JPH1074816A - Wafer transporting device - Google Patents
Wafer transporting deviceInfo
- Publication number
- JPH1074816A JPH1074816A JP22883396A JP22883396A JPH1074816A JP H1074816 A JPH1074816 A JP H1074816A JP 22883396 A JP22883396 A JP 22883396A JP 22883396 A JP22883396 A JP 22883396A JP H1074816 A JPH1074816 A JP H1074816A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- piece
- arm
- center
- semiconductor wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は半導体製造装置等に
用いられるウェファ搬送装置に係り、特に真空中でのウ
ェファの搬送に好適なウェファ搬送装置に関するもので
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wafer transfer device used for a semiconductor manufacturing apparatus and the like, and more particularly to a wafer transfer device suitable for transferring a wafer in a vacuum.
【0002】[0002]
【従来の技術】ウェファ搬送装置において、搬送中のウ
エハを保持する手段として真空チャックがよく用いられ
る。真空チャックに接するウエハに負圧を働かせること
によってウエハを真空チャックに吸着させる。2. Description of the Related Art In a wafer transfer apparatus, a vacuum chuck is often used as a means for holding a wafer being transferred. The wafer is attracted to the vacuum chuck by applying a negative pressure to the wafer in contact with the vacuum chuck.
【0003】ところで、一般に半導体デバイスの製造に
おいては、半導体製造装置の真空処理室内に被処理体で
ある半導体ウェファを搬入し、減圧雰囲気下で種々の処
理を行う工程が多く用いられている。この場合、減圧雰
囲気下の真空処理室に半導体ウェファを搬入し、また処
理の終わった半導体ウェファを真空処理室から搬出する
必要がある。このようなウェファ搬送装置では、アーム
先端部に半導体ウェファを載せたときの半導体ウェファ
の保持に真空吸着機構を利用することはできない。即
ち、真空処理室外の大気中では半導体ウェファを真空吸
着できるが、減圧雰囲気下では半導体ウェファに差圧が
作用しなくなるために真空吸着することができなくな
る。[0003] In general, in the manufacture of semiconductor devices, a process of carrying a semiconductor wafer as an object to be processed into a vacuum processing chamber of a semiconductor manufacturing apparatus and performing various processes under a reduced-pressure atmosphere is often used. In this case, it is necessary to load the semiconductor wafer into the vacuum processing chamber under a reduced-pressure atmosphere, and to transport the processed semiconductor wafer from the vacuum processing chamber. In such a wafer transfer device, the vacuum suction mechanism cannot be used for holding the semiconductor wafer when the semiconductor wafer is placed on the tip of the arm. That is, the semiconductor wafer can be vacuum-sucked in the atmosphere outside the vacuum processing chamber, but cannot be vacuum-sucked in a reduced-pressure atmosphere because the differential pressure does not act on the semiconductor wafer.
【0004】そこで従来は、アーム先端部に半導体ウェ
ファとの間の摩擦係数が大きな部材を設け、摩擦により
半導体ウェファがずれないようにして搬送している。Therefore, conventionally, a member having a large coefficient of friction between the arm and the semiconductor wafer is provided at the end of the arm, and the arm is transported so that the semiconductor wafer does not shift due to friction.
【0005】また、アーム先端部に半導体ウェファの外
形に合わせた円錐形の側壁部を設けたり3か所程度の突
起を設けて、円錐形側壁部や突起で形成される内接円の
中に半導体ウェファを置いて搬送するものがある。[0005] Further, a conical side wall portion corresponding to the outer shape of the semiconductor wafer is provided at an end portion of the arm, or approximately three projections are provided, so that an inscribed circle formed by the conical side wall portion and the projection is formed. In some cases, semiconductor wafers are placed and transported.
【0006】[0006]
【発明が解決しようとする課題】上記従来技術におい
て、摩擦を利用したものや半導体ウェファの外形に合わ
せた円錐形側壁部を設けたものは搬送速度を上昇させる
と位置ずれを生ずるため搬送速度を上昇させることがで
きず、半導体製造装置としてのスループット(生産性)
を向上させることができない。In the above-mentioned prior art, those using friction or those provided with a conical side wall portion conforming to the outer shape of the semiconductor wafer cause a positional shift when the conveying speed is increased, so that the transfer speed is reduced. Unable to increase, throughput as semiconductor manufacturing equipment (productivity)
Can not be improved.
【0007】また半導体ウェファの外形に合わせた突起
を設けたものは、突起で形成される内接円と半導体ウェ
ファの外形が近接していると、突起で形成される内接円
の上方に半導体ウェファを正確に位置合わせし、降下さ
せてアーム先端部に半導体ウェファを載置することが困
難になる。突起で形成される内接円を半導体ウェファの
外形より余裕をもって大きくすればアーム先端部への半
導体ウェファの載置は容易になるが、半導体ウェファの
周縁と突起との間の間隙も拡がる。搬送中に位置ずれで
突起に半導体ウェファの周縁が衝突し、脆性の高い半導
体ウェファなどは端部を欠損する恐れがある。In the semiconductor wafer provided with a protrusion corresponding to the outer shape of the semiconductor wafer, if the inscribed circle formed by the protrusion and the outer shape of the semiconductor wafer are close to each other, the semiconductor is placed above the inscribed circle formed by the protrusion. It becomes difficult to accurately position and lower the wafer and place the semiconductor wafer on the tip of the arm. If the inscribed circle formed by the protrusion is made larger than the outer shape of the semiconductor wafer with a margin, the mounting of the semiconductor wafer on the tip of the arm becomes easy, but the gap between the peripheral edge of the semiconductor wafer and the protrusion also increases. During transport, the periphery of the semiconductor wafer collides with the projection due to positional displacement, and a highly brittle semiconductor wafer or the like may lose its end.
【0008】それゆえ本発明の目的は、高速搬送が可能
で、アーム先端部へのウェファの載置も容易で、しかも
ウェファを欠損する恐れのないウェファ搬送装置を提供
することにある。It is therefore an object of the present invention to provide a wafer transfer device which can perform high-speed transfer, can easily place a wafer on the tip of an arm, and does not have a risk of losing the wafer.
【0009】[0009]
【課題を解決するための手段】上記問題を達成する本発
明ウェファ搬送装置の特徴とするところは、アーム先端
部にウェファを載置して搬送するウェファ搬送装置にお
いて、アーム先端部において、載置されるウェファの外
形に沿った位置に設けられた少なくとも3個のL字状部
材であって、各L字状部材は一対の片とその結合部を有
し、その結合部において前記アーム先端部に搖動可能に
支持され、一方の片が立上り他方の片が上記載置される
ウェファの中心位置に向って延びる、少なくとも3個の
L字状部材と、ウェファを載置した時に各L字状部材の
他方の片がそのウェファの重さを受けて、一方の片がウ
ェファ中心に近付くように各L字状部材を搖動させ、ウ
ェファが載置されていない時には該一方の片が載置され
るウェファ中心から離れ、放射状外側の方向に揺動する
ように各L字状部材を付勢する手段とを備えることにあ
る。A feature of the wafer transfer device of the present invention that achieves the above-mentioned problem is that a wafer transfer device that mounts and transfers a wafer at the tip of an arm is provided at the tip of the arm. At least three L-shaped members provided at positions along the outer shape of the wafer to be formed, wherein each L-shaped member has a pair of pieces and a coupling portion thereof, and the arm tip portion at the coupling portion At least three L-shaped members, each of which is swingably supported, one of which rises and the other of which extends toward the center position of the wafer on which the wafer is placed, and each of which is L-shaped when the wafer is placed thereon The other piece of the member receives the weight of the wafer and swings each L-shaped member so that one piece approaches the center of the wafer, and the one piece is placed when the wafer is not placed. Is the wafer center Km is to and means for urging the respective L-shaped member so as to swing in the direction of the radially outward.
【0010】本発明ウェファ搬送装置においては、ウェ
ファが載置されていない時には一方の各片が載置される
ウェファの放射状外側方向に傾いて、円錐形側壁部同様
の案内面を構成する。一方の各片の先端部で画定される
内接円内の上方にウェファを位置合わせする。ウェファ
に少々の位置ずれがあってもウェファは案内面によって
案内され、ウェファを下降させて他方の各片の上に載置
することができる。In the wafer transport apparatus of the present invention, when the wafer is not mounted, one of the pieces is inclined radially outwardly of the wafer on which one of the pieces is mounted to form a guide surface similar to the conical side wall portion. The wafer is positioned above the inscribed circle defined by the tip of each piece. Even if the wafer is slightly displaced, the wafer is guided by the guide surface, and the wafer can be lowered and placed on the other pieces.
【0011】他方の各片の上にウェファを載置した状態
では、他方の各片がそのウェファの重さを受けてL字状
部材を搖動させ、一方の各片を立上らせる。一方の各片
の先端部で形成される内接円の大きさが小さなものとな
ってウェファの外形に合わせた突起を設けたものと同様
にウェファの動きを拘束し、ウェファの位置ずれを阻止
する。In a state where the wafer is placed on the other piece, the other piece receives the weight of the wafer and swings the L-shaped member so that one piece stands up. The size of the inscribed circle formed at the tip of one of the pieces is small, and the movement of the wafer is restrained and the displacement of the wafer is prevented in the same way as the one with a projection that matches the outer shape of the wafer I do.
【0012】ウェファの位置ずれを阻止でき、しかも、
一方の各片の先端部で画定される内接円の大きさの変化
はウェファの有無によるもので格別な制御機構を必要と
しない。アーム先端部の構成を単純で軽量にできるか
ら、高速にウェファを搬送することができる。The wafer can be prevented from being displaced.
The change in the size of the inscribed circle defined by the tip of each piece depends on the presence or absence of the wafer, and does not require a special control mechanism. Since the configuration of the arm tip can be made simple and lightweight, the wafer can be transferred at high speed.
【0013】[0013]
【発明の実施の形態】以下、本発明の一実施形態を図
1、図2を参照して説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS.
【0014】図1において、ウェファ搬送装置1の駆動
部2にはモータ等が内蔵されていて第1アーム部3、第
2アーム部4、アーム先端部5を各々駆動軸の回りで回
転させ、アーム全体を旋回させたり伸縮させたりする駆
動を行なう。駆動機構は公知のものでよいので説明は省
略する。In FIG. 1, a motor or the like is built in a drive unit 2 of a wafer transfer device 1 to rotate a first arm 3, a second arm 4, and an arm tip 5 around a drive shaft, respectively. Driving for turning or expanding and contracting the entire arm is performed. Since the drive mechanism may be a known one, the description is omitted.
【0015】ウェファ搬送装置1のアーム先端部5はU
字状切欠き部5bを有するフォーク状部5aを備える。
フォーク状部5aに半導体ウェファ6を載置して、内蔵
モータの駆動で第1アーム3、第2アーム4、アーム先
端部5を任意の位置に動作させ、半導体ウェファ6を所
望の目的地へ移動搬送する。アーム先端部5のU字状切
欠き部5b内を半導体製造装置側の受け渡し装置が上下
して半導体ウェファ6の受け渡しを行なう。アーム先端
部5は3個のL字状のウェファ保持部材7を備えてい
る。各ウェファ保持部材は、2つの片とこれら2片が結
合する結合部を有し、結合部で搖動可能に軸受支持され
ている。図1においては、ウェファ保持部材7の立上っ
た片の内側に半導体ウェファ6が載置されている。ウェ
ファ保持部材7は、半導体ウェファ6との摩擦係数が小
さい滑りやすい素材で形成されている。The tip 5 of the arm of the wafer transfer device 1 is U-shaped.
A fork-shaped part 5a having a character-shaped notch 5b is provided.
The semiconductor wafer 6 is placed on the fork-shaped portion 5a, and the first arm 3, the second arm 4, and the arm tip 5 are moved to arbitrary positions by driving the built-in motor, and the semiconductor wafer 6 is moved to a desired destination. Move and transport. The transfer device on the semiconductor manufacturing apparatus side moves up and down in the U-shaped notch 5b of the arm tip 5 to transfer the semiconductor wafer 6. The arm tip 5 is provided with three L-shaped wafer holding members 7. Each wafer holding member has two pieces and a connecting part where these two pieces are connected, and the bearing is supported by the connecting part in a swingable manner. In FIG. 1, a semiconductor wafer 6 is placed inside a rising piece of a wafer holding member 7. The wafer holding member 7 is formed of a slippery material having a small coefficient of friction with the semiconductor wafer 6.
【0016】図2に示すように、L字状のウェファ保持
部材7は、載置される半導体ウェファの外形に沿った位
置に配置され、一方の片7aが立上り、他方の片7bが
載置される半導体ウェファ6の半径方向に沿って中心位
置に向って延び、2片の結合部(屈曲部)7cを中心に
所望の角度を揺動できるように支持されている。支持軸
8はL字状ウェファ保持部材7の結合部7cを回転可能
に支持し、揺動時の回転中心となる。内側の片7bの下
面には圧縮バ9が結合し、半導体ウェファ6が載置され
ていない時にはL字状ウェファ保持部材7を外側に傾け
る。但し、圧縮バネ9はウェファの荷重によって圧縮で
きるバネ定数を有する。この時、外側の片7aは、上に
向かって開いた傾斜面を作るように、載置される半導体
ウェファ6の放射状外側方向に傾く。As shown in FIG. 2, the L-shaped wafer holding member 7 is arranged at a position along the outer shape of the semiconductor wafer to be mounted, with one piece 7a rising and the other piece 7b being mounted. The semiconductor wafer 6 extends toward the center along the radial direction of the semiconductor wafer 6 and is supported so as to be able to swing at a desired angle around the two-piece joint (bend) 7c. The support shaft 8 rotatably supports the coupling portion 7c of the L-shaped wafer holding member 7, and serves as a rotation center when swinging. A compression bar 9 is coupled to the lower surface of the inner piece 7b, and when the semiconductor wafer 6 is not mounted, the L-shaped wafer holding member 7 is inclined outward. However, the compression spring 9 has a spring constant that can be compressed by the load of the wafer. At this time, the outer piece 7a is inclined in a radially outward direction of the semiconductor wafer 6 to be mounted so as to form an inclined surface that is open upward.
【0017】半導体製造装置側の受け渡し装置10は、
フォーク状部5aのU字状切欠き部5bを通過できるウ
ェファ載置台10aを有する。ウェファ載置台10a上
にウェファ6が載置される。The delivery device 10 on the semiconductor manufacturing device side includes:
It has a wafer mounting table 10a that can pass through the U-shaped notch 5b of the fork 5a. The wafer 6 is mounted on the wafer mounting table 10a.
【0018】ウェファ保持部材7の一方片7aが載置さ
れる半導体ウェファ6の放射状外側方向に揺動して傾い
ている時、一方片7aの先端部で画定される内接円は載
置される半導体ウェファ6の外形よりも寸法d分だけ大
きくなっている。従って、受け渡し装置10上のウェフ
ァ6が寸法dの範囲で位置ずれをしても、ウェファ6は
内接円内に収まる。従って、受け渡し装置10はその下
降時に容易に半導体ウェファ6をL字状ウェファ保持部
材7に受け渡すことができる。When one of the pieces 7a of the wafer holding member 7 swings in a radially outward direction of the semiconductor wafer 6 on which it is mounted and is inclined, the inscribed circle defined by the tip of the one piece 7a is mounted. Is larger than the outer shape of the semiconductor wafer 6 by the dimension d. Therefore, even if the wafer 6 on the transfer device 10 is displaced within the range of the dimension d, the wafer 6 is within the inscribed circle. Accordingly, the transfer device 10 can easily transfer the semiconductor wafer 6 to the L-shaped wafer holding member 7 when the transfer device 10 is lowered.
【0019】図2(b)は半導体ウェファ6が受け渡し
装置10の下降でアーム先端部5に受け渡された状況を
示している。受け渡し装置10の下降時に半導体ウェフ
ァ6の下面はウェファ保持部材7の他方片7bに接触す
る。仮にウェファの下面が他方片7bに接する前に、ウ
ェファの周縁が一方片7aの傾斜面に接した時は、ウェ
ファ周縁が一方片7aの傾斜面を滑りながら、ウェファ
は降下する。やがてウェファ下面が他方片7bに接す
る。FIG. 2B shows a situation where the semiconductor wafer 6 has been transferred to the arm tip 5 by the lowering of the transfer device 10. When the transfer device 10 is lowered, the lower surface of the semiconductor wafer 6 contacts the other piece 7b of the wafer holding member 7. If the peripheral edge of the wafer contacts the inclined surface of the one piece 7a before the lower surface of the wafer contacts the other piece 7b, the wafer descends while the peripheral edge of the wafer slides on the inclined surface of the one piece 7a. Eventually, the lower surface of the wafer contacts the other piece 7b.
【0020】バネ9の弾力が半導体ウェファ6の重力よ
り小さく設定されているのでバネ9は縮み、他方片7b
が半導体ウェファ6の重さを受けて降下する。L字形ウ
ェファ保持部材7は、支持軸8を回転中心として揺動
し、一方片7aを立上げ、他方片7bを載置される半導
体ウェファ6の下面に沿うよう沈ませる。他方片7bは
ウェファ6下面に沿って、その中心位置に向って延び
る。Since the elasticity of the spring 9 is set smaller than the gravitational force of the semiconductor wafer 6, the spring 9 contracts and the other piece 7b
Falls under the weight of the semiconductor wafer 6. The L-shaped wafer holding member 7 swings around the support shaft 8 to raise one piece 7a and sink the other piece 7b along the lower surface of the semiconductor wafer 6 to be mounted. The other piece 7b extends along the lower surface of the wafer 6 toward the center thereof.
【0021】立上った時の一方片7aの内接円の大きさ
は半導体ウェファ6の外形よりも僅かに大きい程度に選
定されている。従って、水平面内でのウェファ6の位置
自由度は小さい。アーム先端部5を高速に移動させても
立上った一方片7aが半導体ウェファ6の位置ずれや飛
び出しを阻止する。半導体ウェファ6の位置ずれは殆ど
無く、位置ずれで半導体ウェファ6が欠けるようなこと
はない。The size of the inscribed circle of the one piece 7a when it rises is selected to be slightly larger than the outer shape of the semiconductor wafer 6. Therefore, the degree of freedom of the position of the wafer 6 in the horizontal plane is small. Even when the arm tip 5 is moved at a high speed, the rising piece 7a prevents the semiconductor wafer 6 from shifting or jumping out. There is almost no displacement of the semiconductor wafer 6, and there is no possibility that the semiconductor wafer 6 is missing due to the displacement.
【0022】図2(b)の状態にある半導体ウェファ6
に対し受け渡し装置10が上昇して図2(a)のよう
に、半導体ウェファ6を受け取る場合には、半導体ウェ
ファ6がなくなることによってバネ9は他方片7bを押
し上げ、L字状ウェファ保持部材7を外側に傾ける。The semiconductor wafer 6 in the state shown in FIG.
2A, when the semiconductor wafer 6 is received as shown in FIG. 2 (a), the spring 9 pushes up the other piece 7b due to the absence of the semiconductor wafer 6, and the L-shaped wafer holding member 7 Tilt outward.
【0023】アーム先端部5表面に凹所を形成し、この
凹所内にL字状ウェファ保持部材7の他方片7bを収容
する。L字状ウェファ保持部材7の揺動範囲はアーム先
端部5の凹所形状で簡単に変更でき、アーム先端部5は
軽量にできる。A recess is formed in the surface of the arm tip 5 and the other piece 7b of the L-shaped wafer holding member 7 is accommodated in the recess. The swing range of the L-shaped wafer holding member 7 can be easily changed by the concave shape of the arm tip 5, and the arm tip 5 can be reduced in weight.
【0024】図1、図2の実施形態では半導体ウェファ
6は、ウェファ保持部材7の他方片7b上に載置されて
おり、接触面積が少なくて、汚染を受ける機会が少な
い。In the embodiments shown in FIGS. 1 and 2, the semiconductor wafer 6 is mounted on the other piece 7b of the wafer holding member 7, so that the contact area is small and the chance of contamination is small.
【0025】図3は他の実施形態を示している。図3で
図1、図2の実施形態と同一物、相当物には同一引用符
号を付けている。FIG. 3 shows another embodiment. In FIG. 3, the same components as those in FIGS. 1 and 2 are denoted by the same reference numerals.
【0026】図3の実施形態が図1、図2の実施形態と
異なる点は、バネ9が圧縮バネから引張バネに変えられ
ていることにある。図3(a)は、ウェファ6がウェフ
ァ保持部材7に接していない状態を示し、図3(b)は
ウェファ6がウェファ保持部材7上に載った状態を示
す。引張バネ9がウェファ保持部材7の外側立上がり片
を外側方向に引張ることにより、ウェファがない状態で
はウェファ保持部材7は外側に傾く。ウェファを載置す
ると、引張バネ9が伸び、ウェファ保持部材(の立上が
り片)を立上がらせる。The embodiment of FIG. 3 differs from the embodiments of FIGS. 1 and 2 in that the spring 9 is changed from a compression spring to a tension spring. FIG. 3A shows a state where the wafer 6 is not in contact with the wafer holding member 7, and FIG. 3B shows a state where the wafer 6 is placed on the wafer holding member 7. When the tension spring 9 pulls the outer rising piece of the wafer holding member 7 outward, the wafer holding member 7 is tilted outward in a state where there is no wafer. When the wafer is placed, the tension spring 9 is extended, and (the rising piece of) the wafer holding member rises.
【0027】図4はさらに他の実施形態を示している。
図4で図1、図2の実施形態と同一物、相当物には同一
引用符号を付けている。FIG. 4 shows still another embodiment.
In FIG. 4, the same components as those in the embodiments of FIGS. 1 and 2 are denoted by the same reference numerals.
【0028】図4の実施形態が図1、図2や図3の実施
形態と異なる点は、圧縮バネ9や引張バネ9を用いない
で、ウェファ保持部材7の重心位置に工夫が施されてい
ることにある。即ち、ウェファ保持部材7の重心Gは一
方片7a内に位置し、ウェファ6を載置した状態でも支
持軸8よりもウェファ半径方向外側にある。図では支持
軸8よりも高く、一方片7aの外面に近い位置に重心が
配置されている。The embodiment of FIG. 4 differs from the embodiments of FIGS. 1, 2 and 3 in that the center of gravity of the wafer holding member 7 is devised without using the compression spring 9 or the extension spring 9. Is to be. That is, the center of gravity G of the wafer holding member 7 is located within the one piece 7a, and is located outside the support shaft 8 in the wafer radial direction even when the wafer 6 is mounted. In the figure, the center of gravity is located at a position higher than the support shaft 8 and close to the outer surface of the piece 7a.
【0029】重心Gは常にウェファ保持部材を外側に設
ける方向のトルクを発生させる。そのために、ウェファ
保持部材7は半導体ウェファ6が載置されなければ図4
(a)のように、揺動して傾き、半導体ウェファ6が載
置されると、図4(b)のように半導体ウェファ6の重
量で一方片7aが立上がる。The center of gravity G always generates a torque in the direction in which the wafer holding member is provided outside. Therefore, if the semiconductor wafer 6 is not placed on the wafer holding member 7, the wafer holding member 7 shown in FIG.
As shown in FIG. 4A, when the semiconductor wafer 6 is swayed and tilted and placed, the one piece 7a stands up by the weight of the semiconductor wafer 6 as shown in FIG.
【0030】回転軸8とウェファ保持部材7の重心位置
Gの関係は、船舶が転覆する際の浮力の作用点と重心位
置の関係に類似する。復元力が働かず、ウェファ保持部
材(船舶)は倒れる。半導体ウェファ6はカヌーの横縁
に張り出された浮き材と同様の、倒れを防止する機能を
果たす。The relationship between the rotating shaft 8 and the position G of the center of gravity of the wafer holding member 7 is similar to the relationship between the point of action of buoyancy and the position of the center of gravity when the ship rolls over. The restoring force does not work, and the wafer holding member (ship) falls down. The semiconductor wafer 6 has the same function as a floating material protruding from the lateral edge of the canoe to prevent it from falling down.
【0031】なお、半導体ウェファ6がアーム先端部5
のフォーク状部5aに接触して重量の一部がフォーク状
部5aに掛けられてもよい。このような場合には、ウェ
ファ保持部材7の傾きを規正するだけでよいから、アー
ム先端部5におけるウェファ保持部材7の支持構成を極
めて単純なものとすることもできる。The semiconductor wafer 6 is connected to the arm tip 5
A part of the weight may be hung on the fork-shaped portion 5a in contact with the fork-shaped portion 5a. In such a case, it is only necessary to correct the inclination of the wafer holding member 7, so that the support structure of the wafer holding member 7 at the arm tip 5 can be made extremely simple.
【0032】以上の図3、図4の実施形態でも図1、図
2の実施形態と同様な作用効果が得られる。The same effects as those of the embodiment of FIGS. 1 and 2 can be obtained also in the embodiment of FIGS.
【0033】図1、図2の実施形態や図3、図4の実施
形態において、半導体ウェファ6の重量で一方片7aが
立上がった場合、一方片7aはアーム先端部5に対して
垂直でなく半導体ウェファ6上に覆いかぶさる形に傾斜
していても良い。半導体ウェファ6に対する保持特性の
向上が期待できる。逆に、一方片7aが立上がっても、
その内面が上向きに開いたテーパを形成してもよい。In the embodiment shown in FIGS. 1 and 2 and the embodiments shown in FIGS. 3 and 4, when one of the pieces 7a rises due to the weight of the semiconductor wafer 6, the one piece 7a is perpendicular to the arm tip 5. Alternatively, it may be inclined so as to cover over the semiconductor wafer 6. An improvement in the holding characteristics for the semiconductor wafer 6 can be expected. Conversely, even if one piece 7a rises,
The inner surface may form a taper that opens upward.
【0034】以上の実施形態では、半導体ウェファを例
に取って説明したが、コンパクトディスクなどの他のウ
ェファの搬送にも適用することができる。In the above embodiment, the semiconductor wafer has been described as an example, but the present invention can be applied to the transport of other wafers such as a compact disk.
【0035】以上実施例に沿って本発明を説明したが、
本発明はこれらに制限されるものではない。たとえば、
種々の変更、改良、組み合わせ等が可能なことは当業者
に自明であろう。The present invention has been described in connection with the preferred embodiments.
The present invention is not limited to these. For example,
It will be apparent to those skilled in the art that various modifications, improvements, combinations, and the like can be made.
【0036】[0036]
【発明の効果】以上説明したように本発明によれば、高
速搬送が可能で、アーム先端部へのウェファの載置も容
易で、しかもウェファを欠損する恐れのないウェファ搬
送装置を得ることができる。As described above, according to the present invention, it is possible to obtain a wafer transfer device capable of high-speed transfer, easy mounting of a wafer on the end of an arm, and free from the possibility of losing the wafer. it can.
【図1】本発明の一実施形態によるウェファ搬送装置の
斜視図である。FIG. 1 is a perspective view of a wafer transfer device according to an embodiment of the present invention.
【図2】図1に示したウェファ搬送装置のアーム先端部
のA−A切断線に沿った拡大断面図である。FIG. 2 is an enlarged cross-sectional view taken along the line AA of the arm tip of the wafer transfer device shown in FIG.
【図3】本発明の他の一実施形態によるウェファ搬送装
置のアーム先端部の拡大断面図である。FIG. 3 is an enlarged sectional view of a tip end of an arm of a wafer transfer device according to another embodiment of the present invention.
【図4】本発明のさらに他の一実施形態によるウェファ
搬送装置のアーム先端部の拡大断面図である。FIG. 4 is an enlarged cross-sectional view of a tip end of an arm of a wafer transfer device according to still another embodiment of the present invention.
1…ウェファ搬送装置 2…駆動部 3…第1アーム部 4…第2アー
ム 5…アーム先端部 5a…フォー
ク状部 5b…U字状切欠き部 6…半導体ウ
ェファ 7…L字状のウェファ保持部材 7a…一方片 7b…他方片 7c…屈曲部 8…支持軸 9…バネ 10…半導体製造装置側の受け渡し装置DESCRIPTION OF SYMBOLS 1 ... Wafer conveyance apparatus 2 ... Drive part 3 ... 1st arm part 4 ... 2nd arm 5 ... Arm tip part 5a ... Fork-shaped part 5b ... U-shaped notch part 6 ... Semiconductor wafer 7 ... L-shaped wafer holding Member 7a: One piece 7b: The other piece 7c: Bending portion 8: Support shaft 9: Spring 10: Delivery device on the semiconductor manufacturing device side
Claims (2)
るウェファ搬送装置において、 アーム先端部において、載置されるウェファの外形に沿
った位置に設けられた少なくとも3個のL字状部材であ
って、各L字状部材は一対の片とその結合部を有し、そ
の結合部において前記アーム先端部に搖動可能に支持さ
れ、一方の片が立上り他方の片が上記載置されるウェフ
ァの中心位置に向って延びる、少なくとも3個のL字状
部材と、 ウェファを載置した時に各L字状部材の他方の片がその
ウェファの重さを受けて、一方の片がウェファ中心に近
付くように各L字状部材を搖動させ、ウェファが載置さ
れていない時には該一方の片が載置されるウェファ中心
から離れ、放射状外側の方向に揺動するように各L字状
部材を付勢する手段とを備えることを特徴とするウェフ
ァ搬送装置。1. A wafer transport device for mounting and transporting a wafer on a tip of an arm, wherein at least three L-shaped members provided at positions along the outer shape of the wafer to be loaded at the tip of the arm. Wherein each of the L-shaped members has a pair of pieces and a joint thereof, and the joint is swingably supported by the distal end of the arm, and one of the pieces rises up and the other piece is placed thereon. At least three L-shaped members extending toward the center of the wafer, and the other piece of each L-shaped member receives the weight of the wafer when the wafer is placed, and one piece is the center of the wafer. Each L-shaped member is swung so as to approach the center of the wafer, and when the wafer is not placed, the one L-shaped member moves away from the center of the wafer on which the one piece is placed and swings radially outward. Means for biasing Wafer transfer apparatus according to claim and.
て、L字状部材を付勢する手段はバネまたは揺動中心よ
りも一方の片の外面側の位置に置かれたL字状部材の重
心であることを特徴とするウェファ搬送装置。2. The wafer conveying device according to claim 1, wherein the means for urging the L-shaped member is a spring or a L-shaped member disposed at a position on the outer surface side of one of the pieces with respect to a swing center. A wafer transport device having a center of gravity.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22883396A JPH1074816A (en) | 1996-08-29 | 1996-08-29 | Wafer transporting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22883396A JPH1074816A (en) | 1996-08-29 | 1996-08-29 | Wafer transporting device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH1074816A true JPH1074816A (en) | 1998-03-17 |
Family
ID=16882580
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22883396A Pending JPH1074816A (en) | 1996-08-29 | 1996-08-29 | Wafer transporting device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH1074816A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100333362B1 (en) * | 1999-09-16 | 2002-04-18 | 박종섭 | Wafer fixing equipment |
KR100665833B1 (en) * | 2000-09-01 | 2007-01-09 | 삼성전자주식회사 | Bake apparatus |
JP2007220868A (en) * | 2006-02-16 | 2007-08-30 | Yaskawa Electric Corp | Substrate carrying/treating equipment |
JP2008213063A (en) * | 2007-03-01 | 2008-09-18 | Hitachi Ltd | Clamping device and automatic aligning and holding method of workpiece |
US7748760B2 (en) | 2006-10-27 | 2010-07-06 | Daihen Corporation | Work holding mechanism |
WO2013027605A1 (en) * | 2011-08-25 | 2013-02-28 | 東京エレクトロン株式会社 | Conveyance mechanism |
CN105225995A (en) * | 2014-06-30 | 2016-01-06 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Wafer transmission set and processing chamber |
CN111199909A (en) * | 2018-11-19 | 2020-05-26 | 北京北方华创微电子装备有限公司 | Base component and semiconductor processing equipment |
CN113897588A (en) * | 2021-09-24 | 2022-01-07 | 北京北方华创微电子装备有限公司 | Shielding device and semiconductor processing equipment |
-
1996
- 1996-08-29 JP JP22883396A patent/JPH1074816A/en active Pending
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100333362B1 (en) * | 1999-09-16 | 2002-04-18 | 박종섭 | Wafer fixing equipment |
KR100665833B1 (en) * | 2000-09-01 | 2007-01-09 | 삼성전자주식회사 | Bake apparatus |
JP2007220868A (en) * | 2006-02-16 | 2007-08-30 | Yaskawa Electric Corp | Substrate carrying/treating equipment |
KR101404175B1 (en) * | 2006-10-27 | 2014-06-05 | 가부시키가이샤 다이헨 | Work holding mechanism |
US7748760B2 (en) | 2006-10-27 | 2010-07-06 | Daihen Corporation | Work holding mechanism |
KR101404177B1 (en) * | 2006-10-27 | 2014-06-09 | 가부시키가이샤 다이헨 | Work holding mechanism |
TWI403398B (en) * | 2006-10-27 | 2013-08-01 | Daihen Corp | Work holding mechanism |
JP2008213063A (en) * | 2007-03-01 | 2008-09-18 | Hitachi Ltd | Clamping device and automatic aligning and holding method of workpiece |
WO2013027605A1 (en) * | 2011-08-25 | 2013-02-28 | 東京エレクトロン株式会社 | Conveyance mechanism |
CN105225995A (en) * | 2014-06-30 | 2016-01-06 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Wafer transmission set and processing chamber |
CN111199909A (en) * | 2018-11-19 | 2020-05-26 | 北京北方华创微电子装备有限公司 | Base component and semiconductor processing equipment |
CN111199909B (en) * | 2018-11-19 | 2023-06-16 | 北京北方华创微电子装备有限公司 | Base assembly and semiconductor processing equipment |
CN113897588A (en) * | 2021-09-24 | 2022-01-07 | 北京北方华创微电子装备有限公司 | Shielding device and semiconductor processing equipment |
WO2023045190A1 (en) * | 2021-09-24 | 2023-03-30 | 北京北方华创微电子装备有限公司 | Shielding device and semiconductor process apparatus |
CN113897588B (en) * | 2021-09-24 | 2023-09-08 | 北京北方华创微电子装备有限公司 | Masking device and semiconductor processing equipment |
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