの伝送損失15dB以下であることが判る。
According to Table 4, the insulating substrate used in the present invention has a low relative dielectric constant of less than 5, and has a measurement frequency of 10
Q value at GHz shows a high value of 2000 or more, and 20G
It can be seen that the transmission loss at 15 Hz is 15 dB or less.

【0055】[0055]

【発明の効果】本発明の高周波用配線基板では、絶縁基
板の10GHzでのQ値が2000以上と高い値を示す
ため、周波数20GHzにおいて伝送損失15dB/m
以下を達成でき、高周波伝送特性を向上できる。さら
に、絶縁基板の比誘電率が5未満と低いため、絶縁基板
に形成される配線層の幅を広くできる。
According to the high frequency wiring board of the present invention, the Q value of the insulating substrate at 10 GHz is as high as 2000 or more, so that the transmission loss is 15 dB / m at a frequency of 20 GHz.
The following can be achieved, and high-frequency transmission characteristics can be improved. Further, since the relative permittivity of the insulating substrate is as low as less than 5, the width of the wiring layer formed on the insulating substrate can be increased.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の高周波用配線基板を示す斜視図であ
る。
FIG. 1 is a perspective view showing a high-frequency wiring board of the present invention.

【符号の説明】[Explanation of symbols]

1・・・絶縁基板 2・・・全面電極(グランド) 3・・・マイクロストリップライン DESCRIPTION OF SYMBOLS 1 ... Insulating substrate 2 ... Full surface electrode (ground) 3 ... Microstrip line

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】絶縁基板の表面あるいは内部に、周波数1
GHz以上の高周波信号が伝送可能な配線層を配設して
なる高周波用配線基板において、前記絶縁基板が、金属
元素としてB、Siからなる複合酸化物であって、各金
属元素酸化物による重量比組成式をxB2 3 ・ySi
2 と表した時、前記x、yが0.1≦x≦20、80
≦y≦99.9、x+y=100を満足するとともに、
10GHzでのQ値が2000以上であることを特徴と
する高周波用配線基板。
1. A frequency 1 on the surface or inside of an insulating substrate.
In a high-frequency wiring board provided with a wiring layer capable of transmitting a high-frequency signal of GHz or more, the insulating substrate is a composite oxide made of B and Si as metal elements, and the weight of each metal element oxide is reduced. XB 2 O 3 .ySi
When expressed as O 2 , the x and y are 0.1 ≦ x ≦ 20, 80
≦ y ≦ 99.9, x + y = 100,
A high frequency wiring board, wherein the Q value at 10 GHz is 2000 or more.
【請求項2】絶縁基板の表面あるいは内部に、周波数1
GHz以上の高周波信号が伝送可能な配線層を配設して
なる高周波用配線基板において、前記絶縁基板が、金属
元素としてB、Siからなる複合酸化物であって、各金
属元素酸化物による重量比組成式をxB2 3 ・ySi
2 と表した時、前記x、yが0.1≦x≦20、80
≦y≦99.9、x+y=100を満足する主成分と、
該主成分100重量部に対して周期律表第4a族元素の
うち少なくとも1種を酸化物換算で0.1重量部以上、
もしくは希土類元素のうち少なくとも1種を酸化物換算
で0.1重量部以上含有することを特徴とする高周波用
配線基板。
2. The method according to claim 1, wherein a frequency of 1
In a high-frequency wiring board provided with a wiring layer capable of transmitting a high-frequency signal of GHz or more, the insulating substrate is a composite oxide made of B and Si as metal elements, and the weight of each metal element oxide is reduced. XB 2 O 3 .ySi
When expressed as O 2 , the x and y are 0.1 ≦ x ≦ 20, 80
A main component satisfying ≦ y ≦ 99.9, x + y = 100;
0.1 parts by weight or more of at least one element of Group 4a of the periodic table in terms of oxide with respect to 100 parts by weight of the main component,
Alternatively, a high-frequency wiring board containing at least one rare earth element in an amount of 0.1 part by weight or more in terms of oxide.
【請求項3】主成分100重量部に対して周期律表第4
a族元素のうち少なくとも1種を酸化物換算で0.1〜
10重量部、もしくは希土類元素のうち少なくとも1種
を酸化物換算で0.1〜15重量部含有することを特徴
とする請求項2記載の高周波用配線基板。
3. The periodic table No. 4 based on 100 parts by weight of the main component.
at least one of group a elements is 0.1 to
3. The high-frequency wiring board according to claim 2, wherein the wiring board contains 0.1 to 15 parts by weight of at least one of rare earth elements in terms of oxide.
【請求項4】絶縁基板の表面あるいは内部に、周波数1
GHz以上の高周波信号が伝送可能な配線層を配設して
なる高周波用配線基板において、前記絶縁基板が、金属
元素としてMg、Siからなる複合酸化物であって、各
金属元素酸化物によるモル比組成式をaMgO・bSi
2 と表した時、前記a、bが15≦a≦39、61≦
b≦85、a+b=100を満足するとともに、クリス
トバライトを主結晶相とし、比誘電率が5未満、かつ1
0GHzでのQ値が2000以上であることを特徴とす
る高周波用配線基板。
4. The method of claim 1, wherein a frequency of 1
In a high-frequency wiring board provided with a wiring layer capable of transmitting a high-frequency signal of GHz or more, the insulating substrate is a composite oxide containing Mg and Si as metal elements, The specific composition formula is aMgO · bSi
When represented as O 2 , the a and b are 15 ≦ a ≦ 39, 61 ≦
It satisfies b ≦ 85, a + b = 100, has cristobalite as a main crystal phase, has a relative dielectric constant of less than 5, and 1
A high-frequency wiring board, wherein the Q value at 0 GHz is 2000 or more.
JP01705698A 1998-01-29 1998-01-29 High frequency wiring board Expired - Fee Related JP3623093B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP01705698A JP3623093B2 (en) 1998-01-29 1998-01-29 High frequency wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01705698A JP3623093B2 (en) 1998-01-29 1998-01-29 High frequency wiring board

Publications (2)

Publication Number Publication Date
JPH11214812A true JPH11214812A (en) 1999-08-06
JP3623093B2 JP3623093B2 (en) 2005-02-23

Family

ID=11933341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP01705698A Expired - Fee Related JP3623093B2 (en) 1998-01-29 1998-01-29 High frequency wiring board

Country Status (1)

Country Link
JP (1) JP3623093B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1323682A2 (en) 2001-12-25 2003-07-02 Ngk Spark Plug Co., Ltd Dielectric material and dielectric sintered body, and wiring board

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1323682A2 (en) 2001-12-25 2003-07-02 Ngk Spark Plug Co., Ltd Dielectric material and dielectric sintered body, and wiring board
EP1353542A2 (en) 2001-12-25 2003-10-15 Ngk Spark Plug Co., Ltd Multilayered wiring board, and process for its production
US7309669B2 (en) 2001-12-25 2007-12-18 Ngk Spark Plug Co., Ltd. Dielectric material and dielectric sintered body, and wiring board using the same

Also Published As

Publication number Publication date
JP3623093B2 (en) 2005-02-23

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