JPH11100258A - Wiring substrate for high frequency application - Google Patents

Wiring substrate for high frequency application

Info

Publication number
JPH11100258A
JPH11100258A JP9262399A JP26239997A JPH11100258A JP H11100258 A JPH11100258 A JP H11100258A JP 9262399 A JP9262399 A JP 9262399A JP 26239997 A JP26239997 A JP 26239997A JP H11100258 A JPH11100258 A JP H11100258A
Authority
JP
Japan
Prior art keywords
powder
frequency
high frequency
value
insulating substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9262399A
Other languages
Japanese (ja)
Inventor
Takeshi Okamura
健 岡村
Tetsuya Kishino
哲也 岸野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP9262399A priority Critical patent/JPH11100258A/en
Publication of JPH11100258A publication Critical patent/JPH11100258A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0237High frequency adaptations
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass

Abstract

PROBLEM TO BE SOLVED: To provide the wiring substrate for high frequency application, which is capable of improving the high frequency transmission characteristics by using the dielectric porcelain having a low dielectric constant and a high Q value as the insulating substrate. SOLUTION: The wiring substrate for high frequency application is constituted by the arrangement of the wired layer capable of transmitting high frequency signal having a frequency of >=1 GHz on the surface and/or in the inner part of the insulating substrate 1 which is a composite oxide containing Mg, Al and Si as metal element. The composition of the oxides of these metals is shown by the molar-ratio compositional formula; xMgO.yAl2 O3 .zSiO2 , where x, y and z satisfy the following formulas; 10<=x<=40, 10<=y<=40, 20<=z<=80 and x+y+z=100. The composite oxide consists of the above main component 60-99.9 wt.% and at least one element selected from among La, Pr, Nd, Eu, Gd, Tb, Dy, Ho, Er, Tm, Lu, Ce, Ti, Sm and Y in an amount of 0.1-40 wt.% expressed in terms of its oxide.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、高周波用配線基板
に関し、ストリップ線路、マイクロストリップ線路、コ
プレーナ線路、誘電体導波管路等を有する高周波用配線
基板に関するものである。
The present invention relates to a high-frequency wiring board, and more particularly to a high-frequency wiring board having a strip line, a microstrip line, a coplanar line, a dielectric waveguide, and the like.

【0002】[0002]

【従来技術】マイクロ波、ミリ波等の高周波域で用いら
れる高周波回路においては、基板としては比誘電率が低
く誘電損失(tanδ)が小さい(Q値が大きい)材料
を使用する必要がある。このため、従来、基板材料とし
ては主として比誘電率が約10、測定周波数10GHz
でのQ値が20000以上のアルミナ磁器が採用されて
いた(例えば、特開昭62−103904号公報等参
照)。
2. Description of the Related Art In a high-frequency circuit used in a high-frequency range such as a microwave and a millimeter wave, a substrate must be made of a material having a low relative dielectric constant and a small dielectric loss (tan δ) (a large Q value). For this reason, conventionally, as a substrate material, the relative dielectric constant is mainly about 10, and the measurement frequency is 10 GHz.
Alumina porcelain having a Q value of 20000 or more has been adopted (see, for example, JP-A-62-103904).

【0003】一方、比誘電率が低い材料としては、従
来、コージェライトが知られているが、焼成温度範囲が
極めて狭いことから緻密な焼結体が得難く、ガラス材を
添加する事によって、比誘電率が4〜6、測定周波数1
0GHzでのQ値が1000程度のガラスセラミックス
が知られている(例えば特開昭61−234128号公
報等参照)。
On the other hand, cordierite is conventionally known as a material having a low relative dielectric constant. However, since the firing temperature range is extremely narrow, it is difficult to obtain a dense sintered body. Relative permittivity 4-6, measurement frequency 1
Glass ceramics having a Q value of about 1000 at 0 GHz are known (for example, see Japanese Patent Application Laid-Open No. 61-234128).

【0004】[0004]

【発明が解決しようとする課題】しかしながら、低誘電
率材料として用いられているガラスセラミックス等の磁
器は比誘電率が4〜6と小さいがQ値が10GHzで1
000程度であり、より高いQ値の低誘電率材料が求め
られていた。
However, porcelain such as glass ceramics used as a low dielectric constant material has a small relative dielectric constant of 4 to 6, but a Q value of 1 GHz at 10 GHz.
A low dielectric constant material having a higher Q value of about 000 has been demanded.

【0005】一方、アルミナ磁器は10GHzでのQ値
は20000以上と高いが、比誘電率が約10と比較的
高いため、たとえば図1に示すような高インピーダンス
のストリップラインを形成しようとすると、ライン幅が
小さくなりすぎて断線が生じたり、相対的なライン幅の
ばらつきが大きくなりマイクロ波集積回路の不良率が増
大するという問題があった。またライン間が狭くなるこ
とによりクロストークが発生するという問題があった。
On the other hand, alumina porcelain has a high Q value at 10 GHz of 20,000 or more, but has a relatively high relative dielectric constant of about 10, so that, for example, when a high impedance strip line as shown in FIG. There has been a problem that the line width becomes too small to cause disconnection, and a relative line width variation becomes large, thereby increasing the failure rate of the microwave integrated circuit. In addition, there is a problem in that crosstalk occurs due to the narrow line interval.

【0006】他方、この種の磁器基板におけるストリッ
プラインのインピーダンスは、基板の厚さが一定であれ
ば、その比誘電率及びストリップラインの幅にそれぞれ
反比例するため、ライン幅を小さくする代わりに、比誘
電率の低い基板材料を使用することによってもインピー
ダンスを高めることができ、このため、より低誘電率材
料が求められていた。さらに、マイクロ波からミリ波へ
と伝送周波数がより高周波化した場合、Q値が低いと急
激に伝送損失が大きくなることから、より低損失な材料
が求められていた。
On the other hand, if the thickness of the substrate is constant, the impedance of the strip line in this type of porcelain substrate is inversely proportional to the relative dielectric constant and the width of the strip line. By using a substrate material having a low relative dielectric constant, the impedance can be increased, and therefore, a material having a lower dielectric constant has been demanded. Further, when the transmission frequency increases from microwaves to millimeter waves, the transmission loss increases rapidly when the Q value is low, so that a material having a lower loss has been required.

【0007】本発明は、絶縁基板材料として、低誘電率
で、かつ高Q値の焼結体を用いることにより、高周波伝
送特性を向上できる高周波用配線基板を提供することを
目的とする。
It is an object of the present invention to provide a high-frequency wiring board that can improve high-frequency transmission characteristics by using a sintered body having a low dielectric constant and a high Q value as an insulating substrate material.

【0008】[0008]

【課題を解決するための手段】本発明の高周波用配線基
板は、絶縁基板の表面および/または内部に、周波数1
GHz以上の高周波信号が伝送可能な配線層を配設して
なる高周波用配線基板において、前記絶縁基板が、金属
元素としてMg、Al、Siからなる複合酸化物であっ
て、各金属元素の酸化物によるモル比組成式を、xMg
O・yAl2 3 ・zSiO2 と表した時、前記x、
y、zが、10≦x≦40、10≦y≦40、20≦z
≦80、x+y+z=100を満足する主成分60〜9
9.9重量%と、La、Pr、Nd、Eu、Gd、T
b、Dy、Ho、Er、Tm、Lu、Ce、Ti、Sm
およびYのうち少なくとも一種をそれぞれの酸化物換算
で合計0.1〜40重量%とからなるものである。
According to the present invention, there is provided a high-frequency wiring board having a frequency of 1 on the surface and / or inside of an insulating substrate.
In a high-frequency wiring board provided with a wiring layer capable of transmitting a high-frequency signal of GHz or more, the insulating substrate is a composite oxide including Mg, Al, and Si as metal elements, and oxidizing each metal element. XMg
When expressed as O.yAl 2 O 3 .zSiO 2 ,
y, z are 10 ≦ x ≦ 40, 10 ≦ y ≦ 40, 20 ≦ z
≦ 80, main components 60-9 satisfying x + y + z = 100
9.9% by weight, La, Pr, Nd, Eu, Gd, T
b, Dy, Ho, Er, Tm, Lu, Ce, Ti, Sm
And at least one of Y is 0.1 to 40% by weight in total in terms of oxides.

【0009】[0009]

【作用】本発明の高周波用配線基板では、絶縁基板を、
上記した主成分60〜99.9重量%と、La、Pr、
Nd、Eu、Gd、Tb、Dy、Ho、Er、Tm、L
u、Ce、Ti、SmおよびYのうち少なくとも一種を
それぞれの酸化物換算で0.1〜40重量%とから構成
することにより、焼成温度等の焼成条件を厳密に制御し
て得られた特性を大きく劣化させることなく、焼成条件
を改善することができる。すなわち、比誘電率が7以
下、10GHzでのQ値が2000以上の低誘電率、高
Q値の特性を得ることができるとともに、例えば、焼成
温度幅が10℃程度であったものを100℃程度まで向
上することができ、製造を容易にし、量産性を向上する
ことができる。
According to the high frequency wiring board of the present invention, the insulating substrate is
60 to 99.9% by weight of the above main component, La, Pr,
Nd, Eu, Gd, Tb, Dy, Ho, Er, Tm, L
By obtaining at least one of u, Ce, Ti, Sm, and Y in the range of 0.1 to 40% by weight in terms of oxides, characteristics obtained by strictly controlling firing conditions such as firing temperature are obtained. Can be improved without greatly deteriorating the firing conditions. That is, a low dielectric constant and high Q value characteristic having a relative dielectric constant of 7 or less and a Q value at 10 GHz of 2000 or more can be obtained. To the extent that it is easy to manufacture and mass productivity can be improved.

【0010】また、このような低誘電率、高Q値の誘電
体磁器を、絶縁基板として用いることで、高周波伝送特
性を向上できる。
The use of such a low dielectric constant, high Q value dielectric porcelain as an insulating substrate can improve high frequency transmission characteristics.

【0011】[0011]

【発明の実施の形態】本発明の高周波用配線基板は、絶
縁基板の表面および/または内部に、周波数1GHz以
上の高周波信号が伝送可能な配線層を配設してなるもの
で、例えば図1に示すように、絶縁基板1の表面に配線
層2、3を形成して構成されている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A high-frequency wiring board according to the present invention is provided with a wiring layer capable of transmitting a high-frequency signal having a frequency of 1 GHz or higher on the surface and / or inside of an insulating substrate. As shown in FIG. 1, wiring layers 2 and 3 are formed on the surface of an insulating substrate 1.

【0012】即ち、絶縁基板1の下面に配線層(グラン
ド)2を、上面に配線層3(マイクロストリップライ
ン)を形成して構成されている。この配線層2、3には
高周波信号として1GHz以上、特には20GHz以
上、さらには50GHz以上の高周波信号が伝送され
る。
That is, the wiring layer (ground) 2 is formed on the lower surface of the insulating substrate 1 and the wiring layer 3 (microstrip line) is formed on the upper surface. A high frequency signal of 1 GHz or more, particularly 20 GHz or more, and more preferably 50 GHz or more is transmitted to the wiring layers 2 and 3 as a high frequency signal.

【0013】図1では絶縁基板1の表面にマイクロスト
リップ線路である配線層3を形成した例について説明し
たが、例えば、絶縁基板1の内部にストリップ線路、コ
プレーナ線路、誘電体導波管線路を形成しても良い。ま
た、このような高周波用配線基板は、マイクロ波、ミリ
波用等の高周波域で用いられるパッケージ、誘電体共振
器、LCフィルター、コンデンサ、誘電体導波路、誘電
体アンテナ等に用いることができる。
FIG. 1 shows an example in which the wiring layer 3 which is a microstrip line is formed on the surface of the insulating substrate 1. For example, a strip line, a coplanar line, and a dielectric waveguide line are provided inside the insulating substrate 1. It may be formed. Further, such a high-frequency wiring board can be used for a package, a dielectric resonator, an LC filter, a capacitor, a dielectric waveguide, a dielectric antenna, and the like used in a high-frequency region such as microwaves and millimeter waves. .

【0014】そして、本発明の高周波用配線基板では、
絶縁基板1が、金属元素の酸化物によるモル比組成式を
xMgO・yAl2 3 ・zSiO2 と表した時、前記
x、y、zが10≦x≦40、10≦y≦40、20≦
x≦80、x+y+z=100を満足するものを主成分
とする。
In the high-frequency wiring board of the present invention,
Insulating substrate 1, when representing the molar ratio composition formula a xMgO · yAl 2 O 3 · zSiO 2 of an oxide of a metal element, the x, y, z is 10 ≦ x ≦ 40,10 ≦ y ≦ 40,20 ≤
Those satisfying x ≦ 80 and x + y + z = 100 are the main components.

【0015】基板の主成分組成を前記範囲に限定したの
は、次の理由による。すなわち、MgOのモル百分率を
示すxを10〜40モル%としたのは、xが10モル%
よりも小さい場合は良好な焼結体が得られずQ値が低く
なり、また40モル%を越えると比誘電率が高くなるか
らである。特にMgO量を示すxは、Q値を5000以
上とするという点から15〜35モル%が望ましい。
The main component composition of the substrate is limited to the above range for the following reason. That is, x indicating the molar percentage of MgO is set to 10 to 40 mol% because x is 10 mol%.
If it is smaller than this, a good sintered body cannot be obtained and the Q value becomes low, and if it exceeds 40 mol%, the relative dielectric constant becomes high. In particular, x indicating the amount of MgO is desirably 15 to 35 mol% from the viewpoint that the Q value is 5000 or more.

【0016】また、Al2 3 のモル百分率を示すyを
10〜40モル%としたのは、yが10モル%よりも小
さい場合は良好な焼結体が得られずQ値が低くなり、ま
た40モル%を越えると比誘電率が高くなるからであ
る。特にAl2 3 量を示すyは、Q値を5000以上
とするという点から17〜35モル%が望ましい。
The reason why y, which represents the mole percentage of Al 2 O 3 , is set to 10 to 40 mol% is that when y is less than 10 mol%, a good sintered body cannot be obtained and the Q value becomes low. If it exceeds 40 mol%, the relative dielectric constant will increase. Particularly, y indicating the amount of Al 2 O 3 is desirably 17 to 35 mol% from the viewpoint that the Q value is 5000 or more.

【0017】SiO2 のモル百分率を示すzを20〜8
0モル%としたのは、zが20モル%よりも小さい場合
は比誘電率が高くなり、80モル%を越えると良好な焼
結体が得られずQ値が低くなる。特にSiO2 量を示す
zは、Q値を5000以上とするという点から30〜6
0モル%が望ましい。
The z representing the molar percentage of SiO 2 is 20 to 8
The reason why 0 mol% is set is that when z is smaller than 20 mol%, the relative dielectric constant increases, and when z exceeds 80 mol%, a good sintered body cannot be obtained and the Q value decreases. In particular, z indicating the amount of SiO 2 is 30 to 6 from the viewpoint that the Q value is 5000 or more.
0 mol% is desirable.

【0018】そして、本発明によれば、絶縁基板は、上
記主成分60〜99.9重量%と、La、Pr、Nd、
Eu、Gd、Tb、Dy、Ho、Er、Tm、Lu、C
e、Ti、SmおよびYのうち少なくとも一種をそれぞ
れの酸化物換算で0.1〜40重量%とからなるもので
ある。
According to the present invention, the insulating substrate contains 60 to 99.9% by weight of the main component and La, Pr, Nd,
Eu, Gd, Tb, Dy, Ho, Er, Tm, Lu, C
At least one of e, Ti, Sm, and Y is 0.1 to 40% by weight in terms of each oxide.

【0019】主成分を60〜99.9重量%、La、P
r等を酸化物換算で0.1〜40重量部としたのは、主
成分が99.9重量%よりも多い場合(La、Pr等が
酸化物換算で0.1重量%より少ない場合)は緻密化焼
成温度は広くならず、主成分が0.01重量%よりも少
ない場合(La、Pr等が酸化物換算で40重量%より
多い場合)は比誘電率が大きくなるとともに焼成温度範
囲がかえって狭くなるからである。La、Pr等の含有
量を増加させるほど緻密化焼成温度は広くなるが、一方
比誘電率が増加し、またQ値が低下していくため、これ
らの特性と緻密化焼成温度とのかねあいで含有量を決定
することが望ましい。
The main component is 60 to 99.9% by weight, La, P
The reason that r and the like are 0.1 to 40 parts by weight in terms of oxides is that the main component is more than 99.9% by weight (when La and Pr are less than 0.1% by weight in terms of oxides). The densification firing temperature is not wide, and when the main component is less than 0.01% by weight (when La, Pr, etc. is more than 40% by weight in terms of oxide), the relative dielectric constant increases and the firing temperature range increases. However, it becomes narrower. As the content of La, Pr, etc. increases, the densification firing temperature increases, but on the other hand, the relative dielectric constant increases and the Q value decreases. It is desirable to determine the content.

【0020】本発明の絶縁基板は、Q値を5000以上
とするためには15≦x≦35、17≦y≦35、30
≦x≦60を満足することが望ましく、さらにQ値を7
000以上とするためには20≦x≦30、17≦y≦
30、40≦x≦60を満足することがより望ましい。
The insulating substrate according to the present invention has the following characteristics: 15 ≦ x ≦ 35, 17 ≦ y ≦ 35, 30
≤x≤60, and a Q value of 7
In order to be 000 or more, 20 ≦ x ≦ 30, 17 ≦ y ≦
It is more desirable to satisfy 30, 40 ≦ x ≦ 60.

【0021】本発明の絶縁基板では、特に、コージェラ
イトの組成、即ちx=22.2、y=22.2、z=5
5.6で、La、Pr、Nd、Eu、Gd、Tb、D
y、Ho、Er、Tm、Lu、Ce、Ti、Smおよび
Yのうち少なくとも一種をそれぞれの酸化物換算で0.
1〜10重量%含有することが望ましい。これらの元素
のうち、実用的(安価)な材料であるという点でLa、
Y、Tiが望ましい。
In the insulating substrate of the present invention, in particular, the composition of cordierite, that is, x = 22.2, y = 22.2, z = 5
At 5.6, La, Pr, Nd, Eu, Gd, Tb, D
at least one of y, Ho, Er, Tm, Lu, Ce, Ti, Sm, and Y in terms of their respective oxides.
It is desirable to contain 1 to 10 wt%. Among these elements, La, in that it is a practical (cheap) material,
Y and Ti are desirable.

【0022】絶縁基板について、測定周波数10GHz
でのQ値が2000以上を満足するようにしたのは、Q
値が2000以上ある場合には、近年における高周波数
帯の絶縁基板に十分対応することができるからである。
Q値は、高ければ高い程望ましいが、特には、10GH
zでのQ値が5000以上であることが望ましい。
For the insulating substrate, the measurement frequency is 10 GHz
The reason why the Q value at 2000 is to satisfy 2000 or more is that Q
When the value is 2000 or more, it is possible to sufficiently cope with an insulating substrate in a high frequency band in recent years.
The Q value is preferably as high as possible.
It is desirable that the Q value at z is 5000 or more.

【0023】また、本発明の絶縁基板では、主相はコー
ジェライトであり、他に結晶相として、ムライト、スピ
ネル、プロトエンスタタイト、クリノエンスタタイト、
フォルステライト、クリストバライト、トリジマイト、
サファリン、クオーツ等が析出し、さらにLa、Pr、
Nd、Eu、Gd、Tb、Dy、Ho、Er、Tm、L
u、Ce、Ti、SmおよびYのうち少なくとも一種と
主成分元素との酸化化合物等が析出する場合があるが、
組成によってその析出相が異なる。
In the insulating substrate of the present invention, the main phase is cordierite, and the other crystalline phases are mullite, spinel, protoenstatite, clinoenstatite,
Forsterite, cristobalite, tridymite,
Safarin, quartz, etc. precipitate, and La, Pr,
Nd, Eu, Gd, Tb, Dy, Ho, Er, Tm, L
An oxide compound of at least one of u, Ce, Ti, Sm and Y and a main component element may be precipitated.
The precipitation phase differs depending on the composition.

【0024】本発明の絶縁基板は、原料粉末として、例
えば、MgCO3 粉末、Al2 3粉末、SiO2
末、LaO粉末、PrO粉末、Nd2 3 粉末、Eu2
3 粉末、Gd2 3 粉末、Tb2 3 粉末、Dy2
3 粉末、Ho2 3 粉末、Er2 3 粉末、Tm2 3
粉末、Lu2 3 粉末、CeO2 粉末、TiO2 粉末、
Sm2 3 粉末、Y2 3 粉末を用い、所定の割合で秤
量し、湿式混合した後乾燥し、この混合物を大気中にお
いて1100〜1300℃で0.5〜3時間仮焼した
後、粉砕した。得られた粉末に適量のバインダを加えて
成形し、この成形体を大気中1200〜1450℃で焼
成することにより得られる。特に、コージェライトを主
結晶相とする誘電体磁器は難焼結性であるため、適正な
焼成温度を探しだし、焼成温度を厳密に制御して焼成す
る必要がある。
The insulating substrate of the present invention may be made of, for example, MgCO 3 powder, Al 2 O 3 powder, SiO 2 powder, LaO powder, PrO powder, Nd 2 O 3 powder, Eu 2
O 3 powder, Gd 2 O 3 powder, Tb 2 O 3 powder, Dy 2 O
3 powder, Ho 2 O 3 powder, Er 2 O 3 powder, Tm 2 O 3
Powder, Lu 2 O 3 powder, CeO 2 powder, TiO 2 powder,
Sm 2 O 3 powder and Y 2 O 3 powder were weighed at a predetermined ratio, wet-mixed and dried, and the mixture was calcined in the atmosphere at 1100 to 1300 ° C. for 0.5 to 3 hours. Crushed. It is obtained by adding an appropriate amount of a binder to the obtained powder and molding, and firing this molded body at 1200 to 1450 ° C in the air. In particular, since dielectric porcelain having cordierite as a main crystal phase is difficult to sinter, it is necessary to find an appropriate firing temperature and to fire at a strictly controlled firing temperature.

【0025】尚、本発明の高周波用配線基板の絶縁基板
は、金属元素として、Mg、Al、Siと、La、P
r、Nd、Eu、Gd、Tb、Dy、Ho、Er、T
m、Lu、Ce、Ti、SmおよびYからなるものであ
るが、例えば、粉砕ボールや原料粉末の不純物として、
Ca、Ba、Zr、Ni、Fe、Cr、P、Na等が混
入する場合があるが、この場合でも、上記組成を満足す
る限り低誘電率で、高Q値とすることができる。
It should be noted that the insulating substrate of the high-frequency wiring board of the present invention comprises Mg, Al, Si, La, P
r, Nd, Eu, Gd, Tb, Dy, Ho, Er, T
m, Lu, Ce, Ti, Sm, and Y. For example, as impurities in pulverized balls or raw material powders,
In some cases, Ca, Ba, Zr, Ni, Fe, Cr, P, Na, and the like are mixed, but even in this case, as long as the above composition is satisfied, a low dielectric constant and a high Q value can be obtained.

【0026】[0026]

【実施例】原料粉末として純度99%のMgCO3
末、純度99.7%のAl2 3 粉末、純度99.4%
のSiO2 粉末、純度99.9%のLa2 3 粉末、P
23 粉末、Nd2 3 粉末、Eu2 3 粉末、Gd
2 3 粉末、Tb2 3 粉末、Dy2 3 粉末、Ho2
3 粉末、Er2 3 粉末、Tm2 3 粉末、Lu2
3 粉末、CeO2 粉末、TiO2 粉末、Sm2 3
末、Y2 3 粉末を用い、これらを焼結体が表1〜5に
示す組成となるように秤量し、15時間湿式混合した
後、乾燥し、この混合物を1200℃2時間仮焼した後
粉砕した。
EXAMPLES As raw material powder, 99% pure MgCO 3 powder, 99.7% pure Al 2 O 3 powder, 99.4% pure
Of SiO 2 powder, La 2 O 3 powder of 99.9% purity, P
r 2 O 3 powder, Nd 2 O 3 powder, Eu 2 O 3 powder, Gd
2 O 3 powder, Tb 2 O 3 powder, Dy 2 O 3 powder, Ho 2
O 3 powder, Er 2 O 3 powder, Tm 2 O 3 powder, Lu 2 O
3 powder, CeO 2 powder, TiO 2 powder, Sm 2 O 3 powder, and Y 2 O 3 powder were weighed so that the sintered body had the composition shown in Tables 1 to 5, and wet-mixed for 15 hours. Thereafter, the mixture was dried, and the mixture was calcined at 1200 ° C. for 2 hours and then pulverized.

【0027】得られた粉末に適量のバインダを加えて造
粒し、これを1000kg/cm2の圧力の下で成形し
て直径60mm厚さ5mmの成形体を得た。この成形体
を大気中において表1〜5に示す温度で2時間焼成して
直径50mm厚さ0.2mmに研磨し基板とした。この
基板に0.3mm幅のCuからなるマイクロストリップ
ラインを形成し、図1に示す高周波伝送線路を作製し、
20GHzでの伝送損失を測定した。
The obtained powder was granulated by adding an appropriate amount of a binder, and the obtained powder was molded under a pressure of 1000 kg / cm 2 to obtain a molded body having a diameter of 60 mm and a thickness of 5 mm. This molded body was fired in the air at the temperatures shown in Tables 1 to 2 for 2 hours, and polished to a diameter of 50 mm and a thickness of 0.2 mm to obtain a substrate. A microstrip line made of Cu having a width of 0.3 mm was formed on this substrate, and a high-frequency transmission line shown in FIG.
The transmission loss at 20 GHz was measured.

【0028】また、比誘電率、Q値の測定には直径10
mm、厚さ5mmの焼結体を作製して、誘電体共振器法
にて10GHzでの値を測定し、その結果を表1〜5に
記載した。
For measurement of relative permittivity and Q value, diameter 10
A sintered body having a thickness of 5 mm and a thickness of 5 mm was prepared, and the value at 10 GHz was measured by the dielectric resonator method. The results are shown in Tables 1 to 5.

【0029】[0029]

【表1】 [Table 1]

【0030】[0030]

【表2】 [Table 2]

【0031】[0031]

【表3】 [Table 3]

【0032】[0032]

【表4】 [Table 4]

【0033】[0033]

【表5】 [Table 5]

【0034】表1〜5によれば、本発明に用いられる絶
縁基板は、比誘電率が7以下と低く、しかも測定周波数
10GHzでのQ値が2000以上と高い値を示すこと
がわかる。しかも図1に示す高周波伝送線路では、周波
数20GHzにおいて伝送損失15dB/m以下を示す
ことが判る。
Tables 1 to 5 show that the insulating substrate used in the present invention has a low relative dielectric constant of 7 or less and a high Q value of 2000 or more at a measurement frequency of 10 GHz. Moreover, it can be seen that the high-frequency transmission line shown in FIG. 1 exhibits a transmission loss of 15 dB / m or less at a frequency of 20 GHz.

【0035】比較例としてガラスセラミックスからなる
基板を作製した。この基板の比誘電率は5.6であり、
測定周波数10GHzでのQ値が1000であり、図1
に示す高周波伝送線路では、周波数20GHzにおいて
伝送損失24dB/mであった。
As a comparative example, a substrate made of glass ceramics was manufactured. The relative permittivity of this substrate is 5.6,
The Q value at a measurement frequency of 10 GHz is 1000, and FIG.
In the high-frequency transmission line shown in FIG. 7, the transmission loss was 24 dB / m at a frequency of 20 GHz.

【0036】[0036]

【発明の効果】本発明の高周波用配線基板は、絶縁基板
が、モル比組成式がxMgO・yAl2 3 ・zSiO
2 で表される主成分と、La、Pr、Nd、Eu、G
d、Tb、Dy、Ho、Er、Tm、Lu、Ce、T
i、SmおよびYのうち少なくとも一種をそれぞれの酸
化物換算で0.1〜40重量%とからなるので、7以下
の低い比誘電率を有し、10GHzでのQ値が2000
以上の高いQ値を有し、これにより高周波伝送特性を向
上できる。
According to the high frequency wiring board of the present invention, the insulating substrate has a molar ratio composition formula of xMgO.yAl 2 O 3 .zSiO.
2 and La, Pr, Nd, Eu, G
d, Tb, Dy, Ho, Er, Tm, Lu, Ce, T
Since at least one of i, Sm and Y consists of 0.1 to 40% by weight in terms of their oxides, they have a low relative dielectric constant of 7 or less and a Q value at 10 GHz of 2000.
It has a high Q value as described above, thereby improving high-frequency transmission characteristics.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の高周波用配線基板を示す斜視図であ
る。
FIG. 1 is a perspective view showing a high-frequency wiring board of the present invention.

【符号の説明】[Explanation of symbols]

1・・・絶縁基板 2・・・配線層極(グランド) 3・・・配線層極(マイクロストリップライン) DESCRIPTION OF SYMBOLS 1 ... Insulating board 2 ... Wiring layer pole (ground) 3 ... Wiring layer pole (microstrip line)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】絶縁基板の表面および/または内部に、周
波数1GHz以上の高周波信号が伝送可能な配線層を配
設してなる高周波用配線基板において、前記絶縁基板
が、金属元素としてMg、Al、Siからなる複合酸化
物であって、各金属元素の酸化物によるモル比組成式を xMgO・yAl2 3 ・zSiO2 と表した時、前記x、y、zが 10≦x≦40 10≦y≦40 20≦z≦80 x+y+z=100 を満足する主成分60〜99.9重量%と、La、P
r、Nd、Eu、Gd、Tb、Dy、Ho、Er、T
m、Lu、Ce、Ti、SmおよびYのうち少なくとも
一種をそれぞれの酸化物換算で合計0.1〜40重量%
とからなることを特徴とする高周波用配線基板。
1. A high-frequency wiring board having a wiring layer capable of transmitting a high-frequency signal having a frequency of 1 GHz or more disposed on a surface and / or inside of an insulating substrate. a composite oxide comprising Si, when the molar ratio composition formula of an oxide of each metal element expressed as xMgO · yAl 2 O 3 · zSiO 2, wherein x, y, z is 10 ≦ x ≦ 40 10 ≦ y ≦ 40 20 ≦ z ≦ 80 x + y + z = 100 60 to 99.9% by weight of the main component satisfying
r, Nd, Eu, Gd, Tb, Dy, Ho, Er, T
at least one of m, Lu, Ce, Ti, Sm, and Y is 0.1 to 40% by weight in total in terms of their oxides.
A high-frequency wiring board, comprising:
JP9262399A 1997-09-26 1997-09-26 Wiring substrate for high frequency application Pending JPH11100258A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9262399A JPH11100258A (en) 1997-09-26 1997-09-26 Wiring substrate for high frequency application

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9262399A JPH11100258A (en) 1997-09-26 1997-09-26 Wiring substrate for high frequency application

Publications (1)

Publication Number Publication Date
JPH11100258A true JPH11100258A (en) 1999-04-13

Family

ID=17375241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9262399A Pending JPH11100258A (en) 1997-09-26 1997-09-26 Wiring substrate for high frequency application

Country Status (1)

Country Link
JP (1) JPH11100258A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000327410A (en) * 1999-05-24 2000-11-28 Kyocera Corp Dielectric porcelain composition and non-radioactive dielectric cable line
JP2003026471A (en) * 2001-07-12 2003-01-29 Ube Electronics Ltd Dielectric porcelain composition for high frequency and method of manufacturing the same
JP2007137764A (en) * 2006-11-29 2007-06-07 Kyocera Corp Dielectric ceramic composition, and dielectric resonator, nonradioactive dielectric line and high frequency wiring board using the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000327410A (en) * 1999-05-24 2000-11-28 Kyocera Corp Dielectric porcelain composition and non-radioactive dielectric cable line
JP2003026471A (en) * 2001-07-12 2003-01-29 Ube Electronics Ltd Dielectric porcelain composition for high frequency and method of manufacturing the same
JP2007137764A (en) * 2006-11-29 2007-06-07 Kyocera Corp Dielectric ceramic composition, and dielectric resonator, nonradioactive dielectric line and high frequency wiring board using the same

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