JPH11200097A - Barrel plating method for chip parts - Google Patents
Barrel plating method for chip partsInfo
- Publication number
- JPH11200097A JPH11200097A JP561898A JP561898A JPH11200097A JP H11200097 A JPH11200097 A JP H11200097A JP 561898 A JP561898 A JP 561898A JP 561898 A JP561898 A JP 561898A JP H11200097 A JPH11200097 A JP H11200097A
- Authority
- JP
- Japan
- Prior art keywords
- barrel
- chip
- plating
- resistors
- multiplicity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、高密度配線回路に
用いられるチップ部品のバレルめっき方法に関するもの
である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a barrel plating method for chip components used in high-density wiring circuits.
【0002】[0002]
【従来の技術】以下、従来のバレルめっき方法につい
て、電子部品の一例としてチップ抵抗器を例にして説明
する。2. Description of the Related Art A conventional barrel plating method will be described below, taking a chip resistor as an example of an electronic component.
【0003】チップ抵抗器の電極めっきは、バレルめっ
き装置を利用したバレルめっき法によって行われる。す
なわち、めっき層を形成すべき多数個のチップ抵抗器素
体を、ダミーと俗称される導電性の金属ボールからなる
多数個の給電体、およびセラミック製ボール等からなる
攪拌促進体とともにバレル内に投入し、これらをめっき
液内で回転させるとともにバレル内に挿入された陰極リ
ード線とバレル以外に配置された金属陽極間を所定時間
通電することにより行われる。[0003] Electrode plating of a chip resistor is performed by a barrel plating method using a barrel plating apparatus. That is, a large number of chip resistor elements to be formed with a plating layer are placed in a barrel together with a large number of power supply elements made of conductive metal balls commonly called dummy and an agitation accelerator made of ceramic balls and the like. It is carried out by turning on and rotating them in the plating solution, and energizing between the cathode lead wire inserted in the barrel and the metal anode arranged outside the barrel for a predetermined time.
【0004】金属陽極から溶解してイオン化した金属
は、陰極リード線もしくはダミーを介してマイナス電位
を与えられたチップ抵抗器素体の電極表面上に析出し、
めっき層が形成される。The metal dissolved and ionized from the metal anode precipitates on the electrode surface of the chip resistor body to which a negative potential is applied via a cathode lead wire or a dummy.
A plating layer is formed.
【0005】ここで、ダミーは、線的な陰極接点からバ
レル内に分散する多数個のチップ抵抗器素体の全てにむ
らなくマイナス電位を与えるための通電経路の役割を担
っている。また、攪拌促進体は、バレル内の攪拌効率を
良化し、多数個のチップ抵抗器素体のめっき膜厚ばらつ
きを抑制する役割を担っている。Here, the dummy plays a role of a current supply path for uniformly applying a negative potential to all of a large number of chip resistor elements dispersed in the barrel from the linear cathode contact. Further, the stirring promoting body has a role of improving stirring efficiency in the barrel and suppressing a variation in plating film thickness of a large number of chip resistor elements.
【0006】[0006]
【発明が解決しようとする課題】しかしながら、従来の
チップ部品のバレルめっき方法では、めっき後チップ部
品同士がくっつき、個片のチップ部品として分離できな
いものが発生する場合がある。このようにくっついたチ
ップ部品を個片のチップ部品に分離するため無理矢理も
みほぐし等を行うと、電極剥がれなどの不具合の生じる
場合があり、一度くっついてしまったチップ部品は安易
に個片のチップ部品に分離できないという課題を有して
いた。However, in the conventional barrel plating method for chip components, chip components may adhere to each other after plating and may not be separated as individual chip components. If you forcibly remove the chip components that are attached in this way into individual chip components, problems such as electrode peeling may occur. There was a problem that it could not be separated into parts.
【0007】本発明は上記従来の課題を解決するため
に、チップ部品同士のくっつき不良を激減することがで
きるチップ部品のバレルめっき方法を提供することを目
的とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a barrel plating method for chip components, which can drastically reduce sticking defects between chip components.
【0008】[0008]
【課題を解決するための手段】上記目的を達成するため
に本発明のチップ部品のバレルめっき方法は、バレルめ
っきのバレル内に、めっき層を形成すべき多数個のチッ
プ部品と、前記チップ部品と同一形状であり、かつ非導
電物の調整体と、バレル内の陰イオンを伝導する多数個
の金属給電体とを投入するものである。In order to achieve the above object, a method of barrel plating a chip component according to the present invention comprises the steps of: forming a plurality of chip components for forming a plating layer in a barrel of barrel plating; And a non-conductive adjuster and a number of metal feeders that conduct anions in the barrel.
【0009】[0009]
【発明の実施の形態】本発明の請求項1に記載の発明
は、バレルめっきによってチップ部品にめっき層を形成
する方法において、バレルめっきのバレル内に、前記め
っき層を形成すべき多数個のチップ部品と前記チップ部
品と同一形状の調整体と前記バレル内の陰イオンを伝導
する多数個の金属給電体とを投入してめっきするもので
あり、チップ部品同士のくっつき不良を減らすことが可
能になるという作用を有するものである。DESCRIPTION OF THE PREFERRED EMBODIMENTS The invention according to claim 1 of the present invention is directed to a method of forming a plating layer on a chip component by barrel plating, wherein a plurality of plating layers to be formed in a barrel of barrel plating are formed. A chip component, an adjusting body having the same shape as the chip component, and a large number of metal feeders that conduct anions in the barrel are charged and plated to reduce a sticking defect between the chip components. It has the effect of becoming
【0010】また、本発明の請求項2に記載の発明は、
請求項1に記載の調整体は、めっき層を形成すべきチッ
プ部品と同一形状であり、かつ非導電物であり、チップ
抵抗器等の素体であるアルミナ基板をそのまま分割し、
個片のチップとしたものを調整体として使用できるとい
う作用を有するものである。[0010] The invention described in claim 2 of the present invention provides:
The adjustment body according to claim 1 has the same shape as the chip component on which the plating layer is to be formed, and is a non-conductive material, and the alumina substrate which is a base body such as a chip resistor is divided as it is,
This has an effect that an individual chip can be used as an adjusting body.
【0011】また、本発明の請求項3に記載の発明は、
請求項1に記載の調整体の投入数量は、めっき層を形成
すべきチップ部品の投入量の50%以上200%以下で
あるものであり、チップ部品同士のくっつき不良を減ら
すことが可能になるという作用を有するものである。Further, the invention according to claim 3 of the present invention provides:
The input amount of the adjusting member according to claim 1 is 50% or more and 200% or less of the input amount of the chip component on which the plating layer is to be formed, and it is possible to reduce sticking defects between the chip components. It has the action of:
【0012】以下、本発明の一実施の形態におけるチッ
プ部品のバレルめっき方法について、図面を参照しなが
ら説明する。Hereinafter, a method for barrel plating chip components according to an embodiment of the present invention will be described with reference to the drawings.
【0013】図1は本発明の一実施の形態におけるバレ
ルめっきのバレルめっき装置の断面図である。図2
(a)は同要部である調整体の斜視図、図2(b)は同
要部である電子部品の一例としてのチップ抵抗器の斜視
図、図3は同工程を説明する工程図である。FIG. 1 is a sectional view of a barrel plating apparatus for barrel plating according to an embodiment of the present invention. FIG.
FIG. 2A is a perspective view of an adjusting body as the main part, FIG. 2B is a perspective view of a chip resistor as an example of the electronic part as the main part, and FIG. 3 is a process diagram illustrating the same step. is there.
【0014】バレルめっき装置6は、めっき液を貯留す
るめっき槽2と、めっき槽2内に浸漬し回転させる有孔
のバレル4とを備えて構成される。このバレル4は、め
っき槽2の端に設けてある陰極電極サドルに対して、脱
着可能に装着されるようになっており、陰極電極サドル
に電気的に接続される陰極リード線3がバレル4内部に
挿入設置されている。また、金属陽極5はバレル4の外
のめっき液1に浸漬される。陰極電極サドルおよび金属
陽極5は、図示しない整流器の陰極、陽極のそれぞれの
端子に接続される。The barrel plating apparatus 6 includes a plating tank 2 for storing a plating solution, and a perforated barrel 4 dipped in the plating tank 2 and rotated. The barrel 4 is detachably attached to a cathode electrode saddle provided at an end of the plating tank 2, and the cathode lead wire 3 electrically connected to the cathode electrode saddle is connected to the barrel 4. It is inserted and installed inside. The metal anode 5 is immersed in the plating solution 1 outside the barrel 4. The cathode electrode saddle and the metal anode 5 are connected to respective terminals of a cathode and an anode of a rectifier (not shown).
【0015】本発明の一実施の形態におけるチップ抵抗
器のバレルめっき方法では、まず、バレル4内にめっき
層を形成すべき3216タイプチップ抵抗器7(3.2
×1.6×0.6mm)を2kgと、このチップ抵抗器7よ
り小さい導電性ボールでできた給電体8を5kgと、チッ
プ抵抗器7と同一形状(3.2×1.6×0.6mm)で
あるアルミナでできたチップ状の調整体9を2kgとを同
時に投入する工程Aを行う。In the barrel plating method for a chip resistor according to an embodiment of the present invention, first, a 3216 type chip resistor 7 (3.2) for forming a plating layer in the barrel 4 is formed.
× 1.6 × 0.6 mm), 2 kg, and a feeder 8 made of conductive balls smaller than the chip resistor 7, 5 kg, and the same shape (3.2 × 1.6 × 0) as the chip resistor 7. Step A, in which 2 kg of a chip-shaped adjusting member 9 made of alumina having a diameter of 0.6 mm) is simultaneously introduced.
【0016】次に、バレル4を回転させながら油脂やホ
コリなどを除去するための脱脂工程Bを行い、水洗Cを
行う。そして、表面の活性化および酸化膜除去のため酸
処理工程Dを行い、水洗Eを行う。Next, a degreasing step B for removing oils and fats and dust and the like is performed while rotating the barrel 4, and a water washing C is performed. Then, an acid treatment step D for activating the surface and removing the oxide film is performed, and a washing E is performed.
【0017】次に、Niめっき工程Fを電流密度1〜1
0A/dm2で50分間実施する。次に、水洗Gを行っ
た後、はんだめっき工程Hを電流密度1〜10A/dm
2とし40分間実施する。Next, the Ni plating step F is performed at a current density of 1-1.
Perform at 0 A / dm 2 for 50 minutes. Next, after performing washing G, the solder plating step H was performed at a current density of 1 to 10 A / dm.
Perform for 40 minutes as 2 .
【0018】次に、水洗Iして、第三リン酸ナトリウム
5%水溶液による変色防止処理Jを行い、その後水洗K
を行う。Next, washing with water I is performed, and a discoloration preventing treatment J with a 5% aqueous solution of tribasic sodium phosphate is performed.
I do.
【0019】次に、チップ抵抗器7および給電体8、調
整体9を乾燥用の籠にバレルから取り出す工程Lを行っ
た後、乾燥Mを行う。Next, after performing the step L of taking out the chip resistor 7, the power supply 8 and the adjustment body 9 from the barrel in a basket for drying, the drying M is performed.
【0020】以下、従来のバレルめっき方法と本実施の
形態におけるバレルめっき方法でめっきした後のチップ
抵抗器のくっつき率を比較した結果について説明する。
(表1)には、従来のバレルめっき方法と、本発明のバ
レルめっき方法において調整体の投入量を製品量に対し
て変化させた時のチップ抵抗器のくっつき率を示す。な
お、ここで言うくっつき率とは、一バレル内に発生した
製品同士の重なり(くっついた状態)不良率を意味す
る。The results of comparing the sticking rates of the chip resistors after plating by the conventional barrel plating method and the barrel plating method in the present embodiment will be described below.
Table 1 shows the sticking ratio of the chip resistor when the input amount of the adjuster is changed with respect to the product amount in the conventional barrel plating method and the barrel plating method of the present invention. Here, the sticking rate means an overlapping (stuck state) defect rate of products generated in one barrel.
【0021】[0021]
【表1】 [Table 1]
【0022】(表1)からも明らかなように、本発明の
実施の形態におけるバレルめっき方法でめっきしたチッ
プ抵抗器のくっつき率は1%以下であり、従来の方法に
比べ大幅にくっつき率を低減することができる。くっつ
き発生は、特にチップ抵抗器の場合水の表面張力により
裏面同士での重なりが生じやすく、そのまま重なった状
態が一定時間継続されることによりその接触した導電部
分にはんだめっき膜が成長し、くっつき不良に至ると考
えられている。このため、非導電物でありかつ製品と同
一形状のダミーを、絶えず故意にチップ抵抗器と接触さ
せることにより、チップ抵抗器同士の接触確立を低減
し、これによりくっつき不良の発生を抑制している。As is clear from Table 1, the sticking rate of the chip resistor plated by the barrel plating method in the embodiment of the present invention is 1% or less, which is much smaller than the conventional method. Can be reduced. In the case of chip resistors, in particular, in the case of chip resistors, the back surface tends to overlap due to the surface tension of water. It is thought to lead to failure. For this reason, the dummy which is non-conductive and has the same shape as the product is constantly and intentionally brought into contact with the chip resistors, thereby reducing the probability of contact between the chip resistors and thereby suppressing the occurrence of sticking failure. I have.
【0023】なお、調整体が製品投入量に対し50%に
満たない場合には、調整体が少なくなるほどくっつき率
が多くなる。また、逆に200%を越えると、この調整
体のめっき膜形成を阻害する影響が大きくなりすぎ、従
来の積算電気量では十分な膜厚をチップ抵抗器へ形成す
ることが困難になる。つまり、製品投入量に対し200
%を越える量を投入することは別の弊害が生じることに
なり、適切な条件とはならない。When the amount of the adjuster is less than 50% of the product input, the smaller the adjuster, the higher the sticking rate. On the other hand, if it exceeds 200%, the effect of inhibiting the formation of the plating film by the adjustment body becomes too large, and it becomes difficult to form a sufficient film thickness on the chip resistor with the conventional integrated amount of electricity. In other words, 200
Injecting an amount exceeding% results in another adverse effect, which is not an appropriate condition.
【0024】従って、本発明におけるチップ部品のバレ
ルめっき方法でめっきすることにより、その他の条件を
全く変えること無く、めっき後のくっつき不良を大幅に
低減することが可能になる。Therefore, by plating the chip parts by the barrel plating method of the present invention, it is possible to greatly reduce sticking defects after plating without changing other conditions at all.
【0025】なお、本発明の一実施の形態では、チップ
抵抗器を用いて説明したが、これは多連チップ抵抗器等
の他のチップ抵抗器や、チップコンデンサ等の他のチッ
プ部品でも同様の効果が得られる。Although one embodiment of the present invention has been described using a chip resistor, the same applies to other chip resistors such as a multiple chip resistor and other chip components such as a chip capacitor. The effect of is obtained.
【0026】[0026]
【発明の効果】本発明によれば、バレルめっき装置のバ
レル内に、めっき層を形成すべき多数個のチップ部品と
同一形状であり、かつ非導電物の調整体を投入すること
により、その他のめっき条件を全く変えること無くチッ
プ部品同士のくっつき不良を激減することが可能にな
る。According to the present invention, by adding a non-conductive adjusting body having the same shape as a large number of chip components to be formed with a plating layer into a barrel of a barrel plating apparatus, It is possible to drastically reduce sticking defects between chip components without changing plating conditions at all.
【0027】したがって、くっついたチップ部品を個片
のチップ部品として分離する手間が少なくなるのはもち
ろんのこと、もみほぐし等による電極剥がれなどの問題
も解消し、歩留および品質信頼性が向上するという効果
が得られる。Therefore, not only the trouble of separating the attached chip parts as individual chip parts is reduced, but also the problem of electrode peeling due to unraveling or the like is eliminated, and the yield and quality reliability are improved. The effect is obtained.
【図1】本発明の一実施の形態におけるバレルめっきの
バレルめっき装置の断面図FIG. 1 is a sectional view of a barrel plating apparatus for barrel plating according to an embodiment of the present invention.
【図2】(a)同要部である調整体の斜視図 (b)同要部であるチップ抵抗器の斜視図FIG. 2 (a) is a perspective view of an adjusting body which is the main part. FIG. 2 (b) is a perspective view of a chip resistor which is the main part.
【図3】同工程図[Fig. 3]
1 めっき液 2 めっき槽 3 陰極リード線 4 バレル 5 金属陽極 6 バレルめっき装置 7 チップ抵抗器 8 給電体 9 調整体 DESCRIPTION OF SYMBOLS 1 Plating solution 2 Plating tank 3 Cathode lead wire 4 Barrel 5 Metal anode 6 Barrel plating device 7 Chip resistor 8 Feeder 9 Adjuster
Claims (3)
き層を形成する方法において、バレルめっきのバレル内
に、前記めっき層を形成すべき多数個のチップ部品と前
記チップ部品と同一形状の調整体と前記バレル内の陰イ
オンを伝導する多数個の金属給電体とを投入してめっき
するチップ部品のバレルめっき方法。1. A method of forming a plating layer on a chip component by barrel plating, wherein a plurality of chip components on which the plating layer is to be formed, an adjusting body having the same shape as the chip component, and A barrel plating method for a chip component in which a plurality of metal feeders that conduct anions in the barrel are charged and plated.
部品と同一形状であり、かつ非導電物である請求項1記
載のチップ部品のバレルめっき方法。2. The barrel plating method for a chip component according to claim 1, wherein the adjusting body has the same shape as the chip component on which the plating layer is to be formed, and is non-conductive.
べきチップ部品の投入量の50%以上200%以下であ
る請求項1記載のチップ部品のバレルめっき方法。3. The barrel plating method for a chip component according to claim 1, wherein the input quantity of the adjusting member is 50% or more and 200% or less of the input quantity of the chip component for forming the plating layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP561898A JPH11200097A (en) | 1998-01-14 | 1998-01-14 | Barrel plating method for chip parts |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP561898A JPH11200097A (en) | 1998-01-14 | 1998-01-14 | Barrel plating method for chip parts |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11200097A true JPH11200097A (en) | 1999-07-27 |
Family
ID=11616179
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP561898A Pending JPH11200097A (en) | 1998-01-14 | 1998-01-14 | Barrel plating method for chip parts |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11200097A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7045050B2 (en) | 2001-07-31 | 2006-05-16 | Sekisui Chemical Co., Ltd. | Method for producing electroconductive particles |
-
1998
- 1998-01-14 JP JP561898A patent/JPH11200097A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7045050B2 (en) | 2001-07-31 | 2006-05-16 | Sekisui Chemical Co., Ltd. | Method for producing electroconductive particles |
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