JPH1116419A - Electrically conductive paste and manufacture of ceramic multilayer substrate using this - Google Patents
Electrically conductive paste and manufacture of ceramic multilayer substrate using thisInfo
- Publication number
- JPH1116419A JPH1116419A JP16896097A JP16896097A JPH1116419A JP H1116419 A JPH1116419 A JP H1116419A JP 16896097 A JP16896097 A JP 16896097A JP 16896097 A JP16896097 A JP 16896097A JP H1116419 A JPH1116419 A JP H1116419A
- Authority
- JP
- Japan
- Prior art keywords
- conductive paste
- copper
- wiring
- substrate
- atmosphere
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Parts Printed On Printed Circuit Boards (AREA)
- Conductive Materials (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、導電性ペースト及
びこれを用いたセラミックス多層基板の製造方法、具体
的には電子部品を搭載するための多層配線基板として多
く用いられるセラミックス基板及びパッケージの製造に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a conductive paste and a ceramic multilayer substrate using the same, and more particularly, to a method for producing a ceramic substrate and a package which are often used as a multilayer wiring substrate for mounting electronic components. About.
【0002】[0002]
【従来の技術】近年、高集積化されたLSIや各種電子
部品を搭載する多層配線基板において、小型化、高信頼
性等の要求を満たすために基板材料としてセラミックス
が用いられることが多くなっている。中でもアルミナは
強度が強い等の利点を有するため前記基板材料用のセラ
ミックス中に占める割合は大きい。しかし一方、前記ア
ルミナの焼成温度は1550℃前後と非常に高いため、
内層の配線として融点が高いW,Mo等を使用する必要
があるが、これらの金属は電気抵抗が高いという欠点が
あり、それにより形成される配線も電気抵抗が高い。こ
れらの問題により、LSIの動作周波数が著しく上昇し
ている現在、大きな問題となっている。2. Description of the Related Art In recent years, ceramics have been increasingly used as a substrate material in multi-layer wiring boards on which highly integrated LSIs and various electronic components are mounted, in order to satisfy requirements such as miniaturization and high reliability. I have. Among them, alumina has advantages such as high strength, and therefore, the proportion of alumina in the ceramics for the substrate material is large. However, on the other hand, the firing temperature of the alumina is very high, around 1550 ° C.,
It is necessary to use W, Mo or the like having a high melting point as the wiring of the inner layer. However, these metals have a drawback that they have a high electric resistance, and the wiring formed thereby has a high electric resistance. Due to these problems, the operating frequency of the LSI has been remarkably increased.
【0003】そこでそのような問題を解決するための手
段として、Ag,AgPd,Cu,Au等の低融点で電
気抵抗の低い金属導体と、これを内層導体として使用で
きる低い温度で焼成の可能なセラミックス材料の研究開
発が行われた。特に銅系の導体は一般的に低コストであ
り、かつ基板中への導体成分の拡散が少ないなどの利点
があるため種々研究が行われてきた。In order to solve such a problem, a metal conductor having a low melting point and low electric resistance such as Ag, AgPd, Cu, Au, etc., and a metal conductor which can be fired at a low temperature at which the metal conductor can be used as an inner layer conductor are available. Research and development of ceramic materials was conducted. In particular, various studies have been made on copper-based conductors because of their advantages such as low cost and low diffusion of conductor components into the substrate.
【0004】しかしながらアルミナ等の焼結基板上に銅
配線を形成する場合に比べ、グリーンシートとの同時焼
成法によって銅配線を形成するには非常に高度な技術を
要する。通常セラミックスと導体を同時焼成するために
は、セラミックスのグリーンシート上に導体を含んだペ
ーストを印刷し、これを適当な厚みに積層したものを大
気中で加熱することにより、積層体とペースト中に含ま
れる有機物の除去とセラミックスならびに導体の焼結を
行う。この内セラミックス成形体中の有機物を除去する
ためには酸化雰囲気中で加熱することが不可欠である
が、銅を酸化雰囲気中で加熱すると酸化され、低抵抗の
導体を形成することが困難であるため様々な工夫がなさ
れてきた。[0004] However, compared with the case where copper wiring is formed on a sintered substrate of alumina or the like, a very advanced technique is required to form copper wiring by a simultaneous firing method with a green sheet. Usually, to simultaneously fire ceramic and conductor, paste containing conductor is printed on green sheet of ceramics, and this is laminated to an appropriate thickness and heated in the atmosphere, so that the laminate and paste Removal of organic matter and sintering of ceramics and conductors. Heating in an oxidizing atmosphere is indispensable to remove organic substances in the ceramic molded body, but when copper is heated in an oxidizing atmosphere, it is oxidized and it is difficult to form a low-resistance conductor. Various ideas have been devised.
【0005】上記問題を解決するために例えば特公平3
−20914号に開示されている方法では酸化第二銅を
主原料としてペーストを作製し、これによりグリーンシ
ート上にパターン形成する。この多層体を酸化雰囲気中
で加熱して有機物を除去した後、酸化第二銅を還元し、
窒素雰囲気中で焼成する。この方法によれば成形体中の
有機物の除去と銅配線の形成が可能になる。しかし酸化
第二銅を銅に還元する段階で体積収縮が起こるため焼成
体中に緻密な銅配線を形成することが困難であり、配線
が細かかったり、断線する問題があり、特に微細な配線
を形成することができなかった。In order to solve the above problem, for example,
In the method disclosed in JP-A-20914, a paste is prepared using cupric oxide as a main raw material, and thereby a pattern is formed on a green sheet. After heating this multilayer body in an oxidizing atmosphere to remove organic substances, reduce cupric oxide,
Fire in a nitrogen atmosphere. According to this method, it is possible to remove organic substances from the molded body and to form copper wiring. However, since volume shrinkage occurs at the stage of reducing cupric oxide to copper, it is difficult to form a dense copper wiring in the fired body, and there is a problem that the wiring is thin or disconnected, and particularly a fine wiring Could not be formed.
【0006】また、特開平2−267990号によれば
酸化第二銅と銅との重量比が40:60〜95:5の範
囲内にあるペーストによりグリーンシート上にパターン
形成し、多層化したものを窒素と水蒸気からなる中性雰
囲気中で加熱することにより有機物を除去し、その後酸
化銅を還元した後、中性雰囲気中で焼成する方法が開示
されている。この方法によれば酸化第二銅の割合を減ら
すことにより、還元の段階での体積収縮を小さくするこ
とができるため、比較的緻密な配線を形成することがで
きる。しかし、この方法では銅の酸化を抑制するために
中性雰囲気中で有機物を除去する必要がある。そのため
成形体中の有機物の除去が不完全になり低分子の有機物
や炭素等が成形体中に残留するため、セラミックス成形
体の焼結が不完全になりやすく、基板の強度などの諸特
性が低下する問題があった。According to Japanese Patent Application Laid-Open No. 2-267990, a multilayer is formed by forming a pattern on a green sheet with a paste having a weight ratio of cupric oxide to copper in the range of 40:60 to 95: 5. A method is disclosed in which an organic substance is removed by heating the material in a neutral atmosphere composed of nitrogen and water vapor, and thereafter, the copper oxide is reduced and then fired in a neutral atmosphere. According to this method, by reducing the proportion of cupric oxide, the volume shrinkage at the reduction stage can be reduced, so that a relatively dense wiring can be formed. However, in this method, it is necessary to remove organic substances in a neutral atmosphere in order to suppress oxidation of copper. As a result, the removal of organic substances in the compact is incomplete, and low-molecular organic substances and carbon remain in the compact, so that the sintering of the ceramic compact tends to be incomplete, and various characteristics such as the strength of the substrate are reduced. There was a problem of lowering.
【0007】[0007]
【発明が解決しようとする課題】上記問題から明らかな
ように銅を内層化したセラミックス多層体を製造するた
めには、製造過程における配線の膨張・収縮を制御する
ことにより配線の細りや断線のない緻密な導体を形成す
る方法を確立する必要がある。同時に焼成体の強度など
諸特性の低下を防止するために有機物を完全に除去する
必要がある。従って本発明の目的は導電パターンを内部
や表面に形成したセラミックス多層体の製造過程におい
て導電性ペーストの膨張・収縮を制御し、同時に基板中
の有機物を完全に除去することによって、低抵抗かつ緻
密な配線を形成可能な導電性ペーストとこれを用いたセ
ラミックス多層基板の製造方法を提供することにある。As is apparent from the above problem, in order to manufacture a ceramic multilayer body having copper as an inner layer, it is necessary to control the expansion and contraction of the wiring during the manufacturing process to reduce the thinning and disconnection of the wiring. It is necessary to establish a method for forming a dense conductor. At the same time, it is necessary to completely remove the organic matter in order to prevent a reduction in various properties such as the strength of the fired body. Therefore, an object of the present invention is to control the expansion and contraction of the conductive paste in the process of manufacturing a ceramic multilayer body having a conductive pattern formed inside or on the surface, and at the same time to completely remove organic substances in the substrate, thereby achieving low resistance and high density. An object of the present invention is to provide a conductive paste capable of forming a complicated wiring and a method for manufacturing a ceramic multilayer substrate using the same.
【0008】[0008]
【課題を解決するための手段】上記の課題を同時に解決
したセラミックス多層基板を作るためには、導電パター
ンを内部や表面に形成したセラミックス多層体の製造過
程において導電性ペーストの膨張・収縮を制御し、同時
に基板中の有機物を完全に除去することが必要である。
又、これらの材料を同時焼成により一体化でき、なおか
つ平坦化できることが重要である。In order to produce a ceramic multilayer substrate which simultaneously solves the above-mentioned problems, it is necessary to control the expansion and contraction of the conductive paste in the process of manufacturing a ceramic multilayer body having a conductive pattern formed inside or on the surface. At the same time, it is necessary to completely remove organic substances from the substrate.
It is also important that these materials can be integrated by co-firing and that they can be planarized.
【0009】そこで本発明者らは鋭意研究を重ね、銅及
び銅酸化物を加熱した際の膨張、収縮の挙動を種々の雰
囲気下、温度範囲で調査し、これらの材料の組み合わせ
により一般的なセラミックス材料の膨張、収縮挙動に近
づけた結果、以下の材料と焼成プロセスの組み合わせに
おいて上記の目的が達成できることをみいだした。まず
導電性ペーストの原料には主として銅と酸化第一銅を用
い、その割合が90:10〜30:70であるものを用
いる。この導電性ペーストを無機組成物を含むグリーン
シート表面に所定のパターンに形成し、これを必要な枚
数積層する。次いでこの積層体を酸化雰囲気中で加熱す
ることにより有機物を除去し、さらに還元雰囲気中で加
熱することにより配線パターンを還元し、次いで不活性
または還元雰囲気中で焼成することにより平坦で信号の
伝送特性に優れるセラミックス多層基板ができる。Therefore, the present inventors have conducted intensive studies and studied the expansion and shrinkage behavior of copper and copper oxide when heated, under various atmospheres and in various temperature ranges. As a result of approaching the expansion and contraction behavior of ceramic materials, it has been found that the above objects can be achieved with the following combinations of materials and firing processes. First, copper and cuprous oxide are mainly used as raw materials of the conductive paste, and those having a ratio of 90:10 to 30:70 are used. This conductive paste is formed in a predetermined pattern on the surface of the green sheet containing the inorganic composition, and a necessary number of the pastes are laminated. Next, the laminate is heated in an oxidizing atmosphere to remove organic substances, further heated in a reducing atmosphere to reduce the wiring pattern, and then baked in an inert or reducing atmosphere to provide a flat and signal transmission. A ceramic multilayer substrate with excellent characteristics can be obtained.
【0010】[0010]
【発明の実施の形態】請求項1に示すように導電性ペー
ストを主として銅と酸化第一銅としたのは、この2つの
組み合わせにより酸化雰囲気中及び還元雰囲気中で加熱
した場合における膨張や収縮を抑えることができるから
である。すなわち、銅は酸化雰囲気中で加熱すると酸化
され比重が低下するために膨張し、還元雰囲気中で加熱
すると逆に比重が増加するために収縮する。一方、酸化
第一銅は酸化雰囲気中で加熱すると焼結により収縮す
る。又、還元雰囲気中で加熱すると酸化銅から銅に還元
され比重が増加するものの、酸化の段階で緻密になって
いるためにほとんど体積が変化しない。よって銅と酸化
第一銅とを組み合わせることで膨張や収縮を抑え、セラ
ミックス基板に応力がかかることによる割れや亀裂の発
生を抑制することができる。BEST MODE FOR CARRYING OUT THE INVENTION The reason why the conductive paste is mainly made of copper and cuprous oxide as described in claim 1 is that expansion and shrinkage when heated in an oxidizing atmosphere and a reducing atmosphere by a combination of the two. It is because it can suppress. That is, copper is oxidized when heated in an oxidizing atmosphere and expands due to a decrease in specific gravity, and conversely when heated in a reducing atmosphere, contracts due to an increase in specific gravity. On the other hand, cuprous oxide shrinks by sintering when heated in an oxidizing atmosphere. Further, when heated in a reducing atmosphere, copper oxide is reduced to copper to increase the specific gravity, but the volume hardly changes because it is dense at the oxidation stage. Therefore, by combining copper and cuprous oxide, expansion and shrinkage can be suppressed, and generation of cracks and cracks due to stress applied to the ceramic substrate can be suppressed.
【0011】請求項2に示すように導電性ペースト中の
銅と酸化第一銅の割合を90:10〜30:70とした
のは、銅の割合が90%を越えると酸化雰囲気中で加熱
した際の膨張が大きく基板に割れが発生し、また酸化第
一銅の割合が70%を越えると酸化雰囲気中で加熱した
際の収縮が大きく配線に亀裂が発生するためである。請
求項3に示すように焼成の雰囲気を規定したのは、基板
及び配線中に含まれる有機物を除去するためには酸化雰
囲気中で熱処理することが必要であるためで、例えば不
活性雰囲気中や中性雰囲気中で熱処理を行った場合に
は、基板中に有機物やカーボンが残留するために基板の
焼成密度が低下したり基板の曲げ強度が低下したりす
る。又、有機物を除去する過程で酸化した信号配線層を
金属に還元するためには、還元雰囲気中で熱処理する必
要がある。さらに還元した信号配線層を酸化せずに焼結
させるためにはN2やArなどの不活性雰囲気中、もし
くは還元雰囲気中で焼成する必要がある。[0011] The ratio of copper to cuprous oxide in the conductive paste is set to 90:10 to 30:70, because when the copper ratio exceeds 90%, heating is performed in an oxidizing atmosphere. When the ratio of cuprous oxide exceeds 70%, when the substrate is heated in an oxidizing atmosphere, the shrinkage is large and the wiring cracks. The firing atmosphere is defined as described in claim 3 because heat treatment in an oxidizing atmosphere is required to remove organic substances contained in the substrate and the wiring. When the heat treatment is performed in a neutral atmosphere, the organic substance or carbon remains in the substrate, so that the firing density of the substrate decreases or the bending strength of the substrate decreases. In order to reduce the signal wiring layer oxidized in the process of removing organic substances to metal, it is necessary to perform heat treatment in a reducing atmosphere. Further, in order to sinter the reduced signal wiring layer without oxidizing, it is necessary to fire in an inert atmosphere such as N 2 or Ar or in a reducing atmosphere.
【0012】実施例1〜4、比較例1,2 セラミックス基板材料としてアノーサイト結晶化ガラス
55wt%とアルミナ45wt%からグリーンシートを
作製した。ついで市販の銅粉末(平均粒径約2μm)及
び酸化第一銅粉末(平均粒径約3μm)にそれぞれビヒ
クルを30wt%添加・混合し、導電性ペーストを作製
した。この導電性ペーストをグリーンシート表面に所定
のパターンにて印刷した。印刷はスクリーン印刷によっ
て行った。ついでこのグリーンシートを重ね2mmとな
るように積層し、熱プレスにて100℃、100kgf
/cm2の条件で圧着して一体化した。Examples 1 to 4 and Comparative Examples 1 and 2 Green sheets were prepared from 55% by weight of anorthite-crystallized glass and 45% by weight of alumina as ceramic substrate materials. Next, 30 wt% of a vehicle was added to and mixed with a commercially available copper powder (average particle size of about 2 μm) and a cuprous oxide powder (average particle size of about 3 μm) to prepare a conductive paste. This conductive paste was printed on the surface of the green sheet in a predetermined pattern. Printing was performed by screen printing. Then, the green sheets are stacked so as to have a thickness of 2 mm, and are hot-pressed at 100 ° C. and 100 kgf.
/ Cm 2 under pressure.
【0013】その後、大気中600℃で2時間熱処理
し、H2−N2雰囲気中300℃で1時間還元処理し、N
2雰囲気中900℃で30分焼成を行いセラミックス基
板を得た。その結果を表1に示す。本発明で規定した範
囲内である実施例1〜4では配線抵抗が十分に低く、基
板や配線に割れや亀裂の発生がなかった。一方、本発明
の規定範囲外である比較例1〜2では基板や配線に亀裂
が発生した。Thereafter, heat treatment is performed at 600 ° C. for 2 hours in the air, and reduction treatment is performed at 300 ° C. for 1 hour in an H 2 —N 2 atmosphere.
Firing was performed at 900 ° C. for 30 minutes in two atmospheres to obtain a ceramic substrate. Table 1 shows the results. In Examples 1 to 4, which were within the range specified in the present invention, the wiring resistance was sufficiently low, and no cracks or cracks occurred on the substrate or the wiring. On the other hand, in Comparative Examples 1 and 2, which were outside the specified range of the present invention, cracks occurred in the substrate and the wiring.
【0014】[0014]
【表1】 [Table 1]
【0015】実施例5、比較例3〜5 実施例1と同一の方法で導電性ペーストを内層した積層
体を作製し、表2に示す条件で焼成を行った。導電性ペ
ーストにはCu:Cu2O=50:50のものを使用し
た。その結果を表2に示す。本発明の規定する条件で作
製した実施例5では配線の抵抗率が十分低く、基板や配
線に変色が発生しなかった。Example 5 and Comparative Examples 3 to 5 A laminate having an inner layer of a conductive paste was prepared in the same manner as in Example 1, and baked under the conditions shown in Table 2. The conductive paste used was Cu: Cu 2 O = 50: 50. Table 2 shows the results. In Example 5 manufactured under the conditions specified by the present invention, the wiring had sufficiently low resistivity, and no discoloration occurred on the substrate or the wiring.
【0016】一方、本発明で規定する範囲外の条件で作
製した比較例3では、酸化雰囲気中で熱処理しなかった
ために基板中にカーボンが多く残留し、その結果基板が
灰色になり、また配線が変色し抵抗値が高くなった。
又、本発明で規定する範囲外の条件で作製した比較例4
では、還元処理をしなかったため配線が黒色を呈し、か
つ配線が一部剥離した。又、本発明で規定する範囲外の
条件で作製した比較例5では、不活性雰囲気中で焼成し
なかったため配線の酸化により黒色を呈し、かつ配線が
一部剥離した。On the other hand, in Comparative Example 3 fabricated under conditions outside the range specified in the present invention, a large amount of carbon remained in the substrate because the substrate was not heat-treated in an oxidizing atmosphere, and as a result, the substrate became gray and wiring Was discolored and the resistance was increased.
Comparative Example 4 produced under conditions outside the range specified in the present invention.
In No., the wiring was black because the reduction treatment was not performed, and the wiring was partially peeled off. Further, in Comparative Example 5 produced under conditions outside the range specified in the present invention, since firing was not performed in an inert atmosphere, the wiring exhibited a black color due to oxidation, and the wiring was partially peeled.
【0017】[0017]
【表2】 [Table 2]
【0018】[0018]
【発明の効果】本発明により信号伝達速度をLSI等の
高速化に対応できるように導体抵抗の低いCu導体が内
層化でき、また基板の特性が劣化しないため優れた電気
的特性を持つ多層セラミックス基板が得られる。According to the present invention, a Cu conductor having a low conductor resistance can be formed as an inner layer so that the signal transmission speed can be adapted to a high speed of an LSI or the like. A substrate is obtained.
Claims (3)
特徴とする導電性ペースト。1. A conductive paste comprising mainly copper and cuprous oxide.
の割合が90:10〜30:70である請求項1記載の
導電性ペースト。2. The conductive paste according to claim 1, wherein the ratio of copper to cuprous oxide in the conductive paste is 90:10 to 30:70.
として銅と酸化第一銅からなる導電ペーストをもって所
定のパターンを形成し、これを必要な枚数積層した後、
酸化雰囲気中で加熱することにより有機物を除去し、つ
いで還元雰囲気中で加熱することにより配線パターンを
還元し、ついで不活性又は還元雰囲気中で焼成すること
を特徴とする導電性ペーストを用いたセラミックス多層
基板の製造方法。3. A predetermined pattern is formed on a green sheet containing an inorganic composition by using a conductive paste mainly composed of copper and cuprous oxide, and after laminating a required number of such patterns,
Ceramics using a conductive paste characterized by removing organic matter by heating in an oxidizing atmosphere, reducing the wiring pattern by heating in a reducing atmosphere, and then firing in an inert or reducing atmosphere A method for manufacturing a multilayer substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16896097A JPH1116419A (en) | 1997-06-25 | 1997-06-25 | Electrically conductive paste and manufacture of ceramic multilayer substrate using this |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16896097A JPH1116419A (en) | 1997-06-25 | 1997-06-25 | Electrically conductive paste and manufacture of ceramic multilayer substrate using this |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH1116419A true JPH1116419A (en) | 1999-01-22 |
Family
ID=15877757
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16896097A Withdrawn JPH1116419A (en) | 1997-06-25 | 1997-06-25 | Electrically conductive paste and manufacture of ceramic multilayer substrate using this |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH1116419A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11270809B2 (en) | 2017-03-16 | 2022-03-08 | Asahi Kasei Kabushiki Kaisha | Dispersing element, method for manufacturing structure with conductive pattern using the same, and structure with conductive pattern |
US11328835B2 (en) | 2017-03-16 | 2022-05-10 | Asahi Kasei Kabushiki Kaisha | Dispersing element, method for manufacturing structure with conductive pattern using the same, and structure with conductive pattern |
-
1997
- 1997-06-25 JP JP16896097A patent/JPH1116419A/en not_active Withdrawn
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11270809B2 (en) | 2017-03-16 | 2022-03-08 | Asahi Kasei Kabushiki Kaisha | Dispersing element, method for manufacturing structure with conductive pattern using the same, and structure with conductive pattern |
US11328835B2 (en) | 2017-03-16 | 2022-05-10 | Asahi Kasei Kabushiki Kaisha | Dispersing element, method for manufacturing structure with conductive pattern using the same, and structure with conductive pattern |
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