JPH11163483A - Wiring substrate and method for manufacturing the same - Google Patents

Wiring substrate and method for manufacturing the same

Info

Publication number
JPH11163483A
JPH11163483A JP32148697A JP32148697A JPH11163483A JP H11163483 A JPH11163483 A JP H11163483A JP 32148697 A JP32148697 A JP 32148697A JP 32148697 A JP32148697 A JP 32148697A JP H11163483 A JPH11163483 A JP H11163483A
Authority
JP
Japan
Prior art keywords
powder
thermosetting resin
wiring conductor
semiconductor element
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP32148697A
Other languages
Japanese (ja)
Other versions
JP3398316B2 (en
Inventor
Fujito Nakakawaji
藤人 中川路
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP32148697A priority Critical patent/JP3398316B2/en
Publication of JPH11163483A publication Critical patent/JPH11163483A/en
Application granted granted Critical
Publication of JP3398316B2 publication Critical patent/JP3398316B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1515Shape
    • H01L2924/15153Shape the die mounting substrate comprising a recess for hosting the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16195Flat cap [not enclosing an internal cavity]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance

Abstract

PROBLEM TO BE SOLVED: To provide a wiring substrate, wherein unwanted radiation from it is suppressed, harmonics noise is removed effectively, noise is hardly released to an external electric circuit board, and a mounted semiconductor element is driven normally and stably at high speed, for a wiring substrate in which an insulating base body wherein inorganic insulating powder is combined with thermosetting resin is coated with a wiring conductor in which metal powder is combined with the thermosetting resin. SOLUTION: An insulating base body 1 comprising inorganic insulating powder and ferromagnetic powder of 60-95 wt.% and thermosetting resin of 5-40 wt.% is coated with a wiring conductor 2 where metal powder is combined with thermosetting resin. The ferromagnetic powder in the insulating base body 1 absorbs unwanted radiation from the wiring conductor 2 for suppressed harmonics noise, thus a mounted semiconductor element is driven normally and stably at high speed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は半導体素子を収容す
るための半導体素子収納用パッケージや混成集積回路基
板等に用いられる配線基板およびその製造方法に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wiring board used for a semiconductor device housing package for housing a semiconductor element, a hybrid integrated circuit board, and the like, and a method of manufacturing the same.

【0002】[0002]

【従来の技術】従来、配線基板、例えば半導体素子を収
容する半導体素子収納用パッケージに使用される配線基
板は、酸化アルミニウム質焼結体等のセラミックスより
成り、その上面に半導体素子を搭載する搭載部を有する
絶縁基体と、絶縁基体の上面で搭載部または搭載部近傍
から絶縁基体下面にかけて導出されたタングステン・モ
リブデン等の高融点金属メタライズから成る配線導体と
から構成されており、絶縁基体の搭載部に半導体素子を
載置するとともに半導体素子の各電極を絶縁基体の上面
に導出した配線導体に半田バンプやボンディングワイヤ
等の電気的接続手段を介して電気的に接続し、しかる
後、絶縁基体の上面に金属やセラミックス等から成る蓋
体を半導体素子を覆うようにしてガラス・樹脂・ロウ材
等の封止材を介して接合させ、半導体素子を気密に収容
することによって製品としての半導体装置となる。そし
て、配線導体の絶縁基体下面に導出した部位を外部電気
回路基板の配線導体に接続することによって半導体素子
の各電極が外部電気回路基板に電気的に接続されること
となる。
2. Description of the Related Art Conventionally, a wiring board, for example, a wiring board used for a package for housing a semiconductor element for housing a semiconductor element is made of ceramics such as an aluminum oxide sintered body, and a semiconductor element is mounted on an upper surface thereof. And a wiring conductor made of a refractory metal metallization such as tungsten or molybdenum led out from the mounting portion or the vicinity of the mounting portion to the lower surface of the insulating substrate on the upper surface of the insulating substrate. The semiconductor element is mounted on the portion, and each electrode of the semiconductor element is electrically connected to a wiring conductor led out to the upper surface of the insulating base via an electrical connection means such as a solder bump or a bonding wire. A cover made of metal, ceramics, or the like is covered on the top surface of the semiconductor device with a sealing material such as glass, resin, brazing material, etc. It engaged, the semiconductor device as a product by housing the semiconductor element hermetically. Then, by connecting the portion of the wiring conductor extending to the lower surface of the insulating base to the wiring conductor of the external electric circuit board, each electrode of the semiconductor element is electrically connected to the external electric circuit board.

【0003】この従来の配線基板は、セラミックグリー
ンシート積層法によって製作され、具体的には、酸化ア
ルミニウム・酸化珪素・酸化マグネシウム・酸化カルシ
ウム等のセラミック原料粉末に適当な有機バインダや溶
剤等を添加混合して泥漿状となすとともにこれを従来周
知のドクターブレード法を採用してシート状とすること
によって複数のセラミックグリーンシートを得、しかる
後、これらのセラミックグリーンシートに適当な打ち抜
き加工を施すとともに配線導体となる金属ペーストを所
定パターンに印刷塗布し、最後にこれらのセラミックグ
リーンシートを所定の順に上下に積層して生セラミック
成形体となすとともにこれを還元雰囲気中約1600℃の高
温で焼成することによって製作される。
[0003] This conventional wiring board is manufactured by a ceramic green sheet laminating method. Specifically, an appropriate organic binder or solvent is added to a ceramic raw material powder such as aluminum oxide, silicon oxide, magnesium oxide or calcium oxide. A plurality of ceramic green sheets are obtained by mixing and forming a slurry into a sheet shape by employing a well-known doctor blade method, and thereafter, these ceramic green sheets are subjected to an appropriate punching process. A metal paste to be a wiring conductor is printed and applied in a predetermined pattern, and finally, these ceramic green sheets are stacked up and down in a predetermined order to form a green ceramic molded body and fired at a high temperature of about 1600 ° C. in a reducing atmosphere. Produced by

【0004】しかしながら、この従来の配線基板は、絶
縁基体を構成する酸化アルミニウム質焼結体等のセラミ
ックスが硬くて脆い性質を有するため、搬送工程や半導
体装置製作の自動ライン等において配線基板同士が、あ
るいは配線基板と半導体装置製作自動ラインの一部とが
激しく衝突すると絶縁基体に欠けや割れ・クラック等が
発生し、その結果、半導体素子を気密に収容することが
できず、半導体素子を長期間にわたり正常かつ安定に作
動させることができなくなるという欠点を有していた。
However, in the conventional wiring board, since ceramics such as an aluminum oxide sintered body constituting the insulating base have a hard and brittle property, the wiring boards are not connected to each other in a transfer process or an automatic line for manufacturing semiconductor devices. If the wiring board and a part of the automatic semiconductor device manufacturing line collide violently, the insulating substrate may be chipped, cracked, cracked, etc., and as a result, the semiconductor element cannot be housed in a gas-tight manner, and the length of the semiconductor element cannot be increased. There was a disadvantage that normal and stable operation could not be achieved over a period of time.

【0005】また、この従来の配線基板の製造方法によ
れば、生セラミック成形体を焼成する際、生セラミック
成形体に不均一な焼成収縮が発生し、得られる配線基板
に反り等の変形や寸法のばらつきが発生し、その結果、
半導体素子と配線導体とを電気的に正確かつ確実に接続
することが困難であるという欠点を有していた。
Further, according to this conventional method for manufacturing a wiring board, when the green ceramic molded body is fired, uneven firing shrinkage occurs in the green ceramic molded body, and the resulting wiring board has deformation such as warpage. Dimensional variations occur, and as a result,
There is a disadvantage that it is difficult to electrically and accurately connect the semiconductor element and the wiring conductor with each other.

【0006】そこで、配線基板の絶縁基体を従来のセラ
ミックスに代えて無機絶縁物粉末を熱硬化性樹脂により
結合した材料からなる絶縁基板を積層することで形成
し、また配線導体を従来のタングステンやモリブデン等
の高融点金属メタライズに代えて銅等の金属粉末を熱硬
化性樹脂により結合して成る材料で形成した配線基板が
提案されている。
Therefore, the insulating substrate of the wiring substrate is formed by laminating an insulating substrate made of a material obtained by bonding inorganic insulating powder with a thermosetting resin in place of conventional ceramics, and the wiring conductor is made of conventional tungsten or tungsten. There has been proposed a wiring board formed of a material obtained by bonding a metal powder such as copper with a thermosetting resin in place of a metal having a high melting point such as molybdenum.

【0007】この無機絶縁物粉末を熱硬化性樹脂で結合
して成る絶縁基板を積層した絶縁基体と金属粉末を熱硬
化性樹脂で結合して成る配線導体とから成る配線基板
は、熱硬化性樹脂前駆体と無機絶縁物粉末とを混合して
成る半硬化状態の前駆体シートを複数準備するとともに
これに適当な打ち抜き加工を施し、次にこれらの前駆体
シートに熱硬化性樹脂前駆体と金属粉末とを混合して成
る金属ペーストを所定パターンに印刷塗布し、最後に金
属ペーストが印刷塗布された前駆体シートを積層すると
ともに約150 〜300 ℃の温度および約4〜100 kgf/
cm2 の圧力でホットプレスし、これを熱硬化させるこ
とによって製作される。
A wiring board composed of an insulating base obtained by laminating an insulating substrate formed by bonding the inorganic insulating powder with a thermosetting resin and a wiring conductor formed by bonding a metal powder with a thermosetting resin is a thermosetting resin. A plurality of semi-cured precursor sheets prepared by mixing a resin precursor and an inorganic insulating powder are prepared and subjected to an appropriate punching process, and then these precursor sheets are mixed with a thermosetting resin precursor. A metal paste mixed with a metal powder is printed and applied in a predetermined pattern. Finally, a precursor sheet on which the metal paste is printed and applied is laminated, and a temperature of about 150 to 300 ° C. and about 4 to 100 kgf /
It is manufactured by hot pressing at a pressure of cm 2 and heat curing.

【0008】この配線基板によれば、絶縁基板となる無
機絶縁物粉末および配線導体となる金属粉末を靭性に優
れる熱硬化樹脂により結合して成ることから、配線基板
同士あるいは配線基板と半導体装置製作自動ラインの一
部とが激しく衝突しても絶縁基体に欠けや割れ・クラッ
ク等が発生することは一切ない。
According to this wiring board, the inorganic insulating powder serving as the insulating substrate and the metal powder serving as the wiring conductor are bonded by a thermosetting resin having excellent toughness. Even if a part of the automatic line collides violently, the insulating substrate will never be chipped, cracked or cracked.

【0009】またこの配線基板の製造方法によれば、絶
縁基体および配線導体に含有される熱硬化性樹脂の前駆
体を熱硬化させることにより製作されることから、焼成
に伴う不均一な収縮による変形や寸法のばらつきが発生
することはない。
According to this method of manufacturing a wiring board, the wiring board is manufactured by thermosetting a precursor of a thermosetting resin contained in the insulating base and the wiring conductor. No deformation or dimensional variation occurs.

【0010】[0010]

【発明が解決しようとする課題】しかしながら、近時、
半導体素子は高速駆動が行なわれるようになってきてお
り、これに伴い半導体素子を駆動するための駆動パルス
もその周波数が高く、かつパルスの立ち上がり時間が極
めて短いものとなってきているため、半導体素子の電源
や信号には駆動パルスよりも高次の高調波ノイズが発生
し易いものとなってきている。
However, recently,
Since semiconductor devices are being driven at high speed, the driving pulse for driving the semiconductor devices has a high frequency and the rise time of the pulses has become extremely short. Higher-order harmonic noise than drive pulses is more likely to be generated in the power supply and signal of the element.

【0011】このような高次の高調波ノイズは、半導体
素子が搭載された配線基板の配線導体を通じてこの配線
基板が接続される外部電気回路基板に伝搬され、他の半
導体装置に悪影響を及ぼすこという問題点があった。ま
た、他の半導体装置がら発生した高調波ノイズが配線導
体を通じて配線基板に搭載される半導体素子に伝搬さ
れ、半導体素子に誤動作を生じさせるという問題点もあ
った。
[0011] Such high-order harmonic noise propagates through a wiring conductor of a wiring board on which a semiconductor element is mounted to an external electric circuit board to which the wiring board is connected, and adversely affects other semiconductor devices. There was a problem. Another problem is that harmonic noise generated by another semiconductor device is propagated through a wiring conductor to a semiconductor element mounted on a wiring board, causing a malfunction in the semiconductor element.

【0012】一方、半導体素子の高速駆動に対応するた
めに配線基板の絶縁基体の材質には損失(tanδ)が
小さい材料が求められており、上記の無機絶縁物粉末を
熱硬化性樹脂で結合して成る絶縁基板と金属粉末を熱硬
化性樹脂で結合して成る配線導体とから成る配線基板に
対しても同様の要求があるが、その反面、絶縁基体の材
質の損失(tanδ)が小さくなると、その絶縁基体内
あるいは表面に被着形成された配線導体からの不要輻射
が大きくなって上記の高調波ノイズが発生し易くなると
いう問題点があった。
On the other hand, in order to cope with high-speed driving of a semiconductor element, a material having a small loss (tan δ) is required for a material of an insulating base of a wiring board, and the above inorganic insulating powder is bonded with a thermosetting resin. There is a similar demand for a wiring board composed of an insulating substrate formed by the above and a wiring conductor formed by bonding metal powder with a thermosetting resin, but on the other hand, the loss (tan δ) of the material of the insulating base is small. In such a case, there is a problem that unnecessary radiation from the wiring conductor formed in the insulating substrate or on the surface thereof becomes large and the above-mentioned harmonic noise is easily generated.

【0013】本発明は上記事情に鑑みて案出されたもの
であり、その目的は、無機絶縁物粉末を熱硬化性樹脂で
結合した絶縁基体に金属粉末を熱硬化性樹脂で結合した
配線導体を被着して成る配線基板について、配線導体か
らの不要輻射を抑制し、高調波ノイズの有効に除去し
て、外部電気回路基板に対してノイズを放出しにくいと
ともに搭載される半導体素子を正常かつ安定に高速駆動
させることが可能な配線基板を提供することにある。
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a wiring conductor in which metal powder is bonded with a thermosetting resin to an insulating base in which inorganic insulating powder is bonded with a thermosetting resin. In the wiring board, the unnecessary radiation from the wiring conductor is suppressed, the harmonic noise is effectively removed, the noise is hardly emitted to the external electric circuit board, and the semiconductor element mounted is normal. Another object of the present invention is to provide a wiring board that can be driven stably at high speed.

【0014】また本発明の目的は、無機絶縁物粉末を熱
硬化性樹脂で結合した絶縁基板に金属粉末を熱硬化性樹
脂で結合した配線導体を被着して成る配線基板の製造方
法について、配線導体からの不要輻射を抑制し、高調波
ノイズの有効に除去して、外部電気回路基板に対してノ
イズを放出しにくいとともに搭載される半導体素子を正
常かつ安定に高速駆動させることが可能な配線基板を得
ることができる製造方法を提供することにある。
Another object of the present invention is to provide a method of manufacturing a wiring board, comprising: attaching an insulating substrate in which inorganic insulating powder is bonded with a thermosetting resin to a wiring conductor in which metal powder is bonded with a thermosetting resin. Suppresses unnecessary radiation from wiring conductors, effectively eliminates harmonic noise, makes it difficult to emit noise to external electric circuit boards, and enables normal and stable high-speed driving of mounted semiconductor elements. An object of the present invention is to provide a manufacturing method capable of obtaining a wiring board.

【0015】[0015]

【課題を解決するための手段】本発明の配線基板は、60
乃至95重量%の無機絶縁物粉末および強磁性体粉末を5
乃至40重量%の熱硬化性樹脂により結合した絶縁基体
に、金属粉末を熱硬化性樹脂により結合した配線導体を
被着して成ることを特徴とするものである。
According to the present invention, there is provided a wiring board comprising:
5 to 95% by weight of inorganic insulating powder and ferromagnetic powder
A wiring conductor formed by bonding a metal powder with a thermosetting resin to an insulating substrate bonded by a thermosetting resin of about 40% by weight.

【0016】また本発明の配線基板は、上記構成の配線
基板において、前記強磁性体粉末を前記無機絶縁物粉末
との合計量に対して30乃至60重量%含有していることを
特徴とするものである。
The wiring board according to the present invention is characterized in that, in the wiring board having the above structure, the ferromagnetic powder is contained in an amount of 30 to 60% by weight based on the total amount of the inorganic insulating powder. Things.

【0017】また、本発明の配線基板の製造方法は、60
乃至95重量%の無機絶縁物粉末および強磁性体粉末と5
乃至40重量%の熱硬化性樹脂前駆体とを混合して成る前
駆体シートを半硬化させる工程と、この半硬化した前駆
体シートに所定の打ち抜き加工を施す工程と、この打ち
抜き加工された前駆体シートに金属粉末と熱硬化性樹脂
前駆体とを混合して成る金属ペーストを所定パターンに
印刷する工程と、前記前駆体シートおよび金属ペースト
を熱硬化させて、無機絶縁物粉末および強磁性体粉末を
熱硬化性樹脂により結合した絶縁基体に金属粉末を熱硬
化性樹脂により結合した配線導体を被着させる工程とを
具備することを特徴とするものである。
Further, the method for manufacturing a wiring board according to the present invention comprises:
5 to 95% by weight of inorganic insulating powder and ferromagnetic powder
Semi-curing of a precursor sheet obtained by mixing a thermosetting resin precursor of about 40% by weight, a predetermined punching process on the semi-cured precursor sheet, Printing a metal paste formed by mixing a metal powder and a thermosetting resin precursor on a body sheet in a predetermined pattern; and thermally curing the precursor sheet and the metal paste to form an inorganic insulating powder and a ferromagnetic material. Applying a wiring conductor in which the metal powder is bonded with the thermosetting resin to the insulating base in which the powder is bonded with the thermosetting resin.

【0018】本発明の配線基板によれば、絶縁基体を無
機絶縁物粉末および強磁性体粉末を熱硬化性樹脂により
結合したものとしたことから、強磁性体粉末により配線
導体からの不要輻射を吸収して高調波ノイズを有効に除
去することができ、外部電気回路基板に対するノイズの
放出や外部電気回路基板からのノイズの伝搬を抑制する
ことが可能であるとともに、無機絶縁物粉末により絶縁
基体の誘電率を所望の小さい値に設定することができて
搭載される半導体素子を正常かつ安定に高速駆動させる
ことが可能な配線基板となる。
According to the wiring board of the present invention, since the insulating base is formed by bonding the inorganic insulating powder and the ferromagnetic powder with the thermosetting resin, unnecessary radiation from the wiring conductor is prevented by the ferromagnetic powder. It can absorb and effectively remove harmonic noise, suppress noise emission to the external electric circuit board and noise propagation from the external electric circuit board, and use inorganic insulating powder to insulate the insulating substrate. Can be set to a desired small value, and a semiconductor element mounted can be normally and stably driven at high speed.

【0019】また本発明の配線基板の製造方法によれ
ば、無機絶縁物粉末および強磁性体粉末と熱硬化性樹脂
前駆体とを混合して成る前駆体シートを用いて上記構成
の配線基板を製造することにより、搭載される半導体素
子を正常かつ安定に高速駆動させることが可能な、優れ
た電気特性を有する配線基板を提供できる。
Further, according to the method of manufacturing a wiring board of the present invention, the wiring board having the above structure is formed using a precursor sheet obtained by mixing an inorganic insulating powder, a ferromagnetic powder and a thermosetting resin precursor. By manufacturing, it is possible to provide a wiring board having excellent electric characteristics, which can normally and stably drive a mounted semiconductor element at high speed.

【0020】[0020]

【発明の実施の形態】次に、本発明を添付の図面に基づ
き、詳細に説明する。図1は本発明の配線基板を半導体
素子を収容する半導体素子収納用パッケージに適用した
場合の実施の形態の一例を示す断面図であり、1は絶縁
基体、2は配線導体である。
Next, the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view showing an example of an embodiment in which the wiring board of the present invention is applied to a package for housing a semiconductor element for housing a semiconductor element, wherein 1 is an insulating base, and 2 is a wiring conductor.

【0021】絶縁基体1は、3枚の絶縁基板1a・1b
・1cを積層することによって形成されており、その上
面中央部に半導体素子を収容するための凹部1dを有
し、凹部1d底面には半導体素子3が樹脂等の接着剤を
介して接着固定される。
The insulating base 1 comprises three insulating substrates 1a and 1b.
1c is formed by laminating, a concave portion 1d for accommodating the semiconductor element is provided at the center of the upper surface, and the semiconductor element 3 is bonded and fixed to the bottom surface of the concave portion 1d via an adhesive such as a resin. You.

【0022】絶縁基体1を構成する絶縁基板1a・1b
・1cは、無機絶縁物粉末、例えば酸化珪素・酸化アル
ミニウム・窒化アルミニウム・炭化珪素・チタン酸バリ
ウム・チタン酸ストロンチウム・チタン酸カルシウム・
酸化チタン・ゼオライト等、および強磁性体粉末、例え
ばフェロ磁性体である鉄・ニッケル・コバルト・酸化ク
ロムもしくはこれらの合金等の粉末、あるいはフェリ磁
性体であるMn−Znフェライト・Ni−Znフェライ
ト・Baフェライト・Mg−Mnフェライト・Ni−C
uフェライト等の各種のフェライト(MOFe2 3
Mは2価金属イオン)の粉末を、エポキシ樹脂・ポリイ
ミド樹脂・フェノール樹脂・熱硬化性ポリフェニレンエ
ーテル樹脂・ポリイミドアミド樹脂・ビスマレイミドト
リアジン樹脂等の熱硬化性樹脂により結合することによ
って形成されている。
The insulating substrates 1a and 1b constituting the insulating base 1
1c is an inorganic insulating powder, for example, silicon oxide, aluminum oxide, aluminum nitride, silicon carbide, barium titanate, strontium titanate, calcium titanate.
Titanium oxide, zeolite, etc., and ferromagnetic powders, for example, powders of ferromagnetic substances such as iron, nickel, cobalt, chromium oxide or alloys thereof, or Mn-Zn ferrites, Ni-Zn ferrites, which are ferrimagnetic substances Ba ferrite / Mg-Mn ferrite / Ni-C
Various ferrites such as u-ferrite (MOFe 2 O 3 :
M is a divalent metal ion) powder formed by bonding with a thermosetting resin such as an epoxy resin, a polyimide resin, a phenol resin, a thermosetting polyphenylene ether resin, a polyimide amide resin, and a bismaleimide triazine resin. .

【0023】絶縁基体1を構成する3枚の絶縁基板1a
・1b・1cはその各々が無機絶縁物粉末および強磁性
体粉末を靭性に優れるエポキシ樹脂等の熱硬化性樹脂で
結合することによって形成されていることから、絶縁基
体1の靭性が極めて強いものとなり、絶縁基体1に外力
が印加されてもこの外力によって絶縁基体1に欠けや割
れ・クラック等が発生することを極めて有効に防止する
ことができる。
Three insulating substrates 1a constituting the insulating base 1
1b and 1c are each formed by bonding an inorganic insulating powder and a ferromagnetic powder with a thermosetting resin such as an epoxy resin having excellent toughness, so that the insulating substrate 1 has extremely strong toughness. Thus, even if an external force is applied to the insulating substrate 1, it is possible to extremely effectively prevent the insulating substrate 1 from being chipped, cracked, or cracked by the external force.

【0024】なお、この無機絶縁物粉末および強磁性体
粉末と熱硬化性樹脂とから成る絶縁基体1を構成する3
枚の絶縁基板1a・1b・1cは、これを構成する無機
絶縁物粉末および強磁性体粉末と熱硬化性樹脂との組成
比において、無機絶縁物粉末および強磁性体粉末の含有
量が60重量%未満であると絶縁基体1の熱膨張係数が半
導体素子3の熱膨張係数に対して大きく相違し、半導体
素子3が作動時に発熱してその熱が半導体素子3と絶縁
基体1の両者に印加されると、両者間に両者の熱膨張係
数の相違に起因する大きな熱応力が発生し、この大きな
熱応力によって半導体素子3が絶縁基体1から剥離した
り半導体素子3に割れや欠けが発生しやすい傾向があ
る。また無機絶縁物粉末および強磁性体粉末の含有量が
95重量%を超えると無機絶縁物粉末および強磁性体粉末
を熱硬化性樹脂で強固に結合することが困難となる傾向
にある。従って、絶縁基体1を構成する絶縁基板1a・
1b・1cは、その各々を構成する無機絶縁物粉末およ
び強磁性体粉末と熱硬化性樹脂との組成比において無機
絶縁物粉末および強磁性体粉末の量が60〜95重量%の範
囲に特定される。
The insulating substrate 1 made of the inorganic insulating powder, the ferromagnetic powder, and the thermosetting resin constitutes the insulating substrate 1.
The insulating substrates 1a, 1b, and 1c have a content of the inorganic insulating powder and the ferromagnetic powder of 60% by weight in the composition ratio of the inorganic insulating powder and the ferromagnetic powder to the thermosetting resin. %, The coefficient of thermal expansion of the insulating substrate 1 greatly differs from the coefficient of thermal expansion of the semiconductor element 3, the semiconductor element 3 generates heat during operation, and the heat is applied to both the semiconductor element 3 and the insulating substrate 1. As a result, a large thermal stress is generated between the two due to the difference in the thermal expansion coefficient between the two, and the large thermal stress causes the semiconductor element 3 to peel off from the insulating base 1 or cause the semiconductor element 3 to crack or chip. Tends to be easy. In addition, the content of the inorganic insulating powder and the ferromagnetic powder is
If it exceeds 95% by weight, it tends to be difficult to firmly bond the inorganic insulating powder and the ferromagnetic powder with a thermosetting resin. Therefore, the insulating substrates 1a
1b and 1c indicate that the amounts of the inorganic insulating powder and the ferromagnetic powder are in the range of 60 to 95% by weight in the composition ratio of the inorganic insulating powder and the ferromagnetic powder to the thermosetting resin. Is done.

【0025】また、無機絶縁物粉末と強磁性体粉末との
合計量に対する強磁性体粉末の量については、強磁性体
粉末の含有量が30重量%未満となると配線導体2からの
不要輻射を吸収して高調波ノイズを有効に除去する効果
が小さいものとなる傾向があり、他方、60重量%を超え
ると絶縁基体1を構成する各絶縁基板1a・1b・1c
の前駆体シート、すなわち無機絶縁物粉末および強磁性
体粉末と熱硬化性樹脂前駆体とを混合して成る前駆体シ
ートの強度が低くなり、製造上の取扱いが困難となる傾
向がある。従って、強磁性体粉末の含有量は、無機絶縁
物粉末と強磁性体粉末との合計量に対して30〜60重量%
の範囲とすることが望ましい。
As for the amount of the ferromagnetic powder relative to the total amount of the inorganic insulating powder and the ferromagnetic powder, when the content of the ferromagnetic powder is less than 30% by weight, unnecessary radiation from the wiring conductor 2 is reduced. The effect of absorbing and effectively removing harmonic noise tends to be small. On the other hand, if it exceeds 60% by weight, each of the insulating substrates 1a, 1b and 1c constituting the insulating base 1
, That is, a precursor sheet obtained by mixing an inorganic insulating powder and a ferromagnetic powder with a thermosetting resin precursor tends to have low strength, which tends to make handling in production difficult. Therefore, the content of the ferromagnetic powder is 30 to 60% by weight based on the total amount of the inorganic insulating powder and the ferromagnetic powder.
It is desirable to be within the range.

【0026】なお、無機絶縁物粉末の粒径としては、1
μm未満では無機絶縁物粉末の比表面積が大きくなるこ
とから、前駆体シートを形成する際に粘度が高くなり前
駆体シートを安定して形成することが困難となる傾向が
ある。他方、50μmを超えると前駆体シートの表面粗さ
が粗くなるため、その表面に均一な配線導体を金属ペー
ストの印刷により形成することが困難となる傾向があ
る。従って、無機絶縁物粉末の粒径は、1〜50μmの範
囲とすることが好ましい。
The particle size of the inorganic insulating powder is 1
If it is less than μm, the specific surface area of the inorganic insulating powder becomes large, so that the viscosity becomes high when forming the precursor sheet, and it tends to be difficult to form the precursor sheet stably. On the other hand, if it exceeds 50 μm, the surface roughness of the precursor sheet becomes rough, and it tends to be difficult to form a uniform wiring conductor on the surface by printing a metal paste. Therefore, the particle diameter of the inorganic insulating powder is preferably in the range of 1 to 50 μm.

【0027】また、強磁性体粉末の粒径としては、0.5
μm未満では強磁性体粉末の比表面積が大きくなること
から、所定の量を充填すると前駆体シートを形成する際
に粘度が高くなり安定して形成することが困難となる傾
向がある。他方、50μmを超えると前駆体シートの表面
粗さが粗くなるため、その表面に均一な配線導体を金属
ペーストの印刷により形成することが困難となる傾向が
ある。従って、強磁性体粉末の粒径は、0.5 〜50μmの
範囲とすることが好ましい。
The particle diameter of the ferromagnetic powder is 0.5
When the particle size is less than μm, the specific surface area of the ferromagnetic powder becomes large. Therefore, when a predetermined amount is filled, the viscosity becomes high when forming the precursor sheet, and it tends to be difficult to form the precursor sheet stably. On the other hand, if it exceeds 50 μm, the surface roughness of the precursor sheet becomes rough, and it tends to be difficult to form a uniform wiring conductor on the surface by printing a metal paste. Therefore, the particle size of the ferromagnetic powder is preferably in the range of 0.5 to 50 μm.

【0028】さらに、強磁性体粉末の粒径と無機絶縁物
粉末の粒径ならびに形状との関係については、強磁性体
粉末を均一に分散させることにより強磁性体粉末の効果
をより効率的に発揮させることとなることから、強磁性
体粉末の粒径は無機絶縁物粉末の粒径の1/2以下と
し、さらに強磁性体粉末の形状はアスペクト比が2以下
の球状もしくは多面体状としておくことが好ましい。
Further, regarding the relationship between the particle size of the ferromagnetic powder and the particle size and shape of the inorganic insulating powder, the effect of the ferromagnetic powder can be more efficiently dispersed by uniformly dispersing the ferromagnetic powder. The particle diameter of the ferromagnetic material powder is set to 1/2 or less of the particle diameter of the inorganic insulating powder, and the shape of the ferromagnetic powder is set to be spherical or polyhedral having an aspect ratio of 2 or less. Is preferred.

【0029】このように絶縁基体1が所定量の強磁性体
粉末を有しているので、強磁性体粉末が不要輻射を熱エ
ネルギーに変換吸収し、また高透磁率を有するため損失
(tanδ)が大きくなって高調波ノイズに対して高イ
ンピーダンスとなる。従って、配線導体2を伝搬する入
出力信号から不要輻射が生じたり、あるいは配線基板に
搭載される半導体素子3より高調波ノイズを含んだ出力
信号が配線導体2を介して外部電気回路基板に伝搬され
ようとしたり、外部電気回路基板より高調波ノイズを含
んだ入力信号が配線導体2を介して半導体素子3に伝搬
されようとしても、不要輻射や入出力信号に含まれる高
調波ノイズは強磁性体粉末により吸収除去されることと
なり、その結果、不要輻射がノイズとして発生したり、
高調波ノイズが半導体素子3より外部電気回路基板に、
あるいは外部電気回路基板より半導体素子3に伝搬され
ることがなくなる。
As described above, since the insulating base 1 has a predetermined amount of ferromagnetic powder, the ferromagnetic powder converts unnecessary radiation into heat energy and absorbs it, and has a high magnetic permeability, so that the loss (tan δ) Becomes large, and becomes high impedance with respect to harmonic noise. Therefore, unnecessary radiation is generated from input / output signals propagating through the wiring conductor 2, or an output signal containing harmonic noise is transmitted from the semiconductor element 3 mounted on the wiring board to the external electric circuit board via the wiring conductor 2. Or the input signal containing the harmonic noise from the external electric circuit board is transmitted to the semiconductor element 3 via the wiring conductor 2, the unnecessary radiation and the harmonic noise contained in the input / output signal are ferromagnetic. It will be absorbed and removed by body powder, as a result, unnecessary radiation will occur as noise,
Harmonic noise is transmitted from the semiconductor element 3 to the external electric circuit board,
Alternatively, it is not transmitted to the semiconductor element 3 from the external electric circuit board.

【0030】なお、強磁性体粉末は、絶縁基体1を構成
する3枚の絶縁基板1a・1b・1cに対して特に配線
導体2からの不要輻射や高調波ノイズの発生が問題とな
る部位に特に重点的に含有させるようにしてもよい。そ
れにより、その部位では強磁性体粉末による不要輻射の
吸収・高調波ノイズの抑制が効果的に行なえるととも
に、他の部位では高い電気絶縁性や良好な高周波信号伝
送特性を発揮させることができ、全体として優れた電気
特性を有する配線基板とすることができる。
The ferromagnetic powder is applied to the three insulating substrates 1a, 1b, and 1c constituting the insulating base 1 in a portion where unnecessary radiation from the wiring conductor 2 and generation of harmonic noise are particularly problematic. In particular, it may be mainly contained. As a result, it is possible to effectively absorb unnecessary radiation and suppress harmonic noise by the ferromagnetic powder at that part, and to exhibit high electrical insulation and good high-frequency signal transmission characteristics at other parts. Thus, a wiring board having excellent electric characteristics as a whole can be obtained.

【0031】また絶縁基体1は、その凹部1d周辺から
下面にかけて例えば銅・銀・金・銀で被覆した銅もしく
はこれらの合金等の金属粉末をエポキシ樹脂等の熱硬化
性樹脂により結合した配線導体2が被着形成されて配設
されている。
The insulating substrate 1 has a wiring conductor formed by bonding metal powder such as copper coated with copper, silver, gold, or silver or an alloy thereof with a thermosetting resin such as an epoxy resin from the periphery to the lower surface of the concave portion 1d. 2 are attached and formed.

【0032】配線導体2は、半導体素子3の各電極を外
部電気回路に電気的に接続する作用をなし、絶縁基体1
の凹部1d周辺に位置する部位には半導体素子3の各電
極がボンディングワイヤ4を介して電気的に接続され、
また絶縁基体1の下面に導出された部位は外部電気回路
に電気的に接続される。
The wiring conductor 2 functions to electrically connect each electrode of the semiconductor element 3 to an external electric circuit.
Each electrode of the semiconductor element 3 is electrically connected to a portion located around the concave portion 1 d through a bonding wire 4.
The portion led out to the lower surface of the insulating base 1 is electrically connected to an external electric circuit.

【0033】なお、配線導体2は、これに含有される金
属粉末の含有量が70重量%未満では配線導体2の電気抵
抗が高いものとなり、また95重量%を超えると金属粉末
を熱硬化性樹脂で強固に結合して所定の配線導体2を形
成することが困難となる傾向にある。従って、配線導体
2は、その内部に含有される金属粉末の量を70〜95重量
%の範囲としておくことが好ましい。
When the content of the metal powder contained in the wiring conductor 2 is less than 70% by weight, the electrical resistance of the wiring conductor 2 becomes high. There is a tendency that it is difficult to form a predetermined wiring conductor 2 by firmly bonding with a resin. Therefore, it is preferable that the amount of the metal powder contained in the wiring conductor 2 be in the range of 70 to 95% by weight.

【0034】また配線導体2は、その露出する表面にニ
ッケルや金等の耐食性に優れかつ良導電性の金属をメッ
キ法により1.0 〜20.0μmの厚みに層着させておくこと
が好ましく、それにより、配線導体2の酸化腐食を有効
に防止することができるとともに配線導体2とボンディ
ングワイヤ4とを強固に電気的に接続させることができ
る。
The wiring conductor 2 is preferably coated with a metal having excellent corrosion resistance and good conductivity, such as nickel or gold, to a thickness of 1.0 to 20.0 μm by plating on the exposed surface. In addition, the oxidative corrosion of the wiring conductor 2 can be effectively prevented, and the wiring conductor 2 and the bonding wire 4 can be firmly electrically connected.

【0035】かくして本発明の配線基板によれば、絶縁
基体1の凹部1d底面に半導体素子3を樹脂等の接着剤
を介して接着固定するとともに半導体素子3の各電極を
ボンディングワイヤ4を介して配線導体2に電気的に接
続し、最後に絶縁基体1の上面に蓋体5を樹脂等から成
る封止材を介して接合させ、絶縁基体1と蓋体5とから
成る容器内部に半導体素子3を気密に収容することによ
り製品としての半導体装置が完成する。
Thus, according to the wiring board of the present invention, the semiconductor element 3 is bonded and fixed to the bottom surface of the concave portion 1 d of the insulating base 1 with an adhesive such as a resin, and each electrode of the semiconductor element 3 is bonded via the bonding wire 4. It is electrically connected to the wiring conductor 2, and finally, the lid 5 is joined to the upper surface of the insulating base 1 via a sealing material made of resin or the like. The semiconductor device as a product is completed by housing 3 in an airtight manner.

【0036】次に、上述の本発明の配線基板の製造方法
について図2に基づいて説明する。
Next, a method of manufacturing the above-described wiring board of the present invention will be described with reference to FIG.

【0037】図2(a)〜(c)は、それぞれ本発明の
配線基板の製造方法を説明するための工程毎の断面図で
ある。
FIGS. 2A to 2C are cross-sectional views for explaining the method of manufacturing a wiring board according to the present invention.

【0038】先ず、図2(a)に示すように絶縁基体1
の絶縁基板1a・1b・1cとなる3枚の前駆体シート
11a・11b・11cを準備する。
First, as shown in FIG.
Precursor sheets to become the insulating substrates 1a, 1b, and 1c of FIG.
Prepare 11a, 11b and 11c.

【0039】前駆体シート11a・11b・11cは、60〜95
重量%の前述の無機絶縁物粉末および前述のフェロ磁性
体もしくはフェリ磁性体といった強磁性体粉末を5〜40
重量%の前述の熱硬化性樹脂の前駆体で結合することに
よって形成されている。
The precursor sheets 11a, 11b and 11c are 60 to 95
5% by weight of the above-mentioned inorganic insulating powder and the above-described ferromagnetic or ferrimagnetic ferromagnetic powder.
It is formed by bonding with the above-mentioned thermosetting resin precursor by weight.

【0040】これら前駆体シート11a・11b・11cは、
微細な打ち抜き加工を施したり配線導体2となる金属ペ
ーストを印刷塗布する際等に前駆体シート11a・11b・
11cに変形やクラックを発生させることなく正確かつ確
実に打ち抜き加工や金属ペーストの印刷を行なうことが
できる。
These precursor sheets 11a, 11b, 11c are:
Precursor sheets 11a, 11b, etc. are used when performing fine punching or printing and applying a metal paste to be the wiring conductor 2.
Punching and printing of metal paste can be performed accurately and reliably without causing deformation or cracks in 11c.

【0041】これらの前駆体シート11a・11b・11c
は、例えば粒径が1〜50μmの酸化珪素粉末および粒径
が0.5 〜20μmのフェライト粉末と、ビスフェノールA
型エポキシ樹脂・ビスフェノールF型エポキシ樹脂・ノ
ボラック型エポキシ樹脂・グリシジルエステル型エポキ
シ樹脂等の熱硬化性樹脂およびアミン系硬化剤・イミダ
ゾール系硬化剤・酸無水物系硬化剤等の硬化剤を混合し
て得たペーストをドクターブレード法等のシート成形法
を採用してシート状となすとともに約25〜130 ℃の温度
で半硬化させることによって製作される。
These precursor sheets 11a, 11b, 11c
Are, for example, a silicon oxide powder having a particle size of 1 to 50 μm, a ferrite powder having a particle size of 0.5 to 20 μm, and bisphenol A
Thermosetting resin such as epoxy resin, bisphenol F type epoxy resin, novolak type epoxy resin, glycidyl ester type epoxy resin and curing agent such as amine type curing agent, imidazole type curing agent, acid anhydride type curing agent The paste thus obtained is formed into a sheet by employing a sheet forming method such as a doctor blade method and is semi-cured at a temperature of about 25 to 130 ° C.

【0042】次に図2(b)に示すように半硬化された
3枚の前駆体シート11a・11b・11cのうち2枚の前駆
体シート11a・11bに凹部1dとなる開口A・A’を、
2枚の前駆体シート11b・11cに配線導体2を引き回す
ための貫通孔B・B’を各々形成する。
Next, as shown in FIG. 2 (b), two precursor sheets 11a, 11b, 11c of the semi-cured three precursor sheets 11a, 11b have openings A, A 'forming recesses 1d in two precursor sheets 11a, 11b. To
Through holes B and B 'are formed in the two precursor sheets 11b and 11c to route the wiring conductor 2 respectively.

【0043】開口A・A’および貫通孔B・B’は、前
駆体シート11a・11b・11cに従来周知の打ち抜き加工
法であるパンチング加工法を施し、前駆体シート11a・
11b・11cの各々に所定形状の孔を穿孔することによっ
て形成される。
The openings A and A 'and the through holes B and B' are formed by subjecting the precursor sheets 11a, 11b and 11c to a punching process which is a conventionally known punching process.
It is formed by drilling a hole of a predetermined shape in each of 11b and 11c.

【0044】この場合、前駆体シート11a・11b・11c
は適当な可撓性を有することから、微細なパンチング加
工であってもそれによりクラックや割れが発生すること
はない。
In this case, the precursor sheets 11a, 11b, 11c
Since has a suitable flexibility, cracks and cracks do not occur due to fine punching.

【0045】次に図2(c)に示すように、半硬化され
た前駆体シート11b・11cの上下面および貫通孔B・
B’内に配線導体2となる金属ペースト12を従来周知の
スクリーン印刷法および充填法を採用して所定パターン
に印刷塗布する。
Next, as shown in FIG. 2C, the upper and lower surfaces of the semi-cured precursor sheets 11b and 11c and the through holes B and
A metal paste 12 to be the wiring conductor 2 is printed and applied in a predetermined pattern in B ′ by using a conventionally known screen printing method and filling method.

【0046】配線導体2となる金属ペースト12として
は、例えば粒径が0.1 〜20μm程度の銅等の金属粉末に
ビスフェノールA型エポキシ樹脂・ノボラック型エポキ
シ樹脂・グリシジルエステル型エポキシ樹脂等の熱硬化
性樹脂の前駆体およびアミン系硬化剤・イミダゾール系
硬化剤・酸無水物系硬化剤等の硬化剤等を添加混合して
ペースト状となしたものが使用される。
The metal paste 12 serving as the wiring conductor 2 is, for example, a metal powder such as copper having a particle size of about 0.1 to 20 μm or a thermosetting resin such as a bisphenol A type epoxy resin, a novolak type epoxy resin, a glycidyl ester type epoxy resin. A paste obtained by adding and mixing a resin precursor and a curing agent such as an amine curing agent, an imidazole curing agent, and an acid anhydride curing agent is used.

【0047】そして最後に前駆体シート11a・11b・11
cを上下に積層するとともにこれを約80〜300 ℃の温度
で約10秒〜24時間加熱し、前駆体シート11a・11b・11
cおよび前駆体シート11b・11cに所定パターンに印刷
塗布された金属ペースト12を十分に熱硬化させることに
よって、図1に示すような絶縁基体1に配線導体2を被
着させた配線基板が得られる。
Finally, the precursor sheets 11a, 11b, 11
c is laminated on top and bottom and heated at a temperature of about 80 to 300 ° C. for about 10 seconds to 24 hours to form precursor sheets 11a, 11b, 11
By sufficiently thermosetting the metal paste 12 printed and applied in a predetermined pattern on the precursor sheet 11b and the precursor sheets 11b and 11c, a wiring board having the wiring conductor 2 adhered to the insulating base 1 as shown in FIG. 1 is obtained. Can be

【0048】この場合、前記前駆体シート11a・11b・
11cおよび金属ペースト12は、熱硬化時に収縮すること
はほとんどなく、従って、得られる配線基板に変形や寸
法のばらつきが発生することは皆無であり、半導体素子
と配線導体とを正確に接続することが可能となる。
In this case, the precursor sheets 11a, 11b,
11c and the metal paste 12 hardly shrink during thermosetting, and therefore, there is no deformation or dimensional variation in the obtained wiring board, and the semiconductor element and the wiring conductor must be accurately connected. Becomes possible.

【0049】また、前駆体シート11a・11b・11cは熱
硬化時に収縮することがほとんどないことから、無機絶
縁物粉末とともに強磁性体粉末を含有させていても、絶
縁基板1a・1b・1cに反りや変形等の悪影響を及ぼ
すこともない。
Further, since the precursor sheets 11a, 11b and 11c hardly shrink during thermosetting, even if the ferromagnetic powder is contained together with the inorganic insulating powder, the insulating substrates 1a, 1b and 1c can be used. There is no adverse effect such as warpage or deformation.

【0050】なお、本発明は上述の実施の形態に限定さ
れるものではなく、本発明の要旨を逸脱しない範囲であ
れば種々の変更は可能である。例えば、上述の実施の形
態では本発明の配線基板を半導体素子を収容する半導体
素子収納用パッケージに適用した場合を例に採って説明
したが、例えば混成集積回路等他の用途に使用される配
線基板に適用してもよく、半導体素子と配線導体との電
気的な接続にパンプ電極を用いた、いわゆるフリップチ
ップ実装法により半導体素子を搭載してもよい。
The present invention is not limited to the above-described embodiment, and various changes can be made without departing from the gist of the present invention. For example, in the above-described embodiment, the case where the wiring board of the present invention is applied to a semiconductor element housing package for housing a semiconductor element has been described as an example. However, for example, wiring used for other purposes such as a hybrid integrated circuit is described. The present invention may be applied to a substrate, or a semiconductor element may be mounted by a so-called flip-chip mounting method using a pump electrode for electrical connection between the semiconductor element and a wiring conductor.

【0051】また、上述の実施の形態では3枚の前駆体
シートを積層することによって配線基板を製作したが、
1枚や2枚あるいは4枚以上の前駆体シートを使用して
配線基板を製作してもよい。
In the above embodiment, the wiring board is manufactured by laminating three precursor sheets.
A wiring board may be manufactured using one, two, or four or more precursor sheets.

【0052】さらに、上述の実施の形態では絶縁基体は
無機絶縁物粉末と熱硬化性樹脂とから成っていたが、こ
れらにさらにガラス繊維やカーボン繊維・アラミド繊維
・アルミナ繊維・チタン酸カリウムウィスカー・ホウ酸
アルミニウムウィスカー等の短繊維を配合させてもよ
い。
Further, in the above-described embodiment, the insulating base is made of the inorganic insulating powder and the thermosetting resin. However, the insulating base is further made of glass fiber, carbon fiber, aramid fiber, alumina fiber, potassium titanate whisker, Short fibers such as aluminum borate whiskers may be blended.

【0053】さらにまた、上述の実施の形態では配線導
体は金属粉末を熱硬化性樹脂により結合することにより
形成したが、配線導体にさらに低融点金属を配合させる
とともにこの低融点金属により金属粉末同士を結合する
ことにより形成してもよい。
Further, in the above-described embodiment, the wiring conductor is formed by bonding the metal powder with a thermosetting resin. May be formed by combining.

【0054】この場合、配線導体となる金属ペースト中
に低融点金属として例えば錫−鉛半田等から成る低融点
金属粉末を配合させるとともにこれを絶縁基体となる前
駆体シートに印刷塗布した後、これに熱を印加して低融
点金属粉末を溶融させ、この溶融した低融点金属により
金属粉末を結合する方法が採用される。
In this case, a low-melting-point metal powder such as tin-lead solder is blended as a low-melting-point metal into a metal paste serving as a wiring conductor, and this is printed and applied to a precursor sheet serving as an insulating base. Is applied to melt the low-melting-point metal powder, and the molten low-melting-point metal is combined with the metal powder.

【0055】[0055]

【発明の効果】本発明の配線基板によれば、絶縁基体を
無機絶縁物粉末および強磁性体粉末を熱硬化性樹脂によ
り結合したものとしたことから、その熱膨張率を搭載さ
れる半導体素子に近似したものとできるとともに、強磁
性体粉末により配線導体からの不要輻射を吸収して高調
波ノイズを有効に除去することができ、外部電気回路基
板に対するノイズの放出や外部電気回路基板からのノイ
ズの伝搬を抑制することが可能であり、しかも、無機絶
縁物粉末により絶縁基体の誘電率を所望の小さい値に設
定することができて搭載される半導体素子を正常かつ安
定に高速駆動させることが可能な配線基板となる。
According to the wiring board of the present invention, since the insulating base is formed by bonding the inorganic insulating powder and the ferromagnetic powder with the thermosetting resin, the semiconductor element having the coefficient of thermal expansion is mounted. The ferromagnetic powder can absorb unnecessary radiation from the wiring conductors and effectively remove harmonic noise, releasing noise to the external electric circuit board and generating noise from the external electric circuit board. Noise propagation can be suppressed, and the dielectric constant of the insulating base can be set to a desired small value by the inorganic insulating powder, so that the mounted semiconductor element can be normally and stably driven at high speed. It becomes a wiring board which can be used.

【0056】また本発明の配線基板によれば、絶縁基体
が無機絶縁物粉末および強磁性体粉末と熱硬化性樹脂と
から成り、無機絶縁物粉末および強磁性体粉末を靱性に
優れる熱硬化性樹脂で結合していることから、絶縁基体
の靭性が極めて強いものとなり、配線基板同士あるいは
配線基板と半導体装置の一部とが激しく衝突しても絶縁
基体に欠けや割れ・クラック等が発生することを極めて
有効に防止することができる。
Further, according to the wiring board of the present invention, the insulating base is made of the inorganic insulating powder and the ferromagnetic powder and the thermosetting resin, and the inorganic insulating powder and the ferromagnetic powder are converted into a thermosetting resin having excellent toughness. Due to the bonding with the resin, the toughness of the insulating substrate becomes extremely strong, and even if the wiring substrates or the wiring substrate and a part of the semiconductor device collide violently, the insulating substrate may be chipped, cracked, or cracked. This can be prevented very effectively.

【0057】以上により、本発明によれば、配線導体か
らの不要輻射を抑制し、高調波ノイズの有効に除去し
て、外部電気回路基板に対してノイズを放出しにくいと
ともに搭載される半導体素子を正常かつ安定に高速駆動
させることが可能な配線基板を提供することができる。
As described above, according to the present invention, the unnecessary radiation from the wiring conductor is suppressed, the harmonic noise is effectively removed, and the semiconductor element which is hard to emit the noise to the external electric circuit board and is mounted. Can be provided normally and stably at a high speed.

【0058】また、本発明の配線基板の製造方法によれ
ば、無機絶縁物粉末および強磁性体粉末と熱硬化性樹脂
前駆体とを混合して成る前駆体シートおよび熱硬化性樹
脂前駆体と金属粉末とを混合して成る金属ペーストを熱
硬化させることによって製作され、前記前駆体シートお
よび金属ペーストはほとんど収縮しないことから、収縮
に起因する変形や寸法のばらつきは発生せず、半導体素
子を配線導体に正確に電気的接続することができる。
According to the method of manufacturing a wiring board of the present invention, a precursor sheet and a thermosetting resin precursor obtained by mixing an inorganic insulating powder and a ferromagnetic powder with a thermosetting resin precursor are provided. The precursor sheet and the metal paste are manufactured by thermosetting a metal paste formed by mixing a metal powder, and since the precursor sheet and the metal paste hardly shrink, deformation and dimensional variation due to shrinkage do not occur. Electrical connection can be made accurately to the wiring conductor.

【0059】その結果、本発明によれば、配線導体から
の不要輻射を抑制し、高調波ノイズの有効に除去して、
外部電気回路基板に対してノイズを放出しにくいととも
に搭載される半導体素子を正常かつ安定に高速駆動させ
ることが可能な配線基板を得ることができる製造方法を
提供することができる。
As a result, according to the present invention, unnecessary radiation from the wiring conductor is suppressed, and harmonic noise is effectively removed.
It is possible to provide a manufacturing method capable of obtaining a wiring board which is less likely to emit noise to an external electric circuit board and which can normally and stably drive a semiconductor element mounted at a high speed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の配線基板を半導体素子収納用パッケー
ジに適用した場合の実施の形態の一例を示す断面図であ
る。
FIG. 1 is a cross-sectional view showing an example of an embodiment in which a wiring board of the present invention is applied to a package for housing a semiconductor element.

【図2】(a)〜(c)はそれぞれ本発明の配線基板の
製造方法を説明するための工程毎の断面図である。
FIGS. 2A to 2C are cross-sectional views for explaining a method of manufacturing a wiring board according to the present invention.

【符号の説明】[Explanation of symbols]

1・・・・・・・・・・・・絶縁基体 1a、1b、1c・・・・・絶縁基板 2・・・・・・・・・・・・配線導体 11a、11b、11c・・・・・前駆体シート 12・・・・・・・・・・・・金属ペースト 1. Insulating base 1a, 1b, 1c ... Insulating substrate 2 ... Wiring conductors 11a, 11b, 11c ...・ ・ Precursor sheet 12 ・ ・ ・ ・ Metal paste

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 60乃至95重量%の無機絶縁物粉末お
よび強磁性体粉末を5乃至40重量%の熱硬化性樹脂に
より結合した絶縁基体に、金属粉末を熱硬化性樹脂によ
り結合した配線導体を被着して成ることを特徴とする配
線基板。
1. A wiring conductor in which a metal powder is bonded by a thermosetting resin to an insulating base in which 60 to 95% by weight of an inorganic insulating powder and a ferromagnetic powder are bonded by a 5 to 40% by weight of a thermosetting resin. A wiring board characterized by being adhered.
【請求項2】 前記強磁性体粉末を前記無機絶縁物粉末
との合計量に対して30乃至60重量%含有しているこ
とを特徴とする請求項1記載の配線基板。
2. The wiring board according to claim 1, wherein said ferromagnetic powder is contained in an amount of 30 to 60% by weight based on the total amount of said ferromagnetic powder and said inorganic insulating powder.
【請求項3】 60乃至95重量%の無機絶縁物粉末お
よび強磁性体粉末と5乃至40重量%の熱硬化性樹脂前
駆体とを混合して成る前駆体シートを半硬化させる工程
と、該半硬化した前駆体シートに所定の打ち抜き加工を
施す工程と、該打ち抜き加工された前駆体シートに金属
粉末と熱硬化性樹脂前駆体とを混合して成る金属ペース
トを所定パターンに印刷する工程と、前記前駆体シート
および金属ペーストを熱硬化させて、無機絶縁物粉末お
よび強磁性体粉末を熱硬化性樹脂により結合した絶縁基
体に金属粉末を熱硬化性樹脂により結合した配線導体を
被着させる工程とを具備することを特徴とする配線基板
の製造方法。
3. a step of semi-curing a precursor sheet obtained by mixing 60 to 95% by weight of an inorganic insulating powder and a ferromagnetic powder with 5 to 40% by weight of a thermosetting resin precursor; A step of performing a predetermined punching process on the semi-cured precursor sheet, and a step of printing a metal paste formed by mixing a metal powder and a thermosetting resin precursor on the punched precursor sheet in a predetermined pattern; The precursor sheet and the metal paste are thermoset, and a wiring conductor in which the metal powder is bonded with the thermosetting resin is adhered to the insulating substrate in which the inorganic insulating powder and the ferromagnetic powder are bonded with the thermosetting resin. And a method of manufacturing a wiring board.
JP32148697A 1997-11-21 1997-11-21 Wiring board and method of manufacturing the same Expired - Fee Related JP3398316B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32148697A JP3398316B2 (en) 1997-11-21 1997-11-21 Wiring board and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32148697A JP3398316B2 (en) 1997-11-21 1997-11-21 Wiring board and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPH11163483A true JPH11163483A (en) 1999-06-18
JP3398316B2 JP3398316B2 (en) 2003-04-21

Family

ID=18133107

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32148697A Expired - Fee Related JP3398316B2 (en) 1997-11-21 1997-11-21 Wiring board and method of manufacturing the same

Country Status (1)

Country Link
JP (1) JP3398316B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002261427A (en) * 2001-02-27 2002-09-13 Kyocera Corp Wiring board and method of manufacturing the same
EP1265280A1 (en) * 2001-06-08 2002-12-11 Sony Corporation Resin component for encapsulating semiconductor and semiconductor device using it

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002261427A (en) * 2001-02-27 2002-09-13 Kyocera Corp Wiring board and method of manufacturing the same
EP1265280A1 (en) * 2001-06-08 2002-12-11 Sony Corporation Resin component for encapsulating semiconductor and semiconductor device using it
US7034405B2 (en) 2001-06-08 2006-04-25 Sony Corporation Resin component for encapsulating semiconductor and semiconductor device using it

Also Published As

Publication number Publication date
JP3398316B2 (en) 2003-04-21

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