JPH11130210A - Substrate storage device in clean room - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a device that stores substrates in a highly clean state, by a simple structure, at low cost and for spatial advantage. SOLUTION: Support members 20 extended along the external wall of a substrate storage device body 6 are provided with paired shelf-supporting members 21 that project horizontally at predetermined vertical intervals by three stages, and the shelf-supporting members 21 are each mounted with a shelf 22 for holding thereon two cassettes 7 that store substrates paralleled with each other in the vertical state. The device body 6 is internally provided with clean units 19 in its upper section. Between the support members 20, paired shelf-supporting members 21 and shelves 22, a ventilation space is defined to direct a downflow of clean air out of the clean units 19 downward. The shelves 22 are each perforated with a multitude of openings that pass the clean air therethrough, which openings are connected to a suction fan 25, so that the clean air is made to flow between the adjacent substrates stored in the cassettes 7 placed on the shelves 22 from around the shelves 22 overall.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate storage device for storing substrates for manufacturing electronic components such as semiconductor wafers, glass substrates for manufacturing liquid crystals, and photomasks in a clean room.

[0002]

2. Description of the Related Art Conventionally, there have been the following devices as described above. A. According to the first conventional example (see Japanese Patent Application Laid-Open No. H3-152004), a pair of left and right partitions are formed in a box-shaped main body outer plate with a plurality of storage spaces vertically defined with a passage therebetween. Is provided. The load storage portion is provided with a filter so that the front surface facing the passage and the rear surface on the opposite side are open, and covers the rear surface, and forms an air supply passage between the rear of the filter and the partition wall. A compartment that communicates with the passage is formed at a lower portion in the outer panel of the main body, and a blower whose discharge section communicates with the air supply path is provided in the compartment. The suction unit of the blower is opened into the compartment, and the clean air flowing out of the passage through the load storage unit is sucked through the compartment. With the above configuration, clean air having a high degree of cleanness that has passed through the filter flows from the rear surface to the front surface of the load storage unit, and the inside of the load storage unit is maintained at a high clean level. B. Second conventional example (refer to JP-A-4-233747) As shown in a schematic sectional view of a carrier stocker of a second conventional example in FIG.
An elevator mechanism 04 is provided for driving a carrier (synonymous with a cassette) 03 up and down along the up / down path facing 2. Each of the two storage units 01, 01 has the same configuration, and has a U-shaped cross section having a top wall 05, a bottom wall 06, and a side wall 07 which is a back surface of the loading / unloading port 02. Each of the walls 05, 06, 07 has a hollow portion communicating therewith. An air outlet 08 is formed on the lower surface of the top wall 05, and a first filter 09 is provided facing the air outlet 08,
A fan 010 is provided on the back. Bottom wall 06
An air suction opening 011 is formed at a position facing the first filter 09. With the above configuration, the fan 01
The air blown by 0 is turned into clean air by the first filter 09, and a downflow 012 is formed for the wafers W arranged and stored in the carrier 03 in a vertical state in parallel. This air flows into the air suction opening 011 of the bottom wall 06.
Through the bottom wall 06. Then, the air is passed through an air circulation path 0 that communicates inside the walls 05, 06, and 07.
13 and circulates upstream of the fan 010.

[0003]

However, the conventional devices have the following disadvantages. a. Disadvantages of the first conventional example When a cassette is used as a load storage section, clean air flows in a horizontal direction with respect to the cassette. Therefore, even if the cassette is placed so that the direction in which the stored substrates are arranged is perpendicular to the flow direction of the clean air, that is, even if the cassette is placed so that the clean air flows between the adjacent substrates, the clean air is blocked by the lateral wall surface of the cassette. However, the clean air does not act on the entire surface of the substrate, and the cleanliness of the substrate itself is low.

B. Disadvantage of the second conventional example Since the clean air of the downflow flows, the disadvantage of the first conventional example does not occur, but the first filter 09 and the fan 0 are respectively stored in the two-stage storage units 01 and 01.
10. An air circulation path 013 must be provided. For this reason, there are drawbacks that the configuration is complicated and expensive, and the storage space is reduced.

The present invention has been made in view of such circumstances, and provides an apparatus capable of storing a substrate in a state of high cleanness at a low cost with a simple configuration and advantageously in terms of space. The purpose is to:

[0006]

The present invention has the following configuration in order to achieve the above object. That is, the invention according to claim 1 includes a plurality of shelf support members provided on the support member at a predetermined interval in the vertical direction and projecting horizontally from the support member, and provided on the shelf support member. And a shelf on which substrates for electronic component production are placed in parallel, provided in the clean room, and provided on the shelf, and flowing around the substrate from above an uppermost shelf support member. An opening through which the clean air of the down flow is passed, and suction means for applying suction pressure for sucking the clean air connected to the opening, and
A ventilation space is formed between the support member and the shelf to allow down-flow clean air to flow downward.

[0007] The invention described in claim 2 is the first invention.
In the substrate storage device in a clean room described in the above, the shelf is to place a cassette for mounting the substrates in parallel with a gap at predetermined intervals in plan view, and in the parallel direction of the substrates The width of the shelf is configured to be smaller than the width of the substrate loading / unloading opening of the cassette.

[0008] The invention described in claim 3 is the first invention.
Alternatively, in the substrate storage device in the clean room according to claim 2, an intake path communicating with the opening is formed in the shelf support member, and the intake path and the intake means are connected.

[0009]

The operation of the present invention is as follows. That is,
According to the first aspect of the present invention, the down-flow clean air flowing from above the uppermost shelf support member such as the uppermost part in the apparatus or the clean unit provided on the ceiling in the clean room is sucked by suction pressure by the suction means. Then, suction is performed through an opening provided in the shelf. By this suction, the clean air flows from above to below the substrates placed in parallel on the shelf, and acts on the entire surface of the substrate to store the substrate in a state of high cleanness. The clean air that was not sucked flowed from the entire periphery of the shelf to the lower shelf including the ventilation space formed between the support member and the shelf support member and the shelf, and was placed in parallel on the lower shelf. Flow on the substrate.

According to a second aspect of the present invention, a cassette accommodating a large number of substrates is placed on a shelf, clean air is supplied to the substrates, and the width of the shelf is reduced by a narrowed shelf. Flow clean air smoothly down the shelf.

According to the third aspect of the present invention, clean air is sucked from an opening through an intake path formed in the shelf support member.

[0012]

Next, embodiments of the present invention will be described in detail with reference to the drawings. FIG. 1 is an overall schematic plan sectional view showing an example of use of a substrate storage device in a clean room according to the present invention, FIG. 2 is an overall schematic longitudinal sectional view showing a first embodiment of the substrate storage device, and FIG. FIG. 2 is an AA line arrow view of FIG. FIG.
As shown in FIG. 1, a substrate storage device 3 is provided in a clean room adjacent to a substrate cleaning device 2 for cleaning a substrate 1 for manufacturing electronic components. A substrate transfer device 4 that transfers the substrate 1 between the substrate cleaning device 2 and the substrate storage device 3 is provided. Although not shown, a clean unit (not shown) is provided in the ceiling of the clean room, and down-flow clean air is flowing from the ceiling to below the floor 5 (see FIG. 2).

The substrate storage device 3 is provided with a cassette transport device 8 which holds two cassettes 7 and transports the cassette 7 in the vertical and horizontal directions at the center of the device body 6. The cassette storage units 9 are provided on both sides of the cassette storage unit 9.

One of the cassette storage unit 9 and the substrate transfer device 4
A temporary placement section 10 for temporarily placing the substrate 1 and the cassette 7 in order to transfer the substrate 1 between the substrate transport device 4 and the cassette transport device 8 is provided therebetween. The temporary placing portion 10 is provided with a comb member 11 having a substrate holding groove for holding the substrate 1 in a vertical posture. The cassette 7 containing the substrate 1 is lowered from above the comb member 11 to From the state where the substrate 1 is stored and held in the cassette 7, the lower end of the substrate 1 is inserted and held in the substrate holding groove of the comb member 11, and the substrate 1 can be taken out of the cassette 7 in this state. Conversely, by raising the cassette 7 with respect to the comb member 11,
The state in which the substrate 1 is held in the comb member 11 is changed to a state in which the substrate 1 is held in the cassette 7.

As shown in FIGS. 2 and 3, the cassette carrying device 8 is provided with a lifting table 13 which can be moved up and down on a supporting table 12 which moves along a conveying path. Lifting table 1
3 is provided with an arm support member 15 via a link mechanism 14. The arm support member 15 is provided with a pair of arms 16 and 16 for locking and holding the flanges on both sides of the cassette 7 so that the distance between the arms 16 can be changed. I have. With this configuration, the two cassettes 7, 7 can be conveyed by moving the pair of arms 16, 16 in parallel and driving them so as to move in the direction toward and away from each other.

A clean unit 19 containing a blower fan 17 and a filter 18 is provided above the transport path of the cassette transport device 8, the cassette storage units 9, 9 and the temporary storage unit 10 on both sides.

The cassette storage unit 9 is provided on a standing wall-shaped support member 20 provided along the outer wall of the apparatus main body 6 at a predetermined interval in the vertical direction and in a state of projecting horizontally from the support member 20, that is, in one piece. Two cassettes 7 each having a pair of shelf support members 21 provided in a three-tiered manner in which the substrates 1 are placed and stored in parallel on the shelf support members 21 in a vertical posture.
Is provided with a shelf 22 on which the.

As shown in a partially cutaway plan view of a main part of FIG. 4 and a cross-sectional view of FIG. 5 (a cross-sectional view taken along the line BB of FIG. 4), the support member 20 includes a support plate 20a having an upright wall shape. A pair of shelves comprising three square pipe-shaped support frames 20b attached to the support plate 20a at predetermined intervals in the vertical direction and a cover 20c attached over the vertically adjacent support frames 20b. Support member 21
Are integrally attached to the support frame 20b.

Further, on the side of the support member 20, side wall portions 20L and 20R of the support member 20 are provided.
The cover 20c, the side wall portion 20L of the support member 20, and the side wall portion 20R of the support member 20 form a space surrounding the shelf 22 in three directions. In addition, it is preferable that the support member 20 be provided with the side wall portions 20L and 20R, since the flow of the clean air is constrained to flow downward without deviating in the lateral direction, and the down flow can be surely formed even with a small flow rate. If a sufficient flow rate can be supplied from the clean unit 19, it is not always necessary to provide it.

As shown in FIG. 4, between the cover 20c and the shelf 22, which constitute the support member 20, is surrounded by the cover 20c, the pair of shelf support members 21, 21 and the shelf 22, and cleans the downflow. A ventilation space S through which air flows downward is formed.

The shelf 22 and the side wall 2 of the support member 20
0L, a ventilation space SL is provided between the shelf 22 and the support member 20.
A ventilation space SR is formed between each side wall portion 20R. The ventilation space between the support member 20 and the shelf 22 is optimally formed by the ventilation space S, the ventilation space SL, and the ventilation space SR. However, if at least one of them is formed. Good.

As shown in FIG. 5, the interior of each of the shelves 22 is formed in a hollow space S1, and a positioning member 23 for positioning and placing the four corners of the lower surface of the cassette 7 on the upper surface of the shelf 22; A large number of openings 24 for passing air through the hollow space S1 are formed.

A suction fan 25 as suction means is provided at a lower portion of the apparatus main body 6, and a pipe 26 is connected to the suction side of the suction fan 25. The shelf 22 has a hollow space S1
Is connected integrally to the pipe 26 and the pipe 2
7 are connected via a valve pipe 29 provided with a flow control valve 28. Further, the exhaust side of the suction fan 25 is directed to the lower side of the floor, and a suction force is applied to the opening 24 by the suction fan 25 so that the down-flow clean air is supplied to the opening 2.
4, the suction fan 25 sucks the air through the hollow space S1, the cylindrical portion 27, the valve pipe 29, and the pipe 26.

The opening of the flow control valve 28 of each shelf 22 is set so as to become smaller as the opening increases. As a result, the suction force of the suction fan 25 becomes smaller as compared to the upper shelf 22, and clean air can be satisfactorily flown to the substrates 1 stored in the cassettes 7 placed on all the shelves 22. In the figure, reference numeral 30 denotes a support leg provided on the lower surface of the apparatus main body 6 to install and support the apparatus main body 6 on the floor 5 of the clean room.

With the above configuration, the clean unit 19
The suction of the down-flow clean air flowing from around the cassette 7 to the uppermost shelf 22 side, and the adjacent substrates 1 stored and held in the cassette 7 placed on the uppermost shelf 22
The air flows downward from above to cause clean air to act on the entire surface of the substrate 1.

The clean air that has not been sucked is moved from the entire periphery of the uppermost shelf 22 to the lower shelf 2 including the ventilation space S.
2 and flows from above to below between the adjacent substrates 1 stored and held in the cassettes 7 placed on the intermediate shelf 22 and the lowermost shelf 22, respectively, so that clean air is
Act on the entire surface of

Thus, even if the substrate 1 rattles in the cassette 7 during transportation or the like and generates dust due to contact with the cassette 7, the generated dust is sucked without scattering and is in a state of high cleanness. The substrate 1 can be stored. In addition, the downflow of clean air flows around the cassette 7 to form an air curtain, which can prevent dust particles from scattering around.

FIG. 6 is a partially cutaway plan view of a main portion of the second embodiment of the substrate storage device, and shows a pair of shelf support members 31, 31.
Each is composed of a hollow rod and has an intake path S2 inside.
Is formed, and a flow control valve 32 is provided in each of the intake passages S2, and a pipe (not shown) is provided in the intake passage S2.
A suction fan (not shown) is connected through the connection. The other configuration is the same as that of the first embodiment, and the same drawing number is assigned and the description is omitted.

According to the second embodiment, the cylindrical portion 26 as in the first embodiment can be dispensed with. In addition, since the area of the ventilation space S can be increased, there is an advantage that clean air can easily flow to the lower shelf 22 side.

In the second embodiment, the shelf support member 3
Instead of forming each of the first and third members in the intake path S2, an intake pipe may be passed through each of the shelf support members 31 and 31.

FIG. 7 is a schematic side view showing a main part of a third embodiment of the substrate storage device. In the state where the cassette 7 is mounted on the shelf 41, the substrates 1 placed in parallel in the cassette 7 are shown. The width L1 of the shelf 41 in the parallel direction is smaller than the width L2 of the substrate loading / unloading opening 42 of the cassette 7. The other configuration is the same as that of the first embodiment, and the same drawing number is assigned and the description is omitted.

According to the third embodiment, the clean air flowing downward without being sucked into the opening 24 of the upper shelf 41 is
It is easy to flow toward the substrate loading / unloading opening 42 of the cassette 7 placed on the lower shelf 41, and clean air can be satisfactorily applied to the entire surface of the substrate 1 stored in the cassette 7.

FIG. 8 is a partially cutaway plan view of a main part of the fourth embodiment of the substrate storage device. One shelf support member 52 is provided at the center of the shelf 51 in the longitudinal direction. Member 52
Is provided on the support frame 20b constituting the support member 20, and between the shelf 51, the shelf support member 52, and the cover 20c constituting the support member 20, a downward U-shaped flow of clean air of down flow is provided. A ventilation space S3 is formed.

The shelf support member 52 is formed of a hollow rod to form an intake passage S4 therein, and a flow control valve 53 is provided in the intake passage S4, and a pipe (not shown) is provided in the intake passage S4. A suction fan (not shown) is connected through the connection. Other configurations are the same as the first embodiment,
The same drawing numbers are given and the description is omitted.

According to the first embodiment, since the area of the ventilation space S can be made larger, there is an advantage that clean air can easily flow to the lower shelf side.

In the above embodiment, the step formed between the support plate 20a and the support frame 20b is covered with the cover 20c, so that the clean air of the downflow from the clean unit 19 flows down smoothly. Alternatively, the shelf support member 21 may be integrally attached to the support plate 20a itself, and the support member 20 may be constituted only by the support plate 20a without providing the support frame 20b and the cover 20c. Various configuration variations are possible.

In the above-described embodiment, the clean unit 19 is provided in the apparatus main body 6. However, the present invention does not provide the clean unit 19, but allows the downflow from the clean unit provided on the ceiling in the clean room. The clean air may be taken in from the uppermost part of the apparatus main body 6.

Further, in the above embodiment, the clean air sucked through the opening 24 is made to flow under the floor of the clean room. However, the pipe 26 may be connected to the clean unit 19 and circulated.

In the above embodiment, the shelves 22, 41, 5
Although the cassettes 1 are placed on the cassette 1 and the substrates 1 are stored, a configuration may be used in which the substrates 1 can be placed and stored one by one in parallel.

[0040]

As is apparent from the above description, according to the first aspect of the present invention, the upper part of the shelf support member such as the uppermost part in the apparatus or the clean unit provided on the ceiling in the clean room. Flowing down-flow clean air from the
Since the substrates are stored in a state of high cleanliness, the configuration is simpler and inexpensive as compared with a case where a fan, a filter and an air circulation path are individually provided for each shelf as in the second conventional example described above. . In addition, since the fan, filter, and air circulation path device provided for each shelf are not required, the installation space can be used for the board storage space, and the vertical space between the shelves can be shortened, thereby expanding the board storage space. it can.

According to the second aspect of the present invention, the clean air flows smoothly to the lower shelf without being disturbed by the shelf.
Substrates can be stored in a state of high cleanliness.

According to the third aspect of the present invention, since the intake passage is formed by using the shelf support member, it is not necessary to provide a pipe for intake, the area of the ventilation space can be increased, and the clean air can be further reduced. Can flow well.

[Brief description of the drawings]

FIG. 1 is an overall schematic plan sectional view showing an example of use of a substrate storage device in a clean room according to the present invention.

FIG. 2 is an overall schematic longitudinal sectional view showing a first embodiment of the substrate storage device.

FIG. 3 is a view taken in the direction of arrows AA in FIG. 2;

FIG. 4 is a partially cutaway plan view of a main part of the first embodiment of the substrate storage device.

FIG. 5 is a sectional view taken along line BB of FIG. 4;

FIG. 6 is a partially cutaway plan view of a main part of a second embodiment of the substrate storage device.

FIG. 7 is a schematic side view showing a main part of a third embodiment of the substrate storage device.

FIG. 8 is a partially cutaway plan view of a main part of a fourth embodiment of the substrate storage device.

FIG. 9 is a schematic sectional view showing a carrier stocker of a second conventional example.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Substrate 7 ... Cassette 20 ... Support member 21 ... Shelf support member 22 ... Shelf 24 ... Opening 25 ... Suction fan (suction means) 31 ... Shelf support member 41 ... Shelf 42 ... Substrate loading / unloading 51 ... Shelf 52 ... Shelf support Member S: Ventilation space S2: Intake path S3: Ventilation space

Claims (3)

[Claims] 1. A plurality of shelf support members provided on a support member at a predetermined interval in a vertical direction and projecting horizontally from the support member, and provided on the shelf support member for manufacturing electronic components. A shelf storage device in a clean room, comprising: a shelf on which substrates are placed in parallel; a down-flow clean air that is provided on the shelf and flows around the substrate from above an uppermost shelf support member. And an intake means connected to the opening for applying suction pressure for sucking clean air, and flowing down-flow clean air downward between the support member and the shelf. A substrate storage device in a clean room, wherein a ventilation space is formed. 2. The substrate storage device in a clean room according to claim 1, wherein the shelf mounts a cassette for mounting the substrates in parallel at predetermined intervals in a plan view with a gap therebetween, and And a substrate storage device in a clean room, wherein a width of the shelf in the parallel direction of the substrates is smaller than a width of a substrate loading / unloading opening of the cassette. 3. The substrate storage device in a clean room according to claim 1, wherein an intake path communicating with the opening is formed in the shelf support member, and the intake path is connected to the intake means. Substrate storage device in a clean room.