JPH1119945A - Method for cleaning vulcanization mold - Google Patents

Method for cleaning vulcanization mold

Info

Publication number
JPH1119945A
JPH1119945A JP9196509A JP19650997A JPH1119945A JP H1119945 A JPH1119945 A JP H1119945A JP 9196509 A JP9196509 A JP 9196509A JP 19650997 A JP19650997 A JP 19650997A JP H1119945 A JPH1119945 A JP H1119945A
Authority
JP
Japan
Prior art keywords
gas
mold
plasma
vulcanizing mold
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9196509A
Other languages
Japanese (ja)
Inventor
Shingo Ono
信吾 大野
Yasuhiro Horiike
▲靖▼浩 堀池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bridgestone Corp
Original Assignee
Bridgestone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bridgestone Corp filed Critical Bridgestone Corp
Priority to JP9196509A priority Critical patent/JPH1119945A/en
Publication of JPH1119945A publication Critical patent/JPH1119945A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like

Abstract

PROBLEM TO BE SOLVED: To make it possible to perform the uniform ashing treatment of a residue at a remarkably high efficiency without restricting the shape and the size of a face on which a mold is formed on a vulcanizing device by supplying a high-frequency electric power to a coil for induction bonding and at the same time, supplying a reactive gas to the center part of a vulcanization mold to product a plasma. SOLUTION: A mold 15 is stored in a jacket 17 for temperature regulation on a platen 16, then these are placed in a vacuum treatment tank 1, and containers 2-1, 2-2 are airtightly sealed and anchored to vacuumize the interior of the treatment tank 1. Further, a reactive gas is caused to flow into the hollow part 15a of the mold 15 as a mixed gas of O2 gas and CF4 gas to retain a plasma gas in the treatment tank 1 at a specified pressure level. In addition, a high frequency is output from a high frequency generation source 8, then is transmitted to a coil 7 for induction bonding through a matching box 6 to produced the plasma gas with the help of the coil 7, and in turn, the plasma composed mainly of an oxygen radical is caused to act upon the inner peripheral face 15a of the mold 15. Thus it is possible to perform the uniform ashing treatment.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ゴムタイヤ、防振
ゴムなどのゴム製品及びその他のエラストマとしてのプ
ラスチック製品の加硫成形に際し、繰り返し用いる金型
内側の成形表面、分割金型の場合は合せ面も含めた表面
及び凹部や穴に不可避的に形成されるエラストマ残滓を
有利に除去するための加硫金型の清浄方法に関し、特に
加硫金型に対する不利な劣化、損傷を伴うことなく、ま
たプラズマ分布の不均一領域形成にわずらわされること
なく、安定した均一な残滓処理が可能な加硫金型の清浄
方法に関する。
The present invention relates to a vulcanization molding of rubber products such as rubber tires and vibration-isolating rubbers and other plastic products as an elastomer, which is used for the molding surface inside a mold which is used repeatedly, and in the case of a split mold. Regarding the cleaning method of the vulcanizing mold to advantageously remove the elastomer residue that is inevitably formed on the surface including the surface and the concave portions and holes, particularly without disadvantageous deterioration and damage to the vulcanizing mold, Also, the present invention relates to a method for cleaning a vulcanization mold capable of performing stable and uniform residue treatment without being bothered by formation of a non-uniform region of plasma distribution.

【0002】[0002]

【従来の技術】既に、本出願人による特開平6−285
868号公報にて詳述したように、エラストマ製品、と
りわけゴムタイヤ製品(以下、単にタイヤと記す)や防
振ゴム製品などは要求性能を満たすため、天然ゴム、合
成ゴム又はこれらのブレンドゴムに架橋剤としての硫黄
と補強材としてのカーボンブラックとを配合するほか、
加硫促進剤や各種耐久性保持のための各種薬品を配合す
る必要がある。
2. Description of the Related Art Japanese Patent Laid-Open No. Hei 6-285 by the present applicant has already been disclosed.
As described in detail in Japanese Patent Publication No. 868, elastomer products, especially rubber tire products (hereinafter simply referred to as tires), vibration-proof rubber products, and the like satisfy the required performance, and are crosslinked with natural rubber, synthetic rubber, or a blend rubber thereof. In addition to blending sulfur as an agent and carbon black as a reinforcing material,
It is necessary to incorporate a vulcanization accelerator and various chemicals for maintaining durability.

【0003】このようにして調合した未加硫ゴム組成物
を加硫成形する際、一般的に200℃に近い高温度で架
橋反応などの化学反応を生じさせるので、ゴム組成物は
流動性を増すばかりでなく一部はガス化し、その結果、
加硫金型の成形表面はもとより、金型の合せ面の極く狭
い隙間や空気抜きのいわゆるベントホールなどの穴など
にもゴム組成物及びその化学反応生成物が加硫成形の都
度、微量ながら残滓物として強固に付着するのは不可避
である。この加硫成形を多数回にわたり繰り返すことに
より残滓物は看過し得ない程の厚さで堆積する。このこ
とは、ゴム組成物に限らず他のエラストマについても大
同小異で同様に生じる。
[0003] When vulcanizing and molding the unvulcanized rubber composition prepared as described above, a chemical reaction such as a crosslinking reaction generally occurs at a high temperature close to 200 ° C. Not only increase, but also gasify partly,
In addition to the molding surface of the vulcanizing mold, the rubber composition and its chemical reaction products are not only present in very small gaps in the mating surfaces of the molds, but also in holes such as so-called vent holes for air release. It is inevitable that they will adhere strongly as residue. By repeating this vulcanization molding many times, the residue is deposited with a thickness that cannot be overlooked. This occurs not only in the rubber composition but also in other elastomers in a similar manner.

【0004】加硫金型に強固に付着堆積した厚い加硫残
滓はタイヤの外観を損ねるのみに止まらず、タイヤ全体
の優れた品質保持に対し悪影響を及ぼす。よって加硫成
形を所定回数だけ実施した加硫金型を新品同様に清浄す
る作業が必要であり、この作業法としてプラスチックビ
ーズやグラスビーズなどの粒体を高圧ガスにより吹き当
てるショットブラスト清浄法、又は酸、アルカリ、アミ
ン系などの溶液中に浸す液体清浄法が主流を占めていた
ところ、これらの清浄法による各種の不利な点を大幅に
改善するため、本出願人は上記特開平6−285868
号公報に記載したプラズマによる加硫金型清浄方法を提
案し、顕著に優れた効果を得ている。
[0004] Thick vulcanization residues firmly adhered and deposited on the vulcanization mold not only impair the appearance of the tire, but also adversely affect the excellent quality maintenance of the entire tire. Therefore, it is necessary to clean the vulcanization mold, which has been vulcanized and molded a predetermined number of times, as if it were a new one.As a method of this work, a shot blast cleaning method in which granules such as plastic beads and glass beads are sprayed with a high-pressure gas, Alternatively, the liquid cleaning method of immersing in a solution of an acid, an alkali, an amine or the like occupies the mainstream. 285868
A method for cleaning a vulcanizing mold by using a plasma described in Japanese Patent Application Laid-Open Publication No. H11-157, has been proposed, and a remarkably excellent effect has been obtained.

【0005】しかし、この成果を突き詰めてみると、下
記する諸点につき更に改善を施す余地があることを見出
した。
However, when these results were examined, it was found that there was room for further improvement in the following points.

【0006】即ち、その第一点は、清浄を必要とする加
硫金型の型形成面に、特殊なタイヤ種は別としても一般
にはタイヤに対する要求特性の十分な発揮に必要不可欠
な太溝、細溝、スリットなどをトレッド部に形成するた
めの多数個のリブやサイプ(細条片)などの突起物を設
けていて、プラズマがこれらの突起物に遮られて清浄面
対象全領域にわたる加硫残滓の均一なアッシング(灰
化)が損なわれがちであることである。
That is, the first point is that, on the mold forming surface of the vulcanizing mold requiring cleaning, a large groove which is generally indispensable for sufficiently exhibiting the required characteristics for the tire, apart from the special tire type. , A large number of ribs and sipe (strips) for forming narrow grooves, slits, etc. in the tread portion are provided, and the plasma is blocked by these protrusions and covers the entire area of the clean surface target Uniform ashing (ashing) of the vulcanization residue tends to be impaired.

【0007】また、本出願人は、特開平8−20705
6号公報、特開平8−216164号公報及び特開平8
−244041号公報にて、高周波電力を印加する一方
の電極を円筒状に構成し、又はその外周面に多数個のフ
ィンを備える構成として、他方の電極としての加硫金型
の内側表面との間で放電によるプラズマを生起させて残
滓部を均一に灰化する装置及び方法を提案した。
Further, the present applicant has disclosed in Japanese Patent Application Laid-Open No. Hei 8-20705.
No. 6, JP-A-8-216164 and JP-A-8-216164
In Japanese Patent Application Laid-Open No. -244041, one electrode for applying high-frequency power is formed in a cylindrical shape, or a structure provided with a plurality of fins on the outer peripheral surface thereof. An apparatus and a method for uniformly generating an incineration of the residue by generating plasma by electric discharge between the electrodes have been proposed.

【0008】しかし、以下に述べる諸点は放電領域内に
加硫金型を位置させるために生じる不利な点であり、即
ちその第二点は、しばしば不均一放電領域が形成され
て、均一なアッシング処理が阻害されがちであること、
第三点は、特に上記不均一放電に基づき加硫金型の温度
が、例えば200℃以上になる現象が生じ、これが金型
の精度を損ねるほか、金型の劣化、損傷をもたらすこ
と、第四点は、第三点との関連もあり、加硫金型の温度
制御が困難であること、そして第五点は、清浄対象外の
表面まで放電領域にさらす結果となるため、この表面部
分に劣化を生じさせ、また損傷を与える憂いがあること
である。
However, the following points are disadvantages caused by locating the vulcanizing mold in the discharge area, that is, the second point is that a non-uniform discharge area is often formed and uniform ashing is performed. Processing is likely to be hindered,
The third point is that the temperature of the vulcanizing mold becomes higher than, for example, 200 ° C. based on the non-uniform electric discharge, and this causes deterioration of the accuracy of the mold, deterioration and damage of the mold. The fourth point is related to the third point, and it is difficult to control the temperature of the vulcanizing mold.The fifth point is that the surface outside the object of cleaning is exposed to the discharge area. To cause deterioration and damage.

【0009】そこで上述した不利な第一点〜第五点を改
善するため、本出願人は更に特開平8−300366号
公報にて、真空処理槽に中性活性種(ラジカル)を供給
するプラズマ発生炉と、該炉に流入する反応ガスをマイ
クロ波放電プラズマにより中性活性種を含むガスとする
マイクロ波発生装置とをそれぞれ設け、プラズマ発生炉
にて発生した中性活性種を導管にて処理槽内に導入し、
導入した中性活性種を加硫金型の残滓面全面に向け一様
に噴出させ、噴出した中性活性種ガスによりエラストマ
残滓をアッシングする方法を提案した。
In order to improve the first to fifth disadvantages, the present applicant further discloses in Japanese Patent Application Laid-Open No. Hei 8-300366 a plasma for supplying a neutral active species (radical) to a vacuum processing tank. A generating furnace and a microwave generator that uses a microwave discharge plasma as a gas containing a neutral active species as a reaction gas flowing into the furnace are provided, and the neutral active species generated in the plasma generating furnace is supplied through a conduit. Introduced into the processing tank,
A method was proposed in which the introduced neutral active species was uniformly ejected toward the entire residue surface of the vulcanizing mold, and the elastomer residue was ashed by the ejected neutral active species gas.

【0010】上記の新しい清浄方法による加硫金型の清
浄は、上記の不利な諸点の改善に関し著しい効果を発揮
しているが、この清浄作業を通じて更に改善を要する点
が明らかになった。即ち、上記方法では、プラズマ発生
炉にて発生した中性活性種を多く含むガスを導管を介し
て処理槽内に供給する間に、中性活性種の一部分が失活
するため、アッシング効率が低下するという不利な点で
ある。
Although the cleaning of the vulcanizing mold by the above-mentioned new cleaning method has remarkably exerted an effect on improvement of the above disadvantages, it has become clear through the cleaning operation that further improvement is required. That is, in the above method, a part of the neutral active species is deactivated while the gas containing a large amount of neutral active species generated in the plasma generating furnace is supplied into the treatment tank through the conduit, so that the ashing efficiency is reduced. The disadvantage is that it decreases.

【0011】[0011]

【発明が解決しようとする課題】従って、この発明の目
的は、上述した不利な諸点すべての改善を目指し、加硫
金型の型形成面の形状や大きさに制約を加えることな
く、また加硫金型に不利な影響を及ぼすことなく、顕著
に高い効率の下で均一な残滓アッシングを実現すること
が可能な加硫金型の清浄方法を提供することにある。
SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to improve all of the disadvantages described above, without restricting the shape and size of the mold forming surface of the vulcanizing mold, and without reducing the shape. It is an object of the present invention to provide a method for cleaning a vulcanization mold capable of achieving uniform residue ashing under remarkably high efficiency without adversely affecting the mold.

【0012】[0012]

【課題を解決するための手段】本発明は、上記目的を達
成するため、下記の加硫金型の清浄方法を提供する。 請求項1:真空処理槽内に環状の加硫金型を位置させ、
エラストマの繰り返し加硫成形により該金型の内側表面
に形成されたエラストマ残滓に低圧反応ガスのプラズマ
を作用させ、該残滓をアッシングして除去する加硫金型
の清浄方法において、上記処理槽内の加硫金型の中空部
に誘導結合用コイルを上記加硫金型内周面と対向するよ
うに配置し、このコイルに高周波電源から高周波電力を
供給すると共に、上記加硫金型の中空部に反応ガスを供
給して、プラズマを生成させ、生成したプラズマガス及
びプラズマにより生成された中性活性種ガスの少なくと
も一方のガスによりエラストマ残滓をアッシングするこ
とを特徴とする加硫金型の清浄方法。 請求項2:上記反応ガスが、酸素ガス単体又は酸素ガス
を主成分とするハロゲン化物ガスとの混合ガスのいずれ
か一方のガスからなる請求項1記載の清浄方法。 請求項3:真空処理槽内における加硫金型を100〜1
80℃の範囲内の温度まで加温保持してアッシング処理
を施す請求項1又は2記載の清浄方法。
The present invention provides the following method for cleaning a vulcanizing mold in order to achieve the above object. Claim 1: An annular vulcanization mold is located in a vacuum processing tank,
In a method for cleaning a vulcanization mold, a plasma of a low-pressure reaction gas is applied to an elastomer residue formed on the inner surface of the mold by repeated vulcanization molding of the elastomer, and the residue is ashed and removed. A coil for inductive coupling is arranged in the hollow portion of the vulcanization mold so as to face the inner peripheral surface of the vulcanization mold, and high-frequency power is supplied to the coil from a high-frequency power supply, and the hollow of the vulcanization mold The reaction gas is supplied to the part, a plasma is generated, and the elastomer residue is ashed by at least one of the generated plasma gas and the neutral active species gas generated by the plasma. Cleaning method. In a preferred embodiment, the reactive gas comprises one of oxygen gas alone and a mixed gas with a halide gas containing oxygen gas as a main component. Claim 3: The vulcanizing mold in the vacuum processing tank is 100 to 1
The cleaning method according to claim 1, wherein the ashing is performed by heating and maintaining the temperature within a range of 80 ° C. 4.

【0013】本発明によれば、真空処理槽内に設置した
加硫金型の内部に誘導結合用コイルを設置して、加硫金
型の残滓面に近い場所で誘導結合プラズマを発生させ、
プラズマガス及び中性活性種ガスによりアッシングを行
うため、輸送による活性種の失活が少なく、プラズマを
均一かつ高密度に発生することができ、均一かつ高能率
なアッシングが可能となる。また、従来の方法より低い
圧力で高密度のプラズマを生成することが可能になるの
で、使用するプロセスガスの量を削減することが可能に
なる。
According to the present invention, an inductive coupling coil is installed inside a vulcanizing mold installed in a vacuum processing tank, and inductively coupled plasma is generated at a location near the residue surface of the vulcanizing mold.
Since the ashing is performed using the plasma gas and the neutral active species gas, active species are hardly deactivated by transport, plasma can be generated uniformly and at a high density, and uniform and highly efficient ashing can be performed. In addition, since high-density plasma can be generated at a lower pressure than in the conventional method, the amount of process gas used can be reduced.

【0014】[0014]

【発明の実施の形態】以下、本発明による加硫金型の清
浄方法につき図1〜3を参照して詳述する。図1は、本
発明の実施に用いる清浄装置の概略断面図であり、この
清浄装置は真空処理槽1を具備する。この真空処理槽1
は下方位置にて相互に上下に分離可能でかつシール可能
な上部容器2−1と下部容器2−2とを有する容器2を
備え、上部容器2−1は下部容器2−2に対し着脱自在
で上方に向け昇降自在である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a method for cleaning a vulcanizing mold according to the present invention will be described in detail with reference to FIGS. FIG. 1 is a schematic sectional view of a cleaning apparatus used for carrying out the present invention, and the cleaning apparatus includes a vacuum processing tank 1. This vacuum processing tank 1
Comprises a container 2 having an upper container 2-1 and a lower container 2-2 which can be separated from each other at a lower position and which can be sealed, and the upper container 2-1 is detachable from the lower container 2-2. Can be moved upward and downward.

【0015】下部容器2−2は、図示を省略した真空ポ
ンプに接続する吸引部3を具備する。加硫金型15の清
浄作業を開始するに先立ち、この真空ポンプを稼働さ
せ、容器2内部の空気を吸引部3を介し図の矢印Aの向
きに排気して、容器2内部の空気圧を例えば10-1〜1
-5Torrのいわゆる中真空〜高真空とする。なお、
図示例の真空処理槽1は下部容器2−2を、ホイールコ
ンベヤ5と共に、例えば複数本の支柱4(図では2本の
みを示す)により床面Fsなどに固定支持する。ホイー
ルコンベヤ5が定盤16上に据えた清浄対象の環状加硫
金型15を保持する。
The lower container 2-2 includes a suction unit 3 connected to a vacuum pump (not shown). Prior to starting the cleaning operation of the vulcanizing mold 15, the vacuum pump is operated to exhaust air in the container 2 through the suction unit 3 in the direction of arrow A in FIG. 10 -1 to 1
0 to -5 Torr called in vacuum to high vacuum. In addition,
In the illustrated example, the vacuum processing tank 1 fixedly supports the lower container 2-2 together with the wheel conveyor 5 on a floor surface Fs or the like by, for example, a plurality of columns 4 (only two columns are shown). The wheel conveyor 5 holds an annular vulcanizing mold 15 to be cleaned, which is set on a surface plate 16.

【0016】上記加硫金型15の中空部15aには、誘
導結合用コイル7が金型15の内周面15sに対向する
ように配置され、このコイル7はマッチングボックス6
を介して高周波発生源8に接続される。
In the hollow portion 15a of the vulcanizing mold 15, an inductive coupling coil 7 is disposed so as to face the inner peripheral surface 15s of the mold 15, and the coil 7 is provided with a matching box 6
Is connected to the high-frequency generation source 8 via the.

【0017】高周波発生源8は周波数300KHz〜3
00MHzの範囲内、望ましくは1MHz〜100MH
zの範囲内の高周波を発生して出力し、この高周波出力
はマッチングボックス6で整合をとられ、上記誘導結合
用コイル7に供給される。
The high frequency generator 8 has a frequency of 300 KHz to 3 KHz.
Within the range of 00 MHz, desirably 1 MHz to 100 MH
A high frequency within the range of z is generated and output, and this high frequency output is matched by a matching box 6 and supplied to the inductive coupling coil 7.

【0018】なお、誘導結合用コイル7は、図1,2で
は2巻きとしたが、これに制限されるものではなく、1
巻きでも3巻き以上でもよい。また、図4に示すよう
に、複数のコイルを並列に接続することもできる。更
に、誘導結合用コイルを中空のパイプにて形成し、内部
に冷却媒体を流すことにより、冷却することができる。
The inductive coupling coil 7 has two windings in FIGS. 1 and 2, but is not limited thereto.
It may be wound or three or more. Further, as shown in FIG. 4, a plurality of coils can be connected in parallel. Furthermore, the coil can be cooled by forming the inductive coupling coil with a hollow pipe and flowing a cooling medium inside.

【0019】符号10は、上記金型15の中空部15a
の内に配置した反応ガス噴出用パイプである。該パイプ
10は、金型15とコイル7との間に複数本が互いに所
定間隔(好ましくは等間隔)で配列されており、図示し
ていないが、これらパイプ10は1本の環状パイプに連
通して固着されていると共に、この環状パイプに反応ガ
ス導入パイプ10aが連結されており、この反応ガス導
入パイプ10aより環状パイプを通って各パイプ10に
反応ガスが供給され、反応ガスは、金型内周面15sに
対向して各パイプ10に設けられた小孔より金型15の
内周面15sに向けて噴出するようになっている。
Reference numeral 10 denotes a hollow portion 15a of the mold 15 described above.
It is a pipe for ejecting the reaction gas arranged in the inside. A plurality of pipes 10 are arranged between the mold 15 and the coil 7 at predetermined intervals (preferably at equal intervals). Although not shown, these pipes 10 communicate with one annular pipe. A reaction gas introduction pipe 10a is connected to the annular pipe, and a reaction gas is supplied from the reaction gas introduction pipe 10a to each pipe 10 through the annular pipe. A small hole provided in each pipe 10 faces the inner peripheral surface 15 s of the mold 15 so as to blow toward the inner peripheral surface 15 s of the mold 15.

【0020】上記清浄装置を用いて加硫金型15の内周
面を清浄化処理する場合は、高周波発生源8を作動さ
せ、マッチングボックス6を介して誘導結合用コイル7
に高周波電力を供給する。これにより、高周波発生源8
から伝送された高周波は誘導結合用コイル7によって金
型15の中空部15aに電磁界を形成する。これと同時
に各パイプ10から反応ガスを噴出させると、電磁界の
エネルギーにより反応ガスはプラズマ化されて、高密度
なプラズマガスと十分な濃度をもつ中性活性種ガスとを
生成する。
When the inner peripheral surface of the vulcanizing mold 15 is cleaned by using the above-described cleaning device, the high-frequency generator 8 is operated, and the inductive coupling coil 7 is passed through the matching box 6.
Supply high frequency power to Thereby, the high frequency generation source 8
The high-frequency wave transmitted from the coil 15 forms an electromagnetic field in the hollow portion 15a of the mold 15 by the inductive coupling coil 7. At the same time, when the reaction gas is ejected from each pipe 10, the reaction gas is turned into plasma by the energy of the electromagnetic field, and a high-density plasma gas and a neutral active species gas having a sufficient concentration are generated.

【0021】この中性活性種ガスは、余分な経路を経る
ことなく、清浄対象の金型の残滓内側表面に到達するた
め、途中での失活は極めて少なく、更に中性活性種ガス
のみならずプラズマ発生部と被処理部である金型内側表
面とが接近しているためにプラズマガス自体も被処理面
に到達し、アッシング作用に寄与することができる。そ
の上、金型を電極として使用していないので、異常放電
は生じず、異常放電に伴う不利の一切を排除することが
でき、余分な電力を消費せず均一なプラズマガスを中性
活性種ガスと共に高密度で発生させることが可能であ
り、その結果、高度に高い効率の下で加硫残滓に対する
アッシング作用を実現することができる。
Since the neutral active species gas reaches the inner surface of the residue of the mold to be cleaned without passing through an extra path, the neutral active species gas is very little deactivated on the way. In addition, since the plasma generating portion and the inner surface of the mold to be processed are close to each other, the plasma gas itself also reaches the surface to be processed, and can contribute to the ashing action. In addition, since the mold is not used as an electrode, abnormal discharge does not occur, all disadvantages associated with abnormal discharge can be eliminated, and a uniform plasma gas can be produced without consuming extra electric power. It is possible to generate the gas at a high density together with the gas, and as a result, it is possible to realize an ashing effect on the vulcanization residue with a high degree of efficiency.

【0022】この場合、真空槽内の加硫金型に負のバイ
アス電圧を印加することにより、更に高速なアッシング
作用を実現できる。なお、バイアス電圧は直流、交流の
いずれでもよい。
In this case, by applying a negative bias voltage to the vulcanizing mold in the vacuum chamber, an even faster ashing action can be realized. The bias voltage may be either DC or AC.

【0023】ここで、反応ガスが、酸素ガス単体又は酸
素ガスを主成分とするハロゲン化物ガスとの混合ガスの
いずれか一方のガスからなれば、アッシング処理効率の
一層の向上に寄与する。ここに反応ガスの酸素ガスはO
2、O3のいずれもが適合し、またハロゲン化物ガスとし
てはF(フッ素)、Cl(塩素)、Br(臭素)、I
(ヨウ素)などを含有するあらゆるガスを使用すること
ができる。また真空処理槽1にガスとして供給できれば
よいため、標準状態(25℃,1atm)で必ずしもガ
スである必要はなく、例えば液体状態であってもよい。
特にフロンやNF3、SF6が好適に用いられ、とりわけ
CF4(四フッ化炭素)が効果的である。
Here, if the reaction gas is composed of any one of oxygen gas alone and a mixed gas with a halide gas containing oxygen gas as a main component, it contributes to further improvement of the ashing processing efficiency. Here, the oxygen gas of the reaction gas is O
Both 2 and O 3 are suitable, and the halide gases include F (fluorine), Cl (chlorine), Br (bromine),
Any gas containing (iodine) or the like can be used. Further, since it is sufficient that the gas can be supplied to the vacuum processing tank 1, the gas does not always need to be in a standard state (25 ° C., 1 atm), and may be in a liquid state, for example.
In particular, Freon, NF 3 and SF 6 are preferably used, and CF 4 (carbon tetrafluoride) is particularly effective.

【0024】加硫金型の清浄に際しては、プラズマガス
及び/又は中性活性種ガスの密度が所望の値となるよう
に、高周波発生源8における高周波周波数及び供給電力
量と反応ガスの流入量(SCCM)とを選定する。この
場合、酸素ガスのみ、又は主成分の酸素ガスと従成分の
ハロゲン化物ガス、好適にはCF4ガスとの混合ガスの
いずれかを反応ガスとして、酸素(O、O2、O3)ラジ
カル、CF4ラジカルを得ることが好ましい。また、ア
ッシング処理中は真空ポンプを動作させて常時吸引部3
から真空処理槽1内のガス排気を継続させ、常に処理槽
1内部の圧力を0.001〜10Torrの範囲内で一
定圧力に保持することが好ましい。
In cleaning the vulcanizing mold, the high frequency and the amount of power supplied to the high frequency generator 8 and the inflow of the reaction gas are set so that the density of the plasma gas and / or the neutral active species gas becomes a desired value. (SCCM). In this case, oxygen (O, O 2 , O 3 ) radicals are used as a reaction gas, either oxygen gas alone or a mixed gas of a main component oxygen gas and a subcomponent halide gas, preferably a CF 4 gas. , CF 4 radicals. In addition, during the ashing process, the vacuum pump is operated to constantly operate the suction unit 3.
It is preferable that the gas in the vacuum processing tank 1 is continuously exhausted, and the pressure inside the processing tank 1 is constantly maintained at a constant pressure in the range of 0.001 to 10 Torr.

【0025】図1において、符号17は金型15を加熱
する加熱源としての温度調節用ジャケットあり、このジ
ャケット17の内部空間17jに高温ガス又はスチーム
などの加熱媒体を供給し、好適には金型15を100〜
180℃の範囲内で所望の温度に加温し保持する。金型
15をこの高温度で保持すればアッシング反応速度がよ
り一層速まるため、プラズマアッシング処理時間を大幅
に短縮することに寄与する。なお、図示は省略したが、
金型15は温度測定用センサを備え、処理槽1の外部で
加熱媒体の温度及び/又は流量制御及び金型15の温度
制御をそれぞれ実施する。
In FIG. 1, reference numeral 17 denotes a temperature adjusting jacket as a heating source for heating the mold 15, and a heating medium such as a high-temperature gas or steam is supplied to an inner space 17j of the jacket 17; Mold 15 from 100
Heat to a desired temperature within the range of 180 ° C. and maintain. If the mold 15 is kept at this high temperature, the ashing reaction speed is further increased, which contributes to greatly shortening the plasma ashing processing time. Although illustration is omitted,
The mold 15 includes a temperature measurement sensor, and controls the temperature and / or flow rate of the heating medium and the temperature of the mold 15 outside the processing tank 1.

【0026】なお、図において、金型15は一体として
図示してるが、この例ではいわゆる割りモールドのうち
外周側を分割形成する多数個、例えば3〜20個のセグ
メントを、金属製、例えばスチール製の支持搬送用定盤
16上面に、実際の使用時と同じ状態に仮組みしたとこ
ろを示している。
Although the mold 15 is shown as an integral part in the figure, in this example, a so-called split mold is formed by dividing a large number, for example, 3 to 20 segments of the outer peripheral side of a so-called split mold with a metal, for example, steel. On the upper surface of the base plate 16 for supporting and transporting made in the same state as in actual use.

【0027】また、タイヤのトレッド部に踏面及び各種
溝やスリットを形成する部分には一般にアルミニウム合
金を適用し、実際に使用する際はこの合金部分をスチー
ル製保持部材に取り付けて上述のセグメントとするもの
であり、この発明では上記合金部分のみの場合とセグメ
ントの場合との両方を含めて金型15と呼ぶ。
In general, an aluminum alloy is applied to a portion where a tread portion and various grooves and slits are formed in a tread portion of a tire, and when actually used, this alloy portion is attached to a steel holding member to attach the above-described segment to the above-mentioned segment. In the present invention, the mold 15 includes both the case of only the alloy portion and the case of the segment.

【0028】金型15が割りモールドである場合は、図
示のセグメントモールドの上下に一対のサイドモールド
を組み合わせてモールド本体とする。このモールド本体
を加硫金型15としてプラズマ清浄を施すこともでき、
更に円周上に分割面を有する、いわゆる上下2つ合せモ
ールド及び多数個のセグメントモールドのうちの一個分
いずれにもこの発明を適用することができる。
If the mold 15 is a split mold, a pair of side molds are combined above and below the segment mold shown to form a mold body. This mold body can be subjected to plasma cleaning as a vulcanizing mold 15,
Further, the present invention can be applied to any one of a so-called upper and lower two-piece mold and a large number of segment molds each having a dividing surface on the circumference.

【0029】図示を省略したが、定盤16は、多数個の
セグメントを仮組みする際又は割りモールド本体や上下
2つ合せモールドを据え置く際、セグメントの集合体又
はこれらモールドを所定位置に据えるための機構を備
え、さらに定盤16は、集合体としての金型15又はこ
れらモールドとしての金型15を凹部2cの中心軸線に
対し心出しをする機構を備える。後者の機構は金型15
及び定盤16を支持するホイールコンベヤ5に設けた心
出し装置と心出し係合する。
Although not shown, the platen 16 is used for temporarily assembling a large number of segments or for placing the split mold body or the upper and lower two-piece mold together, for assembling the segments or placing these molds at predetermined positions. The platen 16 further includes a mechanism for centering the molds 15 as an assembly or the molds 15 as these molds with respect to the central axis of the concave portion 2c. The latter mechanism is mold 15
And a centering device provided on the wheel conveyor 5 supporting the surface plate 16 for centering engagement.

【0030】金型15の処理槽1内への導入は、上部容
器2−1を上昇移動させた状態で、予め処理槽1の外部
で定盤16上に仮組み乃至据え置いた金型15を定盤1
6と共に、図示を省略した別の同様ホイールコンベヤ上
で図示位置まで搬送し、同時に心出しを実施する。
The mold 15 is introduced into the processing tank 1 by moving the upper container 2-1 upward and moving the mold 15 temporarily assembled or set on the platen 16 outside the processing tank 1 in advance. Surface plate 1
Along with 6, it is conveyed to the position shown on another similar wheel conveyor (not shown), and is simultaneously centered.

【0031】[0031]

【実施例】以下、実施例により本発明を具体的に説明す
るが、本発明は下記の実施例に制限されるものではな
い。
EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to the following examples.

【0032】図1〜3に従い、定盤16上にて温度調節
用ジャケット17に8個のセグメントよりなる最大内径
が550mmの金型15を収容し、これらを真空処理槽
1内に据え置いた後、容器2−1,2−2を密封固着し
てから真空ポンプを動作させ、処理槽1内部の圧力を1
×10-4Torrまで減圧した。
According to FIGS. 1 to 3, a mold 15 having a maximum inner diameter of 550 mm comprising eight segments is accommodated in a temperature adjusting jacket 17 on a surface plate 16, and these are placed in a vacuum processing tank 1. After the containers 2-1 and 2-2 are hermetically sealed, the vacuum pump is operated to reduce the pressure inside the processing tank 1 to 1
The pressure was reduced to × 10 -4 Torr.

【0033】反応ガスをO2ガス及びCF4ガスの混合ガ
スとし、 2ガスは1000SCCM、CF4ガスは50
0SCCMの割合で金型15の中空部15aに流入さ
せ、処理槽1内のプラズマガス圧力を1×10-1Tor
rに保持した。高周波発生源8から周波数13.56M
Hzの高周波を出力し、この高周波をマッチングボック
ス6を介して誘導結合用コイル7に伝送し、誘導結合用
コイル7によりプラズマを生成し、酸素ラジカルを主体
とするプラズマを金型15の内周面15sに作用させ
た。なお、誘導結合用コイル7の外径は400mmと
し、2巻きのものを用いた。
The reaction gas is OTwoGas and CFFourGas mixing gas
And OTwoGas is 1000 SCCM, CFFour50 for gas
At a rate of 0 SCCM, it flows into the hollow portion 15a of the mold 15.
And the plasma gas pressure in the processing tank 1 is set to 1 × 10-1Tor
r. 13.56M frequency from high frequency source 8
Hz high frequency and output this high frequency
To the inductive coupling coil 7 through the
Plasma is generated by the coil 7 and mainly oxygen radicals
Plasma acting on the inner peripheral surface 15s of the mold 15
Was. The outer diameter of the inductive coupling coil 7 is 400 mm.
And two turns.

【0034】この実施例では、ジャケット17による金
型15に対する温度制御を一切施さず、金型15の温度
はプラズマがもつエネルギーによる自然昇温にまかせ、
アッシング処理時間は60分及び120分の2種類とし
た。処理終了時の灰化性を5点法により目視評価採点し
(5点満点で値が大なるほど良い)、洗浄度は灰化後、
処理面を水洗して灰分(金属に対しほとんど粘着性をも
たない無機金属塩、例えばZnSO4など)を洗い流し
た後、やはり目視による上記5点法に従い採点した。
In this embodiment, the temperature of the mold 15 is not controlled by the jacket 17 at all, and the temperature of the mold 15 is left to rise naturally by the energy of the plasma.
The ashing processing time was two types of 60 minutes and 120 minutes. The incineration at the end of the treatment was visually evaluated and scored by a 5-point method (the larger the value, the better the score out of 5).
The treated surface was washed with water to remove ash (inorganic metal salt having little adhesion to metal, for example, ZnSO 4 ), and then scored according to the above five-point method.

【0035】実施例の効果を検証するため、特開平8−
300366号公報に従う比較例によるアッシング処理
を実施した。比較例の処理条件はすべて実施例に合わ
せ、評価項目及び判定方法も実施例に従った。実施例及
び比較例の処理をそれぞれ10回行い、各回毎に測定、
評価を実施した。この結果を表1にまとめて示す。
In order to verify the effect of the embodiment, Japanese Patent Laid-Open No.
An ashing process according to a comparative example according to Japanese Patent Publication No. 300366 was performed. The processing conditions of the comparative examples were all in accordance with the examples, and the evaluation items and the determination method were also in accordance with the examples. The processes of the example and the comparative example were each performed 10 times, and each time,
An evaluation was performed. The results are summarized in Table 1.

【0036】[0036]

【表1】 [Table 1]

【0037】表1から、同じ処理時間で実施例の灰化性
及び洗浄度はいずれも比較例のそれらに比し格段に優れ
た値を示していることがわかる。このことは、とりもな
おさず、本発明による金型の加硫残滓の清浄方法は先の
出願による方法に比し、処理効率が格段に改善されるこ
との証である。
From Table 1, it can be seen that both the ashing property and the degree of cleaning of the examples show markedly superior values as compared with those of the comparative example at the same treatment time. This is a testament to the fact that the method for cleaning the vulcanization residue of the mold according to the present invention has remarkably improved processing efficiency as compared with the method according to the earlier application.

【0038】[0038]

【発明の効果】本発明によれば、下記の利点が得られ
る。 加硫金型を電極として使用しないため、不均一放電領
域が形成されることがなく、均一なアッシング処理が可
能となる。更に、加硫金型の温度制御が容易となり、金
型の劣化、損傷を抑制できる。 プラズマガス及び中性活性種ガスの少なくとも一方の
ガスを残滓面に直接噴き当てるので、プラズマガスの密
度低下、中性活性種の失活などの不利を排除して、高度
な電力効率の下に短い処理時間で、均一かつ有効に残滓
をアッシングすることが可能である。 上述したように金型を電極として使用しないので、金
型に任意の直流又は交流のバイアス電圧を印加すること
が可能となり、アッシング反応速度を速め、アッシング
処理時間の短縮が可能となる。 従来の方法に比べ、低圧力で高密度なプラズマが生成
できるため、少ないガス量で十分なアッシング速度が得
られ、工業上有利である。
According to the present invention, the following advantages can be obtained. Since the vulcanization mold is not used as an electrode, a non-uniform discharge region is not formed, and uniform ashing can be performed. Further, the temperature control of the vulcanizing mold becomes easy, and deterioration and damage of the mold can be suppressed. Since at least one of the plasma gas and the neutral active species gas is directly blown onto the residue surface, disadvantages such as a decrease in the density of the plasma gas and the deactivation of the neutral active species are eliminated, and under a high power efficiency. It is possible to ashing the residue uniformly and effectively in a short processing time. As described above, since the mold is not used as an electrode, an arbitrary DC or AC bias voltage can be applied to the mold, thereby increasing the ashing reaction speed and shortening the ashing processing time. Compared with the conventional method, high-density plasma can be generated at a low pressure, so that a sufficient ashing speed can be obtained with a small amount of gas, which is industrially advantageous.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施に用いる清浄装置の一例を示す概
略断面図である。
FIG. 1 is a schematic sectional view showing an example of a cleaning device used for carrying out the present invention.

【図2】同例で用いる誘導結合用コイルの斜視図であ
る。
FIG. 2 is a perspective view of an inductive coupling coil used in the example.

【図3】同例の要部横断面図である。FIG. 3 is a cross-sectional view of a main part of the same example.

【図4】誘導結合用コイルの他の例を示す斜視図であ
る。
FIG. 4 is a perspective view showing another example of the inductive coupling coil.

【符号の説明】[Explanation of symbols]

1 真空処理槽 2 容器 2c 凹部 2−1 上部容器 2−2 下部容器 3 吸引部 4 支柱 5 ホイールコンベヤ 6 マッチングボックス 7 誘導結合用コイル 8 高周波発生源 10 反応ガス噴出用パイプ 10a 反応ガス導入パイプ 10−1 中性活性種噴出用容器(プラズマ発生炉) 11 窓部材 12 カップリングスロット 15 加硫金型 15a 中空部 15s 内周面 16 定盤 17 ジャケット A 排気方向 DESCRIPTION OF SYMBOLS 1 Vacuum processing tank 2 Vessel 2c Depression 2-1 Upper vessel 2-2 Lower vessel 3 Suction part 4 Prop 5 Wheel conveyor 6 Matching box 7 Inductive coupling coil 8 High frequency generation source 10 Reaction gas ejection pipe 10a Reaction gas introduction pipe 10 -1 Neutral activated species ejection container (plasma generating furnace) 11 Window member 12 Coupling slot 15 Vulcanizing mold 15a Hollow portion 15s Inner peripheral surface 16 Surface plate 17 Jacket A

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 真空処理槽内に環状の加硫金型を位置さ
せ、エラストマの繰り返し加硫成形により該金型の内側
表面に形成されたエラストマ残滓に低圧反応ガスのプラ
ズマを作用させ、該残滓をアッシングして除去する加硫
金型の清浄方法において、 上記処理槽内の加硫金型の中空部に誘導結合用コイルを
上記加硫金型内周面と対向するように配置し、このコイ
ルに高周波電源から高周波電力を供給すると共に、上記
加硫金型の中空部に反応ガスを供給して、プラズマを生
成させ、生成したプラズマガス及びプラズマにより生成
された中性活性種ガスの少なくとも一方のガスによりエ
ラストマ残滓をアッシングすることを特徴とする加硫金
型の清浄方法。
An annular vulcanizing mold is positioned in a vacuum processing tank, and plasma of a low-pressure reaction gas is caused to act on an elastomer residue formed on an inner surface of the mold by repeated vulcanization molding of the elastomer. In the method of cleaning a vulcanizing mold for removing a residue by ashing, an inductive coupling coil is disposed in a hollow portion of the vulcanizing mold in the treatment tank so as to face the inner peripheral surface of the vulcanizing mold, A high-frequency power is supplied to the coil from a high-frequency power source, and a reactive gas is supplied to the hollow portion of the vulcanizing mold to generate plasma, and the generated plasma gas and neutral active species gas generated by the plasma are generated. A method for cleaning a vulcanizing mold, comprising ashing an elastomer residue with at least one gas.
【請求項2】 上記反応ガスが、酸素ガス単体又は酸素
ガスを主成分とするハロゲン化物ガスとの混合ガスのい
ずれか一方のガスからなる請求項1記載の清浄方法。
2. The cleaning method according to claim 1, wherein the reaction gas is one of oxygen gas alone and a mixed gas with a halide gas containing oxygen gas as a main component.
【請求項3】 真空処理槽内における加硫金型を100
〜180℃の範囲内の温度まで加温保持してアッシング
処理を施す請求項1又は2記載の清浄方法。
3. A vulcanizing mold in a vacuum processing tank is set to 100
The cleaning method according to claim 1, wherein the ashing process is performed while maintaining the temperature at a temperature within a range of from about 180 ° C. to about 180 ° C. 4.
JP9196509A 1997-07-07 1997-07-07 Method for cleaning vulcanization mold Pending JPH1119945A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9196509A JPH1119945A (en) 1997-07-07 1997-07-07 Method for cleaning vulcanization mold

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9196509A JPH1119945A (en) 1997-07-07 1997-07-07 Method for cleaning vulcanization mold

Publications (1)

Publication Number Publication Date
JPH1119945A true JPH1119945A (en) 1999-01-26

Family

ID=16358944

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9196509A Pending JPH1119945A (en) 1997-07-07 1997-07-07 Method for cleaning vulcanization mold

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006289724A (en) * 2005-04-08 2006-10-26 Yokohama Rubber Co Ltd:The Method and apparatus for washing mold for vulcanizing and molding tire
WO2007015496A1 (en) * 2005-08-02 2007-02-08 The Yokohama Rubber Co., Ltd. Method and equipment for cleaning tire vulcanization die
US8512686B2 (en) 2003-08-01 2013-08-20 Kao Corporation Hair grooming preparation
WO2016170985A1 (en) * 2015-04-23 2016-10-27 株式会社クレハ Impedance matching circuit, high-frequency welding device, and continuous filling device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06285868A (en) * 1993-03-30 1994-10-11 Bridgestone Corp Cleaning method of vulcanizing mold
JPH08300366A (en) * 1995-05-01 1996-11-19 Bridgestone Corp Cleaning of vulcanizing mold

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06285868A (en) * 1993-03-30 1994-10-11 Bridgestone Corp Cleaning method of vulcanizing mold
JPH08300366A (en) * 1995-05-01 1996-11-19 Bridgestone Corp Cleaning of vulcanizing mold

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8512686B2 (en) 2003-08-01 2013-08-20 Kao Corporation Hair grooming preparation
JP2006289724A (en) * 2005-04-08 2006-10-26 Yokohama Rubber Co Ltd:The Method and apparatus for washing mold for vulcanizing and molding tire
JP4585361B2 (en) * 2005-04-08 2010-11-24 横浜ゴム株式会社 Tire vulcanization mold cleaning equipment
WO2007015496A1 (en) * 2005-08-02 2007-02-08 The Yokohama Rubber Co., Ltd. Method and equipment for cleaning tire vulcanization die
JP2007038502A (en) * 2005-08-02 2007-02-15 Yokohama Rubber Co Ltd:The Cleaning method for mold for vulcanizing/molding tire and its apparatus
JP4724487B2 (en) * 2005-08-02 2011-07-13 横浜ゴム株式会社 Method and apparatus for cleaning tire vulcanization mold
US8012264B2 (en) 2005-08-02 2011-09-06 The Yokohama Rubber Co., Ltd. Method and apparatus for cleaning tire vulcanization mold
CN103350473A (en) * 2005-08-02 2013-10-16 横滨橡胶株式会社 Method and equipment for cleaning tire vulcanization die
WO2016170985A1 (en) * 2015-04-23 2016-10-27 株式会社クレハ Impedance matching circuit, high-frequency welding device, and continuous filling device
CN107531348A (en) * 2015-04-23 2018-01-02 株式会社吴羽 Impedance matching circuit, high frequency welding device and continuous filling device
JPWO2016170985A1 (en) * 2015-04-23 2018-02-08 株式会社クレハ Impedance matching circuit, high frequency welding device and continuous filling device
CN107531348B (en) * 2015-04-23 2019-12-27 株式会社吴羽 Impedance matching circuit, high-frequency welding device, and continuous filling device

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