JPH11104461A - Treatment of hazardous gas by using photocatalyst - Google Patents
Treatment of hazardous gas by using photocatalystInfo
- Publication number
- JPH11104461A JPH11104461A JP9289156A JP28915697A JPH11104461A JP H11104461 A JPH11104461 A JP H11104461A JP 9289156 A JP9289156 A JP 9289156A JP 28915697 A JP28915697 A JP 28915697A JP H11104461 A JPH11104461 A JP H11104461A
- Authority
- JP
- Japan
- Prior art keywords
- suspension
- gas
- treated
- harmful
- photocatalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011941 photocatalyst Substances 0.000 title claims abstract description 45
- 231100001261 hazardous Toxicity 0.000 title abstract 6
- 239000000725 suspension Substances 0.000 claims abstract description 53
- 238000000034 method Methods 0.000 claims abstract description 34
- 239000002245 particle Substances 0.000 claims abstract description 20
- 238000013032 photocatalytic reaction Methods 0.000 claims abstract description 10
- 238000000746 purification Methods 0.000 claims abstract description 5
- 238000003672 processing method Methods 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 230000001737 promoting effect Effects 0.000 claims description 3
- 239000007789 gas Substances 0.000 abstract description 74
- 238000004140 cleaning Methods 0.000 abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 7
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract description 6
- 239000002253 acid Substances 0.000 abstract description 6
- 230000001678 irradiating effect Effects 0.000 abstract description 5
- 150000001299 aldehydes Chemical class 0.000 abstract description 3
- 239000001569 carbon dioxide Substances 0.000 abstract description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract description 3
- 238000011084 recovery Methods 0.000 abstract description 3
- 238000000926 separation method Methods 0.000 abstract description 2
- 239000004615 ingredient Substances 0.000 abstract 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 1
- 150000007513 acids Chemical class 0.000 abstract 1
- 239000000460 chlorine Substances 0.000 abstract 1
- 229910052801 chlorine Inorganic materials 0.000 abstract 1
- 239000003205 fragrance Substances 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 229910052717 sulfur Inorganic materials 0.000 abstract 1
- 239000011593 sulfur Substances 0.000 abstract 1
- 238000005406 washing Methods 0.000 description 17
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 12
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 10
- 238000012545 processing Methods 0.000 description 9
- 230000001699 photocatalysis Effects 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 5
- 230000003197 catalytic effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 239000004408 titanium dioxide Substances 0.000 description 5
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- WQOXQRCZOLPYPM-UHFFFAOYSA-N dimethyl disulfide Chemical compound CSSC WQOXQRCZOLPYPM-UHFFFAOYSA-N 0.000 description 4
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 2
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- 206010007269 Carcinogenicity Diseases 0.000 description 1
- QMMFVYPAHWMCMS-UHFFFAOYSA-N Dimethyl sulfide Chemical compound CSC QMMFVYPAHWMCMS-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 230000000274 adsorptive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 230000007670 carcinogenicity Effects 0.000 description 1
- 231100000260 carcinogenicity Toxicity 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000003622 immobilized catalyst Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 150000004045 organic chlorine compounds Chemical class 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000007146 photocatalysis Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Catalysts (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、被処理ガス中の有
害成分を光触媒粒子の光触媒作用により分解除去する有
害ガス処理方法に関する。The present invention relates to a harmful gas treatment method for decomposing and removing harmful components in a gas to be treated by photocatalytic action of photocatalytic particles.
【0002】[0002]
【従来の技術】被処理ガス中に存在する有害成分、例え
ば、硫黄化合物(硫化水素、メチルメルカプタン、硫化
メチル、二硫化メチル、二硫化ジメチル等)、窒素化合
物(アンモニア、アミン類等)、アルデヒド類(ホルム
アルデヒド、アセトアルデヒド等)、ケトン類(アセト
ン等)、アルコール類(メタノール、エタノール等)な
どの多くの臭気成分、近年発癌性等で問題になっている
有機塩素化合物及びその他の有害成分を除去する方法と
しては、活性炭で有害成分を吸着除去する方法、或いは
酸、アルカリ又は酸化剤を含む吸収液で有害成分を吸収
する洗浄方法が代表的に知られている。2. Description of the Related Art Harmful components present in a gas to be treated, such as sulfur compounds (hydrogen sulfide, methyl mercaptan, methyl sulfide, methyl disulfide, dimethyl disulfide, etc.), nitrogen compounds (ammonia, amines, etc.), aldehydes Removes many odorous components such as aldehydes (formaldehyde, acetaldehyde, etc.), ketones (acetone, etc.), alcohols (methanol, ethanol, etc.), organic chlorine compounds and other harmful components which have recently become a problem due to carcinogenicity. As a method of performing the method, a method of adsorbing and removing harmful components with activated carbon or a washing method of absorbing harmful components with an absorbing solution containing an acid, an alkali, or an oxidizing agent is typically known.
【0003】前記活性炭を使用する方法は、吸着量が飽
和に近づくと吸着能力が無くなるので活性炭の再生が必
要になる。また、吸収液を使用する洗浄方法では、ガス
が溶解して飽和に近づくと吸収速度は低下し、ついには
吸収能力が無くなるので吸収液の補充と吸収液の後処理
が必要になるという問題がある。In the above-mentioned method using activated carbon, the adsorbing ability is lost when the amount of adsorption approaches saturation, so that the activated carbon needs to be regenerated. Further, in the cleaning method using the absorbing solution, the absorption rate decreases when the gas is dissolved and approaches the saturation, and eventually the absorbing ability is lost. Therefore, there is a problem that the replenishment of the absorbing solution and the post-treatment of the absorbing solution are required. is there.
【0004】一方、近年、光触媒を用いて被処理ガス中
の有害成分を分解除去する方法が提案されている。この
方法は光触媒に光を照射しながら有害成分を含む被処理
ガスを光触媒に直接接触させ、触媒表面で有害成分を分
解(主に酸化分解)するもので、光触媒の使用形態に応
じて二つの処理方法がある。On the other hand, in recent years, there has been proposed a method of decomposing and removing harmful components in a gas to be treated using a photocatalyst. In this method, the gas to be treated containing harmful components is brought into direct contact with the photocatalyst while irradiating the photocatalyst with light, and the harmful components are decomposed (mainly oxidatively decomposed) on the catalyst surface. There is a processing method.
【0005】光触媒を用いた第1の処理方法は、光触媒
の回収操作を不要にするため、担体表面に光触媒を固定
化した形態で光照射下で被処理ガスを接触させ処理する
方法である。[0005] The first treatment method using a photocatalyst is a method in which a gas to be treated is brought into contact with a gas to be treated under light irradiation in a form in which the photocatalyst is fixed on the surface of the carrier so as to eliminate the operation of recovering the photocatalyst.
【0006】光触媒を用いた第2の処理方法は、粒子状
の光触媒を石英ガラス等の光透過性容器(反応器)内に
充填し、外部より光を照射しながら反応器内に被処理ガ
スを供給して処理する方法である。In a second treatment method using a photocatalyst, a particulate photocatalyst is filled in a light-transmissive container (reactor) such as quartz glass, and a gas to be treated is introduced into the reactor while irradiating light from the outside. Is supplied and processed.
【0007】前記第1の処理方法では、光触媒微粒子
(例えばTiO2 等)を水ガラス等のバインダーを用い
て板状、ハニカム状、ファイバー状の支持材(例えば石
英ガラス等のガラス材やセラミック等)の表面に塗布し
た後、焼成して得られる固定化触媒が利用される。この
ように第1の処理方法では、光触媒の担持操作が複雑
で、またそのためのコストが高価であるという難点が有
り、しかも得られる光触媒は粒子形態に比べて表面積が
減少するため、触媒活性が低下して分解効率が著しく低
下するという問題がある。また光触媒成分が支持材から
剥離するといった寿命の問題がある。In the first processing method, photocatalyst fine particles (for example, TiO 2 ) are used as a plate-like, honeycomb-like, or fiber-like support material (for example, a glass material such as quartz glass, ceramic, etc.) using a binder such as water glass. The immobilized catalyst obtained by applying to the surface of the above (2) and then firing is used. As described above, in the first treatment method, there is a disadvantage that the operation of supporting the photocatalyst is complicated and the cost for the photocatalyst is expensive. In addition, the surface area of the obtained photocatalyst is reduced as compared with the particle form. Thus, there is a problem that the decomposition efficiency is remarkably reduced. In addition, there is a problem of a lifetime such that the photocatalyst component is separated from the support material.
【0008】前記第2の処理方法では、反応器外部より
光を供給するため、大型の装置(反応器)では光が内部
まで到達できず、光を反応器内部に供給することが困難
であるために、おのずと非常に小さな反応器に限定さ
れ、実用的ではないという問題がある。In the second processing method, since light is supplied from the outside of the reactor, light cannot reach the inside of a large-sized apparatus (reactor), and it is difficult to supply light to the inside of the reactor. Therefore, it is naturally limited to a very small reactor, and is not practical.
【0009】[0009]
【発明が解決しようとする課題】そこで本発明は、上記
した問題点を解決することを目的とし、具体的には、光
触媒の分離回収の操作を必要とせず、しかも光触媒を担
持する必要がなく、光触媒を表面積が大きい微粒子のま
まで使用することが可能な触媒活性が高い光触媒を用い
る有害ガス処理方法を提供することを目的とする。SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to solve the above-mentioned problems. Specifically, the present invention does not require an operation of separating and recovering a photocatalyst, and furthermore, does not need to carry a photocatalyst. Another object of the present invention is to provide a method for treating harmful gases using a photocatalyst having a high catalytic activity, which enables the photocatalyst to be used as fine particles having a large surface area.
【0010】[0010]
【課題を解決するための手段】前記した問題点を解決す
るために、本発明の第一番目の有害ガスの処理方法は、
有害成分を含む被処理ガスを光触媒粒子を含有する懸濁
液と光照射下で接触させて浄化処理することを特徴とす
る。Means for Solving the Problems In order to solve the above-mentioned problems, a first method for treating harmful gas of the present invention comprises:
Purification treatment is performed by bringing a gas to be treated containing harmful components into contact with a suspension containing photocatalyst particles under light irradiation.
【0011】本発明の第二番目の有害ガスの処理方法
は、有害成分を含む被処理ガスを光触媒粒子を含有する
懸濁液と接触させて有害成分を吸収させ、その後該懸濁
液に光を照射して浄化処理することを特徴とする。In the second method for treating harmful gases of the present invention, the gas to be treated containing harmful components is brought into contact with a suspension containing photocatalyst particles to absorb the harmful components, and then the suspension is subjected to light irradiation. And performing a purification treatment.
【0012】上記各本発明では、有害成分を含む被処理
ガスと光触媒粒子を含有する懸濁液を接触させることに
より、有害成分を含む被処理ガスは懸濁液との接触時に
該ガス中の有害成分が懸濁液に移行し、清浄ガスとな
る。一方、有害成分は懸濁液に吸収されると同時に光触
媒反応が行われて無害化され、或いは有害成分は懸濁液
に吸収された後に光触媒反応により無害化される。In each of the above-mentioned inventions, the gas to be treated containing the harmful component is brought into contact with the suspension containing the photocatalyst particles so that the gas to be treated containing the harmful component is brought into contact with the suspension during the contact with the suspension. The harmful components migrate into the suspension and become clean gas. On the other hand, the harmful components are detoxified by being absorbed in the suspension and simultaneously undergoing a photocatalytic reaction, or the harmful components are detoxified by the photocatalytic reaction after being absorbed by the suspension.
【0013】上記各本発明の有害ガスの処理方法におい
て、前記懸濁液は有害成分を含む被処理ガスとの接触に
より処理されたガスは清浄ガスとなって直ちに分離する
ので、残った懸濁液は、再度、有害成分を含む被処理ガ
スの吸収及び光触媒反応に使用可能となる。したがっ
て、分離された前記懸濁液を循環させて再度使用するこ
とにより、効率的な有害ガスの処理が可能となる。In the above method of treating harmful gases according to the present invention, the suspension is treated as a clean gas and the gas treated by contact with the gas containing harmful components is immediately separated, so that the remaining suspension is removed. The liquid is again available for absorption of the gas to be treated containing harmful components and for photocatalytic reactions. Therefore, by circulating the separated suspension and reusing it, efficient harmful gas treatment becomes possible.
【0014】上記第一番目の発明の有害ガスの処理方法
において、前記懸濁液が光照射を受けるときの形態は液
滴であることが、光照射効率を高め、従って、触媒反応
効率を高める点において望ましい。In the method for treating a harmful gas according to the first aspect of the present invention, the form in which the suspension is subjected to light irradiation is a droplet, so that the light irradiation efficiency is increased, and therefore, the catalytic reaction efficiency is increased. Desirable in point.
【0015】上記各本発明の有害ガスの処理方法におい
て、前記懸濁液には被処理ガス中の有害成分を吸収する
薬剤、光触媒反応を促進する薬剤、或いは装置内部の洗
浄のための薬剤が添加されていることが、前記懸濁液と
有害成分を含む被処理ガスとの接触において、被処理ガ
ス中の有害成分の懸濁液への移行を促進し、被処理ガス
を清浄化する上で、或いは光照射装置等の洗浄効果を高
め、効率的な光照射を行う上で好ましい。In each of the above-described harmful gas treatment methods of the present invention, the suspension contains a chemical for absorbing harmful components in the gas to be treated, a chemical for promoting a photocatalytic reaction, or a chemical for cleaning the inside of the apparatus. The addition promotes the transfer of the harmful components in the gas to be treated to the suspension in the contact between the suspension and the gas containing the harmful components, and purifies the gas to be treated. Alternatively, it is preferable to enhance the cleaning effect of the light irradiation device and perform efficient light irradiation.
【0016】[0016]
【発明の実施の形態】本発明の有害ガス処理方法を図1
及び図2に示す有害ガス処理装置の概念図に基づいて説
明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG.
And a conceptual diagram of the harmful gas treatment apparatus shown in FIG.
【0017】図1は有害ガスの処理方法に関する第一番
目の本発明の方法を行うための有害ガス処理装置の概念
図である。図1の有害ガス処理装置では、有害成分を含
む被処理ガスが被処理ガスライン1を通じて洗浄塔2下
部から供給される。一方、光触媒粒子を懸濁させた懸濁
液3が洗浄塔2上部から供給されて液滴となって落下
し、下部から供給された被処理ガスと流動状態で接触す
る。前記洗浄塔2には、例えば、スプレー塔、多孔板
塔、充填塔、ベンチュリースクラバー塔などのいずれ
か、或いはそれらを組み合わせた型式を使用することが
でき、懸濁液3を洗浄塔2下部から排出し、ポンプによ
り洗浄塔2上部へ供給して循環させている。FIG. 1 is a conceptual diagram of a harmful gas processing apparatus for performing a first method of the present invention relating to a method of processing harmful gases. In the harmful gas treatment apparatus shown in FIG. 1, a gas to be treated containing a harmful component is supplied from a lower portion of the washing tower 2 through a gas line 1 to be treated. On the other hand, the suspension 3 in which the photocatalyst particles are suspended is supplied from the upper portion of the washing tower 2, falls as droplets, and comes into contact with the gas to be treated supplied from the lower portion in a flowing state. The washing tower 2 can be, for example, any of a spray tower, a perforated plate tower, a packed tower, a Venturi scrubber tower, or a combination thereof. It is discharged and supplied to the upper part of the washing tower 2 by a pump and circulated.
【0018】5は光照射ランプ4の電源であり、洗浄塔
2中間部で光照射ランプ4より光が照射される。この光
照射下で、被処理ガス中の有害成分が液滴状態の懸濁液
3へ吸収され、同時に懸濁液3中の光触媒粒子表面で光
触媒反応が行われ、有害成分が分解される。Reference numeral 5 denotes a power supply for the light irradiation lamp 4, which is irradiated with light from the light irradiation lamp 4 in an intermediate portion of the washing tower 2. Under this light irradiation, the harmful components in the gas to be treated are absorbed by the suspension 3 in the form of droplets, and at the same time, a photocatalytic reaction is performed on the surface of the photocatalyst particles in the suspension 3 to decompose the harmful components.
【0019】懸濁液3には通常、水を用いることができ
るが、被処理ガス中の有害成分を吸収する目的、光触媒
反応を促進する目的、或いは装置内部の洗浄を目的とし
て、必要に応じて、酸、アルカリ、過酸化水素等の薬剤
を添加してもよい。Water can be usually used for the suspension 3, but it may be used for the purpose of absorbing harmful components in the gas to be treated, promoting the photocatalytic reaction, or cleaning the inside of the apparatus if necessary. Then, an agent such as an acid, an alkali, and hydrogen peroxide may be added.
【0020】有害成分が除去された処理ガスは、処理ガ
スライン6を介して直接又は必要に応じて活性炭吸着塔
(図示していない)を経て大気中へ放出される。懸濁液
3に吸収された有害成分は主に炭酸ガスや酸に分解或い
は変換され、懸濁液3に溶けるので、通常、懸濁液3の
再生は中和操作程度でよく、特別の再生操作を必要とし
ないが、被処理ガス中の水分が多く、凝縮して懸濁液3
が増加する場合とか、懸濁液3が汚れてきた場合は懸濁
液処理ライン7を介して触媒回収装置8へ供給し、沈殿
分離、遠心分離或いは膜分離等によって精製処理され
る。The processing gas from which the harmful components have been removed is discharged into the atmosphere via a processing gas line 6 directly or, if necessary, via an activated carbon adsorption tower (not shown). The harmful components absorbed in the suspension 3 are mainly decomposed or converted into carbon dioxide or acid and dissolved in the suspension 3, so that the regeneration of the suspension 3 usually requires only a neutralization operation. Although no operation is required, the water to be treated has a large amount of water and condenses to form a suspension 3
When the amount of water increases or when the suspension 3 becomes contaminated, it is supplied to the catalyst recovery unit 8 through the suspension treatment line 7 and purified by sedimentation, centrifugation or membrane separation.
【0021】図2は、有害ガスの処理方法に関する第二
番目の本発明の方法を行うための有害ガス処理装置の概
念図である。図1の有害ガス処理装置では、被処理ガス
及び洗浄塔2内を落下する液滴に光を供給した例を示し
たが、図2の有害ガス処理装置は、光照射を懸濁液3中
(触媒懸濁液)で行うためのものであり、光照射を懸濁
液3中で行う以外は図1と同様な方法で有害ガスの処理
が行える。すなわち、被処理ガスは被処理ガスライン1
を通じて洗浄塔2下部へ供給され(洗浄塔2は充填塔型
式の例として示した。)、有害成分は洗浄塔2上部より
供給され循環される懸濁液3に溶解した後、光照射反応
器9へ導入され、光照射されて光触媒反応により分解処
理される。FIG. 2 is a conceptual diagram of a harmful gas treatment apparatus for performing a second method of the present invention relating to a method of treating harmful gases. In the harmful gas treatment apparatus shown in FIG. 1, an example is shown in which light is supplied to the gas to be treated and droplets falling in the washing tower 2, but the harmful gas treatment apparatus shown in FIG. (Catalyst suspension), and the harmful gas can be treated in the same manner as in FIG. 1 except that light irradiation is performed in the suspension 3. That is, the gas to be treated is the gas line 1 to be treated.
The washing tower 2 is supplied to the lower part of the washing tower 2 through the washing tower 2 (the washing tower 2 is shown as an example of a packed tower type). 9, irradiated with light, and decomposed by a photocatalytic reaction.
【0022】尚、光照射反応器9内には反応促進や光照
射ランプ4の洗浄のために必要に応じて酸、アルカリ、
過酸化水素等の薬剤を添加したり、空気やオゾンを供給
してもよい。処理されたガスは処理ガスライン6を介し
て直接又は必要に応じて活性炭吸着塔(図示していな
い)を経て大気へ放出される。また図2の有害ガス処理
装置では光照射反応器9を洗浄塔2と切り離して設置し
たが、洗浄塔2内の底部に連続して光照射反応器9を設
けてもよい。The light irradiation reactor 9 contains an acid, an alkali, and
A chemical such as hydrogen peroxide may be added, or air or ozone may be supplied. The treated gas is released directly to the atmosphere via the treatment gas line 6 or, if necessary, via an activated carbon adsorption tower (not shown). Although the light irradiation reactor 9 is installed separately from the washing tower 2 in the harmful gas treatment apparatus of FIG. 2, the light irradiation reactor 9 may be provided continuously at the bottom in the washing tower 2.
【0023】本発明の有害ガス処理方法に使用される光
触媒としては、二酸化チタン、酸化亜鉛、三酸化タング
ステン等の酸化物、硫化カドミウム、硫化亜鉛等の金属
硫化物或いはこれらに白金、金、パラジウム等を添加し
た触媒を使用することができる。又は吸着力を有した比
表面積の大きなアルミナ、シリカ、活性炭等の多孔質性
物質の表面に二酸化チタン等の前記光触媒成分を担持さ
せたものを使用することもできる。The photocatalyst used in the harmful gas treatment method of the present invention includes oxides such as titanium dioxide, zinc oxide and tungsten trioxide; metal sulfides such as cadmium sulfide and zinc sulfide; and platinum, gold and palladium. And the like can be used. Alternatively, a porous material having a large specific surface area, such as alumina, silica, or activated carbon, having an adsorptive power and having the photocatalytic component such as titanium dioxide supported on the surface thereof may be used.
【0024】一般的には比較的安価であり、かつ毒性が
なく取扱の容易な二酸化チタン微粒子が光触媒として本
発明において好適に使用される。光触媒の粒径としては
細かいほど表面積が大きく触媒活性が大きいが、通常
0.01μm〜数mmのものが使用される。また、分散
液中の光触媒の使用量としては0.1〜50g/l、好
ましくは0.5〜10g/l程度である。In general, titanium dioxide fine particles which are relatively inexpensive and easy to handle without toxicity are preferably used as a photocatalyst in the present invention. The finer the particle size of the photocatalyst, the larger the surface area and the greater the catalytic activity. Usually, a photocatalyst having a particle size of 0.01 μm to several mm is used. The amount of the photocatalyst in the dispersion is 0.1 to 50 g / l, preferably about 0.5 to 10 g / l.
【0025】本発明の有害ガス処理方法において照射す
る光は、使用する半導体物質(二酸化チタン等の光触媒
成分)を励起する波長(可視及び/又は紫外光)を含む
ものであれば使用でき、具体的な光源としては低圧水銀
灯、高圧水銀灯、キセノンランプ、太陽光、エキシマレ
ーザー光等を用いることができる。The light irradiated in the harmful gas treatment method of the present invention can be used as long as it contains a wavelength (visible and / or ultraviolet light) that excites a semiconductor substance (a photocatalytic component such as titanium dioxide) to be used. As a typical light source, a low-pressure mercury lamp, a high-pressure mercury lamp, a xenon lamp, sunlight, excimer laser light, or the like can be used.
【0026】[0026]
〔実施例〕硫化水素5ppmを含有する空気を図1に示
すようなスプレー塔形式の洗浄塔(石英ガラス製、内径
100mm、塔高さ2m)の下部より毎分20リットル
で供給し、上部より二酸化チタン(粒径約10μm)5
g/lを含むpHが約6の水を毎分0.3リットルで循
環供給して10日間連続処理した。[Example] Air containing 5 ppm of hydrogen sulfide was supplied from a lower part of a spray tower type washing tower (made of quartz glass, an inner diameter of 100 mm, a tower height of 2 m) as shown in FIG. Titanium dioxide (particle size: about 10 μm) 5
Water having a pH of about 6 containing g / l was circulated and supplied at a rate of 0.3 liter per minute, and the water was continuously treated for 10 days.
【0027】尚、石英ガラス製の洗浄塔の中間部外壁に
設置された低圧水銀灯(20W、4本)より光を供給し
た。その結果、洗浄塔出口より排出された処理ガスの硫
化水素の除去率は試験期間の全てにおいて95%以上で
あった。Light was supplied from a low-pressure mercury lamp (20 W, four tubes) installed on the outer wall in the middle of the quartz glass washing tower. As a result, the removal rate of hydrogen sulfide in the processing gas discharged from the outlet of the washing tower was 95% or more in all the test periods.
【0028】〔比較例〕触媒の添加なしと光照射なし以
外は前記実施例と同じ条件で処理した。その結果、洗浄
塔出口より排出された処理ガス中の硫化水素の除去率は
試験当初、70〜80%であったが、時間と共に低下
し、10日後には20%以下に低下した。Comparative Example A treatment was performed under the same conditions as in the above example except that no catalyst was added and no light irradiation was performed. As a result, the removal rate of hydrogen sulfide in the processing gas discharged from the outlet of the washing tower was 70 to 80% at the beginning of the test, but decreased with time, and decreased to 20% or less after 10 days.
【0029】[0029]
【発明の効果】本発明の光触媒を用いた有害ガス処理方
法によれば、以下の効果が奏される。 光触媒成分を固定化せずに、懸濁液中に懸濁粒子とし
てそのまま使用しているので、即ち、触媒活性を有する
表面を露出したまま使用しているので、触媒活性が高
く、かつ光触媒の固定化のための加工が必要ないのでコ
ストを低くできる。また光触媒が固定化されていないの
で、支持材からの光触媒の剥離、劣化といった問題がな
い。According to the method for treating harmful gas using a photocatalyst of the present invention, the following effects are obtained. Since the photocatalytic component is used as suspension particles in a suspension without immobilization, that is, the photocatalytic component is used while exposing the surface having catalytic activity, the catalytic activity is high, and the photocatalytic Since there is no need for processing for fixing, the cost can be reduced. In addition, since the photocatalyst is not fixed, there is no problem such as peeling or deterioration of the photocatalyst from the support material.
【0030】光触媒は懸濁液中に懸濁粒子として循環
使用されるので、通常、光触媒の分離回収操作を必要と
しない。Since the photocatalyst is circulated as suspended particles in the suspension, the photocatalyst does not usually need to be separated and recovered.
【0031】光触媒を充填塔に充填して光を照射する
従来の方法では、照射される光が充填塔の最表面のみで
内部にまで到達せず、触媒反応が均一に行われないとい
う問題があるが、本発明の光触媒粒子を含有する懸濁液
の液滴に対して光を照射する場合には、光が内部まで到
達でき光触媒反応を効率的に行うことができる。In the conventional method of irradiating light by filling a packed tower with a photocatalyst, there is a problem that the irradiated light does not reach the inside only on the outermost surface of the packed tower and the catalytic reaction is not uniformly performed. However, when irradiating the droplets of the suspension containing the photocatalyst particles of the present invention with light, the light can reach the inside and the photocatalytic reaction can be efficiently performed.
【0032】光触媒粒子を液滴中又は液中で使用する
ため、被処理ガス或いは被処理ガスの分解産物である被
毒成分が光触媒に直接接触しないので、液体を介さずに
被処理ガスに光触媒が直接接触する従来の有害ガスの処
理方法に比べ、光触媒の被毒が防止され触媒活性の低下
の問題がない。Since the photocatalyst particles are used in droplets or in a liquid, the gas to be treated or a poisoning component which is a decomposition product of the gas to be treated does not come into direct contact with the photocatalyst. As compared with the conventional method of treating harmful gas which comes into direct contact with the harmful gas, the photocatalyst is prevented from being poisoned, and there is no problem of lowering the catalytic activity.
【0033】光触媒粒子を含有する懸濁液に吸収され
た被処理ガス中の有害成分が光触媒作用によって炭酸ガ
ス等の無害成分に変換され気相に放出されたり、或いは
酸などの別の物質に変換されるので、該懸濁液は絶えず
新たな被処理ガス中の有害成分の吸収が可能である。こ
のため、有害成分の吸収速度が早く、また有害成分を吸
収した懸濁液の再生が絶えず行われるので、通常は懸濁
液の再生操作を必要としない。The harmful components in the gas to be treated absorbed by the suspension containing the photocatalyst particles are converted into harmless components such as carbon dioxide by photocatalysis and released into the gas phase, or converted into another substance such as an acid. As it is converted, the suspension is constantly capable of absorbing harmful components in the fresh gas to be treated. Therefore, the absorption speed of the harmful component is high, and the suspension which has absorbed the harmful component is constantly regenerated. Therefore, the operation of regenerating the suspension is not usually required.
【図1】有害ガスの処理方法に関する第一番目の本発明
の方法を行うための有害ガス処理装置の概念図である。FIG. 1 is a conceptual diagram of a harmful gas treatment apparatus for performing a first method of the present invention relating to a method of treating harmful gases.
【図2】有害ガスの処理方法に関する第二番目の本発明
の方法を行うための有害ガス処理装置の概念図である。FIG. 2 is a conceptual diagram of a harmful gas treatment apparatus for performing a second method of the present invention relating to a method of treating harmful gases.
1 被処理ガスライン 2 洗浄塔 3 懸濁液 4 光照射ランプ 5 電源 6 処理ガスライン 7 懸濁液処理ライン 8 触媒回収装置 9 光照射反応器 DESCRIPTION OF SYMBOLS 1 Gas line to be processed 2 Cleaning tower 3 Suspension 4 Light irradiation lamp 5 Power supply 6 Processing gas line 7 Suspension processing line 8 Catalyst recovery device 9 Light irradiation reactor
Claims (5)
子を含有する懸濁液と光照射下で接触させて浄化処理す
ることを特徴とする有害ガス処理方法。1. A method for treating harmful gas, comprising purifying a gas to be treated containing harmful components by bringing it into contact with a suspension containing photocatalyst particles under light irradiation.
子を含有する懸濁液と接触させて有害成分を吸収させ、
その後該懸濁液に光を照射して浄化処理することを特徴
とする有害ガス処理方法。2. A gas to be treated containing a harmful component is brought into contact with a suspension containing photocatalyst particles to absorb the harmful component,
Thereafter, the suspension is irradiated with light for purification treatment.
された前記懸濁液を循環させて再度浄化処理に使用する
ことを特徴とする請求項1又は2記載の有害ガス処理方
法。3. The harmful gas treatment method according to claim 1, wherein the suspension used for purifying the gas to be treated containing harmful components is circulated and used again for purification treatment.
は液滴である請求項1又は3記載の有害ガス処理方法。4. The harmful gas processing method according to claim 1, wherein the suspension is subjected to light irradiation in the form of droplets.
を吸収する薬剤及び/又は光触媒反応を促進する薬剤が
添加されていることを特徴とする請求項1、2、3又は
4記載の有害ガス処理方法。5. The suspension according to claim 1, wherein an agent for absorbing harmful components in the gas to be treated and / or an agent for promoting a photocatalytic reaction are added to the suspension. The harmful gas treatment method described in the above.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9289156A JPH11104461A (en) | 1997-10-06 | 1997-10-06 | Treatment of hazardous gas by using photocatalyst |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9289156A JPH11104461A (en) | 1997-10-06 | 1997-10-06 | Treatment of hazardous gas by using photocatalyst |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11104461A true JPH11104461A (en) | 1999-04-20 |
Family
ID=17739497
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9289156A Pending JPH11104461A (en) | 1997-10-06 | 1997-10-06 | Treatment of hazardous gas by using photocatalyst |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11104461A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108240687A (en) * | 2016-12-27 | 2018-07-03 | 奥奈特有限公司 | deodorizing method and deodorization device |
CN117883973A (en) * | 2024-03-15 | 2024-04-16 | 山西大学 | Deodorizing device for livestock manure fermentation |
-
1997
- 1997-10-06 JP JP9289156A patent/JPH11104461A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108240687A (en) * | 2016-12-27 | 2018-07-03 | 奥奈特有限公司 | deodorizing method and deodorization device |
JP2018102622A (en) * | 2016-12-27 | 2018-07-05 | オーニット株式会社 | Deodorization method and deodorization device |
CN108240687B (en) * | 2016-12-27 | 2022-01-11 | 奥奈特有限公司 | Deodorizing method and deodorizing device |
CN117883973A (en) * | 2024-03-15 | 2024-04-16 | 山西大学 | Deodorizing device for livestock manure fermentation |
CN117883973B (en) * | 2024-03-15 | 2024-05-24 | 山西大学 | Deodorizing device for livestock manure fermentation |
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