JPH11188741A - Method and apparatus for cleaning vulcanizing mold - Google Patents

Method and apparatus for cleaning vulcanizing mold

Info

Publication number
JPH11188741A
JPH11188741A JP36722897A JP36722897A JPH11188741A JP H11188741 A JPH11188741 A JP H11188741A JP 36722897 A JP36722897 A JP 36722897A JP 36722897 A JP36722897 A JP 36722897A JP H11188741 A JPH11188741 A JP H11188741A
Authority
JP
Japan
Prior art keywords
plasma
mold
vulcanizing mold
reactive gas
vulcanizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP36722897A
Other languages
Japanese (ja)
Inventor
Shingo Ono
信吾 大野
Shinji Saito
伸二 斉藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bridgestone Corp
Original Assignee
Bridgestone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bridgestone Corp filed Critical Bridgestone Corp
Priority to JP36722897A priority Critical patent/JPH11188741A/en
Publication of JPH11188741A publication Critical patent/JPH11188741A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/70Maintenance
    • B29C33/72Cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/70Maintenance
    • B29C33/72Cleaning
    • B29C2033/725Cleaning cleaning by plasma treatment

Abstract

PROBLEM TO BE SOLVED: To provide a method and apparatus for cleaning a vulcanizing mold by removing the residue comprising a plastic material formed on the vulcanizing mold repeatedly used in the vulcanizing molding of a plastic product or the like. SOLUTION: An electrode 21 provided with air orifices communicating with jet orifices is arranged to the outer surface of a shower pipe and voltage is applied across the electrode 21 and a vulcanizing mold 10 to form a high frequency plasma region between the electrode and the mold and a reactive gas plasma is allowed to act on the vulcanizing mold 10 through the plasma region. The reactive gas plasma is ejected to the inner surface of the vulcanizing mold arranged in a vacuum treatment tank 1 from a large number of the jet orifices of the shower pipe to be allowed to act on the vulcanizing mold 10 to remove the elastomer residue on the surface of the mold by ashing.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ゴムタイヤ、防振
ゴム等のゴム製品、エラストマー等のプラスチック製品
などの加硫成形に繰返し用いられる加硫金型に生成した
上記材料からの残滓を除去する加硫金型の清浄方法及び
装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention removes residues from the above-mentioned materials generated in a vulcanization mold used repeatedly for vulcanization molding of rubber products such as rubber tires, vibration-proof rubbers, and plastic products such as elastomers. The present invention relates to a method and an apparatus for cleaning a vulcanizing mold.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】エラス
トマー製品、とりわけゴムタイヤ製品や防振ゴム製品な
どは要求性能を満たすため、天然ゴム、合成ゴム又はこ
れらのブレンドゴムに硫黄等の架橋剤やカーボンブラッ
ク等の補強材などを配合するほか、加硫促進剤や各種耐
久性保持のための各種薬品を配合する必要がある。
2. Description of the Related Art Elastomer products, especially rubber tire products and vibration-proof rubber products, satisfy the required performance. In addition to blending a reinforcing material such as black, it is necessary to blend a vulcanization accelerator and various chemicals for maintaining durability.

【0003】このようにして調合した未加硫ゴム組成物
を加硫成形する際、一般的に200℃に近い高温度で架
橋反応などの化学反応を生じさせるので、ゴム組成物は
流動性を増すばかりでなく、一部がガス化し、その結
果、加硫金型の成形表面はもとより、金型の合せ面の極
く狭い隙間や空気抜きのいわゆるベントホールなどの穴
などにもゴム組成物及びその化学反応生成物が加硫成形
の都度、微量ながら残滓物として強固に付着するのは不
可避である。この加硫成形を多数回にわたり繰返すこと
により残滓物は看過し得ないほどの厚さで堆積する。こ
のことはゴム組成物に限らず他のエラストマーについて
も大同小異で同様に生じる。
[0003] When vulcanizing and molding the unvulcanized rubber composition prepared as described above, a chemical reaction such as a crosslinking reaction generally occurs at a high temperature close to 200 ° C. Not only does it increase, but also gasifies partially, as a result, the rubber composition and the molding surface of the vulcanizing mold, as well as the very narrow gaps in the mating surfaces of the mold and the holes such as vent holes for air venting It is unavoidable that the chemical reaction product adheres firmly as a residue every time vulcanization and molding is carried out, albeit in a trace amount. By repeating this vulcanization molding many times, the residue is deposited with an unnoticeable thickness. This occurs not only in the rubber composition but also in other elastomers in a similar manner.

【0004】このような加硫金型に強固に付着堆積した
加硫残滓は成形品の外観、品質に悪影響を与えるため、
加硫金型から残滓を除去する必要がある。
[0004] Vulcanized residues firmly adhered and deposited on such a vulcanizing mold adversely affect the appearance and quality of molded products.
It is necessary to remove the residue from the vulcanizing mold.

【0005】従来、上記のような加硫金型に生成した残
滓をアッシングして除去する方法としては、真空処理槽
内に反応性ガスを導入すると共に、上記真空処理槽内に
配置され、高周波電源に接続された2個の電極間に電圧
を印加して、上記反応性ガスにプラズマを生起させ、こ
のプラズマを真空処理槽内に配置した加硫金型に作用さ
せて、この金型表面のエラストマ残滓を除去する方法が
知られている(特開平6−285868号、同8−21
6164号、同8−244041号公報)。
Conventionally, as a method of removing the residue generated in the above vulcanizing mold by ashing, a reactive gas is introduced into a vacuum processing tank, and a high-frequency A voltage is applied between two electrodes connected to a power supply to generate plasma in the reactive gas, and the plasma is applied to a vulcanizing mold disposed in a vacuum processing tank to form a surface of the mold. There is known a method for removing an elastomer residue (see JP-A-6-285868 and JP-A-8-21).
Nos. 6164 and 8-244041).

【0006】また、真空処理槽内に配置された加硫金型
の内面に向けて予めプラズマ化された反応性ガスをシャ
ワ管の多数の噴出孔から噴出させて、上記加硫金型にプ
ラズマ化された反応性ガスを作用させ、表面のエラスト
マ残滓をアッシングして除去するようにした加硫金型の
清浄方法も知られている(特開平8−300366号公
報)。
A reactive gas, which has been converted into plasma in advance, is ejected from a number of ejection holes of a shower tube toward an inner surface of a vulcanization mold placed in a vacuum processing tank, and the plasma is applied to the vulcanization mold. There is also known a method of cleaning a vulcanizing mold in which a converted reactive gas is caused to act to remove an elastomer residue on the surface by ashing (JP-A-8-300366).

【0007】このように、プラズマによる加硫金型の清
浄化は公知であるが、高周波容量結合型のプラズマを用
いた加硫金型の清浄装置では、比較的装置自体の構造は
簡単であるが、プラズマの密度が低く、洗浄に時間がか
かる上、使用する反応性ガスの利用効率も低いため、多
量のガスを使用する必要があること、一方、マイクロ波
ダウンフロー方式等の異なる方式による高密度プラズマ
を用いる方法では、全体に均一にガスを吹き付けるのが
困難な場合が生じ、大型の金型を洗浄することが困難で
ある。
As described above, the cleaning of a vulcanizing mold by plasma is known, but in a vulcanizing mold cleaning apparatus using a high-frequency capacitively coupled plasma, the structure of the apparatus itself is relatively simple. However, since the plasma density is low, cleaning takes time, and the utilization efficiency of the reactive gas used is low, it is necessary to use a large amount of gas.On the other hand, using a different method such as a microwave downflow method In the method using high-density plasma, it may be difficult to uniformly blow the gas over the whole, and it is difficult to clean a large mold.

【0008】本発明は、上記事情に鑑みなされたもの
で、洗浄時間の短縮化が図れると共に、反応性ガスの供
給・排出量を削減することができ、洗浄する金型の大き
さ・形状を選ばず、良好に洗浄を行うことができる加硫
金型の清浄方法及び装置を提供することを目的とする。
The present invention has been made in view of the above circumstances, and it is possible to shorten the cleaning time, reduce the supply and discharge of the reactive gas, and reduce the size and shape of the mold to be cleaned. It is an object of the present invention to provide a method and an apparatus for cleaning a vulcanizing mold, which can be satisfactorily cleaned regardless of the type.

【0009】[0009]

【課題を解決するための手段】本発明は、上記目的を達
成するため、下記の加硫金型の清浄方法及び装置を提供
する。
In order to achieve the above object, the present invention provides the following method and apparatus for cleaning a vulcanizing mold.

【0010】請求項1:真空処理槽内に配置された加硫
金型の内面に向けて予めプラズマ化された反応性ガスを
シャワ管の多数の噴出孔から噴出させて、上記加硫金型
にプラズマ化された反応性ガスを作用させ、表面のエラ
ストマ残滓をアッシングして除去するようにした加硫金
型の清浄方法において、上記シャワ管の外面に上記噴出
孔と連通する空気孔を設けた電極を配設し、この電極と
上記加硫金型との間に電圧を印加してこれらの間に高周
波プラズマ域を形成して、上記プラズマ化された反応性
ガスをこのプラズマ域を通して加硫金型に作用させるこ
とを特徴とする加硫金型の清浄方法。
[0010] Claim 1: A reactive gas, which is preliminarily converted into plasma, is ejected from a large number of ejection holes of a shower tube toward an inner surface of a vulcanization mold disposed in a vacuum processing tank, thereby forming the vulcanization mold. A method for cleaning a vulcanizing mold, in which a reactive gas converted into plasma is applied to ashing to remove an elastomer residue on the surface, an air hole communicating with the ejection hole is provided on an outer surface of the shower tube. A voltage is applied between the electrode and the vulcanizing mold to form a high-frequency plasma region therebetween, and the reactive gas converted into plasma is applied through the plasma region. A method for cleaning a vulcanization mold, wherein the method is applied to a vulcanization mold.

【0011】請求項2:真空処理槽と、一端がこの槽内
に挿入され、他端側にプラズマ発生装置が配備されて、
このプラズマ発生装置によりプラズマ化された反応性ガ
スを流通させる反応性ガス導入管と、この導入管の上記
真空処理槽内に存する一端部に連結され、上記導入管か
らのプラズマ化された反応性ガスを真空処理槽内に噴出
させる多数の噴出孔を有するシャワ管とを具備し、内面
をこのシャワ管の噴出孔と対面して上記真空処理槽内に
配置した加硫金型の内面に上記プラズマ化された反応性
ガスを吹き付けて、この加硫金型表面のエラストマ残滓
をアッシングして除去するようにした加硫金型の清浄装
置において、上記シャワ管の外面に上記噴出孔と連通す
る空気孔を設けた電極を配設すると共に、この電極及び
上記加硫金型をそれぞれ高周波電源に接続して、上記電
極と加硫金型との間に電圧を印加することにより、高周
波プラズマ域を形成し、上記プラズマ化された反応性ガ
スをこのプラズマ域を通して加硫金型に吹き付けるよう
にしたことを特徴とする加硫金型の清浄装置。
In another preferred embodiment, a vacuum processing tank, one end of which is inserted into the tank, and a plasma generator which is provided at the other end,
A reactive gas introduction pipe through which the reactive gas converted into plasma by the plasma generator flows, and one end of the introduction pipe existing in the vacuum processing tank connected to the reactive gas introduced from the introduction pipe; A shower tube having a large number of ejection holes for ejecting gas into the vacuum processing tank, and an inner surface of the vulcanizing mold arranged in the vacuum processing tank facing the ejection hole of the shower tube. In a vulcanizing mold cleaning apparatus in which a plasma-forming reactive gas is sprayed to ashing and removing an elastomer residue on the surface of the vulcanizing mold, the outer surface of the shower tube is communicated with the ejection hole. An electrode provided with an air hole is provided, and this electrode and the vulcanizing mold are connected to a high-frequency power source, respectively, and a voltage is applied between the electrode and the vulcanizing mold, so that a high-frequency plasma region is formed. The shape And, characterized that the vulcanization mold cleaning apparatus that it has to blow the plasma are reactive gases vulcanizing mold through the plasma zone.

【0012】本発明においては、マイクロ波ダウンフロ
ープラズマに高周波容量結合型プラズマを複合すること
で、ガス導入時に反応性ガスが高密度プラズマ中を通過
することにより、反応性の高い状態に励起され、それが
減衰することなく加硫金型に吹き付けられ、これが更に
金型付近の高周波プラズマにより励起が促進される。従
って、本発明によれば、高密度プラズマによるより活性
の高い励起状態の活性種による高速な洗浄と、高周波プ
ラズマによる加硫金型全体のむらのない洗浄とが両立さ
れ、それにより洗浄時間の短縮が可能になると共に、ガ
スの使用効率が高くなり、ガスの使用量、排気ガス量の
削減が可能となる。更に、本発明の装置によれば、金型
の大きさ、形状を選ばず、良好に洗浄を行うことができ
る。
In the present invention, by combining a microwave down-flow plasma with a high-frequency capacitively coupled plasma, a reactive gas passes through the high-density plasma at the time of gas introduction, thereby being excited into a highly reactive state. It is sprayed onto the vulcanizing mold without attenuating, which is further stimulated by high frequency plasma near the mold. Therefore, according to the present invention, both high-speed cleaning with active species in a more active excited state by high-density plasma and uniform cleaning of the entire vulcanization mold by high-frequency plasma are achieved, thereby shortening the cleaning time. And the gas use efficiency is increased, and the amount of gas used and the amount of exhaust gas can be reduced. Furthermore, according to the apparatus of the present invention, it is possible to perform excellent cleaning regardless of the size and shape of the mold.

【0013】[0013]

【発明の実施の形態及び実施例】以下、本発明の加硫金
型清浄装置について図面を参照して更に詳しく説明す
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a vulcanizing mold cleaning apparatus according to the present invention will be described in more detail with reference to the drawings.

【0014】図1において、真空処理槽1は下方位置に
て相互に上下に分離可能でかつシール可能な容器上部2
−1と容器下部2−2とを有する容器2を備え、容器上
部2−1側を容器下部2−2に対し上方に向け着脱自在
とし、容器下部2−2に図示を省略した真空ポンプに接
続させる吸引部3を具備する。加硫金型10の清浄作業
を開始するに先立ちこの真空ポンプを稼働させ、容器2
内部の空気を図の矢印Aの向きに排気して、容器2内部
の空気圧を例えば10-1〜10-5Torrのいわゆる中
真空〜高真空とする。なお図示例の真空処理槽1は容器
下部2−2側を、例えば複数本の支柱4(図では2本の
みを示す)により床面Fsなどに固定する。ホイールコ
ンベヤ5が定盤11上に据えた加硫金型10を保持す
る。
In FIG. 1, a vacuum processing tank 1 has a container upper part 2 which can be vertically separated from each other and can be sealed at a lower position.
A vacuum pump not shown in the container lower part 2-2. The container 2 has a container 2 having a container lower part 2-1 and a container lower part 2-2. A suction unit 3 to be connected is provided. Prior to starting the cleaning operation of the vulcanizing mold 10, the vacuum pump is operated and the container 2
The inside air is exhausted in the direction of arrow A in the figure, and the air pressure inside the container 2 is set to a so-called medium vacuum to high vacuum of, for example, 10 -1 to 10 -5 Torr. In the illustrated example of the vacuum processing tank 1, the lower part 2-2 of the container is fixed to the floor surface Fs or the like by, for example, a plurality of columns 4 (only two are shown in the figure). The wheel conveyor 5 holds the vulcanizing mold 10 set on the surface plate 11.

【0015】14は円筒状外周面を持つプラズマ流のシ
ャワ管で、このシャワ管14は、その外周部に多数の噴
出孔15が形成されていると共に、これら噴出孔15が
加硫金型10の内周面と対向するように配置され、一端
が真空処理槽1内に突出する反応性ガス導入管16の該
一端に連結される。ここで、シャワ管14は周囲面の内
部に空間部S14を有する円筒に形成すると同時に、この
円筒の内周面に上記導入管16の下端部に設けた円板状
プラズマ流誘導部材16−1を連結し、誘導部材16−
1の内部空間部S16-1とシャワ管14の空間部S14とを
相互に連結する。上記のように、シャワ管14の外周の
全表面に空間部S14に貫通する多数個の噴出孔15を設
けるが、これらの噴出孔15は縦横並びの整列配置の
他、縦方向(導入管16が延びる方向)又は横方向に千
鳥配列とすることができる。シャワ管14の材質は石英
又はアルミナなどが適合する。
Numeral 14 denotes a plasma flow shower pipe having a cylindrical outer peripheral surface. The shower pipe 14 has a large number of ejection holes 15 formed on the outer periphery thereof, and these ejection holes 15 are formed in the vulcanizing mold 10. And one end thereof is connected to one end of a reactive gas introduction pipe 16 protruding into the vacuum processing tank 1. Here, the shower tube 14 at the same time forms the cylinder having a space portion S 14 in the interior of the peripheral surface, discoid plasma flow induced provided at the lower end of the inlet tube 16 to the inner peripheral surface of the cylindrical member 16 1 and the guiding member 16-
Connecting the first and the space portion S 14 of the inner space S 16-1 and showering tube 14 to each other. As described above, although providing a plurality of ejection holes 15 penetrating in the space portion S 14 on the entire surface of the outer periphery of the shower tube 14, the other of these jetting holes 15 are aligned in vertical and horizontal alignment, vertical direction (inlet pipe 16 extending direction) or a staggered arrangement in the lateral direction. The material of the shower tube 14 is quartz or alumina.

【0016】導入管16の上端部はコネクタ17を介し
てプラズマ流発生炉18内を通るパイプ19に連結す
る。周波数300MHz〜30GHz、望ましくは1G
Hz〜10GHzのマイクロ波電源部20からの出力電
力をプラズマ流発生炉18に送電し、このマイクロ波電
力の放電により、矢印Bの向きに流入させる反応性ガス
をプラズマ流化する。そのときプラズマ流中の中性活性
種の密度が所望の値となるように、周波数、供給電力量
及び反応性ガスの流入量(SCCM)を選定する。反応
性ガスとしては酸素ガスのみ、又は主成分の酸素ガスと
従成分のハロゲン化物ガス、好適にはCF4ガスとの混
合ガスのいずれかのガスとし、酸素(O、O2、O3)ラ
ジカル、CF4ラジカルを得る。プラズマ流発生炉18
は単一とは限らず、好適にはコネクタ17に対する複数
炉又は多数炉の並列接続とし、各炉に対してマイクロ波
を送電する。
The upper end of the introduction pipe 16 is connected to a pipe 19 passing through a plasma flow generating furnace 18 via a connector 17. Frequency 300MHz-30GHz, preferably 1G
The output power from the microwave power supply unit 20 at 10 Hz to 10 GHz is transmitted to the plasma flow generation furnace 18, and the reactive gas to be flowed in the direction of the arrow B is turned into plasma by the discharge of the microwave power. At that time, the frequency, the supplied power amount, and the inflow amount (SCCM) of the reactive gas are selected so that the density of the neutral active species in the plasma flow becomes a desired value. As the reactive gas, either oxygen gas alone or a mixed gas of the main component oxygen gas and the auxiliary component halide gas, preferably CF 4 gas, is used as the reactive gas, and oxygen (O, O 2 , O 3 ) A radical, CF 4 radical, is obtained. Plasma flow generator 18
Is not limited to a single unit. Preferably, a plurality of furnaces or a plurality of furnaces are connected in parallel to the connector 17, and microwaves are transmitted to each furnace.

【0017】21は、上記シャワ管14の外周面に配設
され、上記噴出孔15と連通する多数の通気孔22が形
成された円筒状電極であり、この電極21を高周波電源
23と接続すると共に、上記加硫金型10も定盤11を
介して高周波電源23に接続し、上記電極21と加硫金
型10との間に高周波プラズマ域Pを形成する。なお、
24はマッチングボックスである。
Reference numeral 21 denotes a cylindrical electrode provided on the outer peripheral surface of the shower tube 14 and having a large number of ventilation holes 22 communicating with the ejection holes 15. The electrode 21 is connected to a high frequency power supply 23. At the same time, the vulcanizing mold 10 is also connected to the high-frequency power source 23 via the surface plate 11 to form a high-frequency plasma region P between the electrode 21 and the vulcanizing mold 10. In addition,
24 is a matching box.

【0018】上記加硫金型清浄装置を用いて加硫金型1
0の内面のエラストマ残滓を除去するに際し、プラズマ
流発生炉18内で生起されたプラズマ流は、パイプ1
9、コネクタ17、導入管16及び誘導部材16−1内
部を導かれてシャワ管14の空間部S14に達し、ここで
多数個の噴出孔15及び電極21の通気孔22を通じて
加硫金型10の全内周表面に向け一様に矢印の向きに噴
出する。それは上記一連の動作中も真空ポンプを動作さ
せて常時吸引部3から真空処理槽1内のガス排気を継続
させ、常に処理槽1内部の圧力を0.01〜10Tor
rの範囲内で一定圧力に保持させるからである。
Using the above vulcanizing mold cleaning device, the vulcanizing mold 1
In removing the elastomer residue on the inner surface of the plasma flow generation furnace 18, the plasma flow generated in the plasma flow generation furnace 18
9, the connector 17, inlet tube 16 and the guide member 16-1 is guided inside reached space S 14 of the showering tube 14, wherein the vulcanization mold through the vent holes 22 of the plurality of ejection holes 15 and electrodes 21 10 are uniformly ejected in the direction of the arrow toward the entire inner peripheral surface. That is, even during the series of operations, the vacuum pump is operated to continuously exhaust the gas in the vacuum processing tank 1 from the suction unit 3, and the pressure inside the processing tank 1 is constantly set to 0.01 to 10 Torr.
This is because the pressure is kept constant within the range of r.

【0019】この場合、本発明にあっては、上記プラズ
マ流は、電極21と加硫金型10との間に形成された高
周波プラズマ域Pを通って加硫金型10に作用するの
で、上記プラズマ流が更に活性化すると共に、加硫金型
10に一様に作用し、マイクロ波ダウンフロー高密度プ
ラズマによるより活性の高い励起状態の活性種による高
速な洗浄と、高周波プラズマによる金型全体のむらのな
い洗浄とが達成されるものである。
In this case, in the present invention, the plasma flow acts on the vulcanization mold 10 through a high-frequency plasma region P formed between the electrode 21 and the vulcanization mold 10. The plasma flow is further activated and acts uniformly on the vulcanizing mold 10, whereby high-speed cleaning with active species in a more active excited state by microwave downflow high-density plasma and mold by high-frequency plasma An even cleaning of the whole is achieved.

【0020】ここで、上記反応性ガスとしては、酸素ガ
ス単体又は酸素ガスを主成分とするハロゲン化物ガスと
の混合ガスなどを好適に使用し得、酸素ガスとしては、
2、O3が挙げられ、ハロゲン化物ガスとしては、F
(フッ素)、CF4、NF3、SF6などを好適に使用し
得るが、特に制限されるものではない。
Here, as the reactive gas, oxygen gas alone or a mixed gas with a halide gas containing oxygen gas as a main component can be suitably used.
O 2 and O 3 , and the halide gas is F
(Fluorine), CF 4 , NF 3 , SF 6 and the like can be suitably used, but are not particularly limited.

【0021】上記反応性ガスの流入量(SCCM)は、
適宜調整されるが、例えば、酸素ガスとハロゲン化物ガ
スとの混合ガスを使用する場合、酸素ガス100〜10
000SCCM、特に100〜2000SCCMに対し
て、ハロゲン化物ガス0〜50%、特に5〜30%とす
ることが好ましい。
The amount of inflow of the reactive gas (SCCM) is
Although it is appropriately adjusted, for example, when a mixed gas of oxygen gas and halide gas is used, oxygen gas 100 to 10
The halide gas is preferably set to 0 to 50%, particularly preferably 5 to 30% with respect to 000 SCCM, particularly 100 to 2000 SCCM.

【0022】更に、高周波容量結合型プラズマの生成条
件も適宜選定されるが、周波数10KHz〜100MH
z、特に1〜100MHz、電力1〜20KW、特に5
〜10KWの条件とすることが好ましい。
Further, the conditions for generating the high frequency capacitively coupled plasma are appropriately selected.
z, especially 1-100 MHz, power 1-20 KW, especially 5
Preferably, the condition is 10 to 10 KW.

【0023】本発明によれば、反応性ガスに対し、2段
階のプラズマ処理を行うので、反応性ガスを効率よくプ
ラズマ化することができ、反応性ガスの無駄が回避さ
れ、供給量及び排出量の削減を図ることができる。そし
て、上記プラズマ処理により、プラズマ流の高密度化が
達成されるので、残滓に対するアッシング速度が飛躍的
に向上する。
According to the present invention, the reactive gas is subjected to a two-stage plasma treatment, so that the reactive gas can be efficiently converted into plasma, the waste of the reactive gas is avoided, and the supply amount and the discharge amount are reduced. The amount can be reduced. Since the plasma processing achieves a high-density plasma flow, the ashing speed for the residue is dramatically improved.

【0024】次に、下記実験例により本発明の効果を具
体的に示す。 〔実験例〕外径480mm、高さ220mmの円筒形電
極の周囲に8個の割金型(セグメントNo.1〜8)か
らなり、最大内径が550mmの加硫金型を配置した特
開平8−216164号公報に示す装置を用い、反応性
ガスとしてO2ガス及びCF4ガスの混合ガスをO2を5
00SCCM、CF4を250SCCMの流量(O2:C
4=2:1の流量比)で真空処理槽内に導入した。こ
の場合、反応性ガス圧力を1.5Torrに保持した。
Next, the effects of the present invention will be specifically shown by the following experimental examples. [Experimental example] Japanese Unexamined Patent Publication No. Hei 8 (1996), which comprises eight split molds (segments Nos. 1 to 8) around a cylindrical electrode having an outer diameter of 480 mm and a height of 220 mm and a maximum inner diameter of 550 mm. using the apparatus shown in -216164 discloses, a mixed gas of O 2 gas and CF 4 gas as a reactive gas O 2 5
00 SCCM and CF 4 at a flow rate of 250 SCCM (O 2 : C
(F 4 = 2: 1 flow ratio) into the vacuum processing tank. In this case, the reactive gas pressure was maintained at 1.5 Torr.

【0025】この状態で電極と加硫金型との間に周波数
13.56MHz、電力5KWの条件で電圧を印加し、
120分間の処理を行った(比較例1)。
In this state, a voltage is applied between the electrode and the vulcanizing mold under the conditions of a frequency of 13.56 MHz and a power of 5 kW,
The treatment was performed for 120 minutes (Comparative Example 1).

【0026】また、特開平8−300366号公報に示
す装置を用い、上記混合ガスを周波数2.45GHz、
電力5KWの条件でマイクロ波放電させることにより形
成したプラズマ流を加硫金型内面に吹き付ける以外は上
記と同様にして120分間の処理を行った(比較例
2)。
Further, using the apparatus disclosed in Japanese Patent Application Laid-Open No. 8-300366, the above mixed gas was supplied at a frequency of 2.45 GHz and
The treatment was performed for 120 minutes in the same manner as described above, except that the plasma flow formed by microwave discharge at a power of 5 KW was blown onto the inner surface of the vulcanizing mold (Comparative Example 2).

【0027】次に、上記図1の装置を用い、上記混合ガ
スを周波数2.45GHz、電力5KWの条件でマイク
ロ波放電させることにより形成したプラズマ流を加硫金
型に吹き付けると共に、この際電極と加硫金型との間に
周波数13.56MHz、電力5KWの条件で電圧を印
加して高周波プラズマ域を形成し、上記プラズマ流を更
に高周波プラズマ域を通しつつ60分間の処理を行った
(実施例)。
Next, using the apparatus shown in FIG. 1, a plasma flow formed by microwave-discharging the mixed gas under the conditions of a frequency of 2.45 GHz and a power of 5 kW is blown to a vulcanizing mold, A voltage was applied between the mold and the vulcanizing mold under the conditions of a frequency of 13.56 MHz and a power of 5 KW to form a high-frequency plasma region, and the plasma flow was further processed through the high-frequency plasma region for 60 minutes ( Example).

【0028】加硫金型の各セグメントNo.1〜8の処
理直後における温度、及び残滓の灰化程度、灰化均一性
を下記基準に基づいて評価した結果を表1に示す。灰化程度(灰化性平均) 灰化程度は5点評価とし、大きい程優れた灰化状況を示
し、4点以上を合格レベルとした。灰化均一性 ほぼ均一に灰化除去できたものを○、そうでないものを
×とした。
Each segment No. of the vulcanizing mold Table 1 shows the results of evaluating the temperature, the degree of incineration of the residue, and the incineration uniformity based on the following criteria immediately after the treatments 1 to 8. The degree of incineration (average of incineration ) was evaluated as 5 points. The larger the degree of incineration, the better the incineration state, and 4 points or more were regarded as acceptable levels. Ashing uniformity A sample that could be almost uniformly incinerated and removed was evaluated as O, and a sample that did not was evaluated as X.

【0029】[0029]

【表1】 [Table 1]

【0030】[0030]

【発明の効果】本発明によれば、加硫金型のエラストマ
残滓を短時間でかつ使用ガス量、排気ガス量を低減して
効率よく確実にアッシング除去することができる。
According to the present invention, it is possible to efficiently and surely remove the elastomer residue of the vulcanizing mold in a short time and by reducing the amount of gas used and the amount of exhaust gas.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例にかかる加硫金型清浄装置の
概略図である。
FIG. 1 is a schematic view of a vulcanizing mold cleaning apparatus according to one embodiment of the present invention.

【符号の説明】 1 真空処理槽 2−1 容器上部 2−2 容器下部 10 加硫金型 18 プラズマ流発生炉 20 マイクロ波電源部 21 電極 23 高周波電源[Description of Signs] 1 Vacuum processing tank 2-1 Upper container 2-2 Lower container 10 Vulcanizing mold 18 Plasma flow generator 20 Microwave power supply unit 21 Electrode 23 High frequency power supply

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 真空処理槽内に配置された加硫金型の内
面に向けて予めプラズマ化された反応性ガスをシャワ管
の多数の噴出孔から噴出させて、上記加硫金型にプラズ
マ化された反応性ガスを作用させ、表面のエラストマ残
滓をアッシングして除去するようにした加硫金型の清浄
方法において、上記シャワ管の外面に上記噴出孔と連通
する空気孔を設けた電極を配設し、この電極と上記加硫
金型との間に電圧を印加してこれらの間に高周波プラズ
マ域を形成して、上記プラズマ化された反応性ガスをこ
のプラズマ域を通して加硫金型に作用させることを特徴
とする加硫金型の清浄方法。
A reactive gas, which is preliminarily converted into plasma, is ejected from a plurality of ejection holes of a shower tube toward an inner surface of a vulcanization mold disposed in a vacuum processing tank, and a plasma is applied to the vulcanization mold. In the method of cleaning a vulcanizing mold, a reactive gas is acted on to remove the elastomer residue on the surface by ashing, an electrode provided with an air hole communicating with the ejection hole on the outer surface of the shower tube. And applying a voltage between the electrode and the vulcanizing mold to form a high-frequency plasma region between the electrodes and allowing the reactive gas converted into plasma to pass through the vulcanizing mold through the plasma region. A method for cleaning a vulcanizing mold, which is applied to a mold.
【請求項2】 真空処理槽と、一端がこの槽内に挿入さ
れ、他端側にプラズマ発生装置が配備されて、このプラ
ズマ発生装置によりプラズマ化された反応性ガスを流通
させる反応性ガス導入管と、この導入管の上記真空処理
槽内に存する一端部に連結され、上記導入管からのプラ
ズマ化された反応性ガスを真空処理槽内に噴出させる多
数の噴出孔を有するシャワ管とを具備し、内面をこのシ
ャワ管の噴出孔と対面して上記真空処理槽内に配置した
加硫金型の内面に上記プラズマ化された反応性ガスを吹
き付けて、この加硫金型表面のエラストマ残滓をアッシ
ングして除去するようにした加硫金型の清浄装置におい
て、上記シャワ管の外面に上記噴出孔と連通する空気孔
を設けた電極を配設すると共に、この電極及び上記加硫
金型をそれぞれ高周波電源に接続して、上記電極と加硫
金型との間に電圧を印加することにより、高周波プラズ
マ域を形成し、上記プラズマ化された反応性ガスをこの
プラズマ域を通して加硫金型に吹き付けるようにしたこ
とを特徴とする加硫金型の清浄装置。
2. A vacuum processing tank, one end of which is inserted into the tank, and a plasma generating device provided on the other end side, and a reactive gas introduced by which the reactive gas converted into plasma by the plasma generating device flows. A pipe and a shower pipe which is connected to one end of the introduction pipe in the vacuum processing tank and has a large number of ejection holes for ejecting the plasma-formed reactive gas from the introduction pipe into the vacuum processing tank. The plasma-forming reactive gas is sprayed on the inner surface of a vulcanizing mold disposed in the vacuum processing tank with the inner surface facing the ejection hole of the shower tube, and the elastomer on the surface of the vulcanizing mold is sprayed. In a vulcanizing mold cleaning apparatus that removes residues by ashing, an electrode having an air hole communicating with the ejection hole is provided on an outer surface of the shower tube, and the electrode and the vulcanizing metal are provided. Each mold has high circumference By connecting to a microwave power source and applying a voltage between the electrode and the vulcanizing mold, a high-frequency plasma region is formed, and the reactive gas converted into plasma is passed through the plasma region to the vulcanizing mold. A vulcanizing mold cleaning device characterized by spraying.
JP36722897A 1997-12-25 1997-12-25 Method and apparatus for cleaning vulcanizing mold Pending JPH11188741A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP36722897A JPH11188741A (en) 1997-12-25 1997-12-25 Method and apparatus for cleaning vulcanizing mold

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP36722897A JPH11188741A (en) 1997-12-25 1997-12-25 Method and apparatus for cleaning vulcanizing mold

Publications (1)

Publication Number Publication Date
JPH11188741A true JPH11188741A (en) 1999-07-13

Family

ID=18488796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP36722897A Pending JPH11188741A (en) 1997-12-25 1997-12-25 Method and apparatus for cleaning vulcanizing mold

Country Status (1)

Country Link
JP (1) JPH11188741A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006289724A (en) * 2005-04-08 2006-10-26 Yokohama Rubber Co Ltd:The Method and apparatus for washing mold for vulcanizing and molding tire

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006289724A (en) * 2005-04-08 2006-10-26 Yokohama Rubber Co Ltd:The Method and apparatus for washing mold for vulcanizing and molding tire
JP4585361B2 (en) * 2005-04-08 2010-11-24 横浜ゴム株式会社 Tire vulcanization mold cleaning equipment

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