JPH11195206A - Magnetoresistive thin film magnetic head and production thereof - Google Patents

Magnetoresistive thin film magnetic head and production thereof

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Publication number
JPH11195206A
JPH11195206A JP36011897A JP36011897A JPH11195206A JP H11195206 A JPH11195206 A JP H11195206A JP 36011897 A JP36011897 A JP 36011897A JP 36011897 A JP36011897 A JP 36011897A JP H11195206 A JPH11195206 A JP H11195206A
Authority
JP
Japan
Prior art keywords
magnetic pole
film
magnetic
recording
upper front
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP36011897A
Other languages
Japanese (ja)
Inventor
Moichi Otomo
茂一 大友
Kuniaki Yoshimura
邦明 吉村
Hideji Takahashi
秀治 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP36011897A priority Critical patent/JPH11195206A/en
Publication of JPH11195206A publication Critical patent/JPH11195206A/en
Withdrawn legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To obtain a magnetoresistive combined head capable of performing a high desity and a high frequency recording by using a soft magnetic film having a highly saturated magnetic density on the front part magnetic pole of an upper part and using a soft magnetic film having a high resistivity on the rear part magnetic pole of the upper and a middle part magnetic pole. SOLUTION: Upper part magnetic poles of a thin film combined head are formed by joining the front part magnetic pole of an upper part 22 and the rear part magnetic pole of an upper part 21. At this time, at least the hickness of one side of the poles is gradually reduced in order to reduce leaches of magnetic fluxes of the joining area. Moreover, a soft magnetic plated film which is an Ni-Fe alloy, etc., and whose saturated magnetic flux density Bs is 1.4 to 2.2 T is formed on the front part magnetic pole 22 whose top end part is opposed to a recording gap and the rear part magnetic pole 21 is magnetically connected to the middle part magnetic pole 13 having a high resistivity ρ at its rear part and a soft magnetic sputtered film having the high ρ of not smaller than 80 μΩcm is formed on the pole 21. Thus, the overwriting characteristic of the head by a magnetic saturation is improved by providing the plated film having the high Bs on the front part magnetic pole 22 stipulating a recording with and also the high frequency characteristic of the head is improved by forming the film having the high ρ on the rear part magnetic pole 21.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は磁気抵抗効果を利用
したMR素子を備える薄膜磁気ヘッドに係り、特に高密
度高周波ディジタル記録に用いたときに非線形磁化遷移
点シフトが小さく、高密度高周波記録が可能な磁気ヘッ
ドに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film magnetic head having an MR element utilizing the magnetoresistance effect, and particularly to a thin film magnetic head having a small nonlinear magnetization transition point shift when used for high density high frequency digital recording. Regarding possible magnetic heads.

【0002】[0002]

【従来の技術】近年、磁気記録装置の記録密度の向上は
著しく、計算機用磁気ディスク装置の分野では年率60
%の早さで記録密度の増加が進んでいる。記録密度の増
加を実現するために、磁気記録媒体の改良に加えて、記
録再生特性に優れた磁気ヘッドの開発が進んでいる。1
平方インチ当たり1ギガビット(1Gb/inch2)
以上の高記録密度を達成するために、再生ヘッドとし
て、従来のインダクティブ型よりも格段に再生出力の高
い、磁気抵抗効果を利用した薄膜素子(以下MR素子と
称す)が開発され、記録ヘッドには従来の電磁誘導を利
用したインダクティブ型の薄膜素子が用いられている。
現実には、再生ヘッドと記録ヘッドを一体に形成した、
インダクティブ記録・MR再生の複合ヘッドが用いられ
ている。
2. Description of the Related Art In recent years, the recording density of a magnetic recording device has been remarkably improved, and in the field of magnetic disk devices for computers, the annual rate is 60%.
%, The recording density is increasing. In order to increase the recording density, in addition to the improvement of the magnetic recording medium, the development of a magnetic head having excellent recording / reproducing characteristics is progressing. 1
1 gigabit per square inch (1 Gb / inch2)
In order to achieve the above-mentioned high recording density, a thin film element (hereinafter referred to as an MR element) utilizing a magnetoresistance effect, which has a much higher reproduction output than the conventional inductive type, has been developed as a reproducing head. Uses a conventional inductive type thin film element utilizing electromagnetic induction.
In reality, the reproducing head and the recording head were formed integrally,
A combined head of inductive recording and MR reproduction is used.

【0003】図7は、現在用いられている従来のMR複
合ヘッドの断面図を示している。図8はその上面図であ
り、A−A’断面の浮上面近傍を示したのが図7であ
る。また、図9は図8の浮上面B−B’で見た正面図を
示している。図7の従来のMR複合ヘッドは、基板10
0の上に、下部磁極111、絶縁層112、中部磁極1
13が形成され、下部磁極と中部磁極の間に、MR素子
からなる再生部114が構成されている。中部磁極の上
に、ギャップ材115が形成され、さらにコイル116
が形成されている。コイルを絶縁するために、絶縁層1
17が形成され、さらに上部磁極118が形成され、最
上層にこれらを保護するための保護層119が形成され
ている。
FIG. 7 is a sectional view of a conventional MR compound head currently used. FIG. 8 is a top view of the same, and FIG. 7 shows the vicinity of the air bearing surface in the AA ′ section. FIG. 9 is a front view as viewed from the air bearing surface BB ′ in FIG. The conventional MR composite head of FIG.
0, a lower magnetic pole 111, an insulating layer 112, a middle magnetic pole 1
13 are formed, and a reproducing section 114 composed of an MR element is formed between the lower magnetic pole and the middle magnetic pole. A gap material 115 is formed on the central magnetic pole, and further a coil 116 is formed.
Are formed. Insulating layer 1 to insulate the coil
17, an upper magnetic pole 118 is formed, and a protective layer 119 for protecting them is formed on the uppermost layer.

【0004】本MR複合ヘッドは、コイル116に記録
電流を印加して上部磁極118と中部磁極113に記録
磁束を誘起せしめ、記録ギャップ近傍で上部磁極と中部
磁極から漏洩する磁界により、浮上面120の近傍に設
置した記録媒体(図では省略してある)に信号磁化を記
録する。再生時には、記録媒体の信号磁化から発生する
磁界をMR素子114で検出する。このMR複合ヘッド
では、図9のように、下部磁極111および中部磁極1
13の幅に比較して上部磁極118の幅を狭く形成して
おり、この上部磁極の幅により記録トラック幅Twを規
定している。
In the present MR composite head, a recording current is applied to a coil 116 to induce a recording magnetic flux in an upper magnetic pole 118 and a central magnetic pole 113, and a magnetic field leaking from the upper magnetic pole and the central magnetic pole near the recording gap causes the air bearing surface 120 to rotate. The signal magnetization is recorded on a recording medium (not shown in the figure) placed in the vicinity of. At the time of reproduction, the magnetic field generated from the signal magnetization of the recording medium is detected by the MR element 114. In this MR composite head, as shown in FIG.
The width of the upper magnetic pole 118 is smaller than the width of the upper magnetic pole 13, and the width of the upper magnetic pole defines the recording track width Tw.

【0005】[0005]

【本発明が解決しようとする課題】計算機用磁気ディス
ク装置では、線記録密度の増加に伴って、オーバーライ
ト(O/W)および非線形磁化遷移点シフト(Non
Linear Transition Shift、以
下省略してNLTSと称す)の特性不足が問題となり、
今後の記録密度の増加を実現するためにはO/Wおよび
NLTSの改善が課題になっている。NLTSとは、デ
ィジタル信号の記録において、記録された信号が本来記
録すべき位置からずれてしまう現象である。また、O/
Wとは長波長の信号を記録した後に、短波長の信号を重
ね書きした場合に、先に記録した長波長信号が消去され
ずに残ってしまう現象である。O/Wは特に高保磁力の
記録媒体に対して、記録磁界強度および記録磁界勾配が
不足している時に問題となる。またNLTSは、高周
波、高密度記録時に磁極の高周波特性が不足し、記録磁
界の変化が遅れることに起因すると考えられる。
In a magnetic disk drive for a computer, as the linear recording density increases, overwrite (O / W) and nonlinear magnetization transition point shift (Non-magnetic transition) occur.
Linear Transform Shift (hereinafter abbreviated as NLTS) has a problem with insufficient characteristics.
In order to increase the recording density in the future, improvement of O / W and NLTS has been an issue. The NLTS is a phenomenon in which a recorded signal deviates from a position to be originally recorded in recording a digital signal. Also, O /
W is a phenomenon in which, when a long wavelength signal is recorded and then a short wavelength signal is overwritten, the previously recorded long wavelength signal remains without being erased. O / W becomes a problem especially when the recording magnetic field strength and the recording magnetic field gradient are insufficient for a recording medium having a high coercive force. The NLTS is considered to be caused by the fact that the high frequency characteristics of the magnetic pole are insufficient at the time of high frequency and high density recording, and the change of the recording magnetic field is delayed.

【0006】従来、薄膜磁気ヘッド用の記録磁極として
は、主に83Ni−17Fe(wt%)合金を中心とす
る組成の合金のメッキ膜が使用されていた。この材料
は、軟磁気特性に優れており、またメッキ法により作製
できるため、狭トラック幅を有する薄膜磁気ヘッドの磁
極材料として好適であった。しかし、記録の高密度化、
高周波化が進むにつれ、以下のような問題が生ずるよう
になった。
Heretofore, as a recording magnetic pole for a thin-film magnetic head, a plating film of an alloy mainly composed of an 83Ni-17Fe (wt%) alloy has been used. Since this material has excellent soft magnetic properties and can be produced by plating, it was suitable as a magnetic pole material for a thin film magnetic head having a narrow track width. However, higher density recording,
As the frequency increases, the following problems arise.

【0007】すなわち、記録密度を増加するためには、
記録媒体の保磁力を増加して記録磁化の反磁界による減
磁をふせぎ、磁化遷移領域を減少して高記録密度での出
力を増加する必要がある。媒体の保磁力が高い場合、こ
れに十分に信号磁化を記録するための強い記録磁界強度
が必要となる。しかしながら、上記の83Ni−17F
e(wt%)合金メッキ膜は飽和磁束密度(以下Bsと
記す)が約1Tであり、近年使用されるようになった保
磁力が1.9X10E5A/m(2400Oe)以上の
媒体に対しては、磁極飽和の問題を生じ記録磁界強度が
不足するという問題を生じた。記録磁界強度の不足は、
特にO/W特性の劣化として現れ、必要となる−30d
B以下のO/W特性が−26dB以上となる問題があっ
た。
That is, in order to increase the recording density,
It is necessary to increase the coercive force of the recording medium to prevent demagnetization of the recording magnetization due to the demagnetizing field, and reduce the magnetization transition region to increase the output at a high recording density. When the coercive force of the medium is high, a strong recording magnetic field strength for sufficiently recording the signal magnetization is required. However, the above 83Ni-17F
The e (wt%) alloy plating film has a saturation magnetic flux density (hereinafter, referred to as Bs) of about 1 T, and has been used in recent years for a medium having a coercive force of 1.9 × 10E5 A / m (2400 Oe) or more. This causes a problem of magnetic pole saturation and a problem of insufficient recording magnetic field intensity. The lack of recording magnetic field strength
In particular, it appears as deterioration of the O / W characteristic and becomes necessary -30d.
There was a problem that the O / W characteristics below B became -26 dB or more.

【0008】一方、記録の高密度化と同時に高周波化も
進展しており、直径3.5インチの記録媒体を用いる磁
気ディスク装置では、最高使用周波数は80MHzを越
えるものが開発されるようになってきている。このよう
に使用周波数が高くなった場合には、必要な記録信号の
変化速度に磁極の磁束変化が追随できず、記録磁界の変
化に遅れを生じて前述のNLTS特性が劣化してしまう
という問題を生ずるようになった。
On the other hand, the frequency of recording has been increasing at the same time as the recording density has been increased, and a magnetic disk device using a 3.5-inch diameter recording medium has been developed to have a maximum usable frequency exceeding 80 MHz. Is coming. When the operating frequency is increased as described above, the change in magnetic flux of the magnetic pole cannot follow the required change speed of the recording signal, and the change in the recording magnetic field is delayed, thereby deteriorating the NLTS characteristics. Came to occur.

【0009】上記のような問題の解決を試みる手段とし
て、記録磁極に高いBsを有し、かつ比抵抗(以下ρと
記す)の高い材料を使用することが考えられている。た
とえば、上部磁極に、前記のBsが約1Tである83N
i−17Fe(wt%)合金メッキ膜の代わりに、Bs
が約1.5Tの45Ni−55Fe(wt%)合金メッ
キ膜を使用することによりO/Wを向上出来ると思われ
る。また、中部磁極を前記の83Ni−17Fe合金メ
ッキ膜の代わりに比抵抗の高いCoTaZr非晶質合金
スパッタ膜を使用することにより高周波特性を向上し、
NLTS特性を改善することが出来ると考えられる。し
かし、さらに高周波、高密度記録に対してO/Wおよび
NLTSを向上した薄膜磁気ヘッドを提供するには以下
のような問題があった。
As a means for solving the above problem, it is considered to use a material having high Bs in the recording magnetic pole and high specific resistance (hereinafter referred to as ρ). For example, in the upper magnetic pole, 83N where Bs is about 1T
Bs instead of i-17Fe (wt%) alloy plating film
It is thought that O / W can be improved by using a 45Ni-55Fe (wt%) alloy plating film of about 1.5T. Further, by using a CoTaZr amorphous alloy sputtered film having a high specific resistance for the central magnetic pole instead of the 83Ni-17Fe alloy plated film, high frequency characteristics are improved,
It is considered that the NLTS characteristics can be improved. However, there are the following problems in providing a thin-film magnetic head with improved O / W and NLTS for high frequency and high density recording.

【0010】すなわち、極めて高い飽和磁束密度Bsを
有する磁性材料は比抵抗ρが低く、比抵抗が高い材料は
飽和磁束密度が十分に高くないという問題があった。以
下、Bsが高い状態を高Bsと略記し、ρが高い状態を
高ρと略記する。従来の薄膜磁気ヘッドでは、基本的に
上部磁極が記録トラック幅を規定するために約3μm以
下の非常に狭い寸法に形成する必要があり、このような
形状の磁極を精度よく形成する方法としてはメッキ法が
適している。しかしながら、比抵抗が高い材料は、主に
スパッタリング法で形成される材料であり、従来記録磁
極に用いている、メッキ法により形成出来る磁性材料で
十分に比抵抗が高い材料がないという問題があった。
That is, there is a problem that a magnetic material having an extremely high saturation magnetic flux density Bs has a low specific resistance ρ, and a material having a high specific resistance does not have a sufficiently high saturation magnetic flux density. Hereinafter, a state in which Bs is high is abbreviated as high Bs, and a state in which ρ is high is abbreviated as high ρ. In a conventional thin-film magnetic head, the upper magnetic pole basically needs to be formed in a very narrow dimension of about 3 μm or less in order to define the recording track width. A method for accurately forming a magnetic pole having such a shape is as follows. A plating method is suitable. However, a material having a high specific resistance is mainly a material formed by a sputtering method, and there is a problem that there is no magnetic material having a sufficiently high specific resistance, which is conventionally used for a recording magnetic pole and can be formed by a plating method. Was.

【0011】[0011]

【課題を解決するための手段】本発明は、上記のような
問題を解決し、高密度、高周波記録を実現するために薄
膜磁気ヘッドのO/WおよびNLTSを改善することを
目的としたものである。
SUMMARY OF THE INVENTION It is an object of the present invention to solve the above-mentioned problems and to improve the O / W and NLTS of a thin-film magnetic head in order to realize high-density, high-frequency recording. It is.

【0012】本発明は、後部で磁気的に接続された膜状
の中部磁極と上部磁極との先端に記録ギャップが設けら
れ、後部の周囲にはコイル層が設けられており、該中部
磁極の反記録ギャップ側にはMR素子と下部磁極を備え
ている磁気ヘッドであって、該上部磁極は互いに接合さ
れた上部前部磁極と上部後部磁極からなり、該上部前部
磁極は先端で記録ギャップに対向し且つBsを1.4〜
2.2Tの範囲内とする軟磁性膜であり、該上部後部磁
極は後部で中部磁極と磁気的に接続され、該上部後部磁
極および中部磁極は80μΩcm以上の比抵抗を有する
軟磁性膜であることを特徴とする磁気抵抗効果型薄膜磁
気ヘッドである。中部磁極のρの値は大きいほど良い
が、80〜1500μΩcm程度が挙げられる。また、
好ましくはρが80〜750μΩcm程度、さらに好ま
しくはρが80〜150μΩcm程度の範囲とすること
が可能である。また、中部磁極の材料としてはCo系非
晶質合金が好ましく、CoNbZr、CoTaZrなど
を選択できる。
According to the present invention, a recording gap is provided at an end of a film-shaped middle magnetic pole and an upper magnetic pole magnetically connected at a rear portion, and a coil layer is provided around the rear portion. A magnetic head having an MR element and a lower magnetic pole on the anti-recording gap side, wherein the upper magnetic pole comprises an upper front magnetic pole and an upper rear magnetic pole joined to each other, and the upper front magnetic pole has a recording gap at a front end. And Bs is 1.4 to
A soft magnetic film having a specific resistance of 80 μΩcm or more, wherein the upper rear magnetic pole is magnetically connected to the middle magnetic pole at the rear. This is a magnetoresistive thin-film magnetic head. The larger the value of ρ of the central magnetic pole is, the better, but about 80 to 1500 μΩcm. Also,
Preferably, ρ is in the range of about 80 to 750 μΩcm, and more preferably, ρ is in the range of about 80 to 150 μΩcm. As the material of the central magnetic pole, a Co-based amorphous alloy is preferable, and CoNbZr, CoTaZr, or the like can be selected.

【0013】本発明のMR複合ヘッドでは、該上部前部
磁極をメッキ膜にして、該上部後部磁極をスパッタ膜に
することができる。さらに、記録トラック幅を規定する
上部磁極の浮上面近傍部には、Bsが1.4T以上のメ
ッキ膜を使用することが好ましい。一方で、上部磁極の
その他の部分、および中部磁極には、ρおよび透磁率の
高いスパッタ膜を使用するとよい。
In the MR combined head of the present invention, the upper front magnetic pole can be a plating film and the upper rear magnetic pole can be a sputtered film. Further, it is preferable to use a plating film having Bs of 1.4 T or more in the vicinity of the air bearing surface of the upper magnetic pole that defines the recording track width. On the other hand, it is preferable to use a sputtered film having a high ρ and magnetic permeability for the other portions of the upper magnetic pole and the middle magnetic pole.

【0014】また、本発明のMR複合ヘッドでは、該上
部前部磁極と該上部後部磁極を接合した領域で、該上部
前部磁極と該上部後部磁極の少なくとも一方の厚さを漸
減させた磁気ヘッドとすることができる。このように接
合領域を形成することで、上部前部磁極と上部後部磁極
の接合領域から漏洩する磁束を低減することができる。
この構造の例としては2通りの構造が挙げられる。第1
の構造は、上部前部磁極の端部の厚さを漸減させて傾斜
面を設け、この傾斜面の上に上部後部磁極を積層する構
造である。第2の構造は、上部後部磁極の端部の厚さを
漸減させて傾斜面を設けて、この傾斜面の上に上部前部
磁極を積層する構造である。傾斜面での密着性を向上す
るには傾斜面の角度を15°から45°程度にするとよ
い。さらに、磁気特性も向上するには傾斜面の角度を2
0°から30°程度にすることが好ましい。
In the MR composite head of the present invention, the thickness of at least one of the upper front magnetic pole and the upper rear magnetic pole is gradually reduced in a region where the upper front magnetic pole and the upper rear magnetic pole are joined. It can be a head. By forming the joining region in this way, the magnetic flux leaking from the joining region between the upper front magnetic pole and the upper rear magnetic pole can be reduced.
Examples of this structure include two types of structures. First
Is a structure in which an inclined surface is provided by gradually reducing the thickness of the end of the upper front magnetic pole, and the upper rear magnetic pole is laminated on the inclined surface. The second structure is a structure in which an inclined surface is provided by gradually reducing the thickness of the end of the upper rear magnetic pole, and the upper front magnetic pole is laminated on the inclined surface. In order to improve the adhesion on the inclined surface, the angle of the inclined surface is preferably set to about 15 ° to 45 °. Further, in order to improve the magnetic characteristics, the angle of the inclined surface is set to 2
It is preferable to set the angle to about 0 ° to 30 °.

【0015】また、本発明のMR複合ヘッドでは、上部
磁極のメッキ膜の記録ギャップに近い部分を、メッキ膜
と同等もしくはこれ以上にBsの高いスパッタ膜で構成
してもよい。さらに、中部磁極と記録ギャップの間に軟
磁性膜を配置して、この軟磁性膜をBsの高いスパッタ
膜またはメッキ膜で構成してもよい。
Further, in the MR composite head of the present invention, the portion of the upper magnetic pole plating film close to the recording gap may be made of a sputtering film having a Bs higher than or equal to the plating film. Further, a soft magnetic film may be disposed between the middle magnetic pole and the recording gap, and the soft magnetic film may be formed of a sputtered film or a plated film having a high Bs.

【0016】また、本発明のMR複合ヘッドでは、該上
部前部磁極は、記録ギャップに接した下地膜と、下地膜
に積層したメッキ膜を有し、この下地膜のBsが該メッ
キ膜のBsより大きい薄膜磁気ヘッドにすることができ
る。また、該中部磁極と記録ギャップの間に中部磁極上
層膜を設け、この中部磁極上層膜のBsが該中部磁極の
Bsより大きいことを特徴とする薄膜磁気ヘッドとする
こともできる。
Further, in the MR composite head of the present invention, the upper front magnetic pole has a base film in contact with the recording gap and a plating film laminated on the base film, and Bs of the base film is the plating film. A thin film magnetic head larger than Bs can be obtained. Further, a thin film magnetic head may be provided in which a middle magnetic pole upper layer film is provided between the middle magnetic pole and the recording gap, and Bs of the middle magnetic pole upper layer film is larger than Bs of the middle magnetic pole.

【0017】また、本発明のMR複合ヘッドでは、該上
部前部磁極の下地膜、中部磁極と記録ギャップの間に設
けた軟磁性膜または中部磁極上層膜としてFeC系合金
膜とNiFe系合金膜からなる多層スパッタ膜を用いた
薄膜磁気ヘッドとすることができる。ここで、FeC系
合金膜としては、FeCを主体として残部がCr等の添
加物である膜、またはFeC膜を用いる。また、NiF
e系合金膜としては、NiFeを主体として残部がCr
等の添加物である膜、またはNiFe膜を用いる。さら
に、FeC合金膜とNiFe合金膜を交互に積層したF
e−C/Ni−Fe多層スパッタ膜としてもよい。
Further, in the MR composite head of the present invention, an FeC alloy film and a NiFe alloy film are used as a base film of the upper front magnetic pole, a soft magnetic film provided between the middle magnetic pole and the recording gap, or an upper magnetic film of the middle magnetic pole. A thin film magnetic head using a multilayer sputtered film made of Here, as the FeC-based alloy film, a film mainly composed of FeC and the remainder being an additive such as Cr or an FeC film is used. Also, NiF
The e-based alloy film is mainly composed of NiFe and the remainder is Cr.
And the like, or a NiFe film. Further, F is obtained by alternately stacking FeC alloy films and NiFe alloy films.
An e-C / Ni-Fe multilayer sputtered film may be used.

【0018】また、本発明のMR複合ヘッドでは、該上
部前部磁極は、記録ギャップに接した下地膜と、下地膜
に積層したメッキ膜を有し、該下地膜のBsが該メッキ
膜のBsより大きく、該中部磁極と記録ギャップの間に
中部磁極上層膜を設け、該中部磁極上層膜のBsが該中
部磁極のBsより大きい薄膜磁気ヘッドとすることがで
きる。
Further, in the MR composite head of the present invention, the upper front magnetic pole has a base film in contact with the recording gap and a plating film laminated on the base film, and Bs of the base film is the plating film. A middle magnetic pole upper layer film is provided between the middle magnetic pole and the recording gap, and the Bs of the middle magnetic pole upper layer film is larger than the Bs of the middle magnetic pole.

【0019】また、本発明のMR複合ヘッドでは、上部
磁極に用いる高Bsメッキ膜としては、Bsが約1.4
Tから1.8T程度で、Ni組成が40から48wt%
のNi−Fe系合金メッキ膜を用いることができる。あ
るいは、Bsが約1.4Tから1.8T程度のCo−F
e−Ni合金メッキ膜を用いることが出来る。また、上
記Ni−Fe系合金メッキ膜またはCo−Fe−Ni系
合金メッキ膜を作成する際に、Feの比率を上げること
で、Bsを2.0Tから2.2T程度に向上させること
ができる。
Further, in the MR composite head of the present invention, the high Bs plating film used for the upper magnetic pole has Bs of about 1.4.
From T to 1.8T, Ni composition is 40 to 48wt%
Can be used. Alternatively, Co-F with Bs of about 1.4T to about 1.8T
An e-Ni alloy plating film can be used. In addition, when the Ni—Fe-based alloy plating film or the Co—Fe—Ni-based alloy plating film is formed, Bs can be improved from 2.0 T to about 2.2 T by increasing the ratio of Fe. .

【0020】また、本発明のMR複合ヘッドでは、上部
後部磁極あるいは中部磁極に用いる高ρのスパッタ膜と
して、例えばCo系非晶質合金スパッタ膜を用いること
が出来る。これらの膜は組成を選択することにより、
0.8Tから1.5TのBsを持ち、80から150μ
Ωcmの高いρを示す。また、Fe−Hf−N、Fe−
Ta−C等のFe系微結晶材料で構成された膜を用いる
ことができる。さらに、Fe−Al−O系、Co−Al
−N系など1000〜1400μΩcmの範囲の材料で
構成された高ρスパッタ膜を使用することが出来る。
In the MR composite head of the present invention, for example, a Co-based amorphous alloy sputtered film can be used as the high ρ sputtered film used for the upper rear magnetic pole or the middle magnetic pole. By selecting the composition of these films,
With 0.8T to 1.5T Bs, 80 to 150μ
It shows a high ρ of Ωcm. In addition, Fe-Hf-N, Fe-
A film made of an Fe-based microcrystalline material such as Ta-C can be used. Furthermore, Fe-Al-O-based, Co-Al
A high ρ sputtered film made of a material in the range of 1000 to 1400 μΩcm, such as an -N type, can be used.

【0021】また、本発明のMR複合ヘッドでは、上部
前部磁極あるいは中部磁極の記録ギャップ近傍に使用す
る高Bsスパッタ膜としては、Fe−Hf−N、Fe−
Ta−C等のFe系微結晶材料で構成された膜、Fe−
N系スパッタ膜、Fe−C系スパッタ膜などが好まし
い。さらに、高Bsスパッタ膜は、Fe−N系スパッタ
膜あるいはFe−C系スパッタ膜などの主磁性膜と、N
i−FeあるいはTa等の中間膜を積層した多層膜で構
成することが出来る。
In the MR composite head of the present invention, the high Bs sputtered film used in the vicinity of the recording gap of the upper front magnetic pole or the middle magnetic pole is made of Fe-Hf-N, Fe-Hf-N or Fe-Hf-N.
A film composed of an Fe-based microcrystalline material such as Ta-C;
N-based sputtered films, Fe-C-based sputtered films, and the like are preferable. Further, the high Bs sputtered film includes a main magnetic film such as an Fe—N based sputtered film or an Fe—C based sputtered film,
It can be composed of a multilayer film in which an intermediate film such as i-Fe or Ta is laminated.

【0022】また、本発明のMR複合ヘッドでは、該上
部後部磁極と該中部磁極の間に、該上部前部磁極と同じ
組成の上部後部補助磁極を有する薄膜磁気ヘッドとする
ことができる。ここで上部後部補助磁極は、上部前部磁
極を形成する際に同時に設けた磁極の一部分であって、
上部後部磁極と該中部磁極を磁気回路で接続する。コイ
ルを設けるために生じる段差を上部前部磁極と上部後部
補助磁極で埋めることによって、上部後部磁極を平坦化
することができる。
Further, in the MR composite head of the present invention, a thin film magnetic head having an upper rear auxiliary magnetic pole having the same composition as the upper front magnetic pole between the upper rear magnetic pole and the middle magnetic pole can be provided. Here, the upper rear auxiliary magnetic pole is a part of the magnetic pole provided at the same time as forming the upper front magnetic pole,
The upper rear magnetic pole and the middle magnetic pole are connected by a magnetic circuit. The upper rear magnetic pole can be flattened by filling the step created by providing the coil with the upper front magnetic pole and the upper rear auxiliary magnetic pole.

【0023】本発明のMR複合ヘッドを製造する場合、
基板上に下部磁極と中部磁極の間に絶縁層を介してMR
素子を備えた再生ヘッドを設け、さらに該中部磁極の上
に記録ギャップを構成するギャップ材を設け、該ギャッ
プ材の上に絶縁材で包んだコイルを設け、さらに、該絶
縁材の斜面と浮上面近傍の該ギャップ材の上に上部前部
磁極を設け、浮上面に対向しない側の該上部前部磁極の
端部をエッチングすることにより傾斜面を設け、該傾斜
面と該絶縁材の上に上部後部磁極を設けるとともに、該
傾斜面と該上部後部磁極の端部を接合し、最上層にこれ
らを保護する保護膜を形成して素子部分を仕上げること
ができる。
When manufacturing the MR composite head of the present invention,
MR on the substrate between the lower magnetic pole and the middle magnetic pole via an insulating layer
A reproducing head having an element is provided, a gap material constituting a recording gap is provided on the middle magnetic pole, a coil wrapped with an insulating material is provided on the gap material, and a slope and a floating surface of the insulating material are provided. An upper front magnetic pole is provided on the gap material near the surface, and an inclined surface is provided by etching an end of the upper front magnetic pole on a side not facing the air bearing surface. In addition, an upper rear magnetic pole is provided, and the inclined surface and the end of the upper rear magnetic pole are joined to each other, and a protective film for protecting these is formed on the uppermost layer to finish the element portion.

【0024】また、本発明のMR複合ヘッドを製造する
場合、基板上に下部磁極と中部磁極の間に絶縁層を介し
てMR素子を備え、該中部磁極の上に記録ギャップを構
成するギャップ材を設け、該ギャップ材の上に絶縁材で
包んだコイルを設け、さらに、絶縁材の上に上部後部磁
極を形成した後、上部後部磁極の浮上面側の端部をエッ
チングすることにより傾斜面を設け、該傾斜面と該絶縁
材と該ギャップ材の上に上部前部磁極を設けるととも
に、該傾斜面と該上部前部磁極の端部を接合し、最上層
にこれらを保護する保護膜を形成して素子部分を仕上げ
ることができる。上述したエッチングは、イオンミリン
グのような物理的な方法または酸液等を用いた化学的な
方法のいづれの方法でもよい。
In the case of manufacturing the MR composite head of the present invention, an MR element is provided on a substrate between a lower magnetic pole and a middle magnetic pole via an insulating layer, and a gap material for forming a recording gap on the middle magnetic pole is provided. And a coil wrapped with an insulating material is provided on the gap material. Further, an upper rear magnetic pole is formed on the insulating material, and then the end of the upper rear magnetic pole on the air bearing surface side is etched to form a slope. A protective film for providing an upper front magnetic pole on the inclined surface, the insulating material, and the gap material, joining the inclined surface and an end of the upper front magnetic pole, and protecting them on the uppermost layer Can be formed to finish the element portion. The above-described etching may be any of a physical method such as ion milling or a chemical method using an acid solution or the like.

【0025】(作用)本発明のMR複合ヘッドでは、上
記のように、記録トラック幅を規定する上部前部磁極の
浮上面近傍部に、Bsが1.4T以上のメッキ膜を使用
する。Bsを1.4T以上とすることにより、磁気飽和
の問題を解決し、O/W特性を大幅に改善することが出
来る。また、記録トラック幅を規定する浮上面近傍の上
部前部磁極にメッキ膜を使用することにより、3μm以
下の狭トラック幅を高い生産性で作製することができ
る。
(Function) In the MR composite head of the present invention, as described above, a plating film having a Bs of 1.4 T or more is used in the vicinity of the air bearing surface of the upper front magnetic pole that defines the recording track width. By setting Bs to 1.4 T or more, the problem of magnetic saturation can be solved and O / W characteristics can be greatly improved. Also, by using a plating film for the upper front magnetic pole near the air bearing surface that defines the recording track width, a narrow track width of 3 μm or less can be manufactured with high productivity.

【0026】また、浮上面近傍以外の上部後部磁極およ
び中部磁極を高比抵抗を有するスパッタ膜で形成するこ
とにより、高周波特性を改善し、NLTS特性を向上す
ることができる。また、上部前部磁極あるいは中部磁極
もしくはその双方の記録ギャップ近傍側に、上部前部磁
極あるいは中部磁極材料よりBsの高いスパッタ膜を形
成することによって、さらに高保磁力の媒体に対してO
/Wを向上してNLTSを改善することが出来る。
Further, by forming the upper rear magnetic pole and the middle magnetic pole other than the vicinity of the air bearing surface with a sputtered film having a high specific resistance, high frequency characteristics can be improved and NLTS characteristics can be improved. Further, by forming a sputtered film having a higher Bs than the material of the upper front magnetic pole or the middle magnetic pole near the recording gap of the upper front magnetic pole or the middle magnetic pole or both of them, it is possible to reduce the O.S.
/ W can be improved to improve NLTS.

【0027】[0027]

【発明の実施の形態】以下、本発明を実施例により詳細
に説明する。図1に、本発明の実施例のMR複合ヘッド
の断面図を示す。本実施例では、浮上面20の近傍以外
の部分の上部後部磁極21、および中部磁極13に高ρ
のスパッタ膜を用い、浮上面近傍の上部前部磁極22に
高Bsのメッキ膜を使用した。なお、図1では記載を省
略したが、上部後部磁極21は図面の右側に延在され、
上部前部磁極のように延曲しながら中部磁極13と接合
するものである。上部後部磁極21と中部磁極13の間
にはギャップ材15を介さずに直接に接合するほうが、
漏洩磁化を抑制できるので望ましい。また、上部前部磁
極22は、上部後部磁極21の傾斜面から上面に乗り上
げているが、この乗り上げの度合いが少ない程、接合部
からの磁界の漏洩がすくなくて済む。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to embodiments. FIG. 1 is a sectional view of an MR composite head according to an embodiment of the present invention. In this embodiment, a high ρ is applied to the upper rear magnetic pole 21 and the middle magnetic pole 13 in portions other than the vicinity of the air bearing surface 20.
And a high Bs plating film was used for the upper front magnetic pole 22 near the air bearing surface. Although not shown in FIG. 1, the upper rear magnetic pole 21 extends to the right side of the drawing.
It joins with the middle magnetic pole 13 while bending like the upper front magnetic pole. It is better to join directly between the upper rear magnetic pole 21 and the middle magnetic pole 13 without using the gap material 15.
This is desirable because leakage magnetization can be suppressed. Further, the upper front magnetic pole 22 rides on the upper surface from the inclined surface of the upper rear magnetic pole 21, but the less the degree of the climb, the less the magnetic field leaks from the joint.

【0028】図2に、本発明の他の実施例のMR複合ヘ
ッドの断面図を示す。本実施例では、図1の実施例と同
様に、中部磁極13、および浮上面20の近傍以外の部
分の上部後部磁極21に高ρのスパッタ膜を用い、浮上
面近傍の上部前部磁極22に高Bsのメッキ膜を使用し
た。メッキ膜である前記上部前部磁極22は、前記メッ
キ膜よりもBsの大きいスパッタ膜である下地膜23の
上に形成した。
FIG. 2 is a sectional view of an MR composite head according to another embodiment of the present invention. In this embodiment, similarly to the embodiment of FIG. 1, a high ρ sputtered film is used for the middle magnetic pole 13 and the upper rear magnetic pole 21 in a portion other than the vicinity of the air bearing surface 20, and the upper front magnetic pole 22 near the air bearing surface is used. A high Bs plating film was used. The upper front magnetic pole 22, which is a plated film, was formed on a base film 23, which was a sputtered film having a larger Bs than the plated film.

【0029】図3に、本発明の実施例の一つであるMR
複合ヘッドの断面図を示す。本実施例では、図2と同様
に、中部磁極13、および浮上面20の近傍以外の部分
の上部後部磁極21に高ρのスパッタ膜を用い、浮上面
近傍の上部前部磁極22に高Bsのメッキ膜を使用し、
前記上部前部磁極22であるメッキ膜の下部に、前記メ
ッキ膜よりもBsの大きいスパッタ膜である下地膜23
を形成した。さらに、中部磁極膜13の記録ギャップ側
(ギャップ材15の側)に、中部磁極膜13よりBsの
高いメッキ膜またはスパッタ膜の中部磁極上層膜24を
配置した。図3の形態において、下地膜23を用いない
場合、または下地膜23のBsが上部前部磁極のBs以
下である場合には、ほぼ図2の形態と同程度にNLTS
とO/W特性が改善される。しかし、図3の形態ほどに
は向上しない。
FIG. 3 shows an MR according to an embodiment of the present invention.
FIG. 2 shows a cross-sectional view of the composite head. In this embodiment, similarly to FIG. 2, a high ρ sputtered film is used for the middle magnetic pole 13 and the upper rear magnetic pole 21 other than the vicinity of the air bearing surface 20, and the high Bs is applied to the upper front magnetic pole 22 near the air bearing surface. Using a plating film of
Under the plating film that is the upper front magnetic pole 22, a base film 23 that is a sputtered film having a larger Bs than the plating film.
Was formed. Further, on the recording gap side of the middle pole film 13 (on the side of the gap member 15), a middle pole upper layer film 24 having a higher Bs than the middle pole film 13 or a sputtered film was disposed. In the embodiment of FIG. 3, when the base film 23 is not used, or when the Bs of the base film 23 is equal to or less than the Bs of the upper front magnetic pole, the NLTS is almost the same as the embodiment of FIG.
And O / W characteristics are improved. However, it is not improved as much as the embodiment of FIG.

【0030】図4に、本発明の実施例の一つであるMR
複合ヘッドの断面図を示す。本実施例では、中部磁極1
3、および浮上面20の近傍以外の部分の上部後部磁極
21に高ρのスパッタ膜を用い、浮上面近傍の上部前部
磁極22に高Bsのメッキ膜を使用した。上部前部磁極
22の浮上面に対向しない側の端部には、先端の角度が
約30°の傾斜面を設けて、上部前部磁極の厚さを漸減
した。この傾斜面の上に上部後部磁極21を直接に接合
することで、接合部における磁界漏洩を抑制できる。記
録磁界の漏洩を最も効果的に抑制するには、図4のよう
に傾斜面同士を接合する形態が望ましい。
FIG. 4 shows an MR according to an embodiment of the present invention.
FIG. 2 shows a cross-sectional view of the composite head. In this embodiment, the central magnetic pole 1
3, and a high ρ sputtered film was used for the upper rear magnetic pole 21 in a portion other than the vicinity of the air bearing surface 20, and a high Bs plating film was used for the upper front magnetic pole 22 near the air bearing surface. At the end of the upper front magnetic pole 22 not facing the air bearing surface, an inclined surface having a tip angle of about 30 ° was provided to gradually reduce the thickness of the upper front magnetic pole. By directly joining the upper rear magnetic pole 21 on the inclined surface, magnetic field leakage at the joint can be suppressed. In order to most effectively suppress the leakage of the recording magnetic field, it is desirable that the inclined surfaces be joined to each other as shown in FIG.

【0031】図5に、本発明の実施例の一つであるMR
複合ヘッドの断面図を示す。本実施例では、中部磁極1
3、および上部後部磁極21に高ρのスパッタ膜を用
い、上部前部磁極22と上部後部補助磁極25に高Bs
のメッキ膜を使用した。また、このメッキ膜よりBsの
大きい下地膜23と26を、それぞれ上部前部磁極22
と上部後部補助磁極25の下に設けた。ここで、上部後
部補助磁極25は上部前部磁極22を形成する際に同時
に設けた部分であって、上部後部磁極と該中部磁極を磁
気回路的に接続する。コイル16と絶縁材17を設ける
ために生じる段差を上部前部磁極22と上部後部補助磁
極25で埋めることによって、上部後部磁極21を平坦
化することができる。なお、図5では、上部後部補助磁
極25と中部磁極13の間にまでギャップ材15を延在
させているが、ギャップ材をこの領域でのみ取り除い
て、上部後部補助磁極25と中部磁極13を直接に接合
するほうが、漏洩磁界を低減できる。
FIG. 5 shows an MR according to an embodiment of the present invention.
FIG. 2 shows a cross-sectional view of the composite head. In this embodiment, the central magnetic pole 1
3 and a high ρ sputtered film is used for the upper rear magnetic pole 21, and a high Bs is used for the upper front magnetic pole 22 and the upper rear auxiliary magnetic pole 25.
Was used. Further, the undercoat films 23 and 26 having Bs larger than the plating film are formed on the upper front magnetic pole 22 respectively.
And below the upper rear auxiliary magnetic pole 25. Here, the upper rear auxiliary magnetic pole 25 is a portion provided at the same time when the upper front magnetic pole 22 is formed, and connects the upper rear magnetic pole and the middle magnetic pole in a magnetic circuit. The upper rear magnetic pole 21 can be flattened by filling the step created by providing the coil 16 and the insulating material 17 with the upper front magnetic pole 22 and the upper rear auxiliary magnetic pole 25. In FIG. 5, the gap material 15 extends between the upper rear auxiliary magnetic pole 25 and the middle magnetic pole 13. However, the gap material is removed only in this region, and the upper rear auxiliary magnetic pole 25 and the middle magnetic pole 13 are separated. Direct bonding reduces the leakage magnetic field.

【0032】以上に述べた図1から図5は、中部磁極1
3の反記録ギャップ側に、MR素子14と下部磁極11
を備えたMR複合ヘッドである。これらの磁気ヘッドで
は、上部前部磁極と上部後部磁極部の少なくとも一方に
傾斜面を設けて接合しないと、磁極内における磁区の移
動によるノイズが発生し易い。従って、MR素子を設け
る場合には、このノイズが中部磁極からMR素子に伝搬
しないように、傾斜面を介した接合を設けることが望ま
しい。
FIGS. 1 to 5 described above show the middle magnetic pole 1.
3, the MR element 14 and the lower magnetic pole 11
This is an MR composite head provided with: In these magnetic heads, noise is likely to occur due to the movement of magnetic domains in the magnetic poles unless at least one of the upper front magnetic pole and the upper rear magnetic pole is provided with an inclined surface and joined. Therefore, when an MR element is provided, it is desirable to provide a junction via an inclined surface so that this noise does not propagate from the central magnetic pole to the MR element.

【0033】本発明のMR複合ヘッドの製造方法を以下
に記載する。図1に示した実施例では、基板10として
Al2O3−TiCを用い、この上に下部磁極11とな
るCo83Ta12.2Zr4.8(at%)の組成を
有する非晶質合金スパッタ膜をマグネトロンスパッタ装
置を用いて形成した。膜厚は2μmとし、Bsは0.9
T、ρは145μΩcmであった。次に、下部磁極とし
て残すべき部分をレジストで保護し、化学エッチングに
より不要部を除去した。化学エッチングには硝酸、硫酸
コバルトおよびフッ酸の混合液を用いた。化学エッチン
グを行った場合、下部磁極である軟磁性膜の端部は、基
板に対して傾斜するごとくエッチングされる。この軟磁
性膜の端面と基板との傾斜角度は約20°から45°程
度とした。
The method for manufacturing the MR composite head of the present invention will be described below. In the embodiment shown in FIG. 1, Al2O3-TiC is used as the substrate 10, and an amorphous alloy sputtered film having a composition of Co83Ta12.2Zr4.8 (at%) to be the lower magnetic pole 11 is formed thereon by a magnetron sputtering apparatus. Formed. The film thickness is 2 μm, and Bs is 0.9
T and ρ were 145 μΩcm. Next, a portion to be left as the lower magnetic pole was protected with a resist, and an unnecessary portion was removed by chemical etching. For the chemical etching, a mixed solution of nitric acid, cobalt sulfate and hydrofluoric acid was used. When the chemical etching is performed, the edge of the soft magnetic film as the lower magnetic pole is etched so as to be inclined with respect to the substrate. The inclination angle between the end face of the soft magnetic film and the substrate was set to about 20 ° to 45 °.

【0034】次に、再生ギャップとなる絶縁層12およ
びMR素子、電極、バイアス膜などからなる再生素子1
4を形成した。次に、下部磁極と同様の方法でCoTa
Zr非晶質合金スパッタ膜からなる中部磁極13を形成
した。但し、中部磁極では組成をCo88Ta8Zr4
(at%)とし、Bsを1.3Tに向上した膜を用い
た。ρは120μΩcmとし、厚さは3μmとした。次
に、記録ギャップとなる絶縁材15、コイル16、およ
びコイルの絶縁材17を形成した。さらに上部後部磁極
21として、中部磁極と同じ組成のCoTaZr非晶質
合金スパッタ膜をマグネトロンスパッタ装置を用いて形
成し、上記と同様に化学エッチングにより、上部後部磁
極の形状を形成した。厚さは3.5μmとした。このと
き、上部後部磁極21の浮上面側端部は傾斜面となり、
その厚さが漸減した形状が得られた。この傾斜面は、上
部前部磁極22の一部を積層する領域とした。
Next, the insulating layer 12 serving as a reproducing gap and the reproducing element 1 comprising the MR element, the electrode, the bias film, etc.
4 was formed. Next, CoTa is formed in the same manner as the lower magnetic pole.
A central magnetic pole 13 made of a Zr amorphous alloy sputtered film was formed. However, the composition of the middle magnetic pole is Co88Ta8Zr4.
(At%), and a film with Bs improved to 1.3T was used. ρ was 120 μΩcm and the thickness was 3 μm. Next, an insulating material 15, a coil 16, and a coil insulating material 17 to be a recording gap were formed. Further, as the upper rear magnetic pole 21, a CoTaZr amorphous alloy sputtered film having the same composition as the middle magnetic pole was formed using a magnetron sputtering apparatus, and the shape of the upper rear magnetic pole was formed by chemical etching in the same manner as described above. The thickness was 3.5 μm. At this time, the air bearing surface side end of the upper rear magnetic pole 21 becomes an inclined surface,
A shape whose thickness was gradually reduced was obtained. This inclined surface was a region where a part of the upper front magnetic pole 22 was laminated.

【0035】次に、上部前部磁極22として、45Ni
−55Fe(wt%)合金膜をメッキ法により形成し
た。 この膜のBsは1.6T、厚さは3.5μmとし
た。メッキ法では、あらかじめメッキ電流を流すための
下地膜を厚さ0.1μmの45Ni−55Fe合金スパ
ッタ膜で形成し、この上に上部前部磁極の形状の周囲を
囲むが如くフレーム状のレジストを形成し、その後メッ
キ処理を施した。その結果フレーム内部および外部にメ
ッキ膜が形成され、不要な下地膜およびメッキ膜をイオ
ンミリングまたは化学エッチングにより除去することに
より、所望の形状の上部前部磁極を得た。さらに、Al
2O3からなる保護材19を形成し、所定の形状に加工
することによりMR複合ヘッドを作製した。
Next, 45Ni is used as the upper front magnetic pole 22.
A -55Fe (wt%) alloy film was formed by a plating method. The Bs of this film was 1.6 T and the thickness was 3.5 μm. In the plating method, a base film for flowing a plating current is formed in advance by a 45 μm-thick 45Ni-55Fe alloy sputtered film, and a frame-shaped resist is formed thereon so as to surround the periphery of the shape of the upper front magnetic pole. Formed and then plated. As a result, a plating film was formed inside and outside the frame, and an unnecessary underlayer and plating film were removed by ion milling or chemical etching to obtain an upper front magnetic pole having a desired shape. Furthermore, Al
An MR composite head was manufactured by forming a protective material 19 made of 2O3 and processing it into a predetermined shape.

【0036】これに対して、積層する順序と傾斜面を付
ける側を逆にした製造方法として、上部前部磁極を形成
するプロセス、上部前部磁極の浮上面と反対の側の端部
に傾斜面を設けるプロセス、該傾斜面上に上部後部磁極
を接合するプロセスを有するMR複合ヘッドの製造方法
を用いて、図4のような構造としてもよい。即ち、基板
上に、下部磁極と中部磁極の間に絶縁層を介してMR素
子を備えた再生ヘッドを設け、さらに該中部磁極の上に
記録ギャップを構成するギャップ材を設け、該ギャップ
材の上に絶縁材で包んだコイルを設け、さらに、該絶縁
材の斜面と浮上面近傍の該ギャップ材の上に上部前部磁
極を設け、浮上面に対向しない側の該上部前部磁極の端
部をイオンミリングでエッチングすることにより傾斜面
を設け、該傾斜面と該ギャップ材の上に上部後部磁極を
設けるとともに、該傾斜面と該上部後部磁極の端部を接
合する製造方法である。
On the other hand, as a manufacturing method in which the order of lamination and the side on which the inclined surface is provided are reversed, a process of forming an upper front magnetic pole, and a method of forming an inclined front end on an end opposite to the air bearing surface. The structure shown in FIG. 4 may be obtained by using a method of manufacturing an MR composite head having a process of providing a surface and a process of joining an upper rear magnetic pole on the inclined surface. That is, a reproducing head having an MR element is provided on a substrate between a lower magnetic pole and a middle magnetic pole with an insulating layer interposed therebetween, and a gap material for forming a recording gap is further provided on the middle magnetic pole. A coil wrapped with an insulating material is provided thereon, and further, an upper front magnetic pole is provided on the slope of the insulating material and on the gap material near the air bearing surface, and the end of the upper front magnetic pole on the side not facing the air bearing surface A manufacturing method in which an inclined surface is provided by etching a portion by ion milling, an upper rear magnetic pole is provided on the inclined surface and the gap material, and the inclined surface and an end of the upper rear magnetic pole are joined.

【0037】上部後部磁極の端部あるいは上部前部磁極
の端部をイオンミリングでエッチングして傾斜面を形成
するには、上面にフォトレジストのマスクを被覆して端
部をサイドエッチングする方法を用いることができる。
この際、マスクを上層と下層からなる2層構造にして、
上面に接合させた下層のマスクの面積を、上層のマスク
の面積より小さくすると、イオンの回り込み効果で、よ
り滑らかな傾斜面を得ることができる。この傾斜面の先
端部の角度は15゜〜45゜の範囲内とするが、密着力
を最大にするには15゜〜35゜の範囲内とし、さらに
漏洩磁界を抑制するためには25゜〜28゜程度が望ま
しい
To form an inclined surface by etching the end of the upper rear magnetic pole or the end of the upper front magnetic pole by ion milling, a method of covering the upper surface with a photoresist mask and side-etching the end is used. Can be used.
At this time, the mask has a two-layer structure consisting of an upper layer and a lower layer,
When the area of the lower layer mask bonded to the upper surface is smaller than the area of the upper layer mask, a smoother inclined surface can be obtained by the ion sneaking effect. The angle of the tip of the inclined surface is in the range of 15 ° to 45 °, but is in the range of 15 ° to 35 ° to maximize the adhesion, and 25 ° to suppress the leakage magnetic field. ~ 28 ° is desirable

【0038】図2に示した本発明のもう一つの実施例で
ある図6は、前記の上部前部磁極用の下地膜23とし
て、Fe−C/Ni−Fe多層スパッタ膜を使用した。
この膜は、厚さ45nmの90Fe−10C(at%)
スパッタ膜28を、厚さ5nmの83Ni−17Fe
(wt%)合金膜27を介して多層化した膜である。図
6では4層膜としたが、積層回数をさらに多くした場
合、多層膜全体の膜厚は0.5μmとした。この多層膜
は低ρであるが、1.9Tの高いBsを有している。そ
の他の構成および製造方法は図1のMR複合ヘッドと同
様とした。なお、上部前部磁極22のメッキ膜の厚さを
3μmとした。
FIG. 6, which is another embodiment of the present invention shown in FIG. 2, uses an Fe--C / Ni--Fe multilayer sputtered film as the under film 23 for the upper front magnetic pole.
This film is 90Fe-10C (at%) having a thickness of 45 nm.
The sputtered film 28 is made of 5 nm thick 83Ni-17Fe.
(Wt%) This is a multilayered film with the alloy film 27 interposed therebetween. Although a four-layer film is shown in FIG. 6, when the number of laminations is further increased, the thickness of the entire multilayer film is set to 0.5 μm. This multilayer film has a low ρ, but has a high Bs of 1.9T. Other configurations and manufacturing methods were the same as those of the MR composite head of FIG. The thickness of the plating film of the upper front magnetic pole 22 was 3 μm.

【0039】図3に示した本発明のもう一つの実施例で
は、中部磁極とギャップ材の間に中部磁極上層膜24と
して、上記と同様のFe−C/Ni−Fe多層スパッタ
膜を厚さ0.5μmで形成した。中部磁極であるCoT
aZr膜の厚さは2.5μmとした。その他の構成およ
び製造方法は図2のMR複合ヘッドと同様とした。上記
のように作製した本発明のMR複合ヘッドの記録特性を
従来のMR複合ヘッドと比較した結果を次に記載する。
In another embodiment of the present invention shown in FIG. 3, an Fe—C / Ni—Fe multi-layer sputtered film having the same thickness as that described above is formed between the middle magnetic pole and the gap material as the middle magnetic pole upper film 24. Formed at 0.5 μm. CoT, the central magnetic pole
The thickness of the aZr film was 2.5 μm. Other configurations and manufacturing methods were the same as those of the MR composite head of FIG. The results of comparing the recording characteristics of the MR composite head of the present invention produced as described above with those of the conventional MR composite head are described below.

【0040】記録特性の測定には、3.5インチの記録
媒体を用い、5400r.p.m.の回転数で中周およ
び外周での測定を行った。中周での記録密度は175k
FCI、外周での記録密度は160kFCIである。記
録媒体は、保磁力が2.0X10E5A/m(2500
Oe)、浮上量を約45nmとした。O/Wは、LF
(Low Frequency)で記録した時の再生出
力に対する、LFで記録した後HF(High Fre
quency)で記録した時のLFの残留出力の比を測
定した。NLTSは5次高調波抽出法で測定した。中周
のLFは13MHz、HFは65MHz、外周のLFは
16MHz、HFは80MHzである。
For the measurement of recording characteristics, a 3.5-inch recording medium was used, and the recording characteristics were measured at 5400 rpm. p. m. The measurement was performed on the middle circumference and the outer circumference at the rotation speed of. The recording density at the middle circumference is 175k
FCI, the recording density at the outer periphery is 160 kFCI. The recording medium has a coercive force of 2.0 × 10E5 A / m (2500
Oe), the flying height was about 45 nm. O / W is LF
HF (High Frequency) after recording with LF with respect to the reproduction output when recording with (Low Frequency)
The ratio of the residual power of the LF when it was recorded in the frequency range was measured. NLTS was measured by the fifth harmonic extraction method. The middle LF is 13 MHz, the HF is 65 MHz, the outer LF is 16 MHz, and the HF is 80 MHz.

【0041】比較のための従来のMR複合ヘッドとし
て、中部磁極を83Ni−17Fe(wt%)合金メッ
キ膜として上部磁極も83Ni−17Fe(wt%)合
金メッキ膜としたMR複合ヘッド、中部磁極を83Ni
−17Fe(wt%)合金メッキ膜として上部磁極を4
5Ni−55Fe(wt%)合金メッキ膜としたMR複
合ヘッド、および中部磁極をCoTaZr非晶質合金ス
パッタ膜として上部磁極を45Ni−55Fe(wt
%)合金メッキ膜としたMR複合ヘッドを用いた。ま
た、いずれの磁気ヘッドも記録トラック幅2μm、記録
ギャップ長0.3μm、下部磁極膜厚2.5μmの条件と
した。記録電流を30mAとした時の中周および外周で
の記録特性を表1に示す。
As a conventional MR composite head for comparison, an MR composite head having a central magnetic pole made of an 83Ni-17Fe (wt%) alloy plated film and an upper magnetic pole made of an 83Ni-17Fe (wt%) alloy plated film, 83Ni
The upper magnetic pole is 4 as a -17Fe (wt%) alloy plating film.
An MR composite head with a 5Ni-55Fe (wt%) alloy plating film, and a 45Ni-55Fe (wt) upper magnetic pole with a central magnetic pole made of a CoTaZr amorphous alloy sputtered film.
%) An MR composite head having an alloy plating film was used. In addition, the recording track width was 2 μm, the recording gap length was 0.3 μm, and the thickness of the lower magnetic pole was 2.5 μm. Table 1 shows the recording characteristics at the middle and outer circumferences when the recording current was 30 mA.

【0042】[0042]

【表1】 [Table 1]

【0043】表1のように、上部磁極および中部磁極に
83Ni−17Fe(wt%)合金メッキ膜を使用した
比較例1は、O/Wが−30dB以上で大きく、また、
NLTSも30%以上の大きな値となっている。上部磁
極に高Bsを有する45Ni−55Fe(wt%)合金
メッキ膜を用いた比較例2では、O/W特性は向上し、
−30dB以下の値となった。しかし、NLTSが40
%台と大きな値を示した。さらに中部磁極に高ρを有す
るCoTaZr非晶質合金膜を用いた比較例3では、O
/W、NLTS特性ともに向上したが、NLTSがまだ
不十分である。
As shown in Table 1, Comparative Example 1 in which the 83Ni-17Fe (wt%) alloy plating film was used for the upper magnetic pole and the middle magnetic pole had a large O / W of -30 dB or more.
The NLTS is also a large value of 30% or more. In Comparative Example 2 using a 45Ni-55Fe (wt%) alloy plating film having high Bs for the upper magnetic pole, the O / W characteristics were improved,
The value was -30 dB or less. However, NLTS is 40
It showed a large value in the% range. Further, in Comparative Example 3 in which a CoTaZr amorphous alloy film having a high
Although both / W and NLTS characteristics were improved, NLTS was still insufficient.

【0044】上部前部磁極を45Ni−55Fe(wt
%)合金メッキ膜、上部後部磁極をCoTaZr非晶質
合金膜を用いた実施例1では、NLTSが大幅に低減し
た。さらに、上部前部磁極の下地膜にFe−C/Ni−
Fe多層膜を使用した実施例2および中部磁極上層膜に
Fe−C/Ni−Fe多層膜を使用した実施例3では、
O/WおよびNLTS特性がさらに向上し、高記録密
度、高周波記録に好適なMR複合ヘッドが得られた。
The upper front magnetic pole is made of 45Ni-55Fe (wt
%) In Example 1 using an alloy plating film and a CoTaZr amorphous alloy film for the upper rear magnetic pole, the NLTS was significantly reduced. Further, the underlayer of the upper front magnetic pole is made of Fe-C / Ni-
In Example 2 using the Fe multilayer film and Example 3 using the Fe—C / Ni—Fe multilayer film as the upper layer of the middle magnetic pole,
The O / W and NLTS characteristics were further improved, and an MR composite head suitable for high recording density and high frequency recording was obtained.

【0045】実施例1と同じ組成で、上部前部磁極と上
部後部磁極の接合部を図4の構造にした別の実施例で
は、実施例1とほぼ同じO/W、NLTS特性を得るこ
とができた。さらに、接合部から記録磁界が漏洩しない
ため、MR素子の再生出力におけるノイズの大きさは実
施例1より抑制された。
In another embodiment having the same composition as in the first embodiment, and having the structure shown in FIG. 4 for the junction between the upper front magnetic pole and the upper rear magnetic pole, the same O / W and NLTS characteristics as in the first embodiment are obtained. Was completed. Further, since the recording magnetic field did not leak from the joint, the magnitude of noise in the reproduction output of the MR element was suppressed as compared with the first embodiment.

【0046】また、実施例3と同様の組成を図5の構造
に適用した他の実施例では、 NLTS特性が実施例2
と同じ程度であり、 O/W特性は実施例3とほぼ同じ
になった。これは、上部後部補助磁極と中部磁極の間で
記録磁界が漏洩したためと考えられる。
In another embodiment in which the same composition as that of the third embodiment is applied to the structure shown in FIG. 5, the NLTS characteristics are different from those of the second embodiment.
And the O / W characteristics were almost the same as in Example 3. This is probably because the recording magnetic field leaked between the upper rear auxiliary magnetic pole and the middle magnetic pole.

【0047】[0047]

【発明の効果】以上のように、上部前部磁極に高Bsの
軟磁性膜を使用し、上部後部磁極および中部磁極に高ρ
を有する軟磁性膜を使用することにより高記録密度、高
周波条件で優れたO/WおよびNLTS特性を有するM
R複合ヘッドを得ることができた。
As described above, the high Bs soft magnetic film is used for the upper front magnetic pole, and the high ρ is used for the upper rear magnetic pole and the middle magnetic pole.
M having excellent O / W and NLTS characteristics under high recording density and high frequency conditions by using a soft magnetic film having
An R composite head was obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のMR複合ヘッドの断面図。FIG. 1 is a sectional view of an MR composite head according to the present invention.

【図2】本発明のMR複合ヘッドの断面図。FIG. 2 is a cross-sectional view of the MR composite head of the present invention.

【図3】本発明のMR複合ヘッドの断面図。FIG. 3 is a cross-sectional view of the MR compound head of the present invention.

【図4】本発明のMR複合ヘッドの断面図。FIG. 4 is a cross-sectional view of the MR compound head of the present invention.

【図5】本発明のMR複合ヘッドの断面図。FIG. 5 is a cross-sectional view of the MR composite head of the present invention.

【図6】本発明のMR複合ヘッドの断面図。FIG. 6 is a cross-sectional view of the MR compound head of the present invention.

【図7】従来のMR複合ヘッドの断面図。FIG. 7 is a sectional view of a conventional MR compound head.

【図8】従来のMR複合ヘッドの上面図。FIG. 8 is a top view of a conventional MR compound head.

【図9】従来のMR複合ヘッドの正面図。FIG. 9 is a front view of a conventional MR compound head.

【符号の説明】[Explanation of symbols]

10 基板、11 下部磁極、12 絶縁層、13 中
部磁極、14 再生素子、15 ギャップ材、16 コ
イル、17 絶縁材、19 保護材、20 浮上面、2
1 上部後部磁極、22 上部前部磁極、23 下地
膜、24 中部磁極上層膜、25 上部後部補助磁極、
26 下地膜、27 83Ni−17Fe合金膜、28
90Fe−10Cスパッタ膜。
Reference Signs List 10 substrate, 11 lower magnetic pole, 12 insulating layer, 13 middle magnetic pole, 14 reproducing element, 15 gap material, 16 coil, 17 insulating material, 19 protective material, 20 floating surface, 2
1 upper rear magnetic pole, 22 upper front magnetic pole, 23 base film, 24 middle magnetic pole upper layer film, 25 upper rear auxiliary magnetic pole,
26 base film, 2783Ni-17Fe alloy film, 28
90Fe-10C sputtered film.

Claims (11)

【特許請求の範囲】[Claims] 【請求項1】 後部で磁気的に接続された膜状の中部磁
極と上部磁極との先端に記録ギャップが設けられ、後部
の周囲にはコイル層が設けられており、該中部磁極の反
記録ギャップ側にはMR素子と下部磁極を備えている磁
気ヘッドであって、該上部磁極は互いに接合された上部
前部磁極と上部後部磁極からなり、該上部前部磁極は先
端で記録ギャップに対向し且つBsを1.4〜2.2T
の範囲内とする軟磁性膜であり、該上部後部磁極は後部
で中部磁極と磁気的に接続され、該上部後部磁極および
中部磁極は80μΩcm以上の比抵抗を有する軟磁性膜
であることを特徴とする磁気抵抗効果型薄膜磁気ヘッ
ド。
1. A recording gap is provided at an end of a film-shaped middle magnetic pole and an upper magnetic pole magnetically connected at a rear portion, and a coil layer is provided around the rear portion. A magnetic head having an MR element and a lower magnetic pole on a gap side, wherein the upper magnetic pole comprises an upper front magnetic pole and an upper rear magnetic pole joined to each other, and the upper front magnetic pole faces a recording gap at a front end. And Bs is set to 1.4 to 2.2T.
Wherein the upper rear magnetic pole is magnetically connected to the middle magnetic pole at the rear, and the upper rear magnetic pole and the middle magnetic pole are soft magnetic films having a specific resistance of 80 μΩcm or more. Magnetoresistive thin film magnetic head.
【請求項2】 該上部前部磁極と該上部後部磁極を接合
した領域で、該上部前部磁極と該上部後部磁極の少なく
とも一方の厚さが漸減することを特徴とする請求項1に
記載の磁気抵抗効果型薄膜磁気ヘッド。
2. The method according to claim 1, wherein a thickness of at least one of the upper front magnetic pole and the upper rear magnetic pole gradually decreases in a region where the upper front magnetic pole and the upper rear magnetic pole are joined. Magnetoresistive thin film magnetic head.
【請求項3】 該上部前部磁極がメッキ膜であり、該上
部後部磁極がスパッタ膜であることを特徴とする請求項
1または2のいずれかに記載の磁気抵抗効果型薄膜磁気
ヘッド。
3. The magnetoresistive thin film magnetic head according to claim 1, wherein the upper front magnetic pole is a plating film, and the upper rear magnetic pole is a sputtered film.
【請求項4】 該上部前部磁極は、記録ギャップに接し
た下地膜と、下地膜に積層したメッキ膜を有し、該下地
膜のBsが該メッキ膜のBsより大きいことを特徴とす
る請求項1、2または3のいずれかに記載の磁気抵抗効
果型薄膜磁気ヘッド。
4. The upper front magnetic pole has a base film in contact with a recording gap and a plating film laminated on the base film, wherein Bs of the base film is larger than Bs of the plating film. 4. A magnetoresistive thin film magnetic head according to claim 1, 2 or 3.
【請求項5】 該下地膜がFeC系合金膜とNiFe系
合金膜からなる(Fe−C/Ni−Fe)多層スパッタ
膜で構成されることを特徴とする請求項4に記載の磁気
抵抗効果型薄膜磁気ヘッド。
5. The magnetoresistive effect according to claim 4, wherein said underlayer is composed of a (Fe—C / Ni—Fe) multilayer sputtered film composed of an FeC-based alloy film and a NiFe-based alloy film. Type thin film magnetic head.
【請求項6】 該中部磁極と記録ギャップの間に軟磁性
膜を設け、該軟磁性膜のBsが該中部磁極のBsより大
きいことを特徴とする請求項1、2、3、4または5の
いずれかに記載の磁気抵抗効果型薄膜磁気ヘッド。
6. A soft magnetic film is provided between the middle magnetic pole and the recording gap, and Bs of the soft magnetic film is larger than Bs of the middle magnetic pole. A thin film magnetic head according to any one of the above.
【請求項7】 該軟磁性膜がFeC系合金膜とNiFe
系合金膜からなる多層スパッタ膜で構成されることを特
徴とする請求項6に記載の磁気抵抗効果型薄膜磁気ヘッ
ド。
7. The soft magnetic film is made of an FeC alloy film and NiFe.
7. The magnetoresistive thin-film magnetic head according to claim 6, wherein the magnetoresistive thin-film magnetic head is constituted by a multilayer sputtered film made of a system alloy film.
【請求項8】 該上部前部磁極は、記録ギャップに接し
た下地膜と、下地膜に積層したメッキ膜を有し、該下地
膜のBsが該メッキ膜のBsより大きく、該中部磁極と
記録ギャップの間に中部磁極上層膜を設け、該中部磁極
上層膜のBsが該中部磁極のBsより大きいことを特徴
とする請求項1、2または3のいずれかに記載の磁気抵
抗効果型薄膜磁気ヘッド。
8. The upper front magnetic pole has a base film in contact with a recording gap and a plating film laminated on the base film, wherein Bs of the base film is larger than Bs of the plating film. 4. The magnetoresistive thin film according to claim 1, wherein a middle magnetic pole upper layer film is provided between the recording gaps, and Bs of the middle magnetic pole upper layer film is larger than Bs of the middle magnetic pole. Magnetic head.
【請求項9】 該上部後部磁極と該中部磁極の間に、該
上部前部磁極と同じ組成の上部後部補助磁極を有するこ
とを特徴とする請求項1、2、3、4、5、6、7また
は8のいずれかに記載の磁気抵抗効果型薄膜磁気ヘッ
ド。
9. An upper rear auxiliary magnetic pole having the same composition as the upper front magnetic pole is provided between the upper rear magnetic pole and the middle magnetic pole. , 7 or 8.
【請求項10】 基板上に、下部磁極と中部磁極の間に
絶縁層を介してMR素子を備えた再生ヘッドを設け、さ
らに該中部磁極の上に記録ギャップを構成するギャップ
材を設け、該ギャップ材の上に絶縁材で包んだコイルを
設け、さらに、該絶縁材の斜面と浮上面近傍の該ギャッ
プ材の上に上部前部磁極を設け、浮上面に対向しない側
の該上部前部磁極の端部をエッチングすることにより傾
斜面を設け、該傾斜面と該絶縁材の上に上部後部磁極を
設けるとともに、該傾斜面と該上部後部磁極の端部を接
合することを特徴とする磁気抵抗効果型薄膜磁気ヘッド
の製造方法。
10. A reproducing head provided with an MR element between a lower magnetic pole and a middle magnetic pole via an insulating layer on a substrate, and a gap material forming a recording gap is provided on the middle magnetic pole. A coil wrapped with an insulating material is provided on the gap material, and further, an upper front magnetic pole is provided on the slope of the insulating material and on the gap material near the floating surface, and the upper front portion on a side not facing the floating surface. An inclined surface is provided by etching the end of the magnetic pole, an upper rear magnetic pole is provided on the inclined surface and the insulating material, and the inclined surface and an end of the upper rear magnetic pole are joined. A method for manufacturing a magnetoresistive thin-film magnetic head.
【請求項11】 基板上に下部磁極と中部磁極の間に絶
縁層を介してMR素子を備え、該中部磁極の上に記録ギ
ャップを構成するギャップ材を設け、該ギャップ材の上
に絶縁材で包んだコイルを設け、さらに、絶縁材の上に
上部後部磁極を形成した後、上部後部磁極の浮上面側の
端部をエッチングすることにより傾斜面を設け、該傾斜
面と該絶縁材と該ギャップ材の上に上部前部磁極を設け
るとともに、該傾斜面と該上部前部磁極の端部を接合す
ることを特徴とする磁気抵抗効果型薄膜磁気ヘッドの製
造方法。
11. An MR element is provided on a substrate between a lower magnetic pole and a middle magnetic pole via an insulating layer, a gap material forming a recording gap is provided on the middle magnetic pole, and an insulating material is formed on the gap material. After providing the coil wrapped in, furthermore, after forming the upper rear magnetic pole on the insulating material, by etching the end of the upper rear magnetic pole on the floating surface side, to provide an inclined surface, the inclined surface and the insulating material A method for manufacturing a magnetoresistive thin-film magnetic head, comprising: providing an upper front magnetic pole on the gap material; and joining the inclined surface and an end of the upper front magnetic pole.
JP36011897A 1997-12-26 1997-12-26 Magnetoresistive thin film magnetic head and production thereof Withdrawn JPH11195206A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP36011897A JPH11195206A (en) 1997-12-26 1997-12-26 Magnetoresistive thin film magnetic head and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP36011897A JPH11195206A (en) 1997-12-26 1997-12-26 Magnetoresistive thin film magnetic head and production thereof

Publications (1)

Publication Number Publication Date
JPH11195206A true JPH11195206A (en) 1999-07-21

Family

ID=18467985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP36011897A Withdrawn JPH11195206A (en) 1997-12-26 1997-12-26 Magnetoresistive thin film magnetic head and production thereof

Country Status (1)

Country Link
JP (1) JPH11195206A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7589937B2 (en) 2003-08-13 2009-09-15 Hitachi Global Storage Technologies Japan, Ltd. Thin film magnetic head with high Fe alloy plating film and manufacturing method thereof
JP2014175048A (en) * 2013-03-12 2014-09-22 Seagate Technology Llc Gap between magnetic materials
US9761252B2 (en) 2013-03-12 2017-09-12 Seagate Technology Llc Write head having beveled non-magnetic write gap seed layer

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7589937B2 (en) 2003-08-13 2009-09-15 Hitachi Global Storage Technologies Japan, Ltd. Thin film magnetic head with high Fe alloy plating film and manufacturing method thereof
JP2014175048A (en) * 2013-03-12 2014-09-22 Seagate Technology Llc Gap between magnetic materials
US9761252B2 (en) 2013-03-12 2017-09-12 Seagate Technology Llc Write head having beveled non-magnetic write gap seed layer
US9922671B2 (en) 2013-03-12 2018-03-20 Seagate Technology Llc Main pole layer with at least two sacrificial layers and a gap layer

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